Lab Ion Sputtering & Evaporation PVD Coater Machine for SEM for Glove Box

Lab Ion Sputtering & Evaporation PVD Coater Machine for SEM for Glove Box    TMAX-BY-JS03- Ion Sputtering & Evaporation Coater for SEM Specification Integrated with sputtering and thermal evaporation functions, this compact and user-friendly instrument is designed for high-quality thin-film deposition, particularly for SEM sample preparation. It supports multiple metal targets for sputtering and carbon fiber evaporation, offering precise control over coating parameters. Technical Specifications Parameter Value Dimensions 305 mm × 400 mm × 390 mm (W×D×H) Vacuum Chamber Material Borosilicate glass, 160 mm × 110 mm (D×H) Target (Upper Electrode) 50 mm × 0.1 mm (D×H) Sputtering Targets Au (standard), optional Ag, Pt, etc. Target Size φ50 mm Sample Stage Compatible with 50 mm/70 mm diameter; customizable Sputtering Voltage 0–1600 V (DC), adjustable Sputtering Current 0–50 mA Sputtering Timer 0–360 s Carbon Evaporation Current 0–100 A (AC) Evaporation Material Carbon fiber Evaporation Voltage 0–30 V Evaporation Time 0–1 s Gas Inlet Valve Compatible with φ3 mm tubing Process Gases Multiple options Power Supply 220 V (110 V optional), 50 Hz Vacuum Pump 2L rotary vane pump (VRD-8, domestic) Key Features 1. Dual-Function Design ·Combines ion sputtering (Au, Pt, Ag, Cu, etc.) and thermal evaporation (carbon fiber) for versatile applications. ·Ideal for high-resolution microscopy (SEM, TEM, EBSD) requiring ultra-fine carbon films (<1 nm). 2. Precision Control ·Adjustable sputtering current, vacuum pressure, and gas selection to optimize coating rate and particle size. ·Digital timer for reproducible processes. 3. Enhanced Sample Protection ·Conductive coatings eliminate charging effects in non-conductive samples. ·Carbon films protect beam-sensitive materials (e.g., biological/plastic samples) from electron beam damage. 4. Efficiency & Reliability ·Compact footprint with automated vacuum protection to prevent short circuits. ·Uniform film deposition with short processing time. Applications · Electron Beam-Sensitive Samples (e.g., polymers, biological tissues): Coating mitigates structural damage. · Non-Conductive Materials: Metal layers (Au, Pt) dissipate charge, improving SEM imaging. · Advanced Materials: Enhances conductivity and surface analysis (EBSD, microprobe) for semiconductors/composites. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; 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RF+DC Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics

RF+DC  Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics     Model: TMAX-BY-JS12| – Product Specifications Technical Specifications Parameter Specification Vacuum Pump System Rotary Vane Pump (Oil-lubricated) + Oil-Free Turbo Molecular Pump Set Rotary Pump Speed 50Hz: 16m³/h (4.4 L/s) | 60Hz: 19.2m³/h (5.2 L/s) Molecular Pump Speed 300 L/s Ultimate Vacuum 5 × 10⁻⁴ Pa Working Pressure 0.5 – 5 Pa Pump-Down Time >10 min (to 10 Pa) Vacuum Measurement Range: Atmosphere to 10⁻⁴ Pa Gas Control Mass Flow Controller (MFC) Chamber Size φ260mm × 200mm (Metal Chamber) Magnetron Target Source Target Size: φ50mm × 3mm (Copper)  Compatible with Weakly Magnetic Materials Operation Method Manual Control (Instruction Manual Provided) Weight / Dimensions 100kg / 610mm (L) × 420mm (W) × 490mm (H) Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption <3000W Cooling System Air Cooling (Pump) + Water Cooling (Sputtering Target) Warranty 1-Year Limited Warranty with Lifetime Technical Support Key Features & Applications Core Advantages 1. Multi-Mode Sputtering Supports RF (Radio Frequency), DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings. 2. High Vacuum Stability Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films. 3. Flexible Compatibility ·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples. ·φ50mm target supports copper and weakly magnetic materials for diverse applications. 4. Efficient Cooling System ·Water-cooled target minimizes thermal load during high-power sputtering. · Air-cooled pump reduces maintenance costs for continuous operation. Typical Applications ·Research Fields Thin film deposition, nanostructured coatings, semiconductor device development. ·Industrial Uses Optical coatings, wear-resistant layers, surface modification of electronic components.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Magnetron Sputtering Thin Film Deposition Coater For SEM preparation

