Nano Vacuum Magnetron Ion Sputtering Coater For Thin Film Fabrication

Nano Vacuum Magnetron Ion Sputtering Coater For Thin Film Fabrication     Model:  TMAX-ZK-JS05- Compact Ion Sputtering Coater Overview The TMAX-ZK-JS05 Compact Ion Sputtering Coater is designed for depositing conductive gold films on samples for scanning electron microscopy (SEM). With user-friendly operation, it is an essential tool for sample preparation in small to medium-sized SEM laboratories. Key Applications · Gold ion sputtering for SEM sample coating. · Compatible with target materials: Au, Pt, Cr, Ag, Ti, Cu, Ni, Au-Pd alloy, etc. Technical Specifications Category Specification Chamber Material Glass Chamber Dimensions Ø100 mm (diameter) × 130 mm (height) Sample Stage (Small) Ø40 mm (holds 6 sample cups simultaneously) Sample Stage (Large, Optional) Ø60 mm Gold Target Size Ø58 mm Vacuum Pump Two-stage direct-drive rotary vane pump (1 L/s) Vacuum Measurement Pirani gauge Vacuum Protection 20 Pa with fine-adjustment gas inlet valve Working Gases Air / Argon (dedicated inlet with flow control) Features & Advantages · Robust Design – Special sealing structure minimizes glass chamber damage. · High Compatibility – Supports Au, Pt, Cr, Ag, Ti, Cu, Ni, and Au-Pd alloy targets. · Precision Control – Adjustable gas flow and vacuum protection ensure uniform coatings. · Efficient Workflow – Dual-stage platform allows batch processing (6 samples at once). Recommended Applications ✔ SEM Sample Prep – Ideal for non-conductive specimen coating. ✔ Materials Research – Thin-film deposition for nanotechnology studies. ✔ Industrial QC – Reliable performance for repeatable conductive layering.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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PVD Magnetron Sputter Coating System For SEM & Wafer Sample Preparation

PVD Magnetron Sputter Coating System For SEM & Wafer Sample Preparation       Model:  TMAX-ZK-JS04- DC Ion Sputtering Coater Technical Specifications Parameter Specification Target Materials Standard: Au (Gold), 57mm diameter × 0.1mm thick  Optional: Pt (Platinum) Standard Sample Holder Holds 12 SEM stubs, height adjustment range: 60mm Rotating/Tilting Stage (Optional) Rotation: 0–60 rpm (continuously adjustable)  Tilt: -90° to +90° (continuously adjustable)  Standard rotating platform: 40mm diameter (holds 4 sample holders, custom sizes available)  Dual locking mechanism for secure fixation Sputtering Current 5–30mA (microprocessor-controlled, programmable) Meters Vacuum: Atm – 1×10⁻³ mbar  Current: 0–99mA Control Method Microprocessor with Start/Pause buttons  Programmable time (1–999s)  Auto-pumping, sputtering, and venting Vacuum System Pumping speed: 133 L/min  Ultimate vacuum: 10⁻⁴ mbar  Noise level: 56 dB Key Features & Applications 1. Precision and Flexibility · Adjustable sputtering current (5–30mA) and rotating/tilting stage enable uniform thin-film deposition for diverse sample geometries. · Dual locking mechanism prevents sample displacement during operation. 2. High-Quality Coating · Gold (Au) and Platinum (Pt) targets ensure high-purity conductive coatings for SEM and analytical applications. 3. Automated & User-Friendly Operation · Programmable controls and auto-venting enhance efficiency and safety. 4. Compact & Low-Noise Design · Stainless steel chamber (120mm × 75mm) with observation window (120mm × 45mm) provides durability and visibility. · Low 56 dB noise level ensures a comfortable working environment. Ideal Applications · SEM sample preparation (conductive coating) · Thin-film deposition for research and industrial applications · Multi-sample processing (supports 12 SEM stubs) · Angle-dependent deposition (with optional rotating/tilting stage) This sputtering system is optimized for laboratories requiring high precision, automation, and versatile coating capabilities.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); 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Paper Wax Paraffin Coating Machine Single Side Waxen Coater

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Anti-Corrosion Spin Coater ( 8000 RPM & 6" wafer Max.) with Complete Accessories

Anti-Corrosion Spin Coater ( 8000 RPM & 6" wafer Max.) with Complete Accessories 

Desktop Magnetron Sputtering Coating Machine System For Oxides & Ceramics & Semiconductors

