Automatic Pulsing Thermal Evaporator Carbon Coater equipped with Vacuum Pump for Lab SEM Sample Preparation

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Lab Benchtop Vacuum Thermal Evaporating Carbon Coater or SEM Sample Coater

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Small Lab Vacuum Sputtering & Thermal Evaporation Evaporator Coater For Metal Film Preparation

Small Lab Vacuum Sputtering & Thermal Evaporation Evaporator Coater For Metal Film Preparation      Dual-function SEM Sample Preparation Instrument 1. Technical Specifications Vacuum System Parameter Specification Rotary Pumping Speed 50 Hz: 8 m³/h (2.2 L/s) / 60 Hz: 9.6 m³/h (2.6 L/s) Vacuum Limit 2 Pa Max Sputtering Current 100 mA Max Evaporation Current 100 A Sputtering Working Pressure 20 Pa – 8 Pa Evaporation Working Pressure 6 Pa – 4 Pa Working Vacuuming Time < 5 min (to 2 Pa) Vacuum Measurement Atmosphere to 2×10 mbar Gas Control Gas Flow Controller Chamber Size Ø150 × 120 mm (height), scratch-resistant quartz glass Magnetron Target Source Ø50 × 0.1 mm (Au) / Optional: Au, Ag, Pt Evaporation Target Source Carbon Rope Operation Method Manual (instruction manual included) Dimensions (Main Unit) 360 mm (L) × 300 mm (W) × 380 mm (H) Dimensions (Evaporation Unit) 360 mm (L) × 300 mm (W) × 160 mm (H) Weight 55 kg Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption < 2000 W Cooling Method Air Cooling (Evaporation) + Water Cooling (Sputtering) Warranty 1-year limited warranty with lifetime product support Sputtering Parameters · Sputtering Targets: Au (standard), optional Ag, Pt, Cr, Al, Cu · Target Size: Ø50 mm · Sample Stage: Adjustable height, accommodates Ø50 mm and Ø70 mm samples (customizable) · Sputtering Voltage: 0–1600 V (DC, adjustable) · Sputtering Current: 0–50 mA · Sputtering Time: 0–360 s Evaporation Parameters · Evaporation Material: Carbon fiber rope · Evaporation Current: 0–100 A (AC) · Evaporation Voltage: 0–30 V · Evaporation Time: 0–1 s · Micro Vacuum Valve: Compatible with Ø3 mm tubing General · Input Voltage: 220 V (110 V optional), 50 Hz · Vacuum Pump: 2 L/s rotary vane pump (domestic VRD-8) 2. Key Features Dual-Function Advantages · Integrated Design: Combines metal sputtering and carbon evaporation in one compact system · Process Flexibility: Switch between conductive metal coatings (Au/Ag/Pt) and ultra-thin carbon films · Time Efficiency: 5-minute pump-down enables rapid sample processing User-Centric Design · Transparent chamber for real-time monitoring · Ergonomic controls with preset programs · Tool-free target replacement system html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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Low-Temperature Pulsed Thermal Evaporator With Multi-Sample For Nanoscale Thin Film

Low-Temperature Pulsed Thermal Evaporator With Multi-Sample For Nanoscale Thin Film  TMAX-HZ-ZD01-Low-Temperature Pulsed Thermal Evaporator Product Overview The TMAX-HZ-ZD01 Pulsed Carbon Coater is an advanced, fully automated instrument designed for high-quality carbon coating of samples in material science and biological research. Featuring a compact design, intelligent ARM-based control, and pulse evaporation technology, it ensures efficient, precise, and low-thermal-damage coating—ideal for high-resolution SEM analysis. Key Features & Advantages 1. Ultra-Compact Design ·Dimensions: 530×300×320 mm, optimized for space-constrained labs. 2. High-Efficiency Pulse Evaporation ·W-type planar carbon source with pre-degassing function minimizes thermal impact on sensitive samples (e.g., polymers, membranes, fibers). ·Nanoscale coating (<5 nm) ensures dense, uniform films for high-resolution SEM imaging. 3. Fully Automated Operation ·5-inch touchscreen with intuitive interface (supports bilingual display). ·One-click start and ARM-based precision control (adjustable in 1 mA/1 Pa/1 s increments). 4. Multi-Sample Capacity ·Holds 12 standard stub samples simultaneously, reducing manual intervention. 5. Reliable Vacuum System ·Achieves <1 Pa ultimate vacuum via rotary vane pump; real-time monitoring with a Pirani gauge. 6. Versatile Carbon Sources ·Compatible with 0.8/1.2/2.4 mm carbon ropes or rods, detectable for continuity. 7. Safety & Stability ·Dual current/vacuum protection and sensor-monitored operation ensure long-term reliability. Technical Specifications Parameter Detail Power Supply 100–250 VAC, 50/60 Hz Evaporation Type Pulsed W-type planar source Evaporation Power 0–10 V DC, 80 A max Evaporation Time 100 ms–1 s (adjustable) Working Vacuum 2–8 Pa (display resolution: 0.1 Pa) Sample Stage Ø65 mm (height-adjustable) Vacuum Chamber Ø120×100 mm Data Monitoring Real-time display of current, voltage, and vacuum status Applications The GCV-1000 excels in preparing temperature-sensitive samples (e.g., organic polymers, biological tissues, electrodes) and delivers nanoscale coatings critical for: · SEM/EDS analysis · Conductivity enhancement · Nanomaterial research Installation & Usage Highlights 1. Quick Setup: Connect power/gas (optional); system self-checks upon startup. 2. Sample Loading: Adjust sample-to-source distance (~20 mm optimal). 3. Automated Process: Set parameters (vacuum/time/voltage) → Start → Automatic venting post-coating. 4. Maintenance: Tool-free carbon rope replacement; vacuum pump oil refill included.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film

PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film    TMAX-ZY-ZD02-Research-Grade Thin Film Deposition Equipment System Overview TMAX-ZY-ZD02 benchtop resistive thermal evaporation coating system integrates a turbo-molecular pump vacuum assembly to achieve high-vacuum thin film deposition. Equipped with 4 evaporation sources and a precision thickness control system, it is optimized for rapid multi-layer metal/alloy deposition. Featuring a plug-and-play design, this compact instrument operates reliably in office or lab environments without specialized infrastructure, making it ideal for R&D and small-batch production. Key Advantages 1. Portability & Flexibility ·Compact footprint with multi-environment adaptability (lab/office). 2. User-Centric Design ·One-touch operation with preloaded parameters (100+ metal deposition recipes). ·10" touchscreen for intuitive process control and real-time monitoring. 3. High-Performance Deposition ·4-source simultaneous evaporation (supports 99 layers of metals/alloys/polymers per run). ·Quartz crystal monitoring for nanometer-level thickness accuracy (±3% uniformity). 4.Premium Components ·All-aluminum chamber for efficient heat dissipation. ·Imported turbo-molecular pump (300L/s) ensures ≤6×10−5 Pa ultimate vacuum. 5.Low Maintenance ·Minimal training required; modular design simplifies servicing. Typical Applications · Thin-film material research (metals/dielectrics) · Optical coatings & nanoelectronics · Thin-film sensors & MEMS devices · Custom alloy/polymer multilayer structures Standard Specifications Component Details Chamber 400×350×360mm (H), CNC-machined aluminum Vacuum System 300L/s turbo pump + dual-stage rotary vane pump Vacuum Measurement Full-range gauge (atmosphere to UHV) Evaporation Sources 4 independent thermal sources (cross-contamination-free) Power Supply DC power for multi-layer deposition Thickness Control Quartz crystal monitor + manual/auto mode switching Software Network-upgradable with remote parameter adjustment Optional: · Co-evaporation kit for alloys · 2" substrate heater (400°C max) · Water-cooled rotating sample stage Technical Parameters · Ultimate Vacuum: ≤6×10−5 Pa (after bake-out) · Leak Rate: ≤5.0×10−9 Pa·L/s · Deposition Rate: ≥8 nm/min (varies by material) · Thickness Uniformity: ≤3% (with planetary rotation) Site Requirements Parameter Specification Dimensions 600×720×1200mm (H) Weight 85 kg Environment 23±3°C, <60% RH Power AC 230V, 32A, 50Hz Cooling Water 0.2MPa, 15–25°C, ≥8L/min (optional) Gas Supply 99.9% N2 (optional for venting) Operational Workflow · Fully automated process: Pre-programmed vacuum pumping, substrate heating, and evaporation. · Multi-layer capability: Sequential deposition of 4 materials (up to 99 layers) with customizable thickness/time modes. · Data export: Real-time parameter logging and remote monitoring. Why Choose? · Time-saving: Eliminates complex setup with industry-leading uptime. · Precision: Combines lab-grade vacuum performance with production-level repeatability. · Scalability: Modular options cater to evolving research needs. Ideal for academic labs, startups, and industrial R&D requiring rapid prototyping of advanced thin films.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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Lab Physical Vapor Deposition Coating Equipment Thin Film Evaporator

