RF Magnetron Sputtering System for Metals & Non-Metals Film Deposition

RF Magnetron Sputtering System for Metals & Non-Metals Film Deposition     Model: TMAX-SD-01-Metals & Non-Metals: Insulators, Semiconductors, Carbon-Based Thin Film Deposition Product Specifications Parameter Specification Model TMAX-SD-01 Type RF Magnetron Sputtering System Chamber Size 150 × 120 mm Target Material 50 mm diameter (metals & non-metals, thickness: 1–2 mm) RF Power Adjustable (1–500 W) RF Frequency 13.56 MHz Matching Network Automatic impedance matcher Sputtering Area 50 mm Ultimate Vacuum 5 Pa (base pressure) Process Gases Argon, nitrogen, and other inert gases (flow rate adjustable) Max. Deposition Rate 8 nm/min Key Features & Applications 1. Versatile RF Sputtering for Metals & Non-Metals · RF Power & Auto-Matching: 13.56 MHz RF with automatic impedance matching ensures stable sputtering of both conductive and insulating materials (e.g., oxides, ceramics). · Broad Applications: Ideal for advanced thin-film research in semiconductors, optics, and functional coatings. 2. Precise Gas Control & High Vacuum Performance · Adjustable Inert Gas Flow: Supports Ar, N₂, and other inert gases for controlled deposition environments. · High Purity Deposition: Base vacuum of 5 Pa minimizes contamination, ensuring high-quality film growth. 3. User-Friendly & Efficient Operation · Quick Target Change: Compatible with 50 mm targets (1–2 mm thick) for flexible material testing. · Preset Process Recipes: Saves and recalls parameters for repeatable experiments and production. 4. Stable & High-Speed Deposition · Max Deposition Rate: 8 nm/min with excellent film uniformity. · Automated Matching: Reduces manual tuning and enhances process stability. Recommended Applications ✔ Research & Development: Thin-film studies for semiconductors, dielectrics, and optical coatings. ✔ Small-Scale Production: Prototyping and specialized coating applications. ✔ Multi-Material Sputtering: Supports both metallic and non-metallic targets for diverse material systems.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Lab Multi-target Magnetron Sputtering System For Compound Film Deposition

Lab Multi-target Magnetron Sputtering System For Compound Film Deposition    Model: TMAX-PD-JS04-Adjustable Multi-Target System for Metal, Oxide, and Semiconductor Product Overview The TMAX-PD-JS04 is a compact magnetron sputtering system designed for laboratory applications, including the deposition of metallic, oxide, dielectric, and semiconductor thin films, as well as the preparation of electrode materials for SEM sample coating. It is also suitable for educational purposes and pre-production process testing. With user-friendly operation, multifunctional capabilities, and high scalability, this system is ideal for academic research and industrial R&D. Key Features ✔ Adjustable Co-Focal Sputtering Structure: The target gun height and angle are adjustable for optimized deposition. ✔ Stable Gas Distribution: Process gases are introduced near the target surface, ensuring uniform reaction gas concentration throughout the vacuum chamber. ✔ Flexible Control Options: Supports both manual operation (Siemens PLC + touchscreen) and fully automatic control (computer + PLC). ✔ Precise Heating & Bias Control: The substrate stage supports heating up to 500°C (accuracy: ±3°C at 200°C, ±1.5°C at 500°C) and bias voltage up to -800V. ✔ High Uniformity: Film uniformity within ±3%~±5% over a 3-inch area. Technical Specifications Parameter Value Chamber Dimensions (L×W×H mm) 300 × 300 × 380 System Dimensions (L×W×H mm) 600 × 900 × 1900 Base Pressure ≤5×10⁻⁵ Pa Pumping & Holding Capability ≤8×10⁻⁴ Pa (30 min) / ≤8 Pa (12 hrs) Target Guns 2 guns (2-inch or 3-inch optional) Sputtering Coverage 2–4 inches Advantages & Applications ✔ Advantages · Co-focal sputtering design for precise film control. · High uniformity (±3%~±5%) ensures consistent coating quality. · Multi-functional for diverse thin-film research needs. ✔ Applications · Academic Research: Thin-film studies, electrode fabrication, and SEM sample preparation. · Advanced Materials: R&D in energy-related organic materials and novel processes. This system excels in low-temperature, high-precision, and controllable thin-film deposition, making it a versatile tool for scientific and industrial innovation.           html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }