Manual Thermal Evaporation Evaporator Machine For Carbon, Ag, Cu Deposition

Manual Thermal Evaporation Evaporator Machine For Carbon, Ag, Cu Deposition    TMAX-BY-ZD07-Manual Thermal Evaporation For TEM&SEM Key Features & Applications The TMAX-BY-ZD07 Thermal Evaporation Coater employs a heating process to evaporate coating materials, which then deposit onto substrates to form thin films. Designed for electron-beam-sensitive and non-conductive samples, it is ideal for protective coating and SEM sample preparation to enhance imaging quality and mitigate charging effects. Technical Parameters Parameter Specification Target Material Carbon Rod Control Mode Manual Chamber Dimensions (D×H) 170 mm × 200 mm Sample Stage Diameter 170 mm Sputtering Gas Vacuum Evaporation Current Max: 100 A; Operating: 0–80 A Operating Vacuum 2×10⁻² mbar Working Voltage 220 V, 50 Hz Pump High-performance Leap Pump (2 L) Core Advantages 1. Efficient Deposition – Rapid thermal evaporation process ensures quick film formation. 2. Versatile Applications – Compatible with: ·Electron-beam-sensitive samples (e.g., biological, polymeric materials) to prevent structural damage. ·Non-conductive samples – Eliminates charging effects in SEM by providing a conductive metal layer. ·New materials research – Facilitates electrode fabrication for conductivity studies. 3. Compact & Reliable – Features a high-quality vacuum pump and user-friendly manual operation. Ideal For · SEM sample preparation (metal coating for improved signal-to-noise ratio). · Protective coating for delicate materials. · Experimental studies on conductive properties of novel materials. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film

PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film    TMAX-ZY-ZD02-Research-Grade Thin Film Deposition Equipment System Overview TMAX-ZY-ZD02 benchtop resistive thermal evaporation coating system integrates a turbo-molecular pump vacuum assembly to achieve high-vacuum thin film deposition. Equipped with 4 evaporation sources and a precision thickness control system, it is optimized for rapid multi-layer metal/alloy deposition. Featuring a plug-and-play design, this compact instrument operates reliably in office or lab environments without specialized infrastructure, making it ideal for R&D and small-batch production. Key Advantages 1. Portability & Flexibility ·Compact footprint with multi-environment adaptability (lab/office). 2. User-Centric Design ·One-touch operation with preloaded parameters (100+ metal deposition recipes). ·10" touchscreen for intuitive process control and real-time monitoring. 3. High-Performance Deposition ·4-source simultaneous evaporation (supports 99 layers of metals/alloys/polymers per run). ·Quartz crystal monitoring for nanometer-level thickness accuracy (±3% uniformity). 4.Premium Components ·All-aluminum chamber for efficient heat dissipation. ·Imported turbo-molecular pump (300L/s) ensures ≤6×10−5 Pa ultimate vacuum. 5.Low Maintenance ·Minimal training required; modular design simplifies servicing. Typical Applications · Thin-film material research (metals/dielectrics) · Optical coatings & nanoelectronics · Thin-film sensors & MEMS devices · Custom alloy/polymer multilayer structures Standard Specifications Component Details Chamber 400×350×360mm (H), CNC-machined aluminum Vacuum System 300L/s turbo pump + dual-stage rotary vane pump Vacuum Measurement Full-range gauge (atmosphere to UHV) Evaporation Sources 4 independent thermal sources (cross-contamination-free) Power Supply DC power for multi-layer deposition Thickness Control Quartz crystal monitor + manual/auto mode switching Software Network-upgradable with remote parameter adjustment Optional: · Co-evaporation kit for alloys · 2" substrate heater (400°C max) · Water-cooled rotating sample stage Technical Parameters · Ultimate Vacuum: ≤6×10−5 Pa (after bake-out) · Leak Rate: ≤5.0×10−9 Pa·L/s · Deposition Rate: ≥8 nm/min (varies by