Desktop Magnetron Sputtering Coating Machine System For Oxides & Ceramics & Semiconductors     Model: TMAX-PC-JS04-Multilayer Thin-Film Fabrication Technical Specifications Parameter Specification Base Vacuum 6.7×10−5 Pa Operating Vacuum (after 1h) ≤4×10−4 Pa Magnetron Targets 3 (3-inch, permanent magnet, water-cooled, side shutters) Target-to-Substrate Distance 120–200 mm (manually adjustable, scale-indicated) Target Tilt Angle 0–45° Substrate Heating Iodine-tungsten lamp, max 400°C Substrate Size Φ60 mm (single-piece) Substrate Rotation 0–50 RPM (motorized) Bias Voltage 0–200 V (adjustable) Gas Flow Control 2-channel MFC, 0–50 sccm range Control Functions Manual heating/rotation/shutter/vacuum monitoring Key Features & Applications 1. Precision & Flexibility · Adjustable target-substrate geometry for tailored film stress and uniformity. · Three-target co-sputtering enables multilayer/composite films (e.g., superlattices). 2. High-Quality Deposition · UHV-compatible chamber minimizes impurities for high-purity films. · Heated substrate (400°C max) improves crystallinity (e.g., for oxides/semiconductors). 3. Compact Research Tool · Benchtop design suits small-batch R&D and material screening. Typical Uses · Protective coatings (e.g., TiN, DLC for tools). · Transparent conductive films (e.g., ITO, AZO). · MEMS/sensor fabrication. Best for: Labs requiring flexible, high-precision thin-film deposition with manual control.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets

DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets     Model: TMAX-PC-JS03-Rotatable Triple-targets  Technical Specifications Category Parameter Value/Description Chamber Structure Design Vertical front-loading, stainless steel   Sample Access Easy loading/unloading Vacuum Performance Base Pressure ≤5×10−5 Pa   Leak Rate ≤5×10−7 Pa·L/s   Pressure Rise Rate (12h) ≤10 Pa   Pumping System Domestic molecular pump + mechanical pump Targets & Power Supplies Target Quantity & Size 3 × 2-inch magnetron targets (HV compatible)   Target Types 1 × Standard magnetic field, 1 × Strong magnetic field   Target-Substrate Distance (Multilayer) 40–120 mm   Target-Substrate Distance (Ion Source) 80–120 mm   RF Power Supply 1 × 1000 W, 13.56 MHz (auto-matching)   DC Power Supply 2 × 1000 W Substrate Holder Capacity Up to 3 substrates   Rotation Speed 5–30 RPM (self-rotation + planetary)   Heating Range Programmable up to 450°C   Bias Voltage Supports up to 1000 V Gas Control System Gas Lines 2 independent MKS mass flow controllers (Ar + reactive gas)   Features Gas mixing, adjustable/measurable chamber pressure Additional Features Chamber Baking Infrared heating (150°C)   Liner Plate Prevents chamber contamination   Safety Protections Water/power failure interlock, anti-misoperation protection Key Features & Applications 1. Advanced Deposition Capabilities · Supports DC/RF sputtering for metals, semiconductors, and insulators. · Triple-target design enables sequential multilayer deposition without vacuum breaks. 2. Precision Process Control · Programmable substrate heating (±450°C) with adjustable ramp rates. · Rotation mechanism (5–30 RPM) ensures uniform film thickness. 3. Research & Small-Batch Flexibility · Ideal for nanoscale functional films (e.g., optoelectronics, tribological coatings). · Reverse sputtering cleaning enhances film adhesion and purity. 4. User-Centric Design · Manual controls for target shutters, rotation, and temperature. · Safety systems mitigate operational risks (e.g., interlock protections). Users · Academic & Government Labs: Thin-film material R&D. · Industrial Prototyping: Small-scale production of specialized coatings.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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High Vacuum Glove Box Metal&Non-Metal Target Sputtering Coating System

