Lab Automatic 300mm Tape Casting Coater Film Coating Machine

Automatic Film Coater with Dryer, Vacuum Chuck & Adjustable Film Applicator compact tape casting coater 1.coater width:10-200mm  2.with Dryer,Vacuum Pump 3.for lab equipment

Laboratory Automatic Doctor Blade Coating Machine with Drying Cover& Vacuum Function

200C Max. Compact Lab Automatic Mini Tablet Film Coater( 10"Wx16"L ) For Battery Electrode Coating

High-Precision PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine

High-Precision PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine     Dual-function SEM Sample Preparation Instrument 1. Technical Specifications Vacuum System Parameter Specification Rotary Pumping Speed 50 Hz: 8 m³/h (2.2 L/s) / 60 Hz: 9.6 m³/h (2.6 L/s) Vacuum Limit 2 Pa Max Sputtering Current 100 mA Max Evaporation Current 100 A Sputtering Working Pressure 20 Pa – 8 Pa Evaporation Working Pressure 6 Pa – 4 Pa Working Vacuuming Time < 5 min (to 2 Pa) Vacuum Measurement Atmosphere to 2×10 mbar Gas Control Gas Flow Controller Chamber Size Ø150 × 120 mm (height), scratch-resistant quartz glass Magnetron Target Source Ø50 × 0.1 mm (Au) / Optional: Au, Ag, Pt Evaporation Target Source Carbon Rope Operation Method Manual (instruction manual included) Dimensions (Main Unit) 360 mm (L) × 300 mm (W) × 380 mm (H) Dimensions (Evaporation Unit) 360 mm (L) × 300 mm (W) × 160 mm (H) Weight 55 kg Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption < 2000 W Cooling Method Air Cooling (Evaporation) + Water Cooling (Sputtering) Warranty 1-year limited warranty with lifetime product support Sputtering Parameters · Sputtering Targets: Au (standard), optional Ag, Pt, Cr, Al, Cu · Target Size: Ø50 mm · Sample Stage: Adjustable height, accommodates Ø50 mm and Ø70 mm samples (customizable) · Sputtering Voltage: 0–1600 V (DC, adjustable) · Sputtering Current: 0–50 mA · Sputtering Time: 0–360 s Evaporation Parameters · Evaporation Material: Carbon fiber rope · Evaporation Current: 0–100 A (AC) · Evaporation Voltage: 0–30 V · Evaporation Time: 0–1 s · Micro Vacuum Valve: Compatible with Ø3 mm tubing General · Input Voltage: 220 V (110 V optional), 50 Hz · Vacuum Pump: 2 L/s rotary vane pump (domestic VRD-8) 2. Key Features Dual-Function Advantages · Integrated Design: Combines metal sputtering and carbon evaporation in one compact system · Process Flexibility: Switch between conductive metal coatings (Au/Ag/Pt) and ultra-thin carbon films · Time Efficiency: 5-minute pump-down enables rapid sample processing User-Centric Design · Transparent chamber for real-time monitoring · Ergonomic controls with preset programs · Tool-free target replacement system html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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RF+DC Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics

RF+DC  Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics     Model: TMAX-BY-JS12| – Product Specifications Technical Specifications Parameter Specification Vacuum Pump System Rotary Vane Pump (Oil-lubricated) + Oil-Free Turbo Molecular Pump Set Rotary Pump Speed 50Hz: 16m³/h (4.4 L/s) | 60Hz: 19.2m³/h (5.2 L/s) Molecular Pump Speed 300 L/s Ultimate Vacuum 5 × 10⁻⁴ Pa Working Pressure 0.5 – 5 Pa Pump-Down Time >10 min (to 10 Pa) Vacuum Measurement Range: Atmosphere to 10⁻⁴ Pa Gas Control Mass Flow Controller (MFC) Chamber Size φ260mm × 200mm (Metal Chamber) Magnetron Target Source Target Size: φ50mm × 3mm (Copper)  Compatible with Weakly Magnetic Materials Operation Method Manual Control (Instruction Manual Provided) Weight / Dimensions 100kg / 610mm (L) × 420mm (W) × 490mm (H) Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption <3000W Cooling System Air Cooling (Pump) + Water Cooling (Sputtering Target) Warranty 1-Year Limited Warranty with Lifetime Technical Support Key Features & Applications Core Advantages 1. Multi-Mode Sputtering Supports RF (Radio Frequency), DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings. 2. High Vacuum Stability Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films. 3. Flexible Compatibility ·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples. ·φ50mm target supports copper and weakly magnetic materials for diverse applications. 4. Efficient Cooling System ·Water-cooled target minimizes thermal load during high-power sputtering. · Air-cooled pump reduces maintenance costs for continuous operation. Typical Applications ·Research Fields Thin film deposition, nanostructured coatings, semiconductor device development. ·Industrial Uses Optical coatings, wear-resistant layers, surface modification of electronic components.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Multistation Dip Coating Machine For Metal process With Multi-Temperature for Thin Film Research

Dip Coater (1-200 mm/min) with 124 L Temperature Chamber and Touch Panel Controller for Large Substrate up to 16"x 9"

200C Benchtop Dip Coating Equipment Machine With Discounted Price

Dip Coater (1-200 mm/min) with 124 L Temperature Chamber and Touch Panel Controller for Large Substrate up to 16"x 9"

Millimeter Large Size Dip Coating Machine Coater With Low Price

Dip Coater (1-200 mm/min) with 124 L Temperature Chamber and Touch Panel Controller for Large Substrate up to 16"x 9"

Laboratory Slot-Die Coating Machine For Lith Battery Electrode Coating

200C Max. Compact Lab Automatic Mini Tablet Film Coater( 10"Wx16"L ) For Battery Electrode Coating

Ultrasonic Spray Coating Machine For Solar Cells, Batteries & Electronics

Ultrasonic Spray Coating Machine For Solar Cells, Batteries & Electronics Model: TMAX-FS01-Basic Ultrasonic Spray Coater Technical Specifications · Overall Dimensions: 750 × 600 × 650 mm · Coating Area: 100 × 100 mm (Customizable) · Motion System: XYZ Three-Axis Movement (Vertical/Front-Back/Left-Right) · Control Method: Handheld Motion Controller – Physical Buttons · Ultrasonic Spray Head: Standard with 1 set of any TMAX ultrasonic spray head (Supporting multi-head customization) · Applications: Qualitative research experiments in labs, small-batch production, thin-film fabrication Overview The TMAX-FS01 Ultrasonic Spray Coating Machine is designed for enterprises, universities, and research institutes entering ultrasonic spray coating technology. Featuring a sleek and functional design, it incorporates a high-precision XYZ three-axis motion module paired with an advanced trajectory editing system, enabling versatile 2D planar coating patterns (rectangles, circles, triangles, curves). Compatible with all TMAX ultrasonic spray heads, the system integrates a precision syringe pump and digital gas flow control. Optional upgrades include: · Ultrasonic dispersion feeding system · Vacuum-adsorbed heated substrate Key Advantages ✔ Ultra-High Material Utilization · Achieves multiple times higher efficiency than conventional spraying, significantly reducing material costs. ✔ Nanoscale Film Thickness · Deposits ultra-thin films (as low as tens of nanometers) with exceptional uniformity. ✔ Nozzle-Free Atomization · Utilizes ultrasonic high-frequency vibration (no compressed air), eliminating substrate impact from high-pressure gas. ✔ Domestic Stepper Motor & Motion Module · XYZ axes driven by stepper motors and ball screw modules, ensuring 0.01mm repeat positioning accuracy and extended lifespan. ✔ Versatile Ultrasonic Spray Head System · FUNSONIC offers dozens of spray heads (20–180 kHz) for diverse coating requirements. ✔ User-Friendly Handheld Controller · Equipped with a 320×240 high-resolution color screen and full Chinese UI for intuitive operation. Standard Configuration · Viscosity & Solid Content: ≤30 cP (solid content ≤20% for suspensions) · Feeding System: Precision syringe pump + bio-grade injector (0.1 μL/min accuracy) · Dry Film Thickness: 20 nm – 100 μm (solution/substrate-dependent) · Input Voltage: 220V ±10%, 50–60 Hz · Solution Conversion Rate: ≥95% (several times higher than traditional two-fluid nozzles) · Droplet Size: Avg. 15–45 μm (smaller droplets at higher frequencies) · Spray Head Frequency: Compatible with 20–180 kHz systems Optional Upgrades Ultrasonic Dispersion Feeding System · Continuous nanoparticle agitation prevents sedimentation, enhancing film uniformity. Heated Drying Platform · Aerospace-grade aluminum or micro-porous ceramic platform with ±200°C precision (higher temps customizable). Vacuum Adsorption Platform · Multi-channel vacuum generator for warp-free substrate fixation. Laser Alignment Device · Ensures rapid and precise spray positioning.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; 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Vertical Ultrasonic Spray Coating Machine System With 500C High Temperature

Vertical Ultrasonic Spray Coating Machine System With 500C High Temperature     Core Features: · Patented ultrasonic nozzle technology with customizable droplet size and spray width · Uniform coating consistency: >95% homogeneity · Clog-resistant nozzle design reduces maintenance costs and downtime · Material savings: >85% material utilization rate (4× higher than conventional two-fluid spray) · XYZ 3-axis servo motion system with precision trajectory control · Vacuum-heated stage for flexible substrates (e.g., battery separators) · Optional high-temperature stage (up to 500°C) for spray pyrolysis film deposition Vertical Precision Ultrasonic Spray System A mid-scale ultrasonic spray system compatible with focused, wide-range, or scattered-spray nozzles, supporting multi-nozzle parallel operation. Equipped with a precision constant-flow metering pump for 24/7 stable liquid supply. Integrated auxiliary modules (gas control, heated/vacuum stages, exhaust systems) make it ideal for pilot-scale production or large-area thin-film fabrication. Advantages Over Conventional Spraying: · Ultrasonic atomization eliminates compressed air需求, enabling: o Higher uniformity (±5% variation) o Thinner coatings (down to nanometers) o 4× less material waste (85% vs. <25% in two-fluid spray) Applications: · Energy: PEM fuel cell electrodes, perovskite/organic solar cells, transparent conductive films · Biomedical: Biosensor coatings · Semiconductors: Photoresist for wafers, PCB flux · Glass Coatings: AR anti-reflection, hydrophilic/hydrophobic, thermal insulation · Textiles: Superhydrophobic/antibacterial coatings Technical Specifications · Automated ultrasonic spraying with nanometer-scale thickness control (20 nm to 100+ µm) · Coating uniformity: >95% · Max. substrate area: 600 × 600 mm · Multi-cylinder constant-flow system for uninterrupted supply · Color touchscreen HMI with intuitive controls · Laser alignment for nozzle positioning · Precision valves (imported) for stable gas-liquid coordination · Built-in exhaust system · In-line ultrasonic dispersion (optional) to prevent particle settling · Self-cleaning function post-operation Optional Modules: · Vacuum-heated stage for flexible materials · High-temp stage (500°C) for spray pyrolysis Key Innovations · Zero-clogging nozzles → Low maintenance · 4× material efficiency vs. conventional methods · Modular design for diverse R&D/production needs   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Production-line Ultrasonic Spray Coating Machine Coater For Cells, Batteries & Electronics

