RF+DC Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics

RF+DC  Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics     Model: TMAX-BY-JS12| – Product Specifications Technical Specifications Parameter Specification Vacuum Pump System Rotary Vane Pump (Oil-lubricated) + Oil-Free Turbo Molecular Pump Set Rotary Pump Speed 50Hz: 16m³/h (4.4 L/s) | 60Hz: 19.2m³/h (5.2 L/s) Molecular Pump Speed 300 L/s Ultimate Vacuum 5 × 10⁻⁴ Pa Working Pressure 0.5 – 5 Pa Pump-Down Time >10 min (to 10 Pa) Vacuum Measurement Range: Atmosphere to 10⁻⁴ Pa Gas Control Mass Flow Controller (MFC) Chamber Size φ260mm × 200mm (Metal Chamber) Magnetron Target Source Target Size: φ50mm × 3mm (Copper)  Compatible with Weakly Magnetic Materials Operation Method Manual Control (Instruction Manual Provided) Weight / Dimensions 100kg / 610mm (L) × 420mm (W) × 490mm (H) Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption <3000W Cooling System Air Cooling (Pump) + Water Cooling (Sputtering Target) Warranty 1-Year Limited Warranty with Lifetime Technical Support Key Features & Applications Core Advantages 1. Multi-Mode Sputtering Supports RF (Radio Frequency), DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings. 2. High Vacuum Stability Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films. 3. Flexible Compatibility ·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples. ·φ50mm target supports copper and weakly magnetic materials for diverse applications. 4. Efficient Cooling System ·Water-cooled target minimizes thermal load during high-power sputtering. · Air-cooled pump reduces maintenance costs for continuous operation. Typical Applications ·Research Fields Thin film deposition, nanostructured coatings, semiconductor device development. ·Industrial Uses Optical coatings, wear-resistant layers, surface modification of electronic components.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

PVD DC Sputtering Coating System For Oxides & Ceramics & Semiconductors

PVD DC Sputtering Coating System For Oxides & Ceramics & Semiconductors   Model: TMAX-BY-JS09| – Product Specifications Product Overview The TMAX-BY-JS09 is a compact, high-vacuum magnetron sputtering system specifically designed for glovebox-integrated applications. Its space-saving flush-mount design allows the observation window to align perfectly with the glovebox wall, eliminating internal space occupation—a common limitation of traditional sputtering systems. Since its launch, this system has been widely adopted by research institutions for its efficiency and precision. Technical Specifications Category Specification Vacuum System Rotary vane pump (oil) + Turbo molecular pump (oil-free) Pumping Speed Rotary pump: 16 m³/h (4.4 L/s) @50Hz / 19.2 m³/h (5.2 L/s) @60Hz  Turbo pump: 300 L/s Ultimate Vacuum 5×10⁻⁵ Pa Working Pressure 0.5–5 Pa Pump-Down Time ≤10 min (to 10⁻³ Pa) Vacuum Measurement From atmosphere to 10⁻⁶ Pa Gas Control Precision gas flow controller Chamber Size φ260 mm × 200 mm (metal) Sputtering Target φ50 mm × 3 mm (Cu target); suitable for weakly magnetic materials Power Supply AC 220V 50Hz or AC 110V 60Hz Power Consumption ≤3000 W Cooling System Air cooling (pump) + Water cooling (sputtering target) Dimensions & Weight 610 mm (L) × 420 mm (W) × 490 mm (H) / ~100 kg Warranty 1-year limited warranty, lifetime technical support Key Features & Customer Benefits 1. Space-Saving Glovebox Integration · Problem Solved: Traditional sputtering systems occupy valuable glovebox space, limiting workflow efficiency. · Our Solution: The flush-mounted design minimizes protrusion, allowing seamless integration without compromising internal workspace—ideal for labs with limited glovebox capacity. 2. High-Performance Vacuum & Fast Pump-Down · Achieves 5×10⁻⁵ Pa ultimate vacuum, ensuring ultra-clean deposition conditions for sensitive materials (e.g., semiconductors, optical coatings). · Rapid pump-down (≤10 min to 10⁻³ Pa) reduces idle time, enhancing lab productivity. 3. Precision Process Control · Stable gas flow control enables repeatable deposition rates, critical for uniform thin-film growth. · Broad vacuum measurement range (atmosphere to 10⁻⁶ Pa) ensures accurate monitoring across all process stages. 4. Versatile Material Compatibility · Supports argon and other process gases for reactive/non-reactive sputtering. · Accommodates 50mm targets (Cu standard, customizable for weakly magnetic materials). 5. Reliable Cooling & Safety · Hybrid air + water cooling prevents overheating during extended operation, ensuring system longevity.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Carbon Fiber Automatic Laminating & Coating Machine

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Roll to Roll Coating Machine with 6 Meter Drying Oven For Lithium Ion Battery

The coating machine TMAX-DYG-132MS is a single face continuous and Intermittent coating machine mainly used for Slurry drying process of lithium battery electrode coating. The battery coating machine adopts continuous and Intermittent coating mode, is mainly used for lithium battery pilot scale production line.