material) · Thickness Uniformity: ≤3% (with planetary rotation) Site Requirements Parameter Specification Dimensions 600×720×1200mm (H) Weight 85 kg Environment 23±3°C, <60% RH Power AC 230V, 32A, 50Hz Cooling Water 0.2MPa, 15–25°C, ≥8L/min (optional) Gas Supply 99.9% N2 (optional for venting) Operational Workflow · Fully automated process: Pre-programmed vacuum pumping, substrate heating, and evaporation. · Multi-layer capability: Sequential deposition of 4 materials (up to 99 layers) with customizable thickness/time modes. · Data export: Real-time parameter logging and remote monitoring. Why Choose? · Time-saving: Eliminates complex setup with industry-leading uptime. · Precision: Combines lab-grade vacuum performance with production-level repeatability. · Scalability: Modular options cater to evolving research needs. Ideal for academic labs, startups, and industrial R&D requiring rapid prototyping of advanced thin films.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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Lab Physical Vapor Deposition Coating Equipment Thin Film Evaporator

Lab Physical Vapor Deposition Coating Equipment Thin Film Evaporator    TMAX-PD-ZD03-Thin Film Evaporator Product Overview The TMAX-PD-ZD03 system adopts an oil-free high-vacuum system with a large pumping-speed molecular pump, featuring an integrated electromechanical design for minimal lab space occupancy. It supports compatible metal and organic evaporation sources, offering high cost-effectiveness and user-friendly operation. Ideal for research institutes, electrode deposition, SEM sample preparation, and studies in OLED/solar cell technologies. Key Features 1. Broad Application Scope Optimized for evaporating noble metals (e.g., Au, Ag) in electrode preparation and semiconductor lift-off processes, reducing material waste. 2. Space-Saving & Durable Compact footprint (550×900 mm) with a full stainless-steel vacuum chamber for enhanced durability and safety. 3. High-Efficiency Vacuum System Oil-free molecular pump (≥300 L/s pumping speed) allows flexible installation angles, shortened pumping paths, and faster processing. 4. Multi-Source Compatibility Configurable with 2–4 evaporation sources (metal/organic), supporting co-evaporation or sequential deposition. 5. Precision Control Constant-current evaporation power supply, in-situ thickness monitoring, and excellent film uniformity (±3–5%) with high repeatability. 6. Upgradability Optional non-stop venting and full automation control. Technical Specifications Core Parameters Category Specification Chamber Dimensions (L×W×H) 300 × 300 × 450 mm (customizable height) System Dimensions (L×W×H) 530 × 750 × 1800 mm (standard) / 1100 × 750 × 1500 mm (alternative) Ultimate Vacuum ≤5×10−5 Pa Base Pressure Holding ≤5 Pa (12 hrs), ≤8×10−4 Pa (30 min) Substrate Stage ≤100 × 100 mm (max. 110 mm substrate or 25×15 mm ITO glass) Source-Substrate Distance >300 mm Evaporation Sources · Metal Sources: 2–3 groups (optional) · Organic Sources: Beam-source furnace type, temperature-controlled (0–500°C), integrated adjustable baffle (0–15°), 2–3 groups (optional). Power Requirements · Voltage: AC 220 V/50 Hz (380 V optional) · Power: ≤6 kW Target Applications · Research & Academia: Electrode deposition, SEM/TEM sample preparation. · Advanced Materials: OLED encapsulation, perovskite solar cell R&D. · Semiconductor: Metal lift-off processes, thin-film device fabrication. Why Choose? · Cost-Effective: Reduced material consumption and energy-efficient operation. · User-Centric: Simplified controls, robust safety features, and modular upgrades. · Future-Ready: Adaptable to evolving lab needs with optional automation.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; 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Solar Cell Thin Film Evaporation Evaporator For Metals, Alloys & Dielectric Deposition

Solar Cell Thin Film Evaporation Evaporator For Metals, Alloys & Dielectric Deposition        TMAX-PC-DZ03-Electron Beam Evaporation Coating System Key Applications Designed for the deposition of conductive films, semiconductor films, ferroelectric films, and optical coatings, this system is widely utilized in university laboratories, research institutions, and small-scale production environments requiring high-precision thin-film fabrication. System Components · Deposition Chamber: U-shaped design with front-loading door, dimensions: 800 × 600 × 600 mm. · E-Gun Electron Beam Source: o Anode voltage: 8 kV / 10 kV (1 set included). o Power range: 0–10 kW (adjustable). · Crucible: Water-cooled, 6-pocket design (11 mL per pocket). · Resistive Evaporation Source (Optional): o Voltage: 5 V / 10 V. o Power: 300 A current, max. 3 kW output (1 set). o Configurable with 3 water-cooled electrodes to form 2 evaporation boats. · Substrate Holder: o Accommodates up to 4″ substrates. o Rotational speed: 5–60 RPM (continuously adjustable). o Substrate-to-source distance: 300–350 mm. o Heating range: up to 800°C ±1°C (manual control). o Includes a manual sample shutter assembly. · Gas Delivery System: 1-channel mass flow controller (MFC). · Vacuum System: o Base pressure: ≤6.7 × 10–4 Pa. o Pump-down time: ≤20 min (from 1 × 10–1 Pa to 5 × 10–4 Pa). o Leak rate: ≤6.7 × 10–7 Pa·L/s. · Thickness Monitoring: Quartz crystal microbalance (QCM) with display range: 0–99,999 Å. Technical Advantages 1. Precision Control: Adjustable e-beam power and substrate rotation ensure uniform film thickness and composition. 2. Versatility: Compatible with multiple evaporation sources (e-beam + resistive), enabling deposition of diverse materials. 3. High-Temperature Stability: Substrate heating up to 800°C (±1°C) supports annealing and epitaxial growth. 4. Efficient Vacuum Performance: Rapid pump-down and low leak rate enhance process reproducibility. 5. User-Friendly Design: Front-loading chamber and modular components simplify maintenance and sample handling. Target Industries & Research Fields · Advanced Materials: Optoelectronics, MEMS, superconducting films. · Energy Applications: Thin-film solar cells, battery electrodes. · Academic Research: Surface science, nanotechnology, and condensed matter physics.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; 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Glovebox Multi-Material Evaporator Machine For Atomic Layer Deposition & Perovskite

 Glovebox Multi-Material Evaporator Machine For Atomic Layer Deposition & Perovskite        TMAX-ZY-DZ01-Advanced Thin-Film Deposition System Overview The TMAX-ZY-DZ01 Electron Beam Evaporation Coating System integrates a cryogenic pump vacuum assembly to deposit thin films via electron beam bombardment in a high-vacuum environment. Equipped with 6 electron beam evaporation sources, 2 resistive thermal evaporation sources, and a precision deposition control system, it enables rapid multilayer metal/alloy film deposition. Ideal for semiconductor fabrication, advanced research, and new material development. Key Applications ✔ Scientific Research – High-precision thin-film deposition for experimental studies. ✔ Semiconductor Wafer Processing – Uniform coatings for microelectronics and MEMS devices. ✔ Optical Thin-Film Components – Low-defect films for lenses, filters, and laser optics. ✔ Nano/Microelectronic Devices – Ultra-thin, controlled-thickness coatings for advanced electronics. System Advantages & Features 1. High Flexibility & Customization · Modular design allows tailored configurations (e.g., additional evaporation sources). · Dual evaporation modes (E-beam + resistive thermal) support diverse materials (metals, alloys, organics). 2. Superior Vacuum Performance · Cryo-Torr 8 (1500L/s) + dry scroll pump achieves <5×10⁻⁶ Pa base pressure (≤35 min pumping time). · VAT ISO-F200 high-vacuum valve ensures pressure stability and cryopump isolation. 