Laboratory Electric Heat Film Coating Machine for Electrode Coater with Dryer

Compact Tape Casting Coater with Vacuum Chuck, Adjustable Film Applicator & Dryer Cover TMAX-TMH250 is a CE Certified ready compact tape casting coater with a heating cover designed to produce films with consistent thickness. It has a unique driving system to produce a smooth coating on all types of materials. The flat vacuum chuck is built in to hold the substrate sheet in place, which is particularly useful when making thin coatings. One 100 mm width adjustable micrometer applicator (doctor-blade). Heating cover with digital temperature controller can dry films after coating up to 100°C with a temperature accuracy of +/-1°C. This equipment can be used for researchers on ceramic tape castings and Li-Ion battery electrode coating.

Large Versatile Roll to Roll Pilot Coating Machine

Large Versatile Roll to Roll Pilot Coating Machine

Multi-Material Evaporation Deposition Coating System Machine For OLED, Solar Cell & Semiconductor

Multi-Material Evaporation Deposition Coating System Machine For OLED, Solar Cell & Semiconductor   TMAX-TK-ZD02-High-Vacuum Multi-Material Evaporation Technical Specifications Category Parameter Specification Basic Configuration Model TMAX-TK-ZD02   Coating Method Multi-source evaporation deposition   Chamber Structure Vertical square, front-opening design Vacuum System Chamber Dimensions Ø400mm × H500mm (Material: 304 stainless steel)   Ultimate Vacuum ≤6.0×10⁻⁴ Pa   Pump-down Time ≤45 min (Atmosphere→10⁻⁴ Pa)   Pump Configuration Compound molecular pump (FF-200/1200, 1200L/s) + Rotary vane pump (TRP-36, 9L/s)   Vacuum Valves GDQ-200 main valve + GDQ-40 bypass valve Deposition Control Heating Temperature Room temperature ~ 300°C   Substrate Holder 120mm×120mm (Custom sizes available)   Film Uniformity ≤±5.0%   Evaporation Sources 3 groups (Boat-type + Filament-type for metals) with baffles   Thickness Control Quartz crystal monitor (Optional, 1 water-cooled probe)  Operational Control System PLC + Touchscreen   Safety Protection Water shortage/Overcurrent/Voltage fault alarms   Power Requirement ≥8kW   Dimensions 1710mm(L)×850mm(W)×1850mm(H) Standard configuration: Manual button control. Quartz crystal monitor available as optional accessory. Key Features & Applications ◉ Modular Design · Integrated vacuum chamber with automated welding and surface treatment · Hybrid sealing (metal + fluororubber) for optimal vacuum maintenance ◉ Process Flexibility · Simultaneous evaporation of metals (Al, Ag, Au, etc.) and organic materials · Adjustable baffles for deposition uniformity control ◉ User-Oriented · Explicit "Optional" labeling for thickness monitoring system · Customizable substrate holders for specialized research needs ◉ Target Applications     Novel thin-film material development     Optoelectronic device research (OLED, thin-film solar cells)     Small-batch functional coating production Advantages Parameter Entry-Lab Systems Industrial Systems Evaporation Sources 3 independent (metal/organic hybrid) 1-2 single-type sources 4-6 (customized) Thickness Control ±5.0% (upgradable to ±2.0%) ±8-10% (no real-time monitoring) ±1-3% (multi-probe standard) Heating Rate 10°C/min (RT→300°C) ≤5°C/min 15-20°C/min (high-temp) Leak Rate ≤5×10⁻⁹ Pa·m³/s (metal seals) ≤1×10⁻⁷ Pa·m³/s (rubber seals) ≤1×10⁻¹⁰ Pa·m³/s Maintenance Cycle 500hrs (turbo pump) 300hrs 1000hrs (mag-lev pumps) Coating Area 144cm² (expandable to 400cm²) 50-100cm² 1000cm²+ Ideal for: ✓ Bridging lab-scale R&D and production verification ✓ Cross-disciplinary material research teams ✓ Budget-conscious innovators demanding industrial-grade performance   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Glovebox Thermal Evaporation Coating Machine Unit With Multi-Source

