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- If you have questions, please contact us, all questions will be answered
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Lab 4.3-inch Full-color Touch Screen Vacuum Benchtop Magnetron Sputtering Machine Used in Fabrication of Perovskite Solar Cells
Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp:+86 131 7450 6016 Skype: gia@tmaxcn.com
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Mini DC Ion Sputtering Carbon Coater Coating Machine System
Mini DC Ion Sputtering Carbon Coater Coating Machine System Product Overview The TMAX-BY-JS02 Ion Sputtering Coater is a DC (direct current) sputtering deposition system based on a two-electrode DC sputtering principle—a simple, reliable, and cost-effective coating technology widely adopted in industrial applications. Beyond its fundamental design, the TMAX-BY-JS02 features: · A dedicated sample sputtering chamber · Vacuum gauge and sputtering current meter · Adjustable sputtering current controller · Micro vacuum valve and timer · Integrated automated circuitry for precise control of chamber pressure, ionization current, and process gas selection, ensuring optimal coating quality. Key Innovations · Durable rubber-sealed bell jar design prevents vacuum leakage and edge chipping during prolonged use. · Ceramic-sealed high-voltage electrode outperforms conventional rubber seals in longevity. · Large-capacity sputtering chamber and optimized target area ensure uniform, contaminant-free coatings. · High-stability solenoid valves and a dual-gas-path automatic control system enhance sample protection and film quality. Ideal for: · SEM sample preparation in electron microscopy labs · Electrode fabrication for R&D research Technical Specifications Parameter Details Sputtering Gas Argon, nitrogen, or other gases (selectable per experiment) Target Material Standard: Gold target (50mm × 0.1mm thick). Optional: Silver, platinum, etc. Sputtering Current Max: 50mA Deposition Rate >4nm/min Chamber Dimensions Ø160mm × 120mm (H) Sample Stage Compatible with Ø50mm and Ø70mm stages (customizable) Power Supply 220V AC (110V optional), 50Hz Features Highlight 1. Leap Vacuum Pump: High-performance pumping for consistent vacuum levels. 2. Dual-Gas Control: Isolated gas paths safeguard sample integrity. 3. User-Centric Design: Timed sputtering, adjustable parameters, and modular stage options streamline operation. Note: Parameters are default for standard configuration. Customizations (e.g., target materials, voltage) available upon request. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }
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Glovebox Dual-Target Sputtering Coating Machine Coater For Oxides & Ceramics & Semiconductors
Glovebox Dual-Target Sputtering Coating Machine Coater For Oxides & Ceramics & Semiconductors Model: TMAX-BY-JS05 – Product Specifications 1. System Overview The TMAX-BY-JS05 is a compact, benchtop magnetron sputtering system designed for high-performance thin-film deposition in research and laboratory environments. Featuring a dual-target configuration, it supports the deposition of single or multilayer functional films, including conductive, dielectric, optical, and hard coatings. The system combines high vacuum performance, precise process control, and user-friendly operation, making it ideal for material science, semiconductor research, and advanced coating development. 