PVD Magnetron Sputtering System For Thin Film Deposition In Research, Semiconductor Prototyping and Optical Coating

PVD Magnetron Sputtering System For Thin Film Deposition In Research, Semiconductor Prototyping and Optical Coating   Model: Lith-SD-JS02-Sputtering System for Research Labs, Semiconductor Prototyping, and Optical Coating Product Overview The Plasma Magnetron Sputtering System (Model: TMAX-SD-JS02) is a compact, user-friendly instrument designed for high-quality thin film deposition. With a quartz chamber (150 × 120 mm) and a maximum sputtering rate of 8 nm/min, it is ideal for research and small-scale production requiring precise, uniform coatings. Compatible with inert gases (Ar, N₂) and versatile metal targets (Au, Ag, Pt, etc.), this system combines efficiency with advanced operational features. Technical Specifications Parameter Specification Quartz Chamber Size 150 × 120 mm Sample Stage Size 70 mm (diameter) Sputtering Area 50 mm (diameter) Max. Vacuum Degree 5 Pa Process Gases Argon, Nitrogen (flow rate adjustable) Max. Sputtering Rate 8 nm/min Power Consumption 200 W Dimensions (W×D×H) 360 × 310 × 150 mm Operating Temperature 0–40°C Relative Humidity < 85% Installation Horizontal desktop placement Key Features & Advantages 1. Intuitive Control & Monitoring 4.3" color touchscreen with graphical interface for real-time display of sputtering current, voltage, and vacuum levels. 2. Flexible Gas & Target Options Adjustable inert gas flow (Ar/N₂) and support for 50 mm diameter metal targets (1–2 mm thickness), enabling quick material swaps and process reproducibility. 3. Modular & User-Centric Design ·Split-type quartz chamber for easy maintenance. ·Height-adjustable sample stage (±20 mm) with rotational alignment. ·Auto-venting post-sputtering simplifies sample handling. 4. Compact & Reliable ·Space-saving footprint with multi-layered software protections for extended durability. 5. Uniform Film Quality ·Dense, homogeneous coatings compatible with noble and transition metals (Au, Ag, Pt, etc.). Target Applications · Research Labs: Thin film studies, surface engineering, and material science. · Semiconductor Prototyping: Deposition of conductive/metallic layers. · Optics & Electronics: Functional coatings for sensors or display components. Note: Optimized for small substrates (≤50 mm) and low-to-medium throughput requirements.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

PVD DC Sputtering Coating System For Oxides & Ceramics & Semiconductors

PVD DC Sputtering Coating System For Oxides & Ceramics & Semiconductors   Model: TMAX-BY-JS09| – Product Specifications Product Overview The TMAX-BY-JS09 is a compact, high-vacuum magnetron sputtering system specifically designed for glovebox-integrated applications. Its space-saving flush-mount design allows the observation window to align perfectly with the glovebox wall, eliminating internal space occupation—a common limitation of traditional sputtering systems. Since its launch, this system has been widely adopted by research institutions for its efficiency and precision. Technical Specifications Category Specification Vacuum System Rotary vane pump (oil) + Turbo molecular pump (oil-free) Pumping Speed Rotary pump: 16 m³/h (4.4 L/s) @50Hz / 19.2 m³/h (5.2 L/s) @60Hz  Turbo pump: 300 L/s Ultimate Vacuum 5×10⁻⁵ Pa Working Pressure 0.5–5 Pa Pump-Down Time ≤10 min (to 10⁻³ Pa) Vacuum Measurement From atmosphere to 10⁻⁶ Pa Gas Control Precision gas flow controller Chamber Size φ260 mm × 200 mm (metal) Sputtering Target φ50 mm × 3 mm (Cu target); suitable for weakly magnetic materials Power Supply AC 220V 50Hz or AC 110V 60Hz Power Consumption ≤3000 W Cooling System Air cooling (pump) + Water cooling (sputtering target) Dimensions & Weight 610 mm (L) × 420 mm (W) × 490 mm (H) / ~100 kg Warranty 1-year limited warranty, lifetime technical support Key Features & Customer Benefits 1. Space-Saving Glovebox Integration · Problem Solved: Traditional sputtering systems occupy valuable glovebox space, limiting workflow efficiency. · Our Solution: The flush-mounted design minimizes protrusion, allowing seamless integration without compromising internal workspace—ideal for labs with limited glovebox capacity. 2. High-Performance Vacuum & Fast Pump-Down · Achieves 5×10⁻⁵ Pa ultimate vacuum, ensuring ultra-clean deposition conditions for sensitive materials (e.g., semiconductors, optical coatings). · Rapid pump-down (≤10 min to 10⁻³ Pa) reduces idle time, enhancing lab productivity. 3. Precision Process Control · Stable gas flow control enables repeatable deposition rates, critical for uniform thin-film growth. · Broad vacuum measurement range (atmosphere to 10⁻⁶ Pa) ensures accurate monitoring across all process stages. 4. Versatile Material Compatibility · Supports argon and other process gases for reactive/non-reactive sputtering. · Accommodates 50mm targets (Cu standard, customizable for weakly magnetic materials). 5. Reliable Cooling & Safety · Hybrid air + water cooling prevents overheating during extended operation, ensuring system longevity.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