Lab Physical Vapor Deposition Coating Equipment Thin Film Evaporator    TMAX-PD-ZD03-Thin Film Evaporator Product Overview The TMAX-PD-ZD03 system adopts an oil-free high-vacuum system with a large pumping-speed molecular pump, featuring an integrated electromechanical design for minimal lab space occupancy. It supports compatible metal and organic evaporation sources, offering high cost-effectiveness and user-friendly operation. Ideal for research institutes, electrode deposition, SEM sample preparation, and studies in OLED/solar cell technologies. Key Features 1. Broad Application Scope Optimized for evaporating noble metals (e.g., Au, Ag) in electrode preparation and semiconductor lift-off processes, reducing material waste. 2. Space-Saving & Durable Compact footprint (550×900 mm) with a full stainless-steel vacuum chamber for enhanced durability and safety. 3. High-Efficiency Vacuum System Oil-free molecular pump (≥300 L/s pumping speed) allows flexible installation angles, shortened pumping paths, and faster processing. 4. Multi-Source Compatibility Configurable with 2–4 evaporation sources (metal/organic), supporting co-evaporation or sequential deposition. 5. Precision Control Constant-current evaporation power supply, in-situ thickness monitoring, and excellent film uniformity (±3–5%) with high repeatability. 6. Upgradability Optional non-stop venting and full automation control. Technical Specifications Core Parameters Category Specification Chamber Dimensions (L×W×H) 300 × 300 × 450 mm (customizable height) System Dimensions (L×W×H) 530 × 750 × 1800 mm (standard) / 1100 × 750 × 1500 mm (alternative) Ultimate Vacuum ≤5×10−5 Pa Base Pressure Holding ≤5 Pa (12 hrs), ≤8×10−4 Pa (30 min) Substrate Stage ≤100 × 100 mm (max. 110 mm substrate or 25×15 mm ITO glass) Source-Substrate Distance >300 mm Evaporation Sources · Metal Sources: 2–3 groups (optional) · Organic Sources: Beam-source furnace type, temperature-controlled (0–500°C), integrated adjustable baffle (0–15°), 2–3 groups (optional). Power Requirements · Voltage: AC 220 V/50 Hz (380 V optional) · Power: ≤6 kW Target Applications · Research & Academia: Electrode deposition, SEM/TEM sample preparation. · Advanced Materials: OLED encapsulation, perovskite solar cell R&D. · Semiconductor: Metal lift-off processes, thin-film device fabrication. Why Choose? · Cost-Effective: Reduced material consumption and energy-efficient operation. · User-Centric: Simplified controls, robust safety features, and modular upgrades. · Future-Ready: Adaptable to evolving lab needs with optional automation.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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Electron-beam Metal Thermal Evaporator Coating System For Nano Film Fabrication

Electron-beam Metal Thermal Evaporator Coating System For Nano Film Fabrication      TMAX-TK-DZ01-Precision Thin-Film Deposition Solution for Research & Industry Technical Specifications Parameter Specification Chamber Dimensions Φ600mm × 750mm (Water-cooled stainless steel) Base Pressure ≤5.0×10⁻⁵ Pa (after 24h baking) Pumping Speed ≤40 min (air → 5×10⁻⁴ Pa) Leak Rate ≤0.8 Pa/h Substrate Capacity Flat (Φ350mm) or Spherical (optional) Heating Temperature Up to 300°C (±1°C) Rotation Speed 0-20 rpm (with bias voltage) E-Gun Power 10kW (6-pocket crucible) Resistance Sources 2 sets (3000W total) Film Uniformity ≤±5% Key System Advantages 1. Superior Thin Film Quality ·Ultra-high vacuum environment (<5×10⁻⁵ Pa) minimizes contamination ·Optional ion-assisted deposition enhances film density and adhesion ·Excellent thickness uniformity (±5%) for precision applications 2. Enhanced Process Capabilities ·Dual evaporation sources (E-beam + thermal) for material flexibility ·Heated rotating substrate stage (300°C) for uniform deposition ·Modular design allows future upgrades (optical monitoring, automation) 3. User-Friendly Operation ·Intuitive PLC+touchscreen control interface ·Comprehensive safety interlocks (cooling, vacuum, power) ·Compact footprint (2.5m×1.6m) optimized for lab spaces Primary Application Areas Optical Coatings • Anti-reflection coatings • Laser mirrors and filters • IR optical components Electronic & Semiconductor Films • Transparent conductors (ITO, AZO) • Dielectric layers (SiO₂, Al₂O₃) • Semiconductor device fabrication Functional Material Research • Ferroelectric films (PZT, BST) • Magnetic thin films • 2D material encapsulation Ideal For: ✓ Academic research laboratories ✓ Industrial R&D centers ✓ Small-scale precision coating production ✓ Advanced material development projects   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }