Vacuum Evaporation PVD System Machine For Metal, OLEDs, Organic

Vacuum Evaporation PVD System Machine For Metal, OLEDs, Organic    TMAX-QH-ZD02-High-Vacuum Multi-Material Evaporation Technical Specifications No. Parameter Description 1 Ultimate Vacuum ≤4×10⁻⁵ Pa (new equipment) 2 Leak Rate 6.7×10⁻⁸ Pa·L/S 3 Working Vacuum 5×10⁻⁴ Pa (Time to reach from atmosphere: <30 min, cold state with glovebox integration) 4 Pressure Holding ≤2 Pa after 12 hours (post pump shutdown) 5 Sample Size 130×130 mm (16× 25×25 mm samples; includes 2 sets) 6 Sample Holder Size 146×146 mm 7 Source-Substrate Distance 320 mm 8 Sample Rotation 0–30 RPM (water-cooled) 9 Evaporation Sources 4× metal + 4× organic sources (2 organic sources on inner/outer door, 2 metal sources on each side) 10 Substrate Lift Fixed (non-adjustable) 11 Chamber Access Manual front-opening door 12 Thickness Probes 4× water-cooled probes (above sources) 13 Mask Storage Optional 14 Sample Loading Side-insertion 15 Deposition Control Auto rate/power/temperature control 16 Pumping System Automated vacuum sequencing 17 Film Uniformity ±5% (for 100 nm films) 18 Safety Features Anti-implosion, auto gas refill, environmental thermocouple Key Features 1. High-Precision Deposition Control · Automated Rate/Power/Temperature Control: Ensures repeatable thin-film growth for research and small-scale production. · Real-Time Thickness Monitoring (4× Probes): Enables accurate multilayer deposition with ±5% uniformity. · Dual-Source Configuration (4 Metal + 4 Organic): Supports co-evaporation for advanced materials like perovskites and organic semiconductors. 2. Optimized for Efficiency & Stability · Fast Pump-Down (<30 min to 5×10⁻⁴ Pa): Reduces downtime between batches, improving lab productivity. · Low Leak Rate (6.7×10⁻⁸ Pa·L/S): Maintains ultra-high vacuum integrity for sensitive processes. · Long-Term Pressure Holding (≤2 Pa after 12 hours): Minimizes re-pumping time for multi-step experiments. 3. User-Friendly Design · Side-Loading & Front-Opening Chamber: Compatible with glovebox workflows, reducing contamination risks. · Water-Cooled Sample Rotation (0–30 RPM): Enhances film homogeneity while preventing thermal damage. · Optional Mask Storage: Enables patterned deposition for micro/nanofabrication. 4. Robust Safety Protections · Anti-Implosion Design: Safeguards against chamber breaches during high-vacuum operation. · Auto Gas Refill & Environmental Thermocouple: Protects samples and equipment during reactive material handling. Application Areas 1. Advanced Optoelectronic Research · OLEDs & Organic Electronics: Precise co-evaporation of metal-organic layers for emissive devices. · Perovskite Solar Cells: Uniform thin-film deposition for high-efficiency photovoltaic research. · Quantum Dots & 2D Materials: Controlled growth of nanoscale films for photonics and sensors. 2. Industrial Thin-Film Development · Barrier Coatings: Ultra-thin encapsulation layers for flexible electronics. · MEMS & Sensors: High-purity metal/oxide deposition for microfabrication. · Optical Coatings: Low-defect films for lenses, mirrors, and filters. 3. Customizable for Specialized Needs · In-Situ Monitoring Upgrades: Additional diagnostics (e.g., RHEED, quartz crystal microbalance) available. · Multi-Source Expansion: Accommodates complex material stacks (e.g., ternary systems). Why Choose This System? ✔ Lab-Optimized Throughput: Balances high sample capacity (16×25 mm substrates) with research-grade precision. ✔ Glovebox-Compatible: Ideal for air-sensitive materials like lithium or reactive organics. ✔ Future-Ready Design: Modular options support evolving thin-film R&D demands.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }