Desktop Magnetron Sputtering Coating Machine System For Oxides & Ceramics & Semiconductors

Desktop Magnetron Sputtering Coating Machine System For Oxides & Ceramics & Semiconductors     Model: TMAX-PC-JS04-Multilayer Thin-Film Fabrication Technical Specifications Parameter Specification Base Vacuum 6.7×10−5 Pa Operating Vacuum (after 1h) ≤4×10−4 Pa Magnetron Targets 3 (3-inch, permanent magnet, water-cooled, side shutters) Target-to-Substrate Distance 120–200 mm (manually adjustable, scale-indicated) Target Tilt Angle 0–45° Substrate Heating Iodine-tungsten lamp, max 400°C Substrate Size Φ60 mm (single-piece) Substrate Rotation 0–50 RPM (motorized) Bias Voltage 0–200 V (adjustable) Gas Flow Control 2-channel MFC, 0–50 sccm range Control Functions Manual heating/rotation/shutter/vacuum monitoring Key Features & Applications 1. Precision & Flexibility · Adjustable target-substrate geometry for tailored film stress and uniformity. · Three-target co-sputtering enables multilayer/composite films (e.g., superlattices). 2. High-Quality Deposition · UHV-compatible chamber minimizes impurities for high-purity films. · Heated substrate (400°C max) improves crystallinity (e.g., for oxides/semiconductors). 3. Compact Research Tool · Benchtop design suits small-batch R&D and material screening. Typical Uses · Protective coatings (e.g., TiN, DLC for tools). · Transparent conductive films (e.g., ITO, AZO). · MEMS/sensor fabrication. Best for: Labs requiring flexible, high-precision thin-film deposition with manual control.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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High Vacuum Glove Box Metal&Non-Metal Target Sputtering Coating System

High Vacuum Glove Box Metal&Non-Metal Target Sputtering Coating System     Model: TMAX-PC-JS02-D-Shaped Magnetron Sputtering Coater Main Purpose Designed for the preparation of nano-scale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, dielectric films, and other advanced thin-film materials. Widely used in universities, research institutes, and small-batch production in scientific laboratories. System Composition · Vacuum chamber system (sputtering chamber) · Target system · Sample stage system · Vacuum pumping & measurement system · Gas flow system · Control system · Film thickness monitoring system · Front-opening door mechanism · Electrical control system Technical Specifications Parameter Specification Ultimate Vacuum 6.7×10-5 Pa System Leak Rate 1×10-7 Pa·L/s Vacuum Recovery Time 40 min to 6.6×10 Pa (after N2 purge) Vacuum Chamber D-shaped, 400 × 350 × 300 mm Sample Stage 3" × 3", 3.2 mm thickness Magnetron Targets 3 targets (2 standard + 1 high-strength) Effective Sputtering Area 3" × 3" Target Diameter Φ50 mm (water-cooled) Target-to-Substrate Distance 50–90 mm (adjustable) Substrate Bias Voltage -200 V Sample Turntable 1 position (holds 2" substrates) Gas Flow System 2-channel mass flow controller Film Thickness Monitor 0–999,999 Å Pumping Options Turbo molecular pump or cryogenic pump + dry scroll pump Key Features & Applications 1. High Precision & Versatility · Suitable for research and small-scale production of high-performance thin films, including optical, electronic, and protective coatings. · Adjustable target-substrate distance ensures optimized film uniformity. 2. Advanced Control & Monitoring · Computerized real-time tracking of deposition parameters enhances repeatability. · Flexible gas flow control (2-channel MFC) supports reactive and non-reactive sputtering. 3. Efficient & Reliable Vacuum System · Fast vacuum recovery minimizes downtime. · Dual pumping options (turbo or cryogenic) adapt to different process requirements. 4. User-Friendly Design · D-shaped chamber & front-opening door facilitate easy sample loading. · Optional heating expands compatibility with temperature-sensitive materials. Ideal for: · Academic & industrial R&D in materials science, nanotechnology, and semiconductor engineering. · Functional film development for optics, wear resistance, and electronic devices. · Prototype fabrication requiring high-precision, customizable coatings. 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Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation

Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation      Model: TMAX-JY-JS02-Cold Magnetron Sputtering Deposition System Product Description The TMAX-JY-JS02 is a benchtop cold magnetron sputtering coating system equipped with a standard rotating/tilting sample stage. It is specifically designed for high-quality conductive coating of non-conductive samples with varied surface morphologies for SEM imaging. It also meets the requirements for electrode coating, semiconductor materials, and other thin-film applications. Key Features · "Ultra-Cold" Sputtering: Utilizes a high-efficiency, low-voltage DC magnetron source to prevent thermal damage to sensitive samples. · Wide-Angle Coverage: Innovative magnetron design ensures uniform coating coverage, even for closely positioned samples. · Fast Operation: Independent solenoid valves for venting, purging, and exhaust enable rapid system cycling. · Stable Coating Performance: Precisely controlled sputtering current ensures consistent deposition rates and optimal coating quality, unaffected by chamber pressure. · Multi-Material Compatibility: Supports various metal targets (Pt standard, optional Au, Au/Pd, or Pt/Pd) with quick and easy target replacement. Technical Specifications Sputtering System Parameter Specification Target Material Standard: Pt (57mm diameter × 0.1mm thickness)  Optional: Au, Au/Pd, Pt/Pd Sample Stage Rotation 0–60 rpm (continuously adjustable) Sample Stage Tilt -45° to +45° (continuously adjustable) Stage Diameter 40mm (holds 4 standard sample holders; custom sizes available) Sputtering Current Microprocessor-controlled (0–99 mA) with safety interlock Vacuum Range Atm ~3 Pa Control Method Programmable (1–999s) with Start/Pause buttons; automatic pumping/sputtering/venting Vacuum Pump Parameter Specification Pumping Speed 133 L/min Ultimate Vacuum 0.05 Pa Noise Level 56 dB Applications & Advantages · Ideal for SEM Sample Preparation: Ensures high-conductivity coatings without thermal damage, critical for delicate or heat-sensitive materials. · Versatile Material Deposition: Suitable for Pt, Au, and alloy coatings in semiconductor, nanotechnology, and materials research. · User-Friendly Operation: Automated processes and ergonomic design enhance efficiency and reproducibility. · Compact & Reliable: Benchtop design saves lab space while delivering professional-grade performance.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Multiple Coating Head Units Comma Blade & Gravure Roll & Rod Bar Coating Machine

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Roll to roll Electrode Coating Laminating Machine

Product Application Small Laboratory Coater Machine  For battery anode and cathode electrode continuous coating  Battery technology supplier 

Lab DC Magnetron Sputtering Coater Machine With Target for Noble Metal Coating

Compact DC Magnetron Sputtering Coater With Gold Target for Noble Metal Coating

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm   Introduction Ion Sputtering Coater (SD900 Model)  is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly within 2 minutes when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate. Vacuum pump is included.   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 0-20mA Working pressure 30Pa -7 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 45kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support 

Materials Science Vacuum Magnetron Ion Sputter Coating Coater

Materials Science Vacuum Magnetron Ion Sputter Coating Coater Introduction Materials Science Magnetron Ion Sputtering Coater(SD900M Model) is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample. Coating Result Sample Picture under SEM (by SD-900M Model) EPTFE (Extended Poly Tetra Fluoro Ethylene) Low vacuum, can be achieved quickly when using proper vacuum pump within 5 minutes. It generates much less heat and avoids plasma damage to the substrate sample. It is user friendly and easy to operate. Vacuum pump is included. Chiller is optional. Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s)  Vacuum limit 2 Pa Max sputtering current 100mA Working pressure 20Pa - 8 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass Magnetron target source Target size φ50*0.1mm(Au)/target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 45kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Water cooling(optional) Warranty One year limited warranty with lifetime product support 

Laboratory Slot-Die Coating Machine For Lith Battery Electrode Coating

200C Max. Compact Lab Automatic Mini Tablet Film Coater( 10"Wx16"L ) For Battery Electrode Coating