Glovebox Thermal Evaporation Coating Machine Unit With Multi-Source      TMAX-TK-ZD01-High-Vacuum Multi-Source Evaporation Key Specifications Parameter Specification Model TMAX-TK-ZD01 Coating Method Multi-source evaporation deposition Chamber Structure Vertical cylindrical, front-opening Chamber Dimensions Φ650mm × H800mm Heating Temperature Room temperature ~ 300°C Substrate Holder Flat plate or umbrella-type Film Uniformity ≤ ±5.0% Evaporation Sources 2-3 metal evaporation source groups Control System PLC/PC (optional) Footprint (Main Unit) L1000mm × W1200mm × H1900mm Total Power ≥ 12kW Advantages & Competitive Features 1. Superior Film Uniformity & Repeatability · ≤ ±5.0% thickness variation ensures high-quality, consistent coatings—better than many entry-level systems (±8–10%). · Ideal for precision optics, semiconductor layers, and functional coatings where uniformity is critical. 2. Multi-Source Flexibility for Advanced Applications · 2-3 independently controlled evaporation sources allow multi-layer & alloy deposition in a single run. · Competitors often limit to single-source setups, requiring multiple cycles for complex coatings. 3. Enhanced Process Control & Adaptability · Optional PLC/PC automation improves repeatability vs. manual systems, reducing human error. · Wide temperature range (RT–300°C) supports diverse materials, from delicate polymers to high-temp substrates. 4. Space-Efficient & User-Oriented Design · Compact footprint (1m × 1.2m) fits small labs, unlike larger industrial systems (e.g., 1.5m+ width). · Front-loading vertical chamber simplifies maintenance and sample handling vs. bulky horizontal designs. Comparison with Similar Systems Feature This model Typical Entry-Level Competitors High-End Industrial Models Film Uniformity ≤ ±5.0% ±8–10% ≤ ±3.0% Evaporation Sources 2-3 (multi-material capable) 1-2 (limited alloys) 4+ (complex stacks) Automation PLC/PC optional Manual or basic controls Full automation Footprint Compact (1m × 1.2m) Similar or larger Large (1.5m+ width) Cost Efficiency Best balance for R&D/small production Lower cost, less precision High cost, overkill for labs Recommended Applications · R&D & Prototyping: Universities and labs needing controllable, small-batch coatings. · Optoelectronics: Anti-reflective films, conductive layers for displays/sensors. · Decorative Coatings: Durable metallic finishes on consumer products.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Thermal Evaporation Evaporator Coating Coater System For Au, Ag, Al Film