Production-line Ultrasonic Spray Coating Machine Coater For Cells, Batteries & Electronics   Key Features: ✔ Wide-span ultrasonic spray head with independent intellectual property, ideal for high-throughput coating applications. ✔ Configurable multi-nozzle array to significantly enhance production speed. ✔ Integrated material conveyor system for seamless connection with upstream/downstream process equipment, enabling full production-line integration. ✔ Optional plasma spray system for pre-coating surface treatment. ✔ Constant-flow feeding system ensures stable, uninterrupted liquid supply for 24/7 operation. ✔ Push-pull waste collection unit simplifies residual coating recovery and disposal. Product Overview: The Production-line Ultrasonic Spray Coating System is an automated ultrasonic coating machine equipped with a substrate conveyor. It supports wide-span ultrasonic spray heads and parallel multi-nozzle arrays, making it particularly suitable for high-volume continuous production. The built-in conveyor enables automated substrate handling, allowing seamless integration with pre- and post-coating processes to embed the system into production lines. A precision constant-flow feeding system tailored to specific process requirements ensures 24-hour stable material supply. For substrates such as glass, plastics, and metals, an atmospheric plasma spray system can be added to enhance coating adhesion through surface pretreatment. Unlike conventional air-assisted two-fluid spray methods, ultrasonic spray technology achieves superior uniformity, thinner coatings, and higher precision. Without relying on compressed air, ultrasonic atomization drastically reduces overspray, improving material utilization to 4× that of traditional methods. Applications: Ideal for R&D and production of nanoscale/submicron functional coatings, including: · New Energy: Thin-film solar cells (perovskite, organic PV, transparent conductive films). · Biomedical: Biosensor coatings. · Microelectronics/Semiconductors: Photoresist spraying for wafers, PCB flux coating. · Glass Coatings: AR anti-reflective films, hydrophilic/hydrophobic coatings, thermal insulation films, transparent conductive layers. · Nonwoven/Textiles: Superhydrophobic coatings, antibacterial treatments. Technical Advantages: ✔ Built-in conveyor for automated substrate transfer and production-line compatibility. ✔ Wide-span nozzles ensure uniform coverage for large-area substrates. ✔ Multi-nozzle arrays boost throughput efficiency. ✔ Coating uniformity: >95%. ✔ Material savings: >85% utilization rate (4× traditional methods). ✔ Full-color touchscreen with user-friendly interface. ✔ High-precision feeding systems for diverse process demands. ✔ Integrated exhaust/waste collection for easy residue management. ✔ Clog-resistant nozzle technology minimizes maintenance costs.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); 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Ultrasonic Nozzle Spray Coating Machine Equipment Unit for Solar Cell

Ultrasonic Nozzle Spray Coating Machine Equipment Unit for Solar Cell      The CF08 is an industrial-grade coating system designed for small-to-medium batch production. Utilizing nationally patented ultrasonic spraying technology, it produces uniform and dense thin film coatings while being applicable for spray pyrolysis. Widely adopted across energy, nanotechnology, microelectronics, semiconductor, and glass coating industries. System Overview The CF08 is an industrial-grade coating system tailored for small-to-medium batch production. It employs patented ultrasonic technology to deposit uniform, dense thin films and supports spray pyrolysis applications. Configurable with single or multiple spray heads, its customizable design ensures adaptability across diverse industries. Key Advantages • Ideal for R&D and small-batch production • Compact benchtop design with easy mobility • Material utilization rate up to 95% • Highly consistent coatings with ±5% uniformity • Effective coating area: 500mm × 500mm Target Industries • Electronics • New Energy • Biomedical • Glass • Textiles/Non-wovens • Nanotechnology Features & Specifications Category Description Uniform Deposition Delivers highly uniform and efficient thin film coating Flow Control Precision flow regulation enables ultra-low volume spraying Thickness Accuracy High-precision thickness control capability Material Utilization >95% liquid material utilization rate Nozzle Performance Clog-resistant spray head design Solution Compatibility Processes both homogeneous solutions and suspensions Application Scope Supports R&D prototyping and production-scale coating Process Control Highly repeatable spraying for consistent results Technical Parameters Parameter Specification Dimensions 1600 (L) × 1000 (W) × 1850 (H) mm Coating Area Standard 500 × 500 mm (Customizable upon request) Power Supply 120V/220V ±10%, 50-60Hz Nozzle System Configurable with multiple ultrasonic nozzle options Liquid Delivery Multiple feeding systems available (peristaltic/syringe/pressure-based) Control Interface 7-inch touchscreen HMI Certifications CE, FDA compliant     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Ultrasonic Pyrolysis Spray Coater Coating Equipment For OLED, Graphene & Semiconductor Films

