Lab 4.3-inch Full-color Touch Screen Vacuum Benchtop Magnetron Sputtering Machine Used in Fabrication of Perovskite Solar Cells

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High-Precision PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine

High-Precision PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine     Dual-function SEM Sample Preparation Instrument 1. Technical Specifications Vacuum System Parameter Specification Rotary Pumping Speed 50 Hz: 8 m³/h (2.2 L/s) / 60 Hz: 9.6 m³/h (2.6 L/s) Vacuum Limit 2 Pa Max Sputtering Current 100 mA Max Evaporation Current 100 A Sputtering Working Pressure 20 Pa – 8 Pa Evaporation Working Pressure 6 Pa – 4 Pa Working Vacuuming Time < 5 min (to 2 Pa) Vacuum Measurement Atmosphere to 2×10 mbar Gas Control Gas Flow Controller Chamber Size Ø150 × 120 mm (height), scratch-resistant quartz glass Magnetron Target Source Ø50 × 0.1 mm (Au) / Optional: Au, Ag, Pt Evaporation Target Source Carbon Rope Operation Method Manual (instruction manual included) Dimensions (Main Unit) 360 mm (L) × 300 mm (W) × 380 mm (H) Dimensions (Evaporation Unit) 360 mm (L) × 300 mm (W) × 160 mm (H) Weight 55 kg Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption < 2000 W Cooling Method Air Cooling (Evaporation) + Water Cooling (Sputtering) Warranty 1-year limited warranty with lifetime product support Sputtering Parameters · Sputtering Targets: Au (standard), optional Ag, Pt, Cr, Al, Cu · Target Size: Ø50 mm · Sample Stage: Adjustable height, accommodates Ø50 mm and Ø70 mm samples (customizable) · Sputtering Voltage: 0–1600 V (DC, adjustable) · Sputtering Current: 0–50 mA · Sputtering Time: 0–360 s Evaporation Parameters · Evaporation Material: Carbon fiber rope · Evaporation Current: 0–100 A (AC) · Evaporation Voltage: 0–30 V · Evaporation Time: 0–1 s · Micro Vacuum Valve: Compatible with Ø3 mm tubing General · Input Voltage: 220 V (110 V optional), 50 Hz · Vacuum Pump: 2 L/s rotary vane pump (domestic VRD-8) 2. Key Features Dual-Function Advantages · Integrated Design: Combines metal sputtering and carbon evaporation in one compact system · Process Flexibility: Switch between conductive metal coatings (Au/Ag/Pt) and ultra-thin carbon films · Time Efficiency: 5-minute pump-down enables rapid sample processing User-Centric Design · Transparent chamber for real-time monitoring · Ergonomic controls with preset programs · Tool-free target replacement system html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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Lab DC/RF Magnetron Sputtering Machine Equipment For SEM