Thermal Evaporation Evaporator Coating Coater System For Au, Ag, Al Film        TMAX-QH-ZD01-High-Vacuum Multi-Material Evaporation Product Overview The TMAX-QH-ZD01is a high-performance vacuum deposition system designed for precision thin-film coating applications in research and industrial laboratories. It features advanced vacuum technology, multi-source evaporation capabilities, and user-friendly controls, making it ideal for organic electronics, optoelectronics, and nanomaterials research. Technical Specifications No. Parameter Description Vacuum Chamber     1 Ultimate Vacuum Better than 4×10–5 Pa (new equipment) 2 Leak Rate 6.7×10–8 Pa·L/s 3 Working Vacuum 5×10–4 Pa (Time from atmosphere to working vacuum <30 min) (For N2-purged glovebox-integrated systems, cold state) 4 Vacuum Retention Pressure remains below 3 Pa after 24 hours post shutdown 5 Sample Size 300 × 300 mm 6 Sample Holder Size 360 × 360 mm 7 Evaporation Sources 4 organic + 4 metal sources 8 Compatible Materials C60, BCP, Cu, Ag, LiF, MoO3, Al, etc. 9 Evaporation Sources Configuration     - Metal Sources: 4 water-cooled electrodes (compatible with 5cc ceramic Ta crucibles for Cu/Al).     - Organic Sources: 4 standard Knudsen cells (10cc, max. 500°C).     Performance Metrics:     - Organic (NPB standard): Deposition rate 0.5–3 Å/s (±0.1 Å/s stability), uniformity ±5% (≤300×300 mm).     - Metal (Al standard): Deposition rate 0.5–3 Å/s (±0.1 Å/s stability), uniformity ±5% (≤300×300 mm).   10 Source-to-Substrate Distance 530 mm (metal sources include extendable electrode rods, default 100 mm). 11 Mask Library Not included (customizable upon request). 12 Thickness Probes 4 imported probes (1 probe monitors 2 sources). 13 Thickness Display Real-time touchscreen monitoring:  - Individual source rate/thickness/temperature (Knudsen cells).  - Total thickness/rate (large-font display). 14 Deposition Control Organic sources: Rate/temperature control. Metal sources: Rate control (manual/automated). 15 Software Process lock function for repeatability. 16 Closed Pumping Mechanical pump isolation feature to enhance productivity. Key Advantages 1. High Precision & Uniformity 1. Stable deposition rates (≤±0.1 Å/s variation) and excellent uniformity (±5%) ensure reproducible thin films for sensitive applications like OLEDs and solar cells. 2. Multi-Source Flexibility 1. Simultaneous evaporation of organic/metallic materials (8 total sources) enables complex multilayer structures without breaking vacuum. 3. Robust Vacuum Performance 1. Ultra-high vacuum (4×10–5 Pa) and low leak rate (6.7×10–8 Pa·L/s) guarantee contamination-free coatings. 4. User-Centric Design 1. Intuitive touchscreen interface, real-time monitoring, and glovebox compatibility streamline workflow for lab environments. Recommended Applications · Research: Organic semiconductors, perovskite solar cells, quantum dots. · Industry: Optical coatings, flexible electronics, barrier films. · Education: Thin-film deposition training, material science experiments.    html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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Lab Physical Vapor Deposition Coating Equipment Thin Film Evaporator

Lab Physical Vapor Deposition Coating Equipment Thin Film Evaporator    TMAX-PD-ZD03-Thin Film Evaporator Product Overview The TMAX-PD-ZD03 system adopts an oil-free high-vacuum system with a large pumping-speed molecular pump, featuring an integrated electromechanical design for minimal lab space occupancy. It supports compatible metal and organic evaporation sources, offering high cost-effectiveness and user-friendly operation. Ideal for research institutes, electrode deposition, SEM sample preparation, and studies in OLED/solar cell technologies. Key Features 1. Broad Application Scope Optimized for evaporating noble metals (e.g., Au, Ag) in electrode preparation and semiconductor lift-off processes, reducing material waste. 2. Space-Saving & Durable Compact footprint (550×900 mm) with a full stainless-steel vacuum chamber for enhanced durability and safety. 3. High-Efficiency Vacuum System Oil-free molecular pump (≥300 L/s pumping speed) allows flexible installation angles, shortened pumping paths, and faster processing. 4. Multi-Source Compatibility Configurable with 2–4 evaporation sources (metal/organic), supporting co-evaporation or sequential deposition. 5. Precision Control Constant-current evaporation power supply, in-situ thickness monitoring, and excellent film uniformity (±3–5%) with high repeatability. 6. Upgradability Optional non-stop venting and full automation control. Technical Specifications Core Parameters Category Specification Chamber Dimensions (L×W×H) 300 × 300 × 450 mm (customizable height) System Dimensions (L×W×H) 530 × 750 × 1800 mm (standard) / 1100 × 750 × 1500 mm (alternative) Ultimate Vacuum ≤5×10−5 Pa Base Pressure Holding ≤5 Pa (12 hrs), ≤8×10−4 Pa (30 min) Substrate Stage ≤100 × 100 mm (max. 110 mm substrate or 25×15 mm ITO glass) Source-Substrate Distance >300 mm Evaporation Sources · Metal Sources: 2–3 groups (optional) · Organic Sources: Beam-source furnace type, temperature-controlled (0–500°C), integrated adjustable baffle (0–15°), 2–3 groups (optional). Power Requirements · Voltage: AC 220 V/50 Hz (380 V optional) · Power: ≤6 kW Target Applications · Research & Academia: Electrode deposition, SEM/TEM sample preparation. · Advanced Materials: OLED encapsulation, perovskite solar cell R&D. · Semiconductor: Metal lift-off processes, thin-film device fabrication. Why Choose? · Cost-Effective: Reduced material consumption and energy-efficient operation. · User-Centric: Simplified controls, robust safety features, and modular upgrades. · Future-Ready: Adaptable to evolving lab needs with optional automation.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film

PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film    TMAX-ZY-ZD02-Research-Grade Thin Film Deposition Equipment System Overview TMAX-ZY-ZD02 benchtop resistive thermal evaporation coating system integrates a turbo-molecular pump vacuum assembly to achieve high-vacuum thin film deposition. Equipped with 4 evaporation sources and a precision thickness control system, it is optimized for rapid multi-layer metal/alloy deposition. Featuring a plug-and-play design, this compact instrument operates reliably in office or lab environments without specialized infrastructure, making it ideal for R&D and small-batch production. Key Advantages 1. Portability & Flexibility ·Compact footprint with multi-environment adaptability (lab/office). 2. User-Centric Design ·One-touch operation with preloaded parameters (100+ metal deposition recipes). ·10" touchscreen for intuitive process control and real-time monitoring. 3. High-Performance Deposition ·4-source simultaneous evaporation (supports 99 layers of metals/alloys/polymers per run). ·Quartz crystal monitoring for nanometer-level thickness accuracy (±3% uniformity). 4.Premium Components ·All-aluminum chamber for efficient heat dissipation. ·Imported turbo-molecular pump (300L/s) ensures ≤6×10−5 Pa ultimate vacuum. 5.Low Maintenance ·Minimal training required; modular design simplifies servicing. Typical Applications · Thin-film material research (metals/dielectrics) · Optical coatings & nanoelectronics · Thin-film sensors & MEMS devices · Custom alloy/polymer multilayer structures Standard Specifications Component Details Chamber 400×350×360mm (H), CNC-machined aluminum Vacuum System 300L/s turbo pump + dual-stage rotary vane pump Vacuum Measurement Full-range gauge (atmosphere to UHV) Evaporation Sources 4 independent thermal sources (cross-contamination-free) Power Supply DC power for multi-layer deposition Thickness Control Quartz crystal monitor + manual/auto mode switching Software Network-upgradable with remote parameter adjustment Optional: · Co-evaporation kit for alloys · 2" substrate heater (400°C max) · Water-cooled rotating sample stage Technical Parameters · Ultimate Vacuum: ≤6×10−5 Pa (after bake-out) · Leak Rate: ≤5.0×10−9 Pa·L/s · Deposition Rate: ≥8 nm/min (varies by material) · Thickness Uniformity: ≤3% (with planetary rotation) Site Requirements Parameter Specification Dimensions 600×720×1200mm (H) Weight 85 kg Environment 23±3°C, <60% RH Power AC 230V, 32A, 50Hz Cooling Water 0.2MPa, 15–25°C, ≥8L/min (optional) Gas Supply 99.9% N2 (optional for venting) Operational Workflow · Fully automated process: Pre-programmed vacuum pumping, substrate heating, and evaporation. · Multi-layer capability: Sequential deposition of 4 materials (up to 99 layers) with customizable thickness/time modes. · Data export: Real-time parameter logging and remote monitoring. Why Choose? · Time-saving: Eliminates complex setup with industry-leading uptime. · Precision: Combines lab-grade vacuum performance with production-level repeatability. · Scalability: Modular options cater to evolving research needs. Ideal for academic labs, startups, and industrial R&D requiring rapid prototyping of advanced thin films.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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Multi-Material Deposition Magnetron Sputter Coating System Equipment For Organic Multilayer