Magnetron Sputtering Thin Film Deposition Coater For SEM preparation     TMAX-ZK-JS01-Cold Magnetron Sputtering Coater Product Highlights · Uniform & Ultra-Fine Coating: Produces highly reflective/translucent decorative films with 6–10nm particle size, ideal for aesthetic applications. · Cold Sputtering Technology: No surface temperature rise, ensuring integrity of heat-sensitive samples. · High Efficiency & Precision: Wide sputtering current range (5–45mA) with 600V voltage and up to 450W power for dense, adherent films. · Automated Operation: Features LCD control, auto-vacuum cycling (<90s pump-down), and gas release for streamlined workflows. Key Applications · Decorative Films: Full-reflective/semi-transparent coatings. · Electrode Fabrication: Battery membranes, conductive layers. · Electron Microscopy: FE-SEM sample preparation. · Delicate Materials: Temperature-sensitive substrates (biological specimens, polymers, filters). Technical Specifications Category Parameters Operation Mode Fully automated magnetron sputtering Sputtering Current 2–50mA (adjustable) Voltage 600V (adjustable) Target Materials Standard: Au/Pt (choose one); Optional: Ag, Cu, Al, Ti, Cr, Pb Vacuum System Oil-sealed rotary pump (1L/s) or optional dry scroll pump (<0.1Pa ultimate) Chamber Size Ø128×130mm Sample Holders 1×Ø90mm, 4×Ø25mm, 6×Ø15mm Gas Supply Air/argon, auto-admitted via Φ4 quick-connect Particle Size 6–10nm Power Supply 220V/50Hz (110V customizable), 450W max Protections Over-current (>50mA cutoff), vacuum (>100Pa cutoff) Unique Advantages · Versatile Target Compatibility: Supports diverse metals for tailored film properties. · Zero Thermal Damage: Critical for polymers, biomaterials, and battery components. · Industrial-Grade Adhesion: Strong film bonding for durable decorative/functional layers. Ideal for · R&D Labs: Precision coating for SEM, thin-film studies. · Manufacturers: Decorative films, electrodes, and sensors. · Bio/Nano Tech: Delicate sample preparation with nanoscale control.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Lab PVD Ion Sputtering Coater For Metal and Carbon Layer

Lab PVD Ion Sputtering Coater For Metal and Carbon Layer        Model: TMAX-JY-JS01-SEM Preparation Overview The TMAX-JY-JS01 compact magnetron ion sputtering coater is designed for high-quality conductive coating (e.g., gold film) on SEM samples or material surfaces. Featuring stable performance and user-friendly operation, it employs cold magnetron sputtering technology, minimizing heat generation to protect sensitive samples. Key Features · Durable Metal Bellows – Corrosion-resistant and aesthetically refined vacuum pump tubing. · Precision Adjustment – Sensitive micro-valve control with clear scale markings. · High-Efficiency Vacuum Pump – Fast pumping speed (8 m³/h) with low noise, ideal for lab environments. · Reliable Circuitry – Stable control board for consistent operation. · Cold Sputtering – Near-zero temperature rise preserves sample integrity. Technical Specifications Parameter Specification Vacuum Chamber Ø150 mm × 110 mm (H) Sample Stage Ø60 mm Gold Target Size Ø50 mm Vacuum System Pumping speed: 8 m³/h Vacuum Monitoring Custom Pirani gauge + analog dial Exhaust Mode Automatic Sputtering Time 0–1000 sec (programmable) Process Gas Air or argon (dedicated inlet) Compatible Target Materials Au, Au/Pd, Pt, Pt/Pd, Cu, Ag, etc. Dimensions ~450 × 330 × 235 mm (L×W×H) Applications & Advantages · SEM Sample Prep: Uniform conductive coatings enhance imaging accuracy. · Material Science: Versatile metal deposition for thin-film research. · User-Centric Design: Fast target switching, low maintenance, and lab-friendly noise levels. Ideal for: Academic labs, quality control, and R&D requiring precision coating with minimal thermal impact.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Mini Auto Ion Sputtering Coater Machine For Carbon, Ti, Au, Al

Mini Auto Ion Sputtering Coater Machine For Carbon, Ti, Au, Al      TMAX-BY-JS13-Glovebox-Compatible SEM Sample Coater for Conductive Coatings 1. Key Features & Design Highlights Ultra-Compact Design · Chamber volume reduced by 67% (φ115×100 mm) vs. conventional systems · 0.02 m³ footprint (307×260×260 mm) and 40 kg weight for easy benchtop placement Rapid Process Ready · Achieves working vacuum in <2 minutes (vs. industry-standard 5–10 mins) · Oil-lubricated rotary pump with dual-frequency support (50/60Hz) Precision Sputtering · φ50×0.1 mm ultra-thin targets (Au/Ag/Pt) for microscale coating · Scratch-resistant quartz viewport for real-time monitoring  Energy Efficient · <1500W power consumption (30% lower than comparable systems) · Air-cooled operation eliminates water chiller requirements 2. Complete Technical Specifications Core Parameters Parameter Specification Vacuum Pump Oil-required rotary pump Pumping Speed 50Hz: 8 m³/h (2.2 L/s) • 60Hz: 9.6 m³/h (2.6 L/s) Base Pressure Achievable in <2 mins Target Materials Au (std.), Ag, Pt (φ50×0.1 mm) Max Substrate Size Ø50 mm Power Supply 110V/60Hz or 220V/50Hz auto-switching Cooling Method Passive air cooling Warranty 1-year limited + lifetime support Mechanical Details · Chamber Material: Stainless steel with quartz viewport · Control Interface: Timer-based automation (manual override) · Safety: Overcurrent protection, grounding detection 3. Recommended Applications ✔ SEM Sample Preparation · Conductive coatings for non-metallic samples (e.g., polymers, biological tissues) · Charge dissipation layers for high-resolution imaging ✔ Material Science Research · Micro/nano-scale metal film deposition · Prototype coating for flexible electronics ✔ Field & Educational Use · Portable solution for shared lab spaces · Low-maintenance operation (no water cooling) 4. Comparison vs. Conventional Systems Aspect SD-800 Traditional Coaters Footprint 0.02 m³ ≥0.05 m³ Setup Time <5 mins 15–30 mins Target Thickness 0.1 mm 0.3–1 mm Cooling Air-cooled Water-chilled       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets

DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets     Model: TMAX-PC-JS03-Rotatable Triple-targets  Technical Specifications Category Parameter Value/Description Chamber Structure Design Vertical front-loading, stainless steel   Sample Access Easy loading/unloading Vacuum Performance Base Pressure ≤5×10−5 Pa   Leak Rate ≤5×10−7 Pa·L/s   Pressure Rise Rate (12h) ≤10 Pa   Pumping System Domestic molecular pump + mechanical pump Targets & Power Supplies Target Quantity & Size 3 × 2-inch magnetron targets (HV compatible)   Target Types 1 × Standard magnetic field, 1 × Strong magnetic field   Target-Substrate Distance (Multilayer) 40–120 mm   Target-Substrate Distance (Ion Source) 80–120 mm   RF Power Supply 1 × 1000 W, 13.56 MHz (auto-matching)   DC Power Supply 2 × 1000 W Substrate Holder Capacity Up to 3 substrates   Rotation Speed 5–30 RPM (self-rotation + planetary)   Heating Range Programmable up to 450°C   Bias Voltage Supports up to 1000 V Gas Control System Gas Lines 2 independent MKS mass flow controllers (Ar + reactive gas)   Features Gas mixing, adjustable/measurable chamber pressure Additional Features Chamber Baking Infrared heating (150°C)   Liner Plate Prevents chamber contamination   Safety Protections Water/power failure interlock, anti-misoperation protection Key Features & Applications 1. Advanced Deposition Capabilities · Supports DC/RF sputtering for metals, semiconductors, and insulators. · Triple-target design enables sequential multilayer deposition without vacuum breaks. 2. Precision Process Control · Programmable substrate heating (±450°C) with adjustable ramp rates. · Rotation mechanism (5–30 RPM) ensures uniform film thickness. 3. Research & Small-Batch Flexibility · Ideal for nanoscale functional films (e.g., optoelectronics, tribological coatings). · Reverse sputtering cleaning enhances film adhesion and purity. 4. User-Centric Design · Manual controls for target shutters, rotation, and temperature. · Safety systems mitigate operational risks (e.g., interlock protections). Users · Academic & Government Labs: Thin-film material R&D. · Industrial Prototyping: Small-scale production of specialized coatings.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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RF Sputtering Coater System For Solar, OLED & Semiconductor

