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  • Automatic Coating Machine Slot Die Coating Machine with 12m Oven

    Lithium ion Battery Continuous Automatic Coating Machine

  • Slot Die Coating Machine Double Sides Slot Die Coating Machine

  • Roll Coating Machine Battery Production Transfer Coating Machine with Intermittent and Continuous Coating

  • Sputter Coater Multi-target Magnetron Sputtering Coating System For Multilayer Thin Film Fabrication

    Multi-target Magnetron Sputtering Coating System For Multilayer Thin Film Fabrication      Model: TMAX-TK-JS01-Multilayer Thin Film Fabrication Technical Parameters Parameter Specification Model TMAX-TK-JS01 Vacuum Chamber Structure Vertical top-opening design, manual gas spring lift Chamber Dimensions Φ220mm × H300mm Heating Temperature Room temperature to 500°C Substrate Holder Size Φ100mm (rotatable, heated) Film Uniformity ≤ ±5.0% within Φ50mm area Sputtering Target 1 × Φ2-inch magnetron target (DC/RF compatible) Process Gas Control 1–2 channels, precision ±0.1 sccm Control System PLC + touchscreen interface Footprint (Main Unit) 600mm (L) × 800mm (W) × 1700mm (H) Power Consumption ≥6 kW Base Vacuum 6.6×10⁻⁵Pa Pumping Time ≤15 min (from atmosphere to 7×10⁻³Pa) Applications Designed for thin-film research and small-batch production, ideal for: · Academic labs: Universities and research institutes studying novel materials. · Industrial R&D: Prototyping functional coatings (e.g., ITO for solar cells, wear-resistant alloys). Key Features 1. Multi-Mode Sputtering ·Supports DC, RF, and pulsed sputtering for metals, oxides, and semiconductors. ·Single-/multi-target configurations for layered or composite films. 2. User-Friendly Operation ·Automated PLC control with real-time monitoring via touchscreen. ·Substrate heating (≤300°C) and rotation (2–20 rpm) for uniform coatings. 3. Compact & Reliable ·Minimal footprint, low maintenance, and energy-efficient design. 4. Safety & Precision ·Water-cooling protection, gas flow control (±0.1 sccm), and arc suppression. Quick Start Guide 1. Installation: ·Ensure stable power (AC 380V ±5%, ≥8 kW), cooling water (≥10 L/min), and proper grounding (<3Ω). ·Verify vacuum seals and gas connections before startup. 2. Operational Workflow: ·Pumping: Start mechanical pump → Open foreline valve → Activate molecular pump (at >5 Pa). ·Deposition: Set substrate temperature → Adjust gas flow → Initiate sputtering (5–15 W/cm² target power). ·Shutdown: Cool substrate (<50°C) → Vent chamber → Maintain pump oil/clean seals regularly. 3. Maintenance Tips: ·Replace mechanical pump oil every 500 operational hours. ·Clean chamber and target surfaces after each use to avoid cross-contamination. Summary The  TMAX-TK-JS01 combines research-grade precision with industrial durability, offering: · Flexibility: Adaptable to diverse materials (metals, dielectrics, etc.). · Efficiency: Fast pumping, intuitive controls, and low running costs. · Support: Comprehensive manuals and technical assistance provided. For advanced applications (e.g., perovskite layers), consult the manufacturer for tailored process parameters.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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