products categories
- Battery Production Equipment Line
- Battery Lab Pilot Equipment Line
- Lithium Battery Pack Assembly Line
- Solid State Battery Assembly Line
- Sodium Ion Battery Production Line
- Supercapacitor Assembly Line
- Lithium Ion Battery Recycling Plant
- Dry Electrode Preparation Solution
- Perovskite Based Solar Cell Lab Line
- Li ion Battery Materials
- Cathode Active Materials
- Anode Active Materials
- Customized Battery Electrode
- Coin Cell Parts
- Lithium Chip
- Cylindrical Cell Parts
- Battery Current Collectors
- Battery Conductive Materials
- Electrolyte
- Metal Mesh
- Battery Binder
- Separator and Tape
- Aluminum Laminate Film
- Nickel Strip
- Battery Tabs
- Graphene Materials
- Nickel Felt
- Titanium Fiber Felt
- Battery
- Battery Pack Machine & Compoments
- Battery Pack Compoments
- Turnkey Solutions Battery Pack Assembly Line
- Cell Sorter
- Battery Pack Spot Welder
- Laser Welder
- Battery Charging Discharging Tester
- Battery Pack Aging Machine
- Battery Pack Comprehensive Tester
- CCD Visual Inspector
- Battery Pape Sticking Machine
- BMS Testing Machine
- Al Wire Bonding Machine
- Lithium Battery Machine
- Battery Tester & Analyzer
- Battery Safety Tester
- Material Characterization Tester
- Rolling Press Machine
- Spot Welding Machine
- Vacuum Mixer Machine
- Crimping/Disassembling Machine
- Vacuum Sealing Machine
- Electrolyte Filling
- Stacking/Winding Machine
- Electrode Cutter/Slitter
- Pouch Forming Machine
- NMP Solvent Treatment System
- Lithium Battery Production Plant
- Vacuum Glove Box
- Furnaces
- Coaters
- PVD Coater
- Laboratory Press Machine
- Large Press Machine
- Planetary Centrifugal Mixer
- Ball Mill
- Laboratory Machine
- Cutting Machine
- Metal Foam
contact us
- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
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Lab High Speed Programmable Vacuum Spin Coater of 6000 rpm Speed
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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Automatic Vertical Plate Gap Coater For Battery Production Electrode Making or Tape Casting Preparation.
TMAX-CF650 is a compact hydraulic crimper for sealing all types of cylinder cases in battery R&D labs. The compact body design allows it to be easily placed inside a glove box and thus preventing contamination of the electrolyte materials during cell assembly. Simple operation with safety protection feature allows customers to master the sealing procedure within 5 minutes.
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Lab Vertical Type Vacuum Spin Film Coater with Vacuum Chunk Optional 200 to 600mm Substrate
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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Dual-Filtration System for NMP Vapor of Li-ion Battery Coating
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Lab Cheap Vacuum Desktop Rotary Coating Instrument with Plate Holder
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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Lab Benchtop Vacuum Thermal Evaporating Carbon Coater or SEM Sample Coater
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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High Vacuum Thermal Evaporation Coater With Three Kinds Of Evaporation Head Heat Evaporation Carbon Rod Molybdenum Boat Tungsten Wire Bar
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film
Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film Model: TMAX-PC-JS08-Dual-Target, Multilayer Films Deposition Equipment Purpose Designed for nano-scale single/multilayer functional films (hard coatings, metals, semiconductors, dielectrics). Features pre-sputtering cleaning for enhanced adhesion. System Components · Vacuum chamber, dual magnetron targets, heating stage, DC/RF power supplies, gas delivery, vacuum pumps, control system. Technical Parameters Category Specification Chamber Structure Vertical front-loading; stainless steel/vacuum materials Base Pressure ≤5×10−5 Pa Leak Rate ≤5×10−7 Pa·L/s Pressure Rise Rate ≤10 Pa (after 12 hours, pump off) Pumping System Domestic molecular pump + mechanical pump Targets 2× 4-inch HV (1 standard-field, 1 strong-field); DC/RF compatible (Kurt J. Lesker) Target-Sample Distance 40–120 mm (multilayer); 80–120 mm (with ion source) Power Supplies RF: 1000 W, 13.56 MHz (auto-matching); DC: 1000 W (AE brand) Sample Stage 3 substrates; 5–30 RPM rotation; 450°C heating; 1000 V bias Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm (±5% uniformity over 2-inch area) Adhesion Test Passes 3-tape peel (glass/Si/ceramic) Gas System 2 MKS mass flow controllers (Ar + reactive gas); mixing capability Baking Temperature 150°C (infrared heating) Key Features 1. Dual-Target Flexibility o Enables co-sputtering or sequential deposition for complex multilayers. 