products categories
- Battery Production Equipment Line
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- Battery Pack Compoments
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contact us
- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
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200*200mm Effective Area Stainless Steel Ultraviolet Ozone Cleaning Machine Widely Used in Perovskite Solar Cells
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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High Precision Benchtop Automatic Ultrasonic Atomization Spraying Machine Suitable for Research And Development of Perovskite Solar Cells
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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High Precision Laser Marking Machine or Perovskite Solar Cell Equipment
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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Lab High Control Accuracy Slit Coater Used in The Preparation of Perovskite Solar Cell Film
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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Screen Belt UV Curing Machine or Solar Cell Research Machine with Automatic Dispensing System
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film
Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film Model: TMAX-PC-JS08-Dual-Target, Multilayer Films Deposition Equipment Purpose Designed for nano-scale single/multilayer functional films (hard coatings, metals, semiconductors, dielectrics). Features pre-sputtering cleaning for enhanced adhesion. System Components · Vacuum chamber, dual magnetron targets, heating stage, DC/RF power supplies, gas delivery, vacuum pumps, control system. Technical Parameters Category Specification Chamber Structure Vertical front-loading; stainless steel/vacuum materials Base Pressure ≤5×10−5 Pa Leak Rate ≤5×10−7 Pa·L/s Pressure Rise Rate ≤10 Pa (after 12 hours, pump off) Pumping System Domestic molecular pump + mechanical pump Targets 2× 4-inch HV (1 standard-field, 1 strong-field); DC/RF compatible (Kurt J. Lesker) Target-Sample Distance 40–120 mm (multilayer); 80–120 mm (with ion source) Power Supplies RF: 1000 W, 13.56 MHz (auto-matching); DC: 1000 W (AE brand) Sample Stage 3 substrates; 5–30 RPM rotation; 450°C heating; 1000 V bias Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm (±5% uniformity over 2-inch area) Adhesion Test Passes 3-tape peel (glass/Si/ceramic) Gas System 2 MKS mass flow controllers (Ar + reactive gas); mixing capability Baking Temperature 150°C (infrared heating) Key Features 1. Dual-Target Flexibility o Enables co-sputtering or sequential deposition for complex multilayers. 2. High Adhesion & Cleanliness o Integrated pre-sputtering cleaning and ion-assisted deposition (anode-layer source). 3. Precision Process Control o Programmable temperature (450°C max), rotation (5–30 RPM), and gas flow. 4. Safety & Reliability o Interlocks for power/water failures; manual controls for critical operations. Target Applications · Research: Nanomaterials, thin-film physics, prototype development. · Education: Advanced deposition techniques training. · Industry: Small-batch functional coatings (e.g., optics, electronics). html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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Multi-target Magnetron Sputtering Machine For Parylene,OLED, Solar Cell & Semiconductor
Multi-target Magnetron Sputtering Machine For Parylene,OLED, Solar Cell & Semiconductor Model: TMAX-PC-JS10-Multi-target, Multi-film Deposition Specifications Category Parameter Primary Application Nanoscale monolayer/multilayer films (hard coatings, metals, semiconductors, dielectrics) Target Users Universities, research institutes (R&D and small-batch production) System Composition Vacuum chamber, sputtering targets, sample stage, vacuum pumps, gas delivery, control systems, film thickness monitor, and auxiliary components Vacuum Performance Parameter Specification Ultimate Vacuum 6.7 × 10-5 Pa System Leak Rate ≤1 × 10-7 Pa·L/s Vacuum Recovery Time ≤40 min (to 6.6 × 10-1 Pa after N2 purge) Chamber & Sample Stage Component Specification Chamber Dimensions Ø630 mm × 350 mm (cylindrical) Sample Capacity 8 × 4-inch substrates (1 mm thickness) Sputtering Targets Feature Specification Target Types 3 × Permanent magnet targets, 3 × High-intensity magnet targets Cooling Method Indirect water-cooled (brazed structure) Target Diameter Ø100 mm