Customizable Meyer Rod Coating Machine Metering Rod Coater

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

PVD Magnetron Sputter Coating System For SEM & Wafer Sample Preparation

PVD Magnetron Sputter Coating System For SEM & Wafer Sample Preparation       Model:  TMAX-ZK-JS04- DC Ion Sputtering Coater Technical Specifications Parameter Specification Target Materials Standard: Au (Gold), 57mm diameter × 0.1mm thick  Optional: Pt (Platinum) Standard Sample Holder Holds 12 SEM stubs, height adjustment range: 60mm Rotating/Tilting Stage (Optional) Rotation: 0–60 rpm (continuously adjustable)  Tilt: -90° to +90° (continuously adjustable)  Standard rotating platform: 40mm diameter (holds 4 sample holders, custom sizes available)  Dual locking mechanism for secure fixation Sputtering Current 5–30mA (microprocessor-controlled, programmable) Meters Vacuum: Atm – 1×10⁻³ mbar  Current: 0–99mA Control Method Microprocessor with Start/Pause buttons  Programmable time (1–999s)  Auto-pumping, sputtering, and venting Vacuum System Pumping speed: 133 L/min  Ultimate vacuum: 10⁻⁴ mbar  Noise level: 56 dB Key Features & Applications 1. Precision and Flexibility · Adjustable sputtering current (5–30mA) and rotating/tilting stage enable uniform thin-film deposition for diverse sample geometries. · Dual locking mechanism prevents sample displacement during operation. 2. High-Quality Coating · Gold (Au) and Platinum (Pt) targets ensure high-purity conductive coatings for SEM and analytical applications. 3. Automated & User-Friendly Operation · Programmable controls and auto-venting enhance efficiency and safety. 4. Compact & Low-Noise Design · Stainless steel chamber (120mm × 75mm) with observation window (120mm × 45mm) provides durability and visibility. · Low 56 dB noise level ensures a comfortable working environment. Ideal Applications · SEM sample preparation (conductive coating) · Thin-film deposition for research and industrial applications · Multi-sample processing (supports 12 SEM stubs) · Angle-dependent deposition (with optional rotating/tilting stage) This sputtering system is optimized for laboratories requiring high precision, automation, and versatile coating capabilities.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); 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background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Paper Wax Paraffin Coating Machine Single Side Waxen Coater

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

150mm Hybrid Film Applicator with Doctor Blade & Slot Die Coating Heads for Battery Electrode Research

High Quality Micrometer Adjustable Film Applicator - 100 mm (Film casting doctor blade) - EQ-Se-KTQ-100 1. Adjustable Film Applicator - This unique wet film applicator features micrometer heads for knife blade adjustment.    2. The operator sets the blade clearance by adjusting the micrometers. This is excellent tool to make quality film for material research laboratories to make ceramic tape casting, battery electrodes, and various coating at lower cost. Stainless steel knife blade with precision ground edge.

Intelligent Ultrasonic Spray Nozzle Pyrolysis Coating Machine System

Intelligent Ultrasonic Spray Nozzle Pyrolysis Coating Machine System Model: TMAX-FS03I-Intelligent Ultrasonic Spray Coater 1. Introduction Ultrasonic spraying is a unique spray technology based on ultrasonic atomization nozzle technology. The sprayed material is initially in a liquid state (solution, sol, suspension, etc.), which is atomized into fine particles by an ultrasonic atomization device and uniformly coated onto the substrate surface with a carrier gas to form a thin film or coating. Advantages over Traditional Spraying: · Superior uniformity · Thinner coating thickness · Higher precision · Reduced paint splashing · Material utilization rate is over 4x higher than traditional methods Applications: Qualitative experiments in scientific research laboratories, small-scale production, and thin-film fabrication. 2. Principle The ultrasonic nozzle converts electrical energy into high-frequency mechanical energy via the piezoelectric effect, creating a standing wave that atomizes the liquid into uniform micron-sized droplets. Key Features: · Precise control of droplet size and distribution · Rapid evaporation for high-surface-area particles and thin-film coatings 3. Structure and Power Control of Ultrasonic Atomization Nozzle Structure: · Nozzle body: Titanium (excellent acoustic properties, high tensile strength, corrosion resistance) · Protective casing: 304 stainless steel (titanium optional) Power Control: · Vibration amplitude must be carefully controlled: o Too low: Insufficient energy for atomization o Too high: Liquid is torn and ejected unevenly · Optimal input power: 1–15 watts 4. Droplet Size Distribution and Flow Rate Droplet Size: · Determined by nozzle frequency, liquid surface tension, and density (frequency is primary factor). · Higher frequency → Smaller median droplet diameter. · Distribution follows a normal curve (median, number-average, and volume-average diameters). Flow Rate: · Depends on liquid arrival speed (not pressure). · Adjustment ratios: o Large apertures: 5:1 o Small apertures: 10:1 5. Advantages · High Stability: Titanium alloy and stainless steel construction; no wear, clogging, or noise. · Material Saving: Minimal splashing; paint utilization >4x traditional methods. · High Controllability: Precise flow rate and spray pattern control. · Easy Maintenance: Self-cleaning; no moving parts or cooling required. · Wide Applications: Fuel cells, solar cells, glass coatings, electronic circuits, chemical liquids, etc. 6. Parameters Parameter Specification Parameter Specification Product Type TMAX-FS03I Motion System XYZ three-axis, programmable (300×300 mm, max 400×400 mm) Nozzle Frequency 20–200 kHz Control Method PLC with touch screen and buttons Nozzle Power 10–100 W Control Content Ultrasonic spraying, liquid supply, heating, ultrasonic dispersion Max Continuous Spray Rate 20–1200 ml/h/pcs (expandable) Liquid Supply Method Precision syringe pump Effective Spray Width 2–260 mm/pcs (expandable) Ultrasonic Dispersion (Optional) 50 ml, 40 kHz, bio-grade sampler Spray Uniformity <5% Dispersion System Power 200 W Solution Conversion Rate ≥95% Heating/Drying (Optional) Up to 200°C Dry Film Thickness 20 nm–100 μm Vacuum Adsorption (Optional) Multi-zone, with vacuum generator Solution Viscosity ≤50 cps Ultrasonic Generator Fully digital, intelligent frequency tracking Temperature Range 1–60°C Exhaust Vent Included Atomized Particle Size (Median) 10–45 μm (distilled water, frequency-dependent) Total Weight ~180 kg Max Carrier Gas Pressure ≤0.15 MPa Accessory Material Sheet metal, powder-coated Input Voltage 220 V ±10%, 50–60 Hz Nozzle Core Material Piezoelectric ceramic, titanium alloy   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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500C High Temperature Benchtop Ultrasonic Spray Coating System Coater Buy Manufacturer Supplier

