Dip Coater (1-200 mm/min) with 124 L Temperature Chamber and Touch Panel Controller for Large Substrate up to 16"x 9"

Dip Coater (1-200 mm/min) with 124 L Temperature Chamber and Touch Panel Controller for Large Substrate up to 16"x 9"

Large size 5-position programmable dip coater w/ 225L Dry Oven

Large size 5-position programmable dip coater w/ 225L Dry Oven

Small Battery Film Coater Machine of 200 ° C for Lithium Battery

Hot sale small battery  film coater machine of 200 ° C for lithium battery

Laboratory Thin Film Flow Coater Coating Machine With Infinitely Variable Speed

Laboratory Compact Bar  filmCoater With Infinitely Variable Speed

200C Max. Compact Lab Automatic Mini Tablet Film Coater ( 10"Wx16"L ) For Battery Electrode Coating

200C Max. Compact Lab Automatic Mini Tablet Film Coater( 10"Wx16"L ) For Battery Electrode Coating

Compact Tape Casting Coater w/ Vacuum Chuck (8"Wx14"L), Film Applicator & Optional 100ºC Dryer Cover

Compact Tape Casting Coater w/ Vacuum Chuck (8"Wx14"L), Film Applicator & Optional 100ºC Dryer Cover TMAX-TMH250 is a CE Certified ready compact tape casting coater with a heating cover designed to produce films with consistent thickness. It has a unique driving system to produce a smooth coating on all types of materials. The flat vacuum chuck is built in to hold the substrate sheet in place, which is particularly useful when making thin coatings. One 100 mm width adjustable micrometer applicator (doctor-blade). Heating cover with digital temperature controller can dry films after coating up to 100°C with a temperature accuracy of +/-1°C. This equipment can be used for researchers on ceramic tape castings and Li-Ion battery electrode coating.

Lab Automatic Compact Film Coater with Vacuum Chuck&Selectable Heating Functions

Compact Tape Casting Coater with Vacuum Chuck, Adjustable Film Applicator & Dryer Cover TMAX-TMH250 is a CE Certified ready compact tape casting coater with a heating cover designed to produce films with consistent thickness. It has a unique driving system to produce a smooth coating on all types of materials. The flat vacuum chuck is built in to hold the substrate sheet in place, which is particularly useful when making thin coatings. One 100 mm width adjustable micrometer applicator (doctor-blade). Heating cover with digital temperature controller can dry films after coating up to 100°C with a temperature accuracy of +/-1°C. This equipment can be used for researchers on ceramic tape castings and Li-Ion battery electrode coating.

Lab Customized Film Coating Machine with Doctor blade & Bar Alternately

Laboratory Compact Bar  filmCoater With Infinitely Variable Speed

Lab Coater Coating Machine For Sodium-Ion Battery Research

Compact Tape Casting Coater with Vacuum Chuck, Adjustable Film Applicator & Dryer Cover TMAX-TMH250 is a CE Certified ready compact tape casting coater with a heating cover designed to produce films with consistent thickness. It has a unique driving system to produce a smooth coating on all types of materials. The flat vacuum chuck is built in to hold the substrate sheet in place, which is particularly useful when making thin coatings. One 100 mm width adjustable micrometer applicator (doctor-blade). Heating cover with digital temperature controller can dry films after coating up to 100°C with a temperature accuracy of +/-1°C. This equipment can be used for researchers on ceramic tape castings and Li-Ion battery electrode coating.

Lab Automatic 300mm Tape Casting Coater Film Coating Machine

Automatic Film Coater with Dryer, Vacuum Chuck & Adjustable Film Applicator compact tape casting coater 1.coater width:10-200mm  2.with Dryer,Vacuum Pump 3.for lab equipment

Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating

Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating     Model: TMAX-PC-JS01- Versatile Magnetron Sputtering System For Functional Film Deposition Coating Application: Designed for the preparation of nanoscale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, and dielectric films. It is widely suitable for scientific research and small-batch production in universities and research institutes. Equipped with an anode-layer ion source for pre-cleaning and assisted deposition, as well as a reverse sputtering function to enhance film quality and adhesion. System Configuration: The system consists of a sputtering vacuum chamber, permanent magnet sputtering targets (3 targets), a single-substrate heating stage, DC/RF power supplies, gas supply system, pumping system, vacuum measurement, electrical control system, and mounting platform. Technical Specifications Parameter Specification Chamber Structure Vertical, top-loading; stainless steel & vacuum-compatible materials Base Pressure (Sputtering Chamber) ≤5×10⁻⁶ Pa Leak Rate ≤5×10⁻⁷ Pa·L/s Pressure Rise Rate ≤1 Pa (after 12 hours of pump shutdown) Pumping System Domestic molecular pump + mechanical pump Magnetron Targets 3 × 3-inch HV-compatible (2 standard field, 1 strong field) Power Supplies RF: 600 W, 13.56 MHz (auto-matching); DC: 2 × 1000 W Target-Substrate Distance 40–120 mm (adjustable) Substrate Heating Max 450°C, programmable control Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm Uniformity (2-inch area) ≤5% deviation Adhesion Test Withstands 3 tape-peeling tests (glass/si/ceramic) Pre-Cleaning Reverse sputtering capability Ion Source Anode-layer for cleaning & assisted deposition Gas Control 2 MKS mass flow controllers (reactive/Ar); gas mixing Baking Temperature 150°C (infrared heating) Safety Features Water/power failure interlock; anti-misoperation Key Features & Suitability 1. Precision Deposition ·Supports DC/RF sputtering for diverse materials (metals, semiconductors, dielectrics). ·Ion-assisted deposition enhances film density and adhesion. 2. High Vacuum Stability ·Ultra-low base pressure (≤5×10⁻⁶ Pa) ensures contamination-free films. ·Low leak rate maintains consistent process conditions. 3. User-Centric Design ·Vertical loading simplifies sample handling. ·Programmable substrate heating (up to 450°C) for optimized film growth. 4. Quality Assurance ·≤5% thickness uniformity and rigorous adhesion standards (tape test). ·Reverse sputtering and ion source for pre-deposition cleaning. 5. Research & Small-Batch Production ·Ideal for universities, labs, and industrial R&D in optics, electronics, and coatings.         html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film

Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film      Model: TMAX-PC-JS08-Dual-Target, Multilayer Films Deposition Equipment Purpose Designed for nano-scale single/multilayer functional films (hard coatings, metals, semiconductors, dielectrics). Features pre-sputtering cleaning for enhanced adhesion. System Components · Vacuum chamber, dual magnetron targets, heating stage, DC/RF power supplies, gas delivery, vacuum pumps, control system. Technical Parameters Category Specification Chamber Structure Vertical front-loading; stainless steel/vacuum materials Base Pressure ≤5×10−5 Pa Leak Rate ≤5×10−7 Pa·L/s Pressure Rise Rate ≤10 Pa (after 12 hours, pump off) Pumping System Domestic molecular pump + mechanical pump Targets 2× 4-inch HV (1 standard-field, 1 strong-field); DC/RF compatible (Kurt J. Lesker) Target-Sample Distance 40–120 mm (multilayer); 80–120 mm (with ion source) Power Supplies RF: 1000 W, 13.56 MHz (auto-matching); DC: 1000 W (AE brand) Sample Stage 3 substrates; 5–30 RPM rotation; 450°C heating; 1000 V bias Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm (±5% uniformity over 2-inch area) Adhesion Test Passes 3-tape peel (glass/Si/ceramic) Gas System 2 MKS mass flow controllers (Ar + reactive gas); mixing capability Baking Temperature 150°C (infrared heating) Key Features 1. Dual-Target Flexibility o Enables co-sputtering or sequential deposition for complex multilayers. 2. High Adhesion & Cleanliness o Integrated pre-sputtering cleaning and ion-assisted deposition (anode-layer source). 3. Precision Process Control o Programmable temperature (450°C max), rotation (5–30 RPM), and gas flow. 4. Safety & Reliability o Interlocks for power/water failures; manual controls for critical operations. Target Applications · Research: Nanomaterials, thin-film physics, prototype development. · Education: Advanced deposition techniques training. · Industry: Small-batch functional coatings (e.g., optics, electronics).     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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