Benchtop Ultrasonic Spray Coater Supplier For Thin Film Coating

Ultrasonic Spray Coating Machine For Solar Cells, Batteries & Electronics Model: TMAX-FS03-Vaccum Ultrasonic Spray Coater Technical Specifications · Overall Dimensions: 1000 × 700 × 680 mm · Coating Area: 300 × 300 mm (Max: 400 × 400 mm) · Motion System: XYZ three-axis, programmable for any planar trajectory · Control Method: o Standard: High-precision control card + 7-inch touchscreen + physical buttons o Optional: PLC + 13.3-inch integrated PC + physical buttons · Ultrasonic Spray Head: o Standard: 1 set of any FUNSONIC ultrasonic spray head (customizable for multiple sets) · Applications: Qualitative experiments in scientific research laboratories, small-batch production, and thin-film fabrication on small surfaces. Overview The sealed ultrasonic spray coating machine differs from the standard 03V model with its enclosed architecture, allowing vacuum treatment of the spray chamber (maximum negative pressure: -0.058 to -0.098 MPa), making it suitable for specialized coating processes. Designed for enterprises, universities, and research institutes new to ultrasonic spray technology, this system features a streamlined structure with comprehensive functionality. It includes: · XYZ three-axis precision motion modules with a versatile trajectory editing system for spraying any 2D pattern (rectangles, circles, triangles, or curves). · Compatibility with all ultrasonic spray heads, paired with a precision constant-flow syringe pump and digital display gas delivery system. · Optional add-ons: ultrasonic dispersion feeding system, vacuum adsorption heated substrate, and more. Advantages ✔ Ultra-High Material Utilization · Achieves several times higher efficiency than conventional spray methods, significantly reducing material costs. ✔ Nanoscale Film Thickness · Produces ultra-thin films (as low as tens of nanometers) with exceptional uniformity. ✔ No Gas-Assisted Atomization · Utilizes high-frequency ultrasonic vibration for atomization, eliminating high-pressure gas impact on substrates. ✔ Stepper Motor & Fully Enclosed Motion Module · XY dual-axis automation with programmable trajectories. · Fully enclosed linear screw modules enhance durability; repeat positioning accuracy: 0.01 mm. ✔ Reinforced Sealing Ring · High-temperature resistant, anti-oxidation, and long-lasting sealing performance. ✔ Reinforced Hinge Design · Ensures firm and stable door closure. ✔ Double-Layered Tempered Glass · Enhances sealing and vacuum performance. Standard Configurations · Viscosity & Solid Content: ≤30 cps; suspensions with ≤20% solid content. · Feeding System: Precision syringe pump + bio-grade injector (accuracy: 0.1 μL/min). · Dry Film Thickness: 20 nm–100 μm (solution- and substrate-dependent). · Input Voltage: 220 V ±10%, 50–60 Hz. · Solution Conversion Rate: ≥95% (multiple times higher than traditional two-fluid gas spray heads). · Atomized Droplet Size: Average 15–45 μm (varies with spray head frequency; higher frequency yields smaller droplets). · Spray Head Frequency: Configurable with 20–180 kHz systems. Optional Configurations · Ultrasonic Dispersion Feeding System: Continuously stirs nanoparticles during spraying, reducing sedimentation and improving film uniformity. · Heated Drying Platform: o Aerospace-grade perforated aluminum or precision microporous ceramic platform. o Precise temperature control up to 200°C (higher temps customizable). · Vacuum Adsorption Platform: Multi-channel vacuum generator with zoned control to prevent film substrate deformation. · Spray Head Alignment Device: Laser-guided for rapid material positioning.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; 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Lab Compact Polymer Film Coater With Doctor Blade Coating Head

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Nano Ultrasonic Spray Coating System For Thin Film Deposition Of Solar/Fuel Cells