3. Precision Deposition Control · INFICON IC6 quartz crystal monitor (0.01 Å/s resolution) with dual water-cooled sensors. · Planetary substrate rotation (0–30 RPM) ensures ≤2% thickness uniformity. · 3 IR heaters (RT–300°C ±0.5°C) and PID-controlled cooling for thermal management. 4. Efficiency & Automation · 3 independent substrate holders (max. 250 mm × 3) enable batch processing. · PC+PLC+FTM control software supports 99-layer programmable recipes, real-time editing, and data export. 5. Reliability & Safety · Telemark E-beam sources (6×7 cc crucibles, 10 kV/800 mA) ensure stable, contamination-free deposition. · Multi-interlock protection (cooling/pressure/power failure/leak detection). Technical Specifications Category Parameter Vacuum System Base pressure: ≤6×10⁻⁸ Torr; Leak rate ≤5×10⁻⁹ Pa·L/s Deposition Rate ≥10 nm/min (material-dependent) E-Beam Sources 6×7 cc crucibles; 10 kV, 800 mA (Telemark 244-9906-1) Resistive Sources 2×100 mm boats; 6–10 V, 400 A (water-cooled) Max. Coating Layers 99 Substrate Capacity 3×250 mm (rotating planetary holders) Chamber Dimensions Φ600 mm × 690 mm (h); detachable liner Cooling System 3 water circuits (8 L/min, 15–25°C) Power Requirements AC 230 V, 32 A, 50 Hz Dimensions/Weight 1750×1150×2000 mm (H); 650 kg Environmental & Operational Requirements · Temperature: 23±3°C · Humidity: <60% RH · Cooling Water: 0.2 MPa, ≥8 L/min · Compressed Gas: 0.5 MPa, 80 L/min (if applicable) Why Choose? · Research-Grade Precision: Combines high vacuum stability with sub-nanometer thickness control. · Multi-Material Compatibility: Handles metals (Al, Au, Ti), oxides, and organic compounds. · Scalability: Suitable for R&D prototyping and small-batch production. · User-Centric Design: Automated workflows reduce manual intervention while allowing parameter flexibility. Ideal for: Universities, semiconductor labs, and optoelectronics manufacturers seeking repeatable, high-quality thin films with minimal downtime.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Electron-beam Metal Thermal Evaporator Coating System For Nano Film Fabrication

Electron-beam Metal Thermal Evaporator Coating System For Nano Film Fabrication      TMAX-TK-DZ01-Precision Thin-Film Deposition Solution for Research & Industry Technical Specifications Parameter Specification Chamber Dimensions Φ600mm × 750mm (Water-cooled stainless steel) Base Pressure ≤5.0×10⁻⁵ Pa (after 24h baking) Pumping Speed ≤40 min (air → 5×10⁻⁴ Pa) Leak Rate ≤0.8 Pa/h Substrate Capacity Flat (Φ350mm) or Spherical (optional) Heating Temperature Up to 300°C (±1°C) Rotation Speed 0-20 rpm (with bias voltage) E-Gun Power 10kW (6-pocket crucible) Resistance Sources 2 sets (3000W total) Film Uniformity ≤±5% Key System Advantages 1. Superior Thin Film Quality ·Ultra-high vacuum environment (<5×10⁻⁵ Pa) minimizes contamination ·Optional ion-assisted deposition enhances film density and adhesion ·Excellent thickness uniformity (±5%) for precision applications 2. Enhanced Process Capabilities ·Dual evaporation sources (E-beam + thermal) for material flexibility ·Heated rotating substrate stage (300°C) for uniform deposition ·Modular design allows future upgrades (optical monitoring, automation) 3. User-Friendly Operation ·Intuitive PLC+touchscreen control interface ·Comprehensive safety interlocks (cooling, vacuum, power) ·Compact footprint (2.5m×1.6m) optimized for lab spaces Primary Application Areas Optical Coatings • Anti-reflection coatings • Laser mirrors and filters • IR optical components Electronic & Semiconductor Films • Transparent conductors (ITO, AZO) • Dielectric layers (SiO₂, Al₂O₃) • Semiconductor device fabrication Functional Material Research • Ferroelectric films (PZT, BST) • Magnetic thin films • 2D material encapsulation Ideal For: ✓ Academic research laboratories ✓ Industrial R&D centers ✓ Small-scale precision coating production ✓ Advanced material development projects   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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