Ultrasonic Atomization Spray Coating Machine Equipment   We specialize in customized solutions tailored to cutting-edge industries, including: · Nanotechnology · Fuel cells · Semiconductor coatings · Medical coatings · Spray pyrolysis We provide comprehensive functional coating solutions and long-term technical support to ensure stable mass production. Our services include: · Custom R&D for specialized instrument coatings · OEM coating services for diverse applications A wide-spraying machine integrating advanced atomization and control technologies for uniform, ultra-thin, and highly controllable thin-film coatings. Key Features: · Multi-system integration: ultrasonic, carrier gas, heating stage, vacuum adsorption, exhaust · Compatible with full-range ultrasonic nozzles · Ideal for small-to-medium area coating and spray pyrolysis · Widely used in precision coating preparation Applications: Industry Use Cases Electronics Lithography wafer, photoresist New Energy Fuel cell PEM, thin-film solar, perovskite Biomedical Medical device coatings Glass Optical/functional coatings Textiles/Nonwoven Functional fabric treatments Nanotechnology Nano-material deposition Advantages · R&D and small-batch production compatible · Compact benchtop design (easy to relocate) · 95% material utilization rate · High coating uniformity (±5% variation) · Effective spraying area: 300mm × 400mm Features & Specifications Features · Uniform & efficient spraying (film thickness down to tens of nanometers) · Precise flow control (operates at ultra-low flow rates) · High thickness control accuracy · >95% liquid utilization · Clog-resistant spray head · Portable benchtop design · Suitable for both R&D and production · Highly repeatable results Technical Parameters Category Specification Dimensions 1500mm (L) × 950mm (W) × 900mm (H) Spray Area* 200mm × 200mm (customizable) Power Supply 120V/220V, ±10%, 50-60Hz Nozzle Options Multiple ultrasonic nozzles available Control Interface 7-inch HMI Additional Modules Heating/vacuum plate Certifications CE, FDA   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Roll to Roll Continuous Fiber Coating Machine for Planar and Fiber Deposition

Roll to Roll Continuous Fiber Coating Machine for Planar and Fiber Deposition Model: KT-DM30 Equipment Introduction: This equipment can not only complete planar coating but also continuous fiber coating processes. On both sides of the cavity, there are retractable and expandable chambers, which enable continuous rotational evaporation coating on the surface of fiber-like materials. This equipment is applied for vacuum evaporation coating of optical films, organic films and metal films, etc. It is particularly suitable for high-tech enterprises, research institutions and universities for membrane layer research and the development of membrane systems. Detailed technical parameters: Cavity dimensions: Diameter approximately 280mm, height approximately 450mm (subject to actual design) Limiting vacuum degree: 6.7*10-5 pa Evaporation source: 2 sets of evaporation sources, with water cooling Evaporation power supply: 2000W, dual-output one-to-two Film thickness meter: Domestic film thickness meter, resolution: 0.1 Å Vacuum pumping system: Molecular pump (300L/S) + Mechanical pump (4L/S) Flat sample stage: Adjustable height (250~350mm), adjustable rotational speed (0~30 revolutions per minute)  Control system: Touchscreen automatic control Roller sample stage: Rotation: Self-rotation (1~30 revolutions per minute), horizontal linear speed 1~100mm per minute, evaporation height 250mm Customizable magnetic sputtering with the same function