Magnetron Ion Thermal Evaporation Carbon Sputter Coater for SEM Sample Preparation

Magnetron Ion Thermal Evaporation Carbon Sputter Coater for SEM Sample Preparation Introduction     Magnetron Ion Sputtering Unit &Thermal Evaporation Carbon Coater is ideal and designed for lab SEM sample preparation. SD900C Model (Magnetron Ion Sputtering Unit) is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample.     SD900C Model (Thermal Evaporation Carbon Unit) carbon coater applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM.     Working vacuum pressure can be achieved quickly when using proper vacuum pump within 5 minutes. It is user friendly and easy to operate.     Vacuum pump is included.     Chiller is optional. (for Magnetron Ion Sputtering Unit)   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 100mA Max evaporation current 100A Working pressure 20Pa -8 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Evaporation target source Target material:carbon rope /target source:carbon rope Operation method Instruction Manual (2 units)Weight/size 55kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Cooling method Air cooling(Evaporation)+water cooling (sputtering ) Warranty One year limited warranty with lifetime product support

High Vacuum Thermal Evaporation Coater With Three Kinds Of Evaporation Head Heat Evaporation Carbon Rod Molybdenum Boat Tungsten Wire Bar

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Lab Ion Sputtering & Evaporation PVD Coater Machine for SEM for Glove Box

Lab Ion Sputtering & Evaporation PVD Coater Machine for SEM for Glove Box    TMAX-BY-JS03- Ion Sputtering & Evaporation Coater for SEM Specification Integrated with sputtering and thermal evaporation functions, this compact and user-friendly instrument is designed for high-quality thin-film deposition, particularly for SEM sample preparation. It supports multiple metal targets for sputtering and carbon fiber evaporation, offering precise control over coating parameters. Technical Specifications Parameter Value Dimensions 305 mm × 400 mm × 390 mm (W×D×H) Vacuum Chamber Material Borosilicate glass, 160 mm × 110 mm (D×H) Target (Upper Electrode) 50 mm × 0.1 mm (D×H) Sputtering Targets Au (standard), optional Ag, Pt, etc. Target Size φ50 mm Sample Stage Compatible with 50 mm/70 mm diameter; customizable Sputtering Voltage 0–1600 V (DC), adjustable Sputtering Current 0–50 mA Sputtering Timer 0–360 s Carbon Evaporation Current 0–100 A (AC) Evaporation Material Carbon fiber Evaporation Voltage 0–30 V Evaporation Time 0–1 s Gas Inlet Valve Compatible with φ3 mm tubing Process Gases Multiple options Power Supply 220 V (110 V optional), 50 Hz Vacuum Pump 2L rotary vane pump (VRD-8, domestic) Key Features 1. Dual-Function Design ·Combines ion sputtering (Au, Pt, Ag, Cu, etc.) and thermal evaporation (carbon fiber) for versatile applications. ·Ideal for high-resolution microscopy (SEM, TEM, EBSD) requiring ultra-fine carbon films (<1 nm). 2. Precision Control ·Adjustable sputtering current, vacuum pressure, and gas selection to optimize coating rate and particle size. ·Digital timer for reproducible processes. 3. Enhanced Sample Protection ·Conductive coatings eliminate charging effects in non-conductive samples. ·Carbon films protect beam-sensitive materials (e.g., biological/plastic samples) from electron beam damage. 4. Efficiency & Reliability ·Compact footprint with automated vacuum protection to prevent short circuits. ·Uniform film deposition with short processing time. Applications · Electron Beam-Sensitive Samples (e.g., polymers, biological tissues): Coating mitigates structural damage. · Non-Conductive Materials: Metal layers (Au, Pt) dissipate charge, improving SEM imaging. · Advanced Materials: Enhances conductivity and surface analysis (EBSD, microprobe) for semiconductors/composites. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; 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Thermal Evaporation Evaporator Coating Coater System For Au, Ag, Al Film

Thermal Evaporation Evaporator Coating Coater System For Au, Ag, Al Film        TMAX-QH-ZD01-High-Vacuum Multi-Material Evaporation Product Overview The TMAX-QH-ZD01is a high-performance vacuum deposition system designed for precision thin-film coating applications in research and industrial laboratories. It features advanced vacuum technology, multi-source evaporation capabilities, and user-friendly controls, making it ideal for organic electronics, optoelectronics, and nanomaterials research. Technical Specifications No. Parameter Description Vacuum Chamber     1 Ultimate Vacuum Better than 4×10–5 Pa (new equipment) 2 Leak Rate 6.7×10–8 Pa·L/s 3 Working Vacuum 5×10–4 Pa (Time from atmosphere to working vacuum <30 min) (For N2-purged glovebox-integrated systems, cold state) 4 Vacuum Retention Pressure remains below 3 Pa after 24 hours post shutdown 5 Sample Size 300 × 300 mm 6 Sample Holder Size 360 × 360 mm 7 Evaporation Sources 4 organic + 4 metal sources 8 Compatible Materials C60, BCP, Cu, Ag, LiF, MoO3, Al, etc. 9 Evaporation Sources Configuration     - Metal Sources: 4 water-cooled electrodes (compatible with 5cc ceramic Ta crucibles for Cu/Al).     - Organic Sources: 4 standard Knudsen cells (10cc, max. 500°C).     Performance Metrics:     - Organic (NPB standard): Deposition rate 0.5–3 Å/s (±0.1 Å/s stability), uniformity ±5% (≤300×300 mm).     - Metal (Al standard): Deposition rate 0.5–3 Å/s (±0.1 Å/s stability), uniformity ±5% (≤300×300 mm).   10 Source-to-Substrate Distance 530 mm (metal sources include extendable electrode rods, default 100 mm). 11 Mask Library Not included (customizable upon request). 12 Thickness Probes 4 imported probes (1 probe monitors 2 sources). 13 Thickness Display Real-time touchscreen monitoring:  - Individual source rate/thickness/temperature (Knudsen cells).  - Total thickness/rate (large-font display). 14 Deposition Control Organic sources: Rate/temperature control. Metal sources: Rate control (manual/automated). 15 Software Process lock function for repeatability. 16 Closed Pumping Mechanical pump isolation feature to enhance productivity. Key Advantages 1. High Precision & Uniformity 1. Stable deposition rates (≤±0.1 Å/s variation) and excellent uniformity (±5%) ensure reproducible thin films for sensitive applications like OLEDs and solar cells. 2. Multi-Source Flexibility 1. Simultaneous evaporation of organic/metallic materials (8 total sources) enables complex multilayer structures without breaking vacuum. 3. Robust Vacuum Performance 1. Ultra-high vacuum (4×10–5 Pa) and low leak rate (6.7×10–8 Pa·L/s) guarantee contamination-free coatings. 4. User-Centric Design 1. Intuitive touchscreen interface, real-time monitoring, and glovebox compatibility streamline workflow for lab environments. Recommended Applications · Research: Organic semiconductors, perovskite solar cells, quantum dots. · Industry: Optical coatings, flexible electronics, barrier films. · Education: Thin-film deposition training, material science experiments.    html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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