Lab DC/RF Magnetron Sputtering Machine Equipment For SEM       Model:  TMAX-PD-JS01-DC/RF Sputtering, Multi-Target, Uniform Coating (±5%), Fast Deposition Product Overview The TMAX-PD-JS01 is a compact magnetron sputtering system designed for laboratory-scale thin-film deposition. Compatible with both DC and RF sputtering sources, it supports the coating of metals, non-metals, and compound films (e.g., ITO). Ideal for academic and industrial research, it enables the preparation of single/multilayer films and facilitates advanced material/process development. Key Features 1. Robust Construction ·All-stainless-steel vacuum chamber ensures durability and operational safety. ·Optimized gas path design for enhanced process control. 2. Space-Efficient & Modular ·Compact footprint (500×360×380mm) with modular expandability, maximizing lab space utilization. 3. High-Efficiency Vacuum System ·Hybrid mechanical + imported molecular pump achieves high vacuum (≤3×10⁻⁵ Pa) in 15–20 minutes, reducing downtime. 4. Precision Process Control ·Uniformity: ≤±5% over Ø80mm substrate area. ·Rotating Substrate Holder: Adjustable speed (0–20 RPM) with magnetic fluid sealing for stable deposition. 5. Flexible Configuration ·Sputtering Sources: 2–3 × 2-inch targets (DC/mid-frequency/RF). ·Gas System: 1–3 gas inlets with ±1% flow accuracy (20 sccm). Technical Specifications Parameter Specification Vacuum Chamber Ø260 × H280mm (304 stainless steel, cylindrical, viewport) Vacuum System Mechanical pump + imported molecular pump Base Pressure ≤3×10⁻⁵ Pa Pump-down Time ≤3×10⁻⁴ Pa in 15min Substrate Holder Max. Ø80mm, rotation speed 0–20 RPM (adjustable) Sputtering Sources 2–3 × 2-inch targets; 1KW DC/mid-frequency/RF power supply Uniformity ≤5% (Ø80mm area) Gas Control 1–3 channels, ±1% accuracy (20 sccm max) Control Mode Manual button or PLC touchscreen (with safety interlocks) Power Supply AC220V/50Hz, 2.5KW Dimensions (L×W×H) 500 × 360 × 380mm Optional Upgrades: Substrate heating/cooling, dry pump, additional flow meters, water chiller. Target Applications · Research: Thin-film studies (metals, oxides, semiconductors). · Education: Lab demonstrations and student projects. · Industry: Prototyping for electronics, optics, and energy materials (e.g., ITO for solar cells). Why choose ? · Fast turnaround: Rapid pump-down accelerates experimental cycles. · Scalable: Modular design adapts to evolving research needs. · User-centric: Intuitive controls and safety features streamline operation.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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Multi-target Magnetron Sputtering Machine For Parylene,OLED, Solar Cell & Semiconductor

Multi-target Magnetron Sputtering Machine For Parylene,OLED, Solar Cell & Semiconductor     Model: TMAX-PC-JS10-Multi-target, Multi-film Deposition Specifications Category Parameter Primary Application Nanoscale monolayer/multilayer films (hard coatings, metals, semiconductors, dielectrics) Target Users Universities, research institutes (R&D and small-batch production) System Composition Vacuum chamber, sputtering targets, sample stage, vacuum pumps, gas delivery, control systems, film thickness monitor, and auxiliary components Vacuum Performance Parameter Specification Ultimate Vacuum 6.7 × 10-5 Pa System Leak Rate ≤1 × 10-7 Pa·L/s Vacuum Recovery Time ≤40 min (to 6.6 × 10-1 Pa after N2 purge) Chamber & Sample Stage Component Specification Chamber Dimensions Ø630 mm × 350 mm (cylindrical) Sample Capacity 8 × 4-inch substrates (1 mm thickness) Sputtering Targets Feature Specification Target Types 3 × Permanent magnet targets, 3 × High-intensity magnet targets Cooling Method Indirect water-cooled (brazed structure) Target Diameter Ø100 mm Target-Substrate Distance 50–90 mm (manual adjustment, with position indicator) Sputtering Mode Vertical downward sputtering Substrate Control Parameter Specification Bias Voltage Up to -200 V Rotation Mechanism Computer-controlled revolution + rotation (stepper motor-driven) Temperature Control RT to 300°C (single calibration required; 3 heaters, one active at a time) Gas & Thickness Control Component Specification Mass Flow Controllers (MFC) 2 channels Film Thickness Monitor Quartz crystal microbalance (0–999,999 Å) Pumping Options Configuration Components Standard Turbo molecular pump + dry scroll pump Alternative Cryogenic pump + dry scroll pump Computer Control Features · Real-time displacement/speed monitoring with error calculation. · Linear/logarithmic display modes for speed vs. displacement. · Site-specific deposition via precision positioning. Key Advantages & Applications ✔ Multi-Target Flexibility – Supports diverse materials (metals, oxides, nitrides). ✔ Uniform Deposition – Computer-controlled rotation ensures film consistency. ✔ High Vacuum Stability – Minimizes contamination for high-purity films. ✔ Research-Ready – Modular design suits optoelectronics, tribological coatings, and semiconductor R&D. Ideal for: Advanced material science studies and prototyping of functional thin-film devices.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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