2. Technical Specifications 2.1 General Parameters Parameter Specification Model TMAX-BY-JS05 Type Benchtop Laboratory System Dimensions (W×D×H) 610 × 420 × 490 mm Weight 100 kg Power Supply AC 220V 50Hz / 110V 60Hz Power Consumption <3 kW Cooling Method Water-cooled (target) + Air-cooled (pump) Warranty 1 year limited (lifetime support) 2.2 Vacuum System Parameter Specification Pump Configuration Rotary Pump (4.4 L/s) + Turbo Pump (300 L/s) Base Pressure ≤5×10⁻⁵ Pa Working Pressure 0.5–5 Pa Pump-Down Time (to 10⁻³ Pa) ≤10 minutes Vacuum Measurement Full-range gauge (Atmosphere to 10⁻⁵ Pa) 2.3 Deposition System Parameter Specification Target Configuration Dual magnetron targets (independent control) Target Size Ø50 × 3 mm (standard: Cu & Al) Target Materials Metals, alloys, oxides, ceramics Magnetic Compatibility Weak magnetic materials supported Deposition Rate Adjustable (process-dependent) 2.4 Process Control Parameter Specification Gas Flow Control Mass flow controller (Ar/other inert gases) Power Supply DC: 0–600V, 0–1.6A; RF: 300W/500W (optional) Thickness Monitoring Real-time touchscreen control with 257 preloaded materials Operation Interface Dual-screen VPI control system 2.5 Chamber & Substrate Parameter Specification Chamber Material Stainless steel Chamber Dimensions Outer: Ø260 × 500 mm; Inner: Ø210 × 270 mm Substrate Holder Customizable (max Ø200 mm) 3. Key Features & Benefits · Dual-Target Flexibility: Enables co-deposition or sequential layering of dissimilar materials (e.g., metal/oxide stacks). · High Vacuum Performance: Achieves 5×10⁻⁵ Pa base pressure for contamination-free films. · Precision Control: Touchscreen interface with real-time thickness monitoring and gas flow regulation. · Compact Design: Optimized for small labs with limited space. · Material Versatility: Supports metals, oxides, polymers, and magnetic materials. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; 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High-Precision PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine
High-Precision PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine Dual-function SEM Sample Preparation Instrument 1. Technical Specifications Vacuum System Parameter Specification Rotary Pumping Speed 50 Hz: 8 m³/h (2.2 L/s) / 60 Hz: 9.6 m³/h (2.6 L/s) Vacuum Limit 2 Pa Max Sputtering Current 100 mA Max Evaporation Current 100 A Sputtering Working Pressure 20 Pa – 8 Pa Evaporation Working Pressure 6 Pa – 4 Pa Working Vacuuming Time < 5 min (to 2 Pa) Vacuum Measurement Atmosphere to 2×10 mbar Gas Control Gas Flow Controller Chamber Size Ø150 × 120 mm (height), scratch-resistant quartz glass Magnetron Target Source Ø50 × 0.1 mm (Au) / Optional: Au, Ag, Pt Evaporation Target Source Carbon Rope Operation Method Manual (instruction manual included) Dimensions (Main Unit) 360 mm (L) × 300 mm (W) × 380 mm (H) Dimensions (Evaporation Unit) 360 mm (L) × 300 mm (W) × 160 mm (H) Weight 55 kg Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption < 2000 W Cooling Method Air Cooling (Evaporation) + Water Cooling (Sputtering) Warranty 1-year limited warranty with lifetime product support Sputtering Parameters · Sputtering Targets: Au (standard), optional Ag, Pt, Cr, Al, Cu · Target Size: Ø50 mm · Sample Stage: Adjustable height, accommodates Ø50 mm and Ø70 mm samples (customizable) · Sputtering Voltage: 0–1600 V (DC, adjustable) · Sputtering Current: 0–50 mA · Sputtering Time: 0–360 s Evaporation Parameters · Evaporation Material: Carbon fiber rope · Evaporation Current: 0–100 A (AC) · Evaporation Voltage: 0–30 V · Evaporation Time: 0–1 s · Micro Vacuum Valve: Compatible with Ø3 mm tubing General · Input Voltage: 220 V (110 V optional), 50 Hz · Vacuum Pump: 2 L/s rotary vane pump (domestic VRD-8) 2. Key Features Dual-Function Advantages · Integrated Design: Combines metal sputtering and carbon evaporation in one compact system · Process Flexibility: Switch between conductive metal coatings (Au/Ag/Pt) and ultra-thin carbon films · Time Efficiency: 5-minute pump-down enables rapid sample processing User-Centric Design · Transparent chamber for real-time monitoring · Ergonomic controls with preset programs · Tool-free target replacement system html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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Small Multi-target Metal Ion Sputtering Coater Machine