High Vacuum Glove Box Metal&Non-Metal Target Sputtering Coating System     Model: TMAX-PC-JS02-D-Shaped Magnetron Sputtering Coater Main Purpose Designed for the preparation of nano-scale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, dielectric films, and other advanced thin-film materials. Widely used in universities, research institutes, and small-batch production in scientific laboratories. System Composition · Vacuum chamber system (sputtering chamber) · Target system · Sample stage system · Vacuum pumping & measurement system · Gas flow system · Control system · Film thickness monitoring system · Front-opening door mechanism · Electrical control system Technical Specifications Parameter Specification Ultimate Vacuum 6.7×10-5 Pa System Leak Rate 1×10-7 Pa·L/s Vacuum Recovery Time 40 min to 6.6×10 Pa (after N2 purge) Vacuum Chamber D-shaped, 400 × 350 × 300 mm Sample Stage 3" × 3", 3.2 mm thickness Magnetron Targets 3 targets (2 standard + 1 high-strength) Effective Sputtering Area 3" × 3" Target Diameter Φ50 mm (water-cooled) Target-to-Substrate Distance 50–90 mm (adjustable) Substrate Bias Voltage -200 V Sample Turntable 1 position (holds 2" substrates) Gas Flow System 2-channel mass flow controller Film Thickness Monitor 0–999,999 Å Pumping Options Turbo molecular pump or cryogenic pump + dry scroll pump Key Features & Applications 1. High Precision & Versatility · Suitable for research and small-scale production of high-performance thin films, including optical, electronic, and protective coatings. · Adjustable target-substrate distance ensures optimized film uniformity. 2. Advanced Control & Monitoring · Computerized real-time tracking of deposition parameters enhances repeatability. · Flexible gas flow control (2-channel MFC) supports reactive and non-reactive sputtering. 3. Efficient & Reliable Vacuum System · Fast vacuum recovery minimizes downtime. · Dual pumping options (turbo or cryogenic) adapt to different process requirements. 4. User-Friendly Design · D-shaped chamber & front-opening door facilitate easy sample loading. · Optional heating expands compatibility with temperature-sensitive materials. Ideal for: · Academic & industrial R&D in materials science, nanotechnology, and semiconductor engineering. · Functional film development for optics, wear resistance, and electronic devices. · Prototype fabrication requiring high-precision, customizable coatings. This system combines high deposition control, flexible configuration, and robust performance, making it a preferred choice for advanced thin-film research and development.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation

Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation      Model: TMAX-JY-JS02-Cold Magnetron Sputtering Deposition System Product Description The TMAX-JY-JS02 is a benchtop cold magnetron sputtering coating system equipped with a standard rotating/tilting sample stage. It is specifically designed for high-quality conductive coating of non-conductive samples with varied surface morphologies for SEM imaging. It also meets the requirements for electrode coating, semiconductor materials, and other thin-film applications. Key Features · "Ultra-Cold" Sputtering: Utilizes a high-efficiency, low-voltage DC magnetron source to prevent thermal damage to sensitive samples. · Wide-Angle Coverage: Innovative magnetron design ensures uniform coating coverage, even for closely positioned samples. · Fast Operation: Independent solenoid valves for venting, purging, and exhaust enable rapid system cycling. · Stable Coating Performance: Precisely controlled sputtering current ensures consistent deposition rates and optimal coating quality, unaffected by chamber pressure. · Multi-Material Compatibility: Supports various metal targets (Pt standard, optional Au, Au/Pd, or Pt/Pd) with quick and easy target replacement. Technical Specifications Sputtering System Parameter Specification Target Material Standard: Pt (57mm diameter × 0.1mm thickness)  Optional: Au, Au/Pd, Pt/Pd Sample Stage Rotation 0–60 rpm (continuously adjustable) Sample Stage Tilt -45° to +45° (continuously adjustable) Stage Diameter 40mm (holds 4 standard sample holders; custom sizes available) Sputtering Current Microprocessor-controlled (0–99 mA) with safety interlock Vacuum Range Atm ~3 Pa Control Method Programmable (1–999s) with Start/Pause buttons; automatic pumping/sputtering/venting Vacuum Pump Parameter Specification Pumping Speed 133 L/min Ultimate Vacuum 0.05 Pa Noise Level 56 dB Applications & Advantages · Ideal for SEM Sample Preparation: Ensures high-conductivity coatings without thermal damage, critical for delicate or heat-sensitive materials. · Versatile Material Deposition: Suitable for Pt, Au, and alloy coatings in semiconductor, nanotechnology, and materials research. · User-Friendly Operation: Automated processes and ergonomic design enhance efficiency and reproducibility. · Compact & Reliable: Benchtop design saves lab space while delivering professional-grade performance.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Economic Hi-speed 150W Desktop Rotary Coater with Acceleration Adjustable Optional Pipette Gun

Anti-Corrosion Spin Coater ( 8000 RPM & 6" wafer Max.) with Complete Accessories 

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Product Application Small Laboratory Coater Machine  For battery anode and cathode electrode continuous coating  Battery technology supplier 

2 inch RF Plasma Magnetron Sputtering Coater Machine for Non-Conductive Thin Films

2 inch  RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin Films

Lab DC Magnetron Sputtering Coater Machine With Target for Noble Metal Coating

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