High Vacuum Benchtop Magnetron Co-sputtering System Equipment

High Vacuum Benchtop Magnetron Co-sputtering System Equipment    TMAX-BY-JS04-Various weakly magnetic targets Specification Category Specification Target Material Various weakly magnetic targets Target Size Ø60-80mm (weakly magnetic targets) Control Mode Manual operation Chamber Borosilicate glass, Ø180mm × H240mm Sample Stage Ø180mm (compatible with Ø80mm stage) Sputtering Gas Supports multiple gases (e.g., Ar) Vacuum System - Turbo molecular pump (80L/s)   - Two-stage high-performance vacuum pump Sputtering Targets - Standard: Au (60mm × 0.1mm)   - Optional: Ag, Pt (customizable) Sputtering Current 0-500A Ultimate Vacuum 5×10⁻⁴ Pa Operating Voltage 220V, 50Hz Key Features & Applications Features: ✔ High Deposition Rate – Enhanced plasma confinement for efficient material utilization. ✔ Low Substrate Heating – Minimized thermal impact on sensitive materials. ✔ Compact Benchtop Design – Ideal for lab-scale thin-film research. ✔ Flexible Target Options – Supports Au, Ag, Pt, and other weakly magnetic materials. Typical Applications: · Semiconductors & Microelectronics – Conductive layers, MEMS, sensors. · Optical Coatings – Reflective/anti-reflective films. · Material Science – Nanostructured thin films, surface engineering.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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SEM Low-Temperature Mini Magnetron Sputtering System For Au, Ag, Al, Metal

SEM Low-Temperature Mini Magnetron Sputtering System For Au, Ag, Al, Metal      Glovebox-Compatible SEM Sample Coater for Beam-Sensitive Materials 1. System Overview ✔ Non-conductive sample coating (Au/Ag/Pt) for SEM imaging ✔ Temperature-sensitive substrates (<60°C process temp) ✔ High-quality thin film deposition with minimized thermal damage 2.  Core parameter Parameter Specification Ultimate Vacuum 4×10⁻² mbar Base Vacuum 1 Pa Pump Down Time <1 minute Vacuum Pump Rotary Vane (2 L/s, Oil-lubricated) Vacuum Measurement Mechanical Gauge (Atmosphere-10⁻² mbar) 3. Cold Sputtering Technology: Patented magnetic confinement reduces substrate heating 4. Glovebox-Adaptable: Optional configuration for inert atmosphere processing Parameter Specification Model TMAX-BY-JS08 Sputtering Type DC Magnetron (Physical Vapor Deposition) Target Materials (Standard) Au (50mmØ×0.1mm) Optional Target Materials Ag, Pt, Cr Maximum Substrate Size Ø70mm (customizable) Chamber Material Borosilicate Glass (160mmØ×120mmH) System Dimensions (W×D×H) 300×360×380 mm Weight 28 kg    

Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating

Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating     Model: TMAX-PC-JS01- Versatile Magnetron Sputtering System For Functional Film Deposition Coating Application: Designed for the preparation of nanoscale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, and dielectric films. It is widely suitable for scientific research and small-batch production in universities and research institutes. Equipped with an anode-layer ion source for pre-cleaning and assisted deposition, as well as a reverse sputtering function to enhance film quality and adhesion. System Configuration: The system consists of a sputtering vacuum chamber, permanent magnet sputtering targets (3 targets), a single-substrate heating stage, DC/RF power supplies, gas supply system, pumping system, vacuum measurement, electrical control system, and mounting platform. Technical Specifications Parameter Specification Chamber Structure Vertical, top-loading; stainless steel & vacuum-compatible materials Base Pressure (Sputtering Chamber) ≤5×10⁻⁶ Pa Leak Rate ≤5×10⁻⁷ Pa·L/s Pressure Rise Rate ≤1 Pa (after 12 hours of pump shutdown) Pumping System Domestic molecular pump + mechanical pump Magnetron Targets 3 × 3-inch HV-compatible (2 standard field, 1 strong field) Power Supplies RF: 600 W, 13.56 MHz (auto-matching); DC: 2 × 1000 W Target-Substrate Distance 40–120 mm (adjustable) Substrate Heating Max 450°C, programmable control Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm Uniformity (2-inch area) ≤5% deviation Adhesion Test Withstands 3 tape-peeling tests (glass/si/ceramic) Pre-Cleaning Reverse sputtering capability Ion Source Anode-layer for cleaning & assisted deposition Gas Control 2 MKS mass flow controllers (reactive/Ar); gas mixing Baking Temperature 150°C (infrared heating) Safety Features Water/power failure interlock; anti-misoperation Key Features & Suitability 1. Precision Deposition ·Supports DC/RF sputtering for diverse materials (metals, semiconductors, dielectrics). ·Ion-assisted deposition enhances film density and adhesion. 2. High Vacuum Stability ·Ultra-low base pressure (≤5×10⁻⁶ Pa) ensures contamination-free films. ·Low leak rate maintains consistent process conditions. 3. User-Centric Design ·Vertical loading simplifies sample handling. ·Programmable substrate heating (up to 450°C) for optimized film growth. 4. Quality Assurance ·≤5% thickness uniformity and rigorous adhesion standards (tape test). ·Reverse sputtering and ion source for pre-deposition cleaning. 5. Research & Small-Batch Production ·Ideal for universities, labs, and industrial R&D in optics, electronics, and coatings.         html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Glovebox Magnetron Sputtering System For Metal Film Deposition

Glovebox Magnetron Sputtering System For Metal Film Deposition     Model: TMAX-PD-JS02-PVD Magnetron Sputtering System Product Overview The TMAX-PD-JS02 High-Vacuum Magnetron Sputtering System is a specialized R&D equipment designed for cutting-edge applications in perovskite solar cells, OLEDs, lithium batteries, quantum dot LEDs, OPVs, and other advanced industries. It enables the deposition of nanoscale oxide, nitride, and metallic thin films. The system integrates seamlessly with glovebox environments, ensuring anhydrous/oxygen-free conditions for the entire process—from spin-coating and sputtering to testing—via a hardware-coupled PVD and glovebox system. Key Features 1. Low-Pressure Sputtering Technology (Optional) 1. Delivers dense thin films with minimal substrate damage. 2. High-Precision Chamber Design 1. SUS304 stainless steel sputtering chamber with mirror-polished interior (including shielding plates) for ultra-clean conditions and optimal vacuum performance. 3. Flexible Control Options 1. Manual/Auto Control: Siemens PLC + touchscreen interface. 2. Fully Automated: PC + PLC integration. Technical Specifications Parameter Details Overall Dimensions (L×W×H) 1100 × 800 × 1900 mm Chamber Dimensions (L×W×H) 440 × 440 × 450 mm Substrate Stage Max. temperature: 500°C (±1°C accuracy) Ultimate Vacuum 2 × 10−5 Pa Pumping Speed & Hold ≤8 × 10−4 Pa in 20 min; ≤5 Pa over 12 hours Deposition Uniformity ±3% to ±5% across the tray Target Options Rectangular: 210×210 mm / 300×300 mm; Circular targets available Applications & Advantages Ideal For: · Research & Prototyping: Tailored for sensitive materials requiring inert environments (e.g., perovskites, OLED layers). · Multi-Process Integration: Combines sputtering, spin-coating, and testing in a single glovebox workflow, minimizing contamination risks. · High-Quality Films: Superior uniformity and low-defect deposition critical for optoelectronic and energy storage devices. Why Choose This System? · Glovebox Compatibility: Unique airtight integration for oxygen/moisture-sensitive processes. · Versatile Configurations: Supports diverse target geometries and automation levels. · Industry-Grade Precision: Tight temperature control (±1°C) and high vacuum stability ensure reproducible results.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; 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