Target-Substrate Distance 50–90 mm (manual adjustment, with position indicator) Sputtering Mode Vertical downward sputtering Substrate Control Parameter Specification Bias Voltage Up to -200 V Rotation Mechanism Computer-controlled revolution + rotation (stepper motor-driven) Temperature Control RT to 300°C (single calibration required; 3 heaters, one active at a time) Gas & Thickness Control Component Specification Mass Flow Controllers (MFC) 2 channels Film Thickness Monitor Quartz crystal microbalance (0–999,999 Å) Pumping Options Configuration Components Standard Turbo molecular pump + dry scroll pump Alternative Cryogenic pump + dry scroll pump Computer Control Features · Real-time displacement/speed monitoring with error calculation. · Linear/logarithmic display modes for speed vs. displacement. · Site-specific deposition via precision positioning. Key Advantages & Applications ✔ Multi-Target Flexibility – Supports diverse materials (metals, oxides, nitrides). ✔ Uniform Deposition – Computer-controlled rotation ensures film consistency. ✔ High Vacuum Stability – Minimizes contamination for high-purity films. ✔ Research-Ready – Modular design suits optoelectronics, tribological coatings, and semiconductor R&D. Ideal for: Advanced material science studies and prototyping of functional thin-film devices. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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Solar Cell Thin Film Evaporation Evaporator For Metals, Alloys & Dielectric Deposition
Solar Cell Thin Film Evaporation Evaporator For Metals, Alloys & Dielectric Deposition TMAX-PC-DZ03-Electron Beam Evaporation Coating System Key Applications Designed for the deposition of conductive films, semiconductor films, ferroelectric films, and optical coatings, this system is widely utilized in university laboratories, research institutions, and small-scale production environments requiring high-precision thin-film fabrication. System Components · Deposition Chamber: U-shaped design with front-loading door, dimensions: 800 × 600 × 600 mm. · E-Gun Electron Beam Source: o Anode voltage: 8 kV / 10 kV (1 set included). o Power range: 0–10 kW (adjustable). · Crucible: Water-cooled, 6-pocket design (11 mL per pocket). · Resistive Evaporation Source (Optional): o Voltage: 5 V / 10 V. o Power: 300 A current, max. 3 kW output (1 set). o Configurable with 3 water-cooled electrodes to form 2 evaporation boats. · Substrate Holder: o Accommodates up to 4″ substrates. o Rotational speed: 5–60 RPM (continuously adjustable). o Substrate-to-source distance: 300–350 mm. o Heating range: up to 800°C ±1°C (manual control). o Includes a manual sample shutter assembly. · Gas Delivery System: 1-channel mass flow controller (MFC). · Vacuum System: o Base pressure: ≤6.7 × 10–4 Pa. o Pump-down time: ≤20 min (from 1 × 10–1 Pa to 5 × 10–4 Pa). o Leak rate: ≤6.7 × 10–7 Pa·L/s. · Thickness Monitoring: Quartz crystal microbalance (QCM) with display range: 0–99,999 Å. Technical Advantages 1. Precision Control: Adjustable e-beam power and substrate rotation ensure uniform film thickness and composition. 2. Versatility: Compatible with multiple evaporation sources (e-beam + resistive), enabling deposition of diverse materials. 3. High-Temperature Stability: Substrate heating up to 800°C (±1°C) supports annealing and epitaxial growth. 4. Efficient Vacuum Performance: Rapid pump-down and low leak rate enhance process reproducibility. 5. User-Friendly Design: Front-loading chamber and modular components simplify maintenance and sample handling. Target Industries & Research Fields · Advanced Materials: Optoelectronics, MEMS, superconducting films. · Energy Applications: Thin-film solar cells, battery electrodes. · Academic Research: Surface science, nanotechnology, and condensed matter physics. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; 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Electron Beam Evaporation Coating System For Layer Deposition In OLED, Solar Cell & Semiconductor