500C High Temperature Benchtop Ultrasonic Spray Coating System Coater Buy Manufacturer Supplier     Technical Parameters · Overall Dimensions: 1100 × 850 × 1150 mm · Coating Area: 300 × 300 mm (Max: 400 × 400 mm) · Motion System: XYZ 3-axis programmable for arbitrary planar trajectories · Control Method: PLC-controlled with LCD touchscreen and physical buttons · Ultrasonic Nozzle: Standard with 1 set of TMAX ultrasonic nozzles (customizable multi-nozzle configurations) · Applications: Qualitative research in laboratories, small-batch production, and thin-film fabrication Overview The high-temperature ultrasonic precision spray coater features a high-accuracy heated platform with temperature control precision of ±0.1°C, supporting multi-stage temperature programming (up to 500°C). Post-power interruption, the system resumes either from the point of failure or restarts the program. Designed with a streamlined structure and comprehensive functionality, the equipment integrates: · XYZ 3-axis precision motion modules · Versatile trajectory editing system for 2D patterns (rectangles, circles, triangles, or curves) · Compatibility with all TMAX ultrasonic nozzles · Precision constant-flow syringe pump · Digital display gas delivery system · Optional upgrades: Ultrasonic dispersion feeding system, vacuum-adsorption heated substrate, etc. Advantages 1. Ultra-High Material Utilization o Achieves several times higher efficiency than conventional spray methods, significantly reducing material costs. 2. Nanoscale Film Thickness o Deposits films as thin as tens of nanometers with exceptional uniformity. 3. Pressure-Free Atomization o Utilizes ultrasonic vibration (no compressed air), eliminating substrate impact from high-pressure gas. 4. Imported Servo Motors & Fully Enclosed Motion Modules o XYZ axes employ imported servo motors and sealed linear screw modules, ensuring 0.01mm repeat positioning accuracy and extended lifespan. 5. Ultrasonic Nozzle System o TMAX offers dozens of nozzle variants for diverse operational requirements and film thicknesses. 6. Control System o Proprietary TMAX software for intuitive operation, integrating: § Ultrasonic atomization/dispersion § Syringe pump/gas flow/heating stage/vacuum chuck control § One-click preset trajectory templates & G-code editing for complex paths. 7. High-Precision Heated Platform o ±0.1°C temperature control, multi-stage programming, and heating up to 500°C. Configuration Category Specifications Standard Configuration   Viscosity & Solid Content ≤30cps viscosity; ≤20% solid content for suspensions Feeding System Precision syringe pump + bio-grade injector (0.1μL/min accuracy) Dry Film Thickness 20nm–100μm (solution/substrate-dependent) Input Voltage 220V±10%, 50–60Hz Solution Conversion Rate ≥95% (multiple times higher than traditional two-fluid nozzles) Atomized Particle Size Avg. 15–45μm (frequency-dependent; higher frequency = finer particles) Nozzle Frequency Compatible with 20–180kHz systems Optional Configurations   Ultrasonic Dispersion Feeding System Continuously disperses nanoparticles during spraying, minimizes sedimentation, and enhances film uniformity. Heated Drying Platform Stainless steel heating plate with precision control up to 500°C. Nozzle Alignment Device Laser-guided positioning for rapid substrate alignment. Custom Options Tailored configurations available upon request.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }