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- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
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Mini DC Ion Sputtering Carbon Coater Coating Machine System
Mini DC Ion Sputtering Carbon Coater Coating Machine System Product Overview The TMAX-BY-JS02 Ion Sputtering Coater is a DC (direct current) sputtering deposition system based on a two-electrode DC sputtering principle—a simple, reliable, and cost-effective coating technology widely adopted in industrial applications. Beyond its fundamental design, the TMAX-BY-JS02 features: · A dedicated sample sputtering chamber · Vacuum gauge and sputtering current meter · Adjustable sputtering current controller · Micro vacuum valve and timer · Integrated automated circuitry for precise control of chamber pressure, ionization current, and process gas selection, ensuring optimal coating quality. Key Innovations · Durable rubber-sealed bell jar design prevents vacuum leakage and edge chipping during prolonged use. · Ceramic-sealed high-voltage electrode outperforms conventional rubber seals in longevity. · Large-capacity sputtering chamber and optimized target area ensure uniform, contaminant-free coatings. · High-stability solenoid valves and a dual-gas-path automatic control system enhance sample protection and film quality. Ideal for: · SEM sample preparation in electron microscopy labs · Electrode fabrication for R&D research Technical Specifications Parameter Details Sputtering Gas Argon, nitrogen, or other gases (selectable per experiment) Target Material Standard: Gold target (50mm × 0.1mm thick). Optional: Silver, platinum, etc. Sputtering Current Max: 50mA Deposition Rate >4nm/min Chamber Dimensions Ø160mm × 120mm (H) Sample Stage Compatible with Ø50mm and Ø70mm stages (customizable) Power Supply 220V AC (110V optional), 50Hz Features Highlight 1. Leap Vacuum Pump: High-performance pumping for consistent vacuum levels. 2. Dual-Gas Control: Isolated gas paths safeguard sample integrity. 3. User-Centric Design: Timed sputtering, adjustable parameters, and modular stage options streamline operation. Note: Parameters are default for standard configuration. 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