2. High Adhesion & Cleanliness o Integrated pre-sputtering cleaning and ion-assisted deposition (anode-layer source). 3. Precision Process Control o Programmable temperature (450°C max), rotation (5–30 RPM), and gas flow. 4. Safety & Reliability o Interlocks for power/water failures; manual controls for critical operations. Target Applications · Research: Nanomaterials, thin-film physics, prototype development. · Education: Advanced deposition techniques training. · Industry: Small-batch functional coatings (e.g., optics, electronics). html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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Multi-target Magnetron Sputtering Coating System For Multilayer Thin Film Fabrication
Multi-target Magnetron Sputtering Coating System For Multilayer Thin Film Fabrication Model: TMAX-TK-JS01-Multilayer Thin Film Fabrication Technical Parameters Parameter Specification Model TMAX-TK-JS01 Vacuum Chamber Structure Vertical top-opening design, manual gas spring lift Chamber Dimensions Φ220mm × H300mm Heating Temperature Room temperature to 500°C Substrate Holder Size Φ100mm (rotatable, heated) Film Uniformity ≤ ±5.0% within Φ50mm area Sputtering Target 1 × Φ2-inch magnetron target (DC/RF compatible) Process Gas Control 1–2 channels, precision ±0.1 sccm Control System PLC + touchscreen interface Footprint (Main Unit) 600mm (L) × 800mm (W) × 1700mm (H) Power Consumption ≥6 kW Base Vacuum 6.6×10⁻⁵Pa Pumping Time ≤15 min (from atmosphere to 7×10⁻³Pa) Applications Designed for thin-film research and small-batch production, ideal for: · Academic labs: Universities and research institutes studying novel materials. · Industrial R&D: Prototyping functional coatings (e.g., ITO for solar cells, wear-resistant alloys). Key Features 1. Multi-Mode Sputtering ·Supports DC, RF, and pulsed sputtering for metals, oxides, and semiconductors. ·Single-/multi-target configurations for layered or composite films. 2. User-Friendly Operation ·Automated PLC control with real-time monitoring via touchscreen. ·Substrate heating (≤300°C) and rotation (2–20 rpm) for uniform coatings. 3. Compact & Reliable ·Minimal footprint, low maintenance, and energy-efficient design. 4. Safety & Precision ·Water-cooling protection, gas flow control (±0.1 sccm), and arc suppression. Quick Start Guide 1. Installation: ·Ensure stable power (AC 380V ±5%, ≥8 kW), cooling water (≥10 L/min), and proper grounding (<3Ω). ·Verify vacuum seals and gas connections before startup. 2. Operational Workflow: ·Pumping: Start mechanical pump → Open foreline valve → Activate molecular pump (at >5 Pa). ·Deposition: Set substrate temperature → Adjust gas flow → Initiate sputtering (5–15 W/cm² target power). ·Shutdown: Cool substrate (<50°C) → Vent chamber → Maintain pump oil/clean seals regularly. 3. Maintenance Tips: ·Replace mechanical pump oil every 500 operational hours. ·Clean chamber and target surfaces after each use to avoid cross-contamination. Summary The TMAX-TK-JS01 combines research-grade precision with industrial durability, offering: · Flexibility: Adaptable to diverse materials (metals, dielectrics, etc.). · Efficiency: Fast pumping, intuitive controls, and low running costs. · Support: Comprehensive manuals and technical assistance provided. For advanced applications (e.g., perovskite layers), consult the manufacturer for tailored process parameters. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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Lab Small Vacuum Programmable Spin Coater Using for Perovskite Solar Cell Fabrication
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