Lab DC Magnetron Sputtering Coater Machine with Rotary Stage & Water Chiller

High Power DC Magnetron Sputtering Coater w Rotary Stage & Water Chiller

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm   Introduction Ion Sputtering Coater (SD900 Model)  is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly within 2 minutes when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate. Vacuum pump is included.   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 0-20mA Working pressure 30Pa -7 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 45kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support 

Materials Science Vacuum Magnetron Ion Sputter Coating Coater

Materials Science Vacuum Magnetron Ion Sputter Coating Coater Introduction Materials Science Magnetron Ion Sputtering Coater(SD900M Model) is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample. Coating Result Sample Picture under SEM (by SD-900M Model) EPTFE (Extended Poly Tetra Fluoro Ethylene) Low vacuum, can be achieved quickly when using proper vacuum pump within 5 minutes. It generates much less heat and avoids plasma damage to the substrate sample. It is user friendly and easy to operate. Vacuum pump is included. Chiller is optional. Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s)  Vacuum limit 2 Pa Max sputtering current 100mA Working pressure 20Pa - 8 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass Magnetron target source Target size φ50*0.1mm(Au)/target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 45kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Water cooling(optional) Warranty One year limited warranty with lifetime product support 

Magnetron Ion Thermal Evaporation Carbon Sputter Coater for SEM Sample Preparation

Magnetron Ion Thermal Evaporation Carbon Sputter Coater for SEM Sample Preparation Introduction     Magnetron Ion Sputtering Unit &Thermal Evaporation Carbon Coater is ideal and designed for lab SEM sample preparation. SD900C Model (Magnetron Ion Sputtering Unit) is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample.     SD900C Model (Thermal Evaporation Carbon Unit) carbon coater applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM.     Working vacuum pressure can be achieved quickly when using proper vacuum pump within 5 minutes. It is user friendly and easy to operate.     Vacuum pump is included.     Chiller is optional. (for Magnetron Ion Sputtering Unit)   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 100mA Max evaporation current 100A Working pressure 20Pa -8 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Evaporation target source Target material:carbon rope /target source:carbon rope Operation method Instruction Manual (2 units)Weight/size 55kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Cooling method Air cooling(Evaporation)+water cooling (sputtering ) Warranty One year limited warranty with lifetime product support

3 Rotary Target Plasma Sputtering Coater Machine Heater (500C) Including 3 Targets

3 Rotary Target Plasma Sputtering Coater w. Substrate Heater (500C) Including 3 Targets

Lab Compact Polymer Film Coater With Doctor Blade Coating Head

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Lab DC or RF Magnetron Ion Sputter Coater with Vacuum Pump And Chiller Using in Perovskite Solar Cell Lab Line

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Versatile Magnetron Sputtering Coater For Conductive Metal Thin Film Layer Deposition

Versatile Magnetron Sputtering Coater For Conductive Metal Thin Film Layer Deposition   Model: TMAX-BY-JS06-Benchtop System for R&D and Educational Laboratories Overview The TMAX-BY-JS06 is a compact, cost-effective, high-vacuum magnetron sputtering system designed for pilot-scale experiments in research and educational laboratories. It integrates key components, including a sputtering vacuum chamber, permanent magnet targets (strong/weak magnetic fields), a fiber-optic rotary stage (customizable), DC power supply, gas supply system, pumping system, water cooling system, film thickness monitoring, vacuum measurement, electronic control system, and a sturdy mounting frame. Key Parameters Parameter Specification Sputtering Gas Adjustable (e.g., argon, nitrogen, etc., depending on experimental requirements). Target Material Standard: Gold target; Optional: Silver, copper, chromium, etc. Target Configuration 50mm (weak magnetic target) / 60mm (strong magnetic target). Sputtering Current 0–500mA Ultimate Vacuum ≤5×10−4 Pa Chamber Dimensions Diameter: 180mm; Height: 200mm Sample Stage Fiber-optic rotary stage (customizable). Operating Voltage 230V, 50Hz Applications & Features 1. Coating for Electron Beam-Sensitive Samples · Ideal for: Biological specimens, polymers, and other beam-sensitive materials. · Advantage: In SEM imaging, high-energy electron beams can cause thermal damage to delicate samples. A thin sputtered conductive coating (e.g., gold or carbon) acts as a protective layer, preserving sample integrity while enhancing imaging quality. 2. Non-Conductive Samples · Ideal for: Insulating materials (e.g., ceramics, glass, or organic compounds). · Advantage: Non-conductive samples accumulate surface charges ("charging effect") under electron beams, distorting SEM images. A sputtered conductive metal layer (e.g., gold or platinum) dissipates charges, eliminating artifacts and improving signal-to-noise ratio for clearer imaging. 3. Electrode Fabrication & Conductivity Studies · Ideal for: Novel materials requiring conductive electrodes for electrical property analysis. · Advantage: Enables precise deposition of thin conductive films for experimental electrode fabrication, facilitating studies on material conductivity.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; 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Vacuum Thermal Evaporating Carbon Coating Coater for Materials Science

Vacuum Thermal Evaporating Carbon Coating Coater for Materials Science   Introduction Thermal Evaporation Carbon Coater (SD800C Model) is ideal and designed for lab SEM sample preparation. SD800C Model carbon coater applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM. Working vacuum pressure can be achieved quickly when using proper vacuum pump within 5 minutes. It is user friendly and easy to operate.      Vacuum pump is included. Parameter  Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h 2.6 L/s) Vacuum limit 2Pa Max evaporation current 100A Working pressure 6Pa -4 Pa Vacuuming tme < 5 Min( 2Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass  Evaporation target source Target material :carbon rope/target source:carbon rope Operation method Instruction Manua Weight/size 45kg/340mm length x 390mm wide x 300mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Warranty One year limited warranty with lifetime product support  

DC Vacuum Portable Auto Ion Sputtering Coater for Non-conductive SEM Sample Preparation

DC Vacuum Portable Auto Ion Sputtering Coater for Non-conductive SEM Sample Preparation Introduction   Compact Automatic Ion Sputtering Coater (SD800 Model) that is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate using Time Control. Vacuum pump is included.   Parameter  Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuuming time < 2 Min Chamber size Φ115*100mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 40kg/307mm length x 260mm wide x 260mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support    

Vacuum Pulsing Thermal Evaporating Sputtering Coating Coater with Vacuum Pump

Vacuum Pulsing Thermal Evaporating Sputtering Coating Coater with Vacuum Pump   Introduction Automatic Pulsing Thermal Evaporation Carbon Coater (SD980 Model) that is ideal and designed for lab SEM sample preparation. SD980 Model carbon coater is a fully-automated carbon coater that applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM. A pulsed mode for protecting samples is also included. Working vacuum pressure can be achieved quickly when using proper vacuum pump. It is user friendly and easy to operate by Controlling Touch Screen Heating Power (Current) and Pulsing Times (Recipe). Vacuum pump is included. Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2 Pa Max evaporation current 80A Working pressure 6 Pa - 4 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass Evaporation target source Target material :carbon rope/target source: carbon rope Operation method Instruction Manual Weight/size 45kg/390mm length x 310mm wide x 290mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Warranty One year limited warranty with lifetime product support