Small Multi-target Metal Ion Sputtering Coater Machine TMAX-BY-JS11-Triple-Target Ion Sputtering Coater – Product Specifications Key Features · Triple-target design for multi-material deposition in a single run · DC sputtering technology ensures reliable, high-quality thin-film coating · Versatile applications for SEM sample preparation, conductive layer coating, and protective film deposition · Adjustable parameters (gas, current, vacuum) for optimized film properties Technical Specifications Parameter Details Target Materials Standard: Au (50mm × 0.1mm) Optional: Ag, Al, Pt, and more Target Size 47mm diameter Control Mode Manual operation Chamber Dimensions Ø160mm × 120mm (H) Sample Stage Adjustable (Ø50mm/70mm standard, customizable) Sputtering Gas Ar, N₂, and others (selectable for different applications) Sputtering Current Max 50mA (recommended ≤30mA) Deposition Rate >40nm/min Vacuum System High-performance vacuum pump included Why Choose this? ✔ Multi-material coating – Deposit three different materials without breaking vacuum ✔ Enhanced SEM imaging – Reduces charging effects on non-conductive samples ✔ Precision control – Adjustable gas flow, current, and vacuum for optimal film uniformity ✔ Wide compatibility – Supports biological, polymer, and advanced material samples Applications · Electron-beam-sensitive samples (e.g., biological, polymers): Protective coating prevents beam damage · Non-conductive samples: Eliminates charging effects for crisp SEM imaging · Advanced materials research: Electrode fabrication and thin-film studies Standard Package Includes · Main unit with triple-target configuration · Gold target (50mm × 0.1mm) · High-performance vacuum pump · Adjustable sample stage (50mm/70mm) Optional Accessories · Additional target materials (Ag, Al, Pt, etc.) · Custom sample stage sizes Note: This machine is ideal for research labs, material science, and electron microscopy applications. Custom configurations available upon request. Optimized for Performance · Designed for Researchers (For detailed inquiries, contact our technical team for tailored solutions.) html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }
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RF+DC Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics
RF+DC Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics Model: TMAX-BY-JS12| – Product Specifications Technical Specifications Parameter Specification Vacuum Pump System Rotary Vane Pump (Oil-lubricated) + Oil-Free Turbo Molecular Pump Set Rotary Pump Speed 50Hz: 16m³/h (4.4 L/s) | 60Hz: 19.2m³/h (5.2 L/s) Molecular Pump Speed 300 L/s Ultimate Vacuum 5 × 10⁻⁴ Pa Working Pressure 0.5 – 5 Pa Pump-Down Time >10 min (to 10 Pa) Vacuum Measurement Range: Atmosphere to 10⁻⁴ Pa Gas Control Mass Flow Controller (MFC) Chamber Size φ260mm × 200mm (Metal Chamber) Magnetron Target Source Target Size: φ50mm × 3mm (Copper) Compatible with Weakly Magnetic Materials Operation Method Manual Control (Instruction Manual Provided) Weight / Dimensions 100kg / 610mm (L) × 420mm (W) × 490mm (H) Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption <3000W Cooling System Air Cooling (Pump) + Water Cooling (Sputtering Target) Warranty 1-Year Limited Warranty with Lifetime Technical Support Key Features & Applications Core Advantages 1. Multi-Mode Sputtering Supports RF (Radio Frequency), DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings. 2. High Vacuum Stability Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films. 3. Flexible Compatibility ·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples. ·φ50mm target supports copper and weakly magnetic materials for diverse applications. 4. Efficient Cooling System ·Water-cooled target minimizes thermal load during high-power sputtering. · Air-cooled pump reduces maintenance costs for continuous operation. Typical Applications ·Research Fields Thin film deposition, nanostructured coatings, semiconductor device development. ·Industrial Uses Optical coatings, wear-resistant layers, surface modification of electronic components. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }
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Ion DC Sputtering Machine System For Conductive Metal Film Preparation Of SEM
Ion DC Sputtering Machine System For Conductive Metal Film Preparation Of SEM Model: TMAX-ZK-JS02-DC Ion Sputtering Coater Product Overview The TMAX-ZK-JS02 DC Ion Sputtering Coater adopts a microcontroller as its core processor, featuring independent intellectual property and excellent scalability for customized development. Equipped with a 5.1-inch touch LCD screen, it intuitively displays set parameters such as sputtering current, sputtering time, working current, and remaining time. Key Specifications · Sputtering Current: 3–30 mA (continuously adjustable, step: 1 mA) · Sputtering Time: 1–600 sec (step: 1 sec) · Safety Interlocks: Dual protection for sputtering current and vacuum level, ensuring immediate shutdown upon triggering to prevent damage. · Sample Capacity: o 4 × φ25 mm samples or 6 × φ15 mm samples o Single sample cup accommodates up to φ50 mm samples. · Vacuum Performance: o Ultimate vacuum: <1 Pa o Pumping speed: 1 L/s o Chamber size: φ108 × 130 mm · Additional Features: o Real-time curves for sputtering current & vacuum level. o Adjustable screen brightness. o System/usage time tracking for targets. Technical Parameters Category Specifications Operation Mode Magnetron Sputtering Input Voltage AC 220V ± 10%, 50Hz Working Voltage DC 2400V Max Power Consumption 500W (host + mechanical pump) Target Materials Au, Pt, Au-Pd alloy, Ag, Pb, Cu, Cr, Sb, etc. Sputtering Gas Air or Argon Chamber Material High-borosilicate glass (φ128 × 100 mm) Vacuum Pump Two-stage rotary vane pump (1 L/s) Sample Stage φ90 mm (or φ25 × 4 / φ15 × 6) Dimensions (L×W×H) 424 × 271 × 255 mm Weight (Host) 11 kg Operating Environment 5–40°C, <60% RH Storage Environment -10–60°C, <80% RH Product Highlights ✔ Fully Automated Control – No manual needle valve adjustment required. ✔ Quick-Target Replacement – Patented clamp structure for effortless swaps. ✔ Special Seal Design – Protects glass components from damage. ✔ Adjustable Sample Stage – Smooth height adjustment via sliding rod. ✔ Built-in Operation Guide – User-friendly interface for instant proficiency. Applications Ideal for conductive film coating in SEM sample preparation, the GVC-1000 ensures simplicity and efficiency. Compatible with a wide range of target materials (Au, Pt, Ag, Cu, etc.) and sputtering gases (Air/Ar). html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }
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Lab DC/RF Magnetron Sputtering Machine Equipment For SEM
Lab DC/RF Magnetron Sputtering Machine Equipment For SEM Model: TMAX-PD-JS01-DC/RF Sputtering, Multi-Target, Uniform Coating (±5%), Fast Deposition Product Overview The TMAX-PD-JS01 is a compact magnetron sputtering system designed for laboratory-scale thin-film deposition. Compatible with both DC and RF sputtering sources, it supports the coating of metals, non-metals, and compound films (e.g., ITO). Ideal for academic and industrial research, it enables the preparation of single/multilayer films and facilitates advanced material/process development. Key Features 1. Robust Construction ·All-stainless-steel vacuum chamber ensures durability and operational safety. ·Optimized gas path design for enhanced process control. 2. Space-Efficient & Modular ·Compact footprint (500×360×380mm) with modular expandability, maximizing lab space utilization. 3. High-Efficiency Vacuum System ·Hybrid mechanical + imported molecular pump achieves high vacuum (≤3×10⁻⁵ Pa) in 15–20 minutes, reducing downtime. 4. Precision Process Control ·Uniformity: ≤±5% over Ø80mm substrate area. ·Rotating Substrate Holder: Adjustable speed (0–20 RPM) with magnetic fluid sealing for stable deposition. 