Paper Wax Paraffin Coating Machine Single Side Waxen Coater

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Anti-Corrosion Spin Coater ( 8000 RPM & 6" wafer Max.) with Complete Accessories

Anti-Corrosion Spin Coater ( 8000 RPM & 6" wafer Max.) with Complete Accessories 

Desktop Magnetron Sputtering Coating Machine System For Oxides & Ceramics & Semiconductors

Desktop Magnetron Sputtering Coating Machine System For Oxides & Ceramics & Semiconductors     Model: TMAX-PC-JS04-Multilayer Thin-Film Fabrication Technical Specifications Parameter Specification Base Vacuum 6.7×10−5 Pa Operating Vacuum (after 1h) ≤4×10−4 Pa Magnetron Targets 3 (3-inch, permanent magnet, water-cooled, side shutters) Target-to-Substrate Distance 120–200 mm (manually adjustable, scale-indicated) Target Tilt Angle 0–45° Substrate Heating Iodine-tungsten lamp, max 400°C Substrate Size Φ60 mm (single-piece) Substrate Rotation 0–50 RPM (motorized) Bias Voltage 0–200 V (adjustable) Gas Flow Control 2-channel MFC, 0–50 sccm range Control Functions Manual heating/rotation/shutter/vacuum monitoring Key Features & Applications 1. Precision & Flexibility · Adjustable target-substrate geometry for tailored film stress and uniformity. · Three-target co-sputtering enables multilayer/composite films (e.g., superlattices). 2. High-Quality Deposition · UHV-compatible chamber minimizes impurities for high-purity films. · Heated substrate (400°C max) improves crystallinity (e.g., for oxides/semiconductors). 3. Compact Research Tool · Benchtop design suits small-batch R&D and material screening. Typical Uses · Protective coatings (e.g., TiN, DLC for tools). · Transparent conductive films (e.g., ITO, AZO). · MEMS/sensor fabrication. Best for: Labs requiring flexible, high-precision thin-film deposition with manual control.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets

DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets     Model: TMAX-PC-JS03-Rotatable Triple-targets  Technical Specifications Category Parameter Value/Description Chamber Structure Design Vertical front-loading, stainless steel   Sample Access Easy loading/unloading Vacuum Performance Base Pressure ≤5×10−5 Pa   Leak Rate ≤5×10−7 Pa·L/s   Pressure Rise Rate (12h) ≤10 Pa   Pumping System Domestic molecular pump + mechanical pump Targets & Power Supplies Target Quantity & Size 3 × 2-inch magnetron targets (HV compatible)   Target Types 1 × Standard magnetic field, 1 × Strong magnetic field   Target-Substrate Distance (Multilayer) 40–120 mm   Target-Substrate Distance (Ion Source) 80–120 mm   RF Power Supply 1 × 1000 W, 13.56 MHz (auto-matching)   DC Power Supply 2 × 1000 W Substrate Holder Capacity Up to 3 substrates   Rotation Speed 5–30 RPM (self-rotation + planetary)   Heating Range Programmable up to 450°C   Bias Voltage Supports up to 1000 V Gas Control System Gas Lines 2 independent MKS mass flow controllers (Ar + reactive gas)   Features Gas mixing, adjustable/measurable chamber pressure Additional Features Chamber Baking Infrared heating (150°C)   Liner Plate Prevents chamber contamination   Safety Protections Water/power failure interlock, anti-misoperation protection Key Features & Applications 1. Advanced Deposition Capabilities · Supports DC/RF sputtering for metals, semiconductors, and insulators. · Triple-target design enables sequential multilayer deposition without vacuum breaks. 2. Precision Process Control · Programmable substrate heating (±450°C) with adjustable ramp rates. · Rotation mechanism (5–30 RPM) ensures uniform film thickness. 3. Research & Small-Batch Flexibility · Ideal for nanoscale functional films (e.g., optoelectronics, tribological coatings). · Reverse sputtering cleaning enhances film adhesion and purity. 4. User-Centric Design · Manual controls for target shutters, rotation, and temperature. · Safety systems mitigate operational risks (e.g., interlock protections). Users · Academic & Government Labs: Thin-film material R&D. · Industrial Prototyping: Small-scale production of specialized coatings.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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High Vacuum Glove Box Metal&Non-Metal Target Sputtering Coating System

High Vacuum Glove Box Metal&Non-Metal Target Sputtering Coating System     Model: TMAX-PC-JS02-D-Shaped Magnetron Sputtering Coater Main Purpose Designed for the preparation of nano-scale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, dielectric films, and other advanced thin-film materials. Widely used in universities, research institutes, and small-batch production in scientific laboratories. System Composition · Vacuum chamber system (sputtering chamber) · Target system · Sample stage system · Vacuum pumping & measurement system · Gas flow system · Control system · Film thickness monitoring system · Front-opening door mechanism · Electrical control system Technical Specifications Parameter Specification Ultimate Vacuum 6.7×10-5 Pa System Leak Rate 1×10-7 Pa·L/s Vacuum Recovery Time 40 min to 6.6×10 Pa (after N2 purge) Vacuum Chamber D-shaped, 400 × 350 × 300 mm Sample Stage 3" × 3", 3.2 mm thickness Magnetron Targets 3 targets (2 standard + 1 high-strength) Effective Sputtering Area 3" × 3" Target Diameter Φ50 mm (water-cooled) Target-to-Substrate Distance 50–90 mm (adjustable) Substrate Bias Voltage -200 V Sample Turntable 1 position (holds 2" substrates) Gas Flow System 2-channel mass flow controller Film Thickness Monitor 0–999,999 Å Pumping Options Turbo molecular pump or cryogenic pump + dry scroll pump Key Features & Applications 1. High Precision & Versatility · Suitable for research and small-scale production of high-performance thin films, including optical, electronic, and protective coatings. · Adjustable target-substrate distance ensures optimized film uniformity. 2. Advanced Control & Monitoring · Computerized real-time tracking of deposition parameters enhances repeatability. · Flexible gas flow control (2-channel MFC) supports reactive and non-reactive sputtering. 3. Efficient & Reliable Vacuum System · Fast vacuum recovery minimizes downtime. · Dual pumping options (turbo or cryogenic) adapt to different process requirements. 4. User-Friendly Design · D-shaped chamber & front-opening door facilitate easy sample loading. · Optional heating expands compatibility with temperature-sensitive materials. Ideal for: · Academic & industrial R&D in materials science, nanotechnology, and semiconductor engineering. · Functional film development for optics, wear resistance, and electronic devices. · Prototype fabrication requiring high-precision, customizable coatings. This system combines high deposition control, flexible configuration, and robust performance, making it a preferred choice for advanced thin-film research and development.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation

Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation      Model: TMAX-JY-JS02-Cold Magnetron Sputtering Deposition System Product Description The TMAX-JY-JS02 is a benchtop cold magnetron sputtering coating system equipped with a standard rotating/tilting sample stage. It is specifically designed for high-quality conductive coating of non-conductive samples with varied surface morphologies for SEM imaging. It also meets the requirements for electrode coating, semiconductor materials, and other thin-film applications. Key Features · "Ultra-Cold" Sputtering: Utilizes a high-efficiency, low-voltage DC magnetron source to prevent thermal damage to sensitive samples. · Wide-Angle Coverage: Innovative magnetron design ensures uniform coating coverage, even for closely positioned samples. · Fast Operation: Independent solenoid valves for venting, purging, and exhaust enable rapid system cycling. · Stable Coating Performance: Precisely controlled sputtering current ensures consistent deposition rates and optimal coating quality, unaffected by chamber pressure. · Multi-Material Compatibility: Supports various metal targets (Pt standard, optional Au, Au/Pd, or Pt/Pd) with quick and easy target replacement. Technical Specifications Sputtering System Parameter Specification Target Material Standard: Pt (57mm diameter × 0.1mm thickness)  Optional: Au, Au/Pd, Pt/Pd Sample Stage Rotation 0–60 rpm (continuously adjustable) Sample Stage Tilt -45° to +45° (continuously adjustable) Stage Diameter 40mm (holds 4 standard sample holders; custom sizes available) Sputtering Current Microprocessor-controlled (0–99 mA) with safety interlock Vacuum Range Atm ~3 Pa Control Method Programmable (1–999s) with Start/Pause buttons; automatic pumping/sputtering/venting Vacuum Pump Parameter Specification Pumping Speed 133 L/min Ultimate Vacuum 0.05 Pa Noise Level 56 dB Applications & Advantages · Ideal for SEM Sample Preparation: Ensures high-conductivity coatings without thermal damage, critical for delicate or heat-sensitive materials. · Versatile Material Deposition: Suitable for Pt, Au, and alloy coatings in semiconductor, nanotechnology, and materials research. · User-Friendly Operation: Automated processes and ergonomic design enhance efficiency and reproducibility. · Compact & Reliable: Benchtop design saves lab space while delivering professional-grade performance.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Economic Hi-speed 150W Desktop Rotary Coater with Acceleration Adjustable Optional Pipette Gun

Anti-Corrosion Spin Coater ( 8000 RPM & 6" wafer Max.) with Complete Accessories 

Multiple Coating Head Units Comma Blade & Gravure Roll & Rod Bar Coating Machine

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Roll to roll Electrode Coating Laminating Machine

Product Application Small Laboratory Coater Machine  For battery anode and cathode electrode continuous coating  Battery technology supplier 

2 inch RF Plasma Magnetron Sputtering Coater Machine for Non-Conductive Thin Films

2 inch  RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin Films

Lab DC Magnetron Sputtering Coater Machine With Target for Noble Metal Coating

Compact DC Magnetron Sputtering Coater With Gold Target for Noble Metal Coating

Lab DC Magnetron Sputtering Coater Machine with Rotary Stage & Water Chiller

High Power DC Magnetron Sputtering Coater w Rotary Stage & Water Chiller

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm   Introduction Ion Sputtering Coater (SD900 Model)  is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly within 2 minutes when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate. Vacuum pump is included.   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 0-20mA Working pressure 30Pa -7 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 45kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support