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- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
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- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
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High-Precision PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine
High-Precision PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine Dual-function SEM Sample Preparation Instrument 1. Technical Specifications Vacuum System Parameter Specification Rotary Pumping Speed 50 Hz: 8 m³/h (2.2 L/s) / 60 Hz: 9.6 m³/h (2.6 L/s) Vacuum Limit 2 Pa Max Sputtering Current 100 mA Max Evaporation Current 100 A Sputtering Working Pressure 20 Pa – 8 Pa Evaporation Working Pressure 6 Pa – 4 Pa Working Vacuuming Time < 5 min (to 2 Pa) Vacuum Measurement Atmosphere to 2×10 mbar Gas Control Gas Flow Controller Chamber Size Ø150 × 120 mm (height), scratch-resistant quartz glass Magnetron Target Source Ø50 × 0.1 mm (Au) / Optional: Au, Ag, Pt Evaporation Target Source Carbon Rope Operation Method Manual (instruction manual included) Dimensions (Main Unit) 360 mm (L) × 300 mm (W) × 380 mm (H) Dimensions (Evaporation Unit) 360 mm (L) × 300 mm (W) × 160 mm (H) Weight 55 kg Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption < 2000 W Cooling Method Air Cooling (Evaporation) + Water Cooling (Sputtering) Warranty 1-year limited warranty with lifetime product support Sputtering Parameters · Sputtering Targets: Au (standard), optional Ag, Pt, Cr, Al, Cu · Target Size: Ø50 mm · Sample Stage: Adjustable height, accommodates Ø50 mm and Ø70 mm samples (customizable) · Sputtering Voltage: 0–1600 V (DC, adjustable) · Sputtering Current: 0–50 mA · Sputtering Time: 0–360 s Evaporation Parameters · Evaporation Material: Carbon fiber rope · Evaporation Current: 0–100 A (AC) · Evaporation Voltage: 0–30 V · Evaporation Time: 0–1 s · Micro Vacuum Valve: Compatible with Ø3 mm tubing General · Input Voltage: 220 V (110 V optional), 50 Hz · Vacuum Pump: 2 L/s rotary vane pump (domestic VRD-8) 2. Key Features Dual-Function Advantages · Integrated Design: Combines metal sputtering and carbon evaporation in one compact system · Process Flexibility: Switch between conductive metal coatings (Au/Ag/Pt) and ultra-thin carbon films · Time Efficiency: 5-minute pump-down enables rapid sample processing User-Centric Design · Transparent chamber for real-time monitoring · Ergonomic controls with preset programs · Tool-free target replacement system html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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Double Chamber PVD Coater System For Thin Film Deposition Preparation
Double Chamber PVD Coater System For Thin Film Deposition Preparation Model: TMAX-PC-JS12-With Ion Source Cleaning & Assisted Sputtering General Information Category Description Application Preparation of nanoscale monolayer/multilayer functional films (hard coatings, metallic/semiconductor/dielectric films). Suitable for research labs, universities, and small-batch production. Key Features • Anode-layer ion source (cleaning + assisted deposition) • Reverse sputtering for adhesion enhancement • Automated PC-controlled process System Structure Sputtering chamber, 3 magnetron targets, heating stage, DC/RF power supplies, gas/pumping systems, vacuum measurement, control unit. Technical Parameters Parameter Specification Chamber Design Vertical front-loading, stainless steel construction Base Vacuum ≤5×10-5 Pa (sputtering chamber) Pumping Speed Recovers to 5×10-4 Pa in 100 min (via bypass valve + turbopump) Leak Rate ≤5×10-7 Pa·L/s Pressure Rise Rate ≤10 Pa after 12 hours (power off) Pumping System Domestic turbomolecular pump + mechanical pump Targets 3 × 3-inch HV targets (2 standard, 1 strong magnetic field) Power Supplies • RF: 600 W, 13.56 MHz (auto-matching) • DC: 2 × 1000 W Target-to-Sample Distance 40–120 mm (adjustable) Substrate Heating Max 450°C, programmable (rate/dwell time controllable) Film Thickness Uniformity ±5% (e.g., Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm over 2-inch area) Adhesion Strength Survives 3 tape-peeling tests (glass/Si/ceramic) Pre-Cleaning Reverse sputtering + anode-layer ion source Gas Control 2 MFCs (Ar + reactive gases), MKS-brand, mixing enabled Baking IR heating, max 150°C Safety Water/power failure interlocks, anti-misoperation protection Automation PC-controlled (target switching, substrate rotation, temperature) Performance Advantages & Suitability Feature Benefit Target Applications Ion Source + Sputtering Ensures clean surfaces and high adhesion Semiconductor films, optical coatings Multi-Mode Deposition Supports DC/RF, reactive sputtering, multilayers Research on novel functional materials Precise Automation Reduces human error, improves reproducibility Small-batch prototyping, academic labs Rapid Pumping Minimizes downtime between runs High-throughput R&D environments Key Features & Suitability · High-Precision Deposition: Ensures uniform, high-adhesion films for research and prototyping. · Multi-Functional Cleaning: Combines ion source + reverse sputtering for optimal surface preparation. · Flexible Configuration: Supports DC/RF modes, multilayer films, and reactive sputtering. · User-Friendly Automation: PC-controlled workflow reduces manual errors. Ideal for: Advanced material research, semiconductor labs, and functional coating development requiring reproducible, high-quality thin films. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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