Multi-Material Deposition Magnetron Sputter Coating System Equipment For Organic Multilayer        Model: TMAX-PC-JS11 – Product Specifications Specifications Category Parameter Details Vacuum Performance Ultimate Vacuum (Sputtering Chamber) ≤6.6×10⁻⁶ Pa   System Leak Rate ≤5.0×10⁻⁷ Pa·L/S   Pump-Down Time (Atmosphere → 6.6×10⁻⁴ Pa) ≤30 min   Vacuum Retention (After 12 Hours Shutdown) ≤5 Pa Sputtering Chamber Structure Vertical, top-opening, stainless steel (argon-welded, electropolished)   Dimensions ≥Ø300 mm × 300 mm (with anti-contamination liner)   Bakeability & Sealing 100–150°C; metal gasket/fluororubber O-ring Magnetron Sputtering Target Configuration 3 × 50 mm adjustable-angle permanent magnet targets (RF/DC/MF compatible)   Power Supply 2 × DC (≥500 W), 1 × auto-matching RF (≥500 W)   Film Uniformity ≤5% deviation   Additional Features 3 × SMC rotary shutters; magnetic material support Substrate Stage Sample Capacity 1 × ≥100 mm diameter   Rotation Speed 0–30 RPM (adjustable)   Heating Range RT–500°C (PID-controlled, thermocouple feedback) Gas Delivery Mass Flow Control 2 paths (100 SCCM + 20 SCCM MFCs, CF16 valves)   Auxiliary Gas Lines 2 × DN16 inlet valves Pumping System High-Vacuum Pump Pfeiffer Hipace 700 (680 L/s) + 4 L/s rotary pump   Valves & Pipeline DN40/CC150 pneumatic valves, stainless steel bellows Control & Safety Automation PLC + industrial PC + touchscreen (real-time monitoring/logging)   Protection Interlocks for water/power faults (overcurrent, open circuit, etc.) Additional Components Frame Steel construction, lockable casters, removable panels   Included Accessories Chiller, silent compressor, tool kit, spare parts Measurement Vacuum Gauge INFICON combination gauge Key Advantages & Applications Advantages: · High Precision: Ultra-high vacuum (UHV) capability ensures contamination-free thin-film deposition. · Flexibility: Multi-target configuration with adjustable parameters for diverse materials (including magnetic films). · Reliability: Robust PLC automation with fail-safe interlocks and real-time diagnostics. · User-Friendly: Integrated touchscreen and PC control streamline operation. Target Applications: · Research & Development: Ideal for academic or industrial labs studying advanced coatings (e.g., semiconductors, optics). · Industrial Coating: Suitable for small-scale production of functional films (wear-resistant, conductive, or decorative layers). · Material Science: Supports experiments requiring controlled environments (e.g., reactive sputtering, multi-layer deposition).     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); 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Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating

Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating     Model: TMAX-PC-JS01- Versatile Magnetron Sputtering System For Functional Film Deposition Coating Application: Designed for the preparation of nanoscale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, and dielectric films. It is widely suitable for scientific research and small-batch production in universities and research institutes. Equipped with an anode-layer ion source for pre-cleaning and assisted deposition, as well as a reverse sputtering function to enhance film quality and adhesion. System Configuration: The system consists of a sputtering vacuum chamber, permanent magnet sputtering targets (3 targets), a single-substrate heating stage, DC/RF power supplies, gas supply system, pumping system, vacuum measurement, electrical control system, and mounting platform. Technical Specifications Parameter Specification Chamber Structure Vertical, top-loading; stainless steel & vacuum-compatible materials Base Pressure (Sputtering Chamber) ≤5×10⁻⁶ Pa Leak Rate ≤5×10⁻⁷ Pa·L/s Pressure Rise Rate ≤1 Pa (after 12 hours of pump shutdown) Pumping System Domestic molecular pump + mechanical pump Magnetron Targets 3 × 3-inch HV-compatible (2 standard field, 1 strong field) Power Supplies RF: 600 W, 13.56 MHz (auto-matching); DC: 2 × 1000 W Target-Substrate Distance 40–120 mm (adjustable) Substrate Heating Max 450°C, programmable control Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm Uniformity (2-inch area) ≤5% deviation Adhesion Test Withstands 3 tape-peeling tests (glass/si/ceramic) Pre-Cleaning Reverse sputtering capability Ion Source Anode-layer for cleaning & assisted deposition Gas Control 2 MKS mass flow controllers (reactive/Ar); gas mixing Baking Temperature 150°C (infrared heating) Safety Features Water/power failure interlock; anti-misoperation Key Features & Suitability 1. Precision Deposition ·Supports DC/RF sputtering for diverse materials (metals, semiconductors, dielectrics). ·Ion-assisted deposition enhances film density and adhesion. 2. High Vacuum Stability ·Ultra-low base pressure (≤5×10⁻⁶ Pa) ensures contamination-free films. ·Low leak rate maintains consistent process conditions. 3. User-Centric Design ·Vertical loading simplifies sample handling. ·Programmable substrate heating (up to 450°C) for optimized film growth. 4. Quality Assurance ·≤5% thickness uniformity and rigorous adhesion standards (tape test). ·Reverse sputtering and ion source for pre-deposition cleaning. 5. Research & Small-Batch Production ·Ideal for universities, labs, and industrial R&D in optics, electronics, and coatings.         html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Small Roll to Roll Battery Electrode Continuous Coating Machine

The TMAX-TMJ-180C desktop continuous coating machine is a small roll to rolling coating machine for lab research, it is assembled by high high precision coating device, suitable for institutions, university and factory pilot scale battery research work.

Lab Cheap Vacuum Desktop Rotary Coating Instrument with Plate Holder

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

600 m³/h NMP Solvent Recovery System for Lithium Battery Coating Line

1 This TMAX-PVM-5L Planetary vacuum mixer machine is a set of vacuum mixing, dispersion of efficient equipment, suitable for lithium electricity experiment process is anode paste mixing process, solder paste, silica gel, chemical industry, etc 2 This lab planetary mixer Mixing motor adopts transmission frequency adjustment,  can choose different rotational speed and torque according to different process, different viscosity. 3 The vacuum planetary mixer is excellent for preparing LiCoO3, LiFePO4, Phosphors and ceramic slurry without gas bubble. And the processed material results in the better dispersion and uniformity.

Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film

Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film      Model: TMAX-PC-JS08-Dual-Target, Multilayer Films Deposition Equipment Purpose Designed for nano-scale single/multilayer functional films (hard coatings, metals, semiconductors, dielectrics). Features pre-sputtering cleaning for enhanced adhesion. System Components · Vacuum chamber, dual magnetron targets, heating stage, DC/RF power supplies, gas delivery, vacuum pumps, control system. Technical Parameters Category Specification Chamber Structure Vertical front-loading; stainless steel/vacuum materials Base Pressure ≤5×10−5 Pa Leak Rate ≤5×10−7 Pa·L/s Pressure Rise Rate ≤10 Pa (after 12 hours, pump off) Pumping System Domestic molecular pump + mechanical pump Targets 2× 4-inch HV (1 standard-field, 1 strong-field); DC/RF compatible (Kurt J. Lesker) Target-Sample Distance 40–120 mm (multilayer); 80–120 mm (with ion source) Power Supplies RF: 1000 W, 13.56 MHz (auto-matching); DC: 1000 W (AE brand) Sample Stage 3 substrates; 5–30 RPM rotation; 450°C heating; 1000 V bias Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm (±5% uniformity over 2-inch area) Adhesion Test Passes 3-tape peel (glass/Si/ceramic) Gas System 2 MKS mass flow controllers (Ar + reactive gas); mixing capability Baking Temperature 150°C (infrared heating) Key Features 1. Dual-Target Flexibility o Enables co-sputtering or sequential deposition for complex multilayers. 2. High Adhesion & Cleanliness o Integrated pre-sputtering cleaning and ion-assisted deposition (anode-layer source). 3. Precision Process Control o Programmable temperature (450°C max), rotation (5–30 RPM), and gas flow. 4. Safety & Reliability o Interlocks for power/water failures; manual controls for critical operations. Target Applications · Research: Nanomaterials, thin-film physics, prototype development. · Education: Advanced deposition techniques training. · Industry: Small-batch functional coatings (e.g., optics, electronics).     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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