Automatic Pulsing Thermal Evaporator Carbon Coater equipped with Vacuum Pump for Lab SEM Sample Preparation

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Lab Benchtop Vacuum Thermal Evaporating Carbon Coater or SEM Sample Coater

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Small Lab Vacuum Sputtering & Thermal Evaporation Evaporator Coater For Metal Film Preparation

Small Lab Vacuum Sputtering & Thermal Evaporation Evaporator Coater For Metal Film Preparation      Dual-function SEM Sample Preparation Instrument 1. Technical Specifications Vacuum System Parameter Specification Rotary Pumping Speed 50 Hz: 8 m³/h (2.2 L/s) / 60 Hz: 9.6 m³/h (2.6 L/s) Vacuum Limit 2 Pa Max Sputtering Current 100 mA Max Evaporation Current 100 A Sputtering Working Pressure 20 Pa – 8 Pa Evaporation Working Pressure 6 Pa – 4 Pa Working Vacuuming Time < 5 min (to 2 Pa) Vacuum Measurement Atmosphere to 2×10 mbar Gas Control Gas Flow Controller Chamber Size Ø150 × 120 mm (height), scratch-resistant quartz glass Magnetron Target Source Ø50 × 0.1 mm (Au) / Optional: Au, Ag, Pt Evaporation Target Source Carbon Rope Operation Method Manual (instruction manual included) Dimensions (Main Unit) 360 mm (L) × 300 mm (W) × 380 mm (H) Dimensions (Evaporation Unit) 360 mm (L) × 300 mm (W) × 160 mm (H) Weight 55 kg Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption < 2000 W Cooling Method Air Cooling (Evaporation) + Water Cooling (Sputtering) Warranty 1-year limited warranty with lifetime product support Sputtering Parameters · Sputtering Targets: Au (standard), optional Ag, Pt, Cr, Al, Cu · Target Size: Ø50 mm · Sample Stage: Adjustable height, accommodates Ø50 mm and Ø70 mm samples (customizable) · Sputtering Voltage: 0–1600 V (DC, adjustable) · Sputtering Current: 0–50 mA · Sputtering Time: 0–360 s Evaporation Parameters · Evaporation Material: Carbon fiber rope · Evaporation Current: 0–100 A (AC) · Evaporation Voltage: 0–30 V · Evaporation Time: 0–1 s · Micro Vacuum Valve: Compatible with Ø3 mm tubing General · Input Voltage: 220 V (110 V optional), 50 Hz · Vacuum Pump: 2 L/s rotary vane pump (domestic VRD-8) 2. Key Features Dual-Function Advantages · Integrated Design: Combines metal sputtering and carbon evaporation in one compact system · Process Flexibility: Switch between conductive metal coatings (Au/Ag/Pt) and ultra-thin carbon films · Time Efficiency: 5-minute pump-down enables rapid sample processing User-Centric Design · Transparent chamber for real-time monitoring · Ergonomic controls with preset programs · Tool-free target replacement system html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film

Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film        TMAX-ZY-ZD01-Multi-Layer Deposition for Metals, Alloys & Dielectric Thin Films Product Overview The TMAX-ZY-ZD01 is a desktop thermal evaporation system designed for high-precision thin-film deposition in research and small-scale production. Featuring a turbomolecular pump vacuum system and multi-source evaporation capabilities, it enables efficient deposition of metals, alloys, and dielectric films with minimal operator training. Key Features & Advantages 1. Wide Application Range · Materials Research: Metal films, dielectric layers, polymer coatings. · Functional Devices: Thin-film sensors, optical coatings, nanoelectronics. · Multi-Layer Deposition: Supports up to 99 layers in a single run. 2. User-Friendly Operation · Plug-and-play design—no specialized lab environment required. · 10-inch touchscreen for intuitive control and process monitoring. · Preloaded 100+ deposition recipes for quick setup. 3. High Precision & Stability · Quartz crystal monitoring ensures real-time thickness control (≤3% uniformity). · Turbo-molecular pump (300L/s) achieves ≤6×10⁻⁵ Pa ultimate vacuum. · 3 independent evaporation sources prevent material cross-contamination. 4. Flexible Configuration · Optional: Co-evaporation for alloys, 400°C substrate heating, and cooled rotating stage. · Automatic & manual modes for customized process control. 5. Low Maintenance & Compact Design · Aluminum chamber for efficient heat dissipation. · 65 kg weight, suitable for benchtop use in labs or offices. Technical Specifications Parameter Specification Chamber Ø300 × 350(h) mm (quartz glass) Vacuum System 300L/s turbomolecular pump + dual-stage rotary pump Ultimate Vacuum ≤6 × 10⁻⁵ Pa (after baking) Leak Rate ≤5.0 × 10⁻⁹ Pa·L/s Deposition Rate ≥10 nm/min (material-dependent) Film Uniformity ≤3% (with rotation) Evaporation Sources 3 independent thermal sources Max Layers per Run 99 layers (up to 4 materials) Control Interface 10" touchscreen with programmable recipes Power Supply AC 230V, 32A, 50Hz Cooling Water (Optional) 0.2 MPa, 15–25°C, ≥8 L/min Operational Workflow 1. Automated Deposition: Pre-programmed vacuum pumping, heating, and evaporation. 2. Multi-Layer Control: Supports time-based or thickness-based deposition modes. 3. Remote Monitoring: Adjust parameters via network connection. Why Choose? ✔ Combines research-grade performance with desktop convenience. ✔ Minimal training required—ideal for multi-user environments. ✔ Scalable for both experimental and small production needs.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Low-Temperature Pulsed Thermal Evaporator With Multi-Sample For Nanoscale Thin Film

Low-Temperature Pulsed Thermal Evaporator With Multi-Sample For Nanoscale Thin Film  TMAX-HZ-ZD01-Low-Temperature Pulsed Thermal Evaporator Product Overview The TMAX-HZ-ZD01 Pulsed Carbon Coater is an advanced, fully automated instrument designed for high-quality carbon coating of samples in material science and biological research. Featuring a compact design, intelligent ARM-based control, and pulse evaporation technology, it ensures efficient, precise, and low-thermal-damage coating—ideal for high-resolution SEM analysis. Key Features & Advantages 1. Ultra-Compact Design ·Dimensions: 530×300×320 mm, optimized for space-constrained labs. 2. High-Efficiency Pulse Evaporation ·W-type planar carbon source with pre-degassing function minimizes thermal impact on sensitive samples (e.g., polymers, membranes, fibers). ·Nanoscale coating (<5 nm) ensures dense, uniform films for high-resolution SEM imaging. 3. Fully Automated Operation ·5-inch touchscreen with intuitive interface (supports bilingual display). ·One-click start and ARM-based precision control (adjustable in 1 mA/1 Pa/1 s increments). 4. Multi-Sample Capacity ·Holds 12 standard stub samples simultaneously, reducing manual intervention. 5. Reliable Vacuum System ·Achieves <1 Pa ultimate vacuum via rotary vane pump; real-time monitoring with a Pirani gauge. 6. Versatile Carbon Sources ·Compatible with 0.8/1.2/2.4 mm carbon ropes or rods, detectable for continuity. 7. Safety & Stability ·Dual current/vacuum protection and sensor-monitored operation ensure long-term reliability. Technical Specifications Parameter Detail Power Supply 100–250 VAC, 50/60 Hz Evaporation Type Pulsed W-type planar source Evaporation Power 0–10 V DC, 80 A max Evaporation Time 100 ms–1 s (adjustable) Working Vacuum 2–8 Pa (display resolution: 0.1 Pa) Sample Stage Ø65 mm (height-adjustable) Vacuum Chamber Ø120×100 mm Data Monitoring Real-time display of current, voltage, and vacuum status Applications The GCV-1000 excels in preparing temperature-sensitive samples (e.g., organic polymers, biological tissues, electrodes) and delivers nanoscale coatings critical for: · SEM/EDS analysis · Conductivity enhancement · Nanomaterial research Installation & Usage Highlights 1. Quick Setup: Connect power/gas (optional); system self-checks upon startup. 2. Sample Loading: Adjust sample-to-source distance (~20 mm optimal). 3. Automated Process: Set parameters (vacuum/time/voltage) → Start → Automatic venting post-coating. 4. Maintenance: Tool-free carbon rope replacement; vacuum pump oil refill included.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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