Nano Ultrasonic Spray Coating System For Thin Film Deposition Of Solar/Fuel Cells     The CF01 is a cost-effective ultrasonic spraying platform designed for seamless integration with existing production lines. System Composition Component Description Ultrasonic Nozzle Precision atomization with spray-forming capabilities. Control Housing Centralized system management and parameter adjustment. Liquid Delivery Systems Configurable options for diverse fluid handling requirements. Key Benefits · Material Savings: Reduces coating material usage by 75% vs. traditional high-pressure spray. · Process Control: Enables ±1% thickness tolerance for ultra-thin films (nanometer to micron-level). · Uniform Coating: Achieves <5% thickness variation across substrates. · Broad Compatibility: Supports 2-200mm spray patterns (nozzle-configurable). Technical Specifications Parameter Specification Notes Dimensions 53 × 56 × 85 mm (L×W×H) Compact footprint Spray Coverage 200 × 200 mm (standard) Customizable upon request Power Supply 120V/220V ±10%, 50-60Hz Global voltage compatibility Control System Windows-based PC interface Includes dedicated software Certifications CE, FDA Compliant for medical/industrial use INDUSTRY APPLICATIONS Table 1: Energy Sector Application Key Feature Fuel Cells Proton exchange membrane coating Thin-Film Solar Cells Transparent conductive oxide (TCO) deposition Silicon Solar Cells Anti-reflective layer spraying Table 2: Electronics & Glass Category Use Case Electronics Photoresist patterning, semiconductor passivation Glass Smart glass (electrochromic), AR coatings for lenses Table 3: Nanotechnology Material Coating Method Graphene Ultrasonic suspension deposition Carbon Nanotubes Aligned CNT arrays for flexible electronics OPERATIONAL FEATURES · Trigger-Signal Activation: Single-command operation for automated production lines. · Self-Cleaning Nozzle: Patented ultrasonic vibration prevents clogging (0.1mm orifice support). · Substrate-Safe: <10m/s droplet velocity (gentle for fragile materials like PET films). · Heating/Vacuum Option: Integrated thermal plate (RT-300°C) for rapid solvent evaporation.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Large-Area Automated Multi-Nozzle Ultrasonic Spray Coating Equipment System For Nanoscale Coating

html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } Large-Area Automated Multi-Nozzle Ultrasonic Spray Coating Equipment System For Nanoscale Coating    Key Features: ✔ Patented Ultrasonic Nozzles – Selectable droplet size & spray width ✔ High-Precision Film Deposition – Coating uniformity: >95% ✔ Large Coating Area – Configurable multi-nozzle arrays ✔ Dual Auto-Loading Vacuum-Heated Platforms – Enables continuous production ✔ XYZ 3-Axis Servo Motion System & Controller – Optimized spray trajectory ✔ Multi-Group Ultrasonic Dispersion Supply System – Prevents particle agglomeration System Overview A high-performance ultrasonic spray coating system equipped with focused, wide-spray, or scattered ultrasonic nozzles, supporting parallel multi-nozzle operation. Features dual auto-loading vacuum-heated platforms for uninterrupted continuous coating, along with a precision constant-flow metering pump for 24-hour stable liquid supply. Integrated auxiliary modules (gas control, substrate heating, vacuum suction, exhaust system) make it ideal for pilot-scale production and large-area thin-film fabrication. Advantages Over Traditional Spray Methods: · Higher uniformity | Thinner coatings | Ultra-high precision · Minimal overspray – 4× higher material utilization vs. conventional two-fluid spraying Applications · New Energy: PEM fuel cell electrodes, thin-film solar cells (perovskite, organic PV), transparent conductive films · Biomedical: Biosensor coatings · Semiconductors: Wafer photoresist, PCB flux deposition · Glass Coatings: AR anti-reflection, hydrophilic/hydrophobic, thermal insulation, conductive films · Textiles: Superhydrophobic, antibacterial coatings Technical Highlights ✔ Automated Ultrasonic Spraying – Ultra-thin films (down to tens of nanometers) ✔ Extra-Large Work Area – Dual-zone coating (650×600mm per zone) ✔ Multi-Nozzle Array – Dramatically boosts throughput ✔ Material Savings – >85% utilization rate (4× conventional methods) ✔ Full-Color Touchscreen – User-friendly HMI ✔ Multi-Pump Constant-Flow Supply – Non-stop stable liquid delivery ✔ Precision Valves – High-speed gas-liquid synchronization (imported regulators) ✔ Built-In Exhaust System – Fume extraction ✔ Clog-Free Nozzle Tech – Low maintenance ✔ Inline Ultrasonic Dispersion – Prevents settling in suspensions ✔ Auto-Cleaning Function – Rapid self-cleaning post-coating   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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