 RF Sputtering Coater System For Solar, OLED & Semiconductor   Model:  TMAX-PD-JS05-Wafer Sputtering Coater System Product Overview The TMAX-PD-JS05 magnetron sputtering system is equipped with multiple sputtering sources, capable of depositing metallic, semiconducting, and dielectric materials. It supports the fabrication of multilayer thin films and co-sputtered alloy films with high precision. Key Features · Compact & Integrated Design: Space-saving layout with refined aesthetics, optional sample-loading functionality. · High Uniformity Coating: Features 4× magnetron sputtering targets (2–4 inches), compatible with 2–8 inch wafers. Substrate holder ensures uniformity within ±3%–5% for 8-inch wafers. · Flexible Control Options: Siemens PLC + touchscreen (manual/automatic) or PC + PLC full-automatic control. Technical Specifications · System Dimensions (L×W×H): 1400 × 1300 × 1900 mm · Chamber Dimensions (L×W×H): 500 × 500 × 500 mm (PD-500C) / 600 × 600 × 500 mm (PD-600C) · Substrate Stage: Max heating temperature 500–800°C · Base Pressure: ≤5 × 10⁻⁵ Pa · Pumping & Holding: Achieves 8 × 10⁻⁴ Pa within ≤30 min; pressure rise ≤8 Pa over 12 hours. · Target Configuration: 4× sputter guns (2–3 inches or 2–4 inches), coating area 2–6 inches. Applications & Advantages Ideal for R&D and small-batch production, the PD-500C/600C excels in depositing high-quality, uniform thin films for optics, electronics, and functional coatings. Its modular control and excellent temperature/vacuum stability cater to advanced material research and industrial precision demands. TMAX-PD-JS05 vs. Conventional Model Feature   Conventional Systems Advantage Uniformity (8-inch wafer) ±3%–5% ±5%–10% or worse Higher film consistency for precision applications System Footprint Compact (1400×1300×1900 mm) 30–50% larger Saves lab/cleanroom space Substrate Heating 500–800°C Typically 300–600°C Supports high-temperature depositions (e.g., oxides, nitrides) Base Vacuum ≤5×10⁻⁵ Pa ~1×10⁻⁴ Pa Better for reactive sputtering, reduced contamination Pressure Stability ≤8 Pa over 12 hours Frequent drift (>10 Pa in hours) Longer process stability Control Options PLC + Touchscreen or PC + PLC Manual or basic PLC Flexible automation, better reproducibility Target Configuration 4× guns (2–4 inch) Often 2–3 guns (2–3 inch) Wider material selection, co-sputtering capability Coating Area 2–8 inch wafers Typically ≤6 inch Broader substrate compatibility Key Takeaways · Precision & Consistency: Superior uniformity (±3–5%) vs. conventional (±5–10%). · Compact & Efficient: 30% smaller footprint without sacrificing performance. · High-Temp & Vacuum Stability: Enables advanced materials (e.g., optical coatings, semiconductors). · Automation Ready: PC-controlled processes improve repeatability over manual systems. Ideal For: R&D labs, semiconductor fabs, and optical coating producers needing high-repeatability, multi-material deposition in a space-efficient design.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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