5. Flexible Configuration ·Sputtering Sources: 2–3 × 2-inch targets (DC/mid-frequency/RF). ·Gas System: 1–3 gas inlets with ±1% flow accuracy (20 sccm). Technical Specifications Parameter Specification Vacuum Chamber Ø260 × H280mm (304 stainless steel, cylindrical, viewport) Vacuum System Mechanical pump + imported molecular pump Base Pressure ≤3×10⁻⁵ Pa Pump-down Time ≤3×10⁻⁴ Pa in 15min Substrate Holder Max. Ø80mm, rotation speed 0–20 RPM (adjustable) Sputtering Sources 2–3 × 2-inch targets; 1KW DC/mid-frequency/RF power supply Uniformity ≤5% (Ø80mm area) Gas Control 1–3 channels, ±1% accuracy (20 sccm max) Control Mode Manual button or PLC touchscreen (with safety interlocks) Power Supply AC220V/50Hz, 2.5KW Dimensions (L×W×H) 500 × 360 × 380mm Optional Upgrades: Substrate heating/cooling, dry pump, additional flow meters, water chiller. Target Applications · Research: Thin-film studies (metals, oxides, semiconductors). · Education: Lab demonstrations and student projects. · Industry: Prototyping for electronics, optics, and energy materials (e.g., ITO for solar cells). Why choose ? · Fast turnaround: Rapid pump-down accelerates experimental cycles. · Scalable: Modular design adapts to evolving research needs. · User-centric: Intuitive controls and safety features streamline operation. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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Mini Auto Ion Sputtering Coater Machine For Carbon, Ti, Au, Al
Mini Auto Ion Sputtering Coater Machine For Carbon, Ti, Au, Al TMAX-BY-JS13-Glovebox-Compatible SEM Sample Coater for Conductive Coatings 1. Key Features & Design Highlights Ultra-Compact Design · Chamber volume reduced by 67% (φ115×100 mm) vs. conventional systems · 0.02 m³ footprint (307×260×260 mm) and 40 kg weight for easy benchtop placement Rapid Process Ready · Achieves working vacuum in <2 minutes (vs. industry-standard 5–10 mins) · Oil-lubricated rotary pump with dual-frequency support (50/60Hz) Precision Sputtering · φ50×0.1 mm ultra-thin targets (Au/Ag/Pt) for microscale coating · Scratch-resistant quartz viewport for real-time monitoring Energy Efficient · <1500W power consumption (30% lower than comparable systems) · Air-cooled operation eliminates water chiller requirements 2. Complete Technical Specifications Core Parameters Parameter Specification Vacuum Pump Oil-required rotary pump Pumping Speed 50Hz: 8 m³/h (2.2 L/s) • 60Hz: 9.6 m³/h (2.6 L/s) Base Pressure Achievable in <2 mins Target Materials Au (std.), Ag, Pt (φ50×0.1 mm) Max Substrate Size Ø50 mm Power Supply 110V/60Hz or 220V/50Hz auto-switching Cooling Method Passive air cooling Warranty 1-year limited + lifetime support Mechanical Details · Chamber Material: Stainless steel with quartz viewport · Control Interface: Timer-based automation (manual override) · Safety: Overcurrent protection, grounding detection 3. Recommended Applications ✔ SEM Sample Preparation · Conductive coatings for non-metallic samples (e.g., polymers, biological tissues) · Charge dissipation layers for high-resolution imaging ✔ Material Science Research · Micro/nano-scale metal film deposition · Prototype coating for flexible electronics ✔ Field & Educational Use · Portable solution for shared lab spaces · Low-maintenance operation (no water cooling) 4. Comparison vs. Conventional Systems Aspect SD-800 Traditional Coaters Footprint 0.02 m³ ≥0.05 m³ Setup Time <5 mins 15–30 mins Target Thickness 0.1 mm 0.3–1 mm Cooling Air-cooled Water-chilled html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Dual-Target PVD Sputtering Machine For Conductive And Biological Multilayer Films