Electron Beam Evaporation Coating System For Layer Deposition In OLED, Solar Cell & Semiconductor TMAX-TK-DZ02-Precision Thin-Film Deposition Solution for Research & Industry 1. Product Overview The TMAX-TK-DZ02 is a high-performance electron beam evaporation system designed for advanced thin-film research and small-batch production. Featuring a compact vertical design with semi-automatic controls, it offers exceptional film uniformity and material versatility for both academic and industrial applications. 2. Key Features & Advantages 2.1 Precision Deposition Performance · Achieves ≤±5% film thickness uniformity via rotating substrate holder (0-40 rpm) · Ultra-high vacuum (6.0×10⁻⁵ Pa) ensures minimal contamination · Fast pumping system reaches working vacuum in ≤30 minutes 2.2 Advanced Configuration Options · 8kW E-gun with 6-crucible carousel (domestic/import options) · Optional Kaufman ion source for improved film density and adhesion · Triple resistive evaporation sources for low-temperature materials 2.3 User-Oriented Design · PLC + touchscreen control for reproducible processes · Compact footprint (2.5×1.6m) ideal for laboratory environments · Comprehensive safety protection system (cooling/voltage/pressure monitoring) 3. Technical Specifications Parameter Specification Chamber Design Vertical cylinder, side-opening Chamber Dimensions Φ500 × H650 mm Base Pressure ≤6.0×10⁻⁵ Pa Pumping Speed 2000 L/s Heating Temperature RT - 300°C (substrate) Substrate Stage Φ200 mm rotating (max Φ300 mm loading) Film Uniformity ≤±5% E-Gun Power 8 kW Control System PLC + Touchscreen Total Power Consumption ≥17 kW 4. Application Areas 4.1 Optical Coatings · Anti-reflection coatings · Laser optics · IR filters and mirrors 4.2 Electronics & Semiconductors · Conductive films (Au, ITO) · Dielectric layers (SiO₂, Al₂O₃) · Semiconductor device fabrication 4.3 Functional Materials · Ferroelectric films (PZT) · MEMS and sensor coatings · Wear/corrosion resistant layers 5. Technical Highlights 5.1 Multi-Material Deposition · Processes metals (Al, Au, Ti), oxides (SiO₂), and organic films · Handles both low-vapor-pressure and refractory materials 5.2 Research-Grade Flexibility · Supports multi-layer deposition for complex structures · Substrate heating enables optimized film crystallization 5.3 Production-Ready Reliability · Robust mechanical design for continuous operation · Low maintenance requirements with easy consumable replacement 6. Why Choose? · Academic/Industrial Versatility: From basic research to pilot production · Cost Efficiency: Lower operational costs than comparable systems · Future Expandability: Modular design accepts process upgrades html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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Ultrasonic Spray Pyrolysis Coater For Fuel Cells & Solar Cells
Ultrasonic Spray Pyrolysis Coater For Fuel Cells & Solar Cells We provide customized solutions tailored to cutting-edge industries, including: · Nanotechnology · Fuel cells · Semiconductor coatings · Medical coatings · Spray pyrolysis Our services encompass: ✔ Full-spectrum functional coating solutions with long-term technical support for stable mass production. ✔ Custom R&D for specialized equipment coatings. ✔ OEM coating services for diverse applications. A high-tech system delivering uniform, ultra-thin, and precisely controlled film coatings. Features real-time monitoring via a teaching device. Integrated Systems Component Function Ultrasonic system Ensures fine atomization for even coating. Carrier gas system Enhances spray precision and control. Heating stage Optimizes substrate temperature for adhesion. Vacuum adsorption Secures substrates during coating. Exhaust system Safely removes fumes. Laser teaching system Facilitates precise nozzle alignment. Applications · Fuel cell proton exchange membrane spraying · Thin-film solar cells · Nano-modified material coating · Glass coating · Spray pyrolysis Key Advantages · ✅ R&D and small-batch production compatible · ✅ Compact desktop design for easy mobility · ✅ Material utilization rate up to 95% · ✅ Uniform coating stability: ±5% thickness variance · ✅ Effective spray area: 400mm × 400mm Features & Specifications · Uniform thin-film spraying (as thin as tens of nanometers). · Precise flow control, enabling ultra-low-flow spraying. · High thickness control accuracy. · Liquid utilization >95%. · Clog-resistant spray head. · Portable benchtop design. · Suitable for lab and industrial use. · Highly controllable spraying for reliable, repeatable results. Technical Parameters Parameter Specification Dimensions 1260 × 850 × 950 mm Spray area* 400 × 400 mm (*Customizable) Power supply 120V / 220V ±10%, 50–60Hz Ultrasonic nozzles Compatible with multiple nozzle types Control interface 7-inch HMI Heating/vacuum plate Standard Certifications CE, FDA html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; 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