Dual-Target PVD Sputtering Machine For Conductive And Biological Multilayer Films Model: TMAX-PC-JS06-RF&DC&MF for Conductive Multilayer Films Technical Parameters No. Parameter Specification 1 Sputtering Chamber Ultimate Vacuum ≤6.6×10⁻⁶ Pa 2 System Leak Rate ≤5.0×10⁻⁷ Pa·L/S 3 Pump-Down Time (from atmosphere) ≤30 min to 6.6×10⁻⁴ Pa 4 Vacuum Retention (12h after shutdown) ≤5 Pa 5 Sputtering Chamber Dimensions ≥Ø300 mm × 300 mm 6 Magnetron Sputtering Targets 2 × 50 mm (RF/DC/MF compatible, adjustable) 7 Power Supplies 1 × 500W DC, 1 × 500W RF (auto-matching) 8 Film Uniformity ≤5% 9 Substrate Holder Rotation 0–30 RPM (adjustable) 10 Substrate Heating Range RT–600°C (PID-controlled) 11 Gas Control 100 SCCM MFC, CF16/DN16 valves 12 Turbo Molecular Pump Speed 300 L/s 13 Mechanical Pump Speed 4 L/s 14 Vacuum Measurement INFICON gauge 15 Control System PLC + Industrial PC + Touchscreen (full automation) Key Features & Applications 1. Dual-Target Flexibility ·Supports multi-layer or composite film deposition (e.g., conductive/insulating stacks). ·RF/DC/MF compatibility enables processing of magnetic materials. 2. High Vacuum Performance ·Ultra-low base pressure (≤6.6×10⁻⁶ Pa) minimizes contamination for high-purity films. ·Fast pump-down and excellent vacuum retention reduce downtime. 3. Precision Process Control ·PID-controlled heating (RT–600°C) for annealing or stress management. ·Automated gas flow (MFC) and power adjustment for reproducible results. 4. User-Centric Design ·Rotating substrate holder ensures uniform coating (≤5% non-uniformity). ·Touchscreen + PLC automation simplifies operation and reduces human error. 5. Compact & Mobile ·Lockable wheeled frame suits lab environments with space constraints. Ideal For: · Research: Thin-film studies (semiconductors, optics, tribology). · Industry: Functional coatings (wear-resistant, decorative, or barrier films). · Magnetic Materials: Sputtering of Fe, Co, Ni alloys or oxides. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Multi-target Magnetron Sputtering Machine For Parylene,OLED, Solar Cell & Semiconductor
Multi-target Magnetron Sputtering Machine For Parylene,OLED, Solar Cell & Semiconductor Model: TMAX-PC-JS10-Multi-target, Multi-film Deposition Specifications Category Parameter Primary Application Nanoscale monolayer/multilayer films (hard coatings, metals, semiconductors, dielectrics) Target Users Universities, research institutes (R&D and small-batch production) System Composition Vacuum chamber, sputtering targets, sample stage, vacuum pumps, gas delivery, control systems, film thickness monitor, and auxiliary components Vacuum Performance Parameter Specification Ultimate Vacuum 6.7 × 10-5 Pa System Leak Rate ≤1 × 10-7 Pa·L/s Vacuum Recovery Time ≤40 min (to 6.6 × 10-1 Pa after N2 purge) Chamber & Sample Stage Component Specification Chamber Dimensions Ø630 mm × 350 mm (cylindrical) Sample Capacity 8 × 4-inch substrates (1 mm thickness) Sputtering Targets Feature Specification Target Types 3 × Permanent magnet targets, 3 × High-intensity magnet targets Cooling Method Indirect water-cooled (brazed structure) Target Diameter Ø100 mm Target-Substrate Distance 50–90 mm (manual adjustment, with position indicator) Sputtering Mode Vertical downward sputtering Substrate Control Parameter Specification Bias Voltage Up to -200 V Rotation Mechanism Computer-controlled revolution + rotation (stepper motor-driven) Temperature Control RT to 300°C (single calibration required; 3 heaters, one active at a time) Gas & Thickness Control Component Specification Mass Flow Controllers (MFC) 2 channels Film Thickness Monitor Quartz crystal microbalance (0–999,999 Å) Pumping Options Configuration Components Standard Turbo molecular pump + dry scroll pump Alternative Cryogenic pump + dry scroll pump Computer Control Features · Real-time displacement/speed monitoring with error calculation. · Linear/logarithmic display modes for speed vs. displacement. · Site-specific deposition via precision positioning. Key Advantages & Applications ✔ Multi-Target Flexibility – Supports diverse materials (metals, oxides, nitrides). ✔ Uniform Deposition – Computer-controlled rotation ensures film consistency. ✔ High Vacuum Stability – Minimizes contamination for high-purity films. ✔ Research-Ready – Modular design suits optoelectronics, tribological coatings, and semiconductor R&D. Ideal for: Advanced material science studies and prototyping of functional thin-film devices. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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