PVD Magnetron Sputter Coating System For SEM & Wafer Sample Preparation

PVD Magnetron Sputter Coating System For SEM & Wafer Sample Preparation       Model:  TMAX-ZK-JS04- DC Ion Sputtering Coater Technical Specifications Parameter Specification Target Materials Standard: Au (Gold), 57mm diameter × 0.1mm thick  Optional: Pt (Platinum) Standard Sample Holder Holds 12 SEM stubs, height adjustment range: 60mm Rotating/Tilting Stage (Optional) Rotation: 0–60 rpm (continuously adjustable)  Tilt: -90° to +90° (continuously adjustable)  Standard rotating platform: 40mm diameter (holds 4 sample holders, custom sizes available)  Dual locking mechanism for secure fixation Sputtering Current 5–30mA (microprocessor-controlled, programmable) Meters Vacuum: Atm – 1×10⁻³ mbar  Current: 0–99mA Control Method Microprocessor with Start/Pause buttons  Programmable time (1–999s)  Auto-pumping, sputtering, and venting Vacuum System Pumping speed: 133 L/min  Ultimate vacuum: 10⁻⁴ mbar  Noise level: 56 dB Key Features & Applications 1. Precision and Flexibility · Adjustable sputtering current (5–30mA) and rotating/tilting stage enable uniform thin-film deposition for diverse sample geometries. · Dual locking mechanism prevents sample displacement during operation. 2. High-Quality Coating · Gold (Au) and Platinum (Pt) targets ensure high-purity conductive coatings for SEM and analytical applications. 3. Automated & User-Friendly Operation · Programmable controls and auto-venting enhance efficiency and safety. 4. Compact & Low-Noise Design · Stainless steel chamber (120mm × 75mm) with observation window (120mm × 45mm) provides durability and visibility. · Low 56 dB noise level ensures a comfortable working environment. Ideal Applications · SEM sample preparation (conductive coating) · Thin-film deposition for research and industrial applications · Multi-sample processing (supports 12 SEM stubs) · Angle-dependent deposition (with optional rotating/tilting stage) This sputtering system is optimized for laboratories requiring high precision, automation, and versatile coating capabilities.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); 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Magnetron Sputter Depostion Coater Machine PVD System For SEM

Magnetron Sputter Depostion Coater Machine PVD System For SEM       Model:  TMAX-HZ-JS03- Au/Carbon Coating Magnetron Sputter Coater Product Overview The  TMAX-HZ-JS03 Dual-Target Magnetron Ion Sputtering Coater, independently developed with cutting-edge technology, sets a new benchmark for sample preparation instruments. It integrates dual-target co-sputtering and multi-layer single-sputtering capabilities, featuring a standard rotating/tilting module for multi-angle, uniform film coverage. This design eliminates charging effects, enhances sample contrast, and delivers high-resolution, true-to-life morphological characterization—ideal for advanced material science and biological research. Technical Specifications Category Parameter Specification Core Parameters Model TMAX-HZ-JS03   Vacuum Chamber (mm) 160 × 120   Sputtering Voltage 300–700 V   Sample Stage (mm) Adjustable 80–100 diameter   Sputtering Type Magnetron   Working Vacuum 2–10 Pa System Configuration Power Supply 100–250 VAC, 50/60 Hz   Target Size (mm) φ50 × 0.1   Control System 5" Touchscreen (ARM)   Max. Power Consumption 100 W Process Control Sputtering Current 10–50 mA (±1 mA)   Sputtering Time 0–600 s (±1 s)   Ultimate Vacuum <1 Pa Safety & Monitoring Vacuum Measurement Digital Pirani Gauge   Protection Current/Vacuum interlock Instrument Highlights 1. SEM-Optimized Coating Performance · Dual-target configuration: Enables sequential Au/Pt and Carbon deposition without breaking vacuum · 2-10Pa working vacuum: Specialized for minimum oxidation during conductive coating · <5nm particle size: Finer than conventional sputter coaters (typically 10-20nm) 2. Intelligent Process Control · 300-700V voltage range with 1mA precision – 30% wider than standard systems for optimal film density · Real-time plasma monitoring prevents arcing on sensitive samples 3. Ergonomic Design · 160mm large chamber: Accommodates tall SEM stubs (up to 25mm) and irregular specimens · Tool-free target change Target Applications ▸ Life Science: Coating for pollen, plant tissues, and hydrated biological samples ▸ Materials Research: Nanowires, polymer films, and porous materials ▸ Failure Analysis: PCB cross-sections and insulating components Operational Advantages · One-cycle coating: 12 samples/batch (50% more than competitors) · Zero thermal damage: Magnetron confinement keeps samples <40°C · Self-diagnostics: Automatic pump protection and target life counter     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Nano PVD Magnetron Sputtering System For Metals, Alloys, Dielectric, Perovskite Films

Nano PVD Magnetron Sputtering System For Metals, Alloys, Dielectric, Perovskite Films     Model: TMAX-TK-JS03-Multilayer Thin Film Fabrication Application Fields Electronics/Batteries, Steel/Metals, Aerospace, Automotive & Components, Electrical Industries Product Features & Applications ► Dual-functionality: Supports both sputtering and evaporation processes. Compact footprint, cost-effective, stable performance, and low maintenance. ► Versatile coating capabilities: Deposits single/multi-layer films including metal films (Ag, Al, Cu, Ni, Cr, NiCr alloys), dielectric films (TiO₂, SiO₂), semiconductor films (ITO), magnetic films, heat-resistant alloys, and corrosion-resistant/ hard coatings. ► Flexible configurations: Single-target, sequential multi-target, or co-sputtering modes for multilayer/composite films. Technical Specifications Parameter Specification Model TMAX-TK-JS03 Chamber Structure Vertical top-opening, rear-mounted pumping system, pneumatic lift Chamber Dimensions Φ350 × H350 mm Heating Temperature Room temp. ~ 500°C Sputtering Mode Upward sputtering Substrate Stage Rotating, Φ120 mm Film Uniformity ≤±5.0% (Φ75 mm area) Targets 2× Φ2" magnetron targets (DC/RF compatible) Gas Control 2–3 channels MFC Control System PLC + touchscreen (semi-automatic) Footprint (Main Unit) L1600 × W800 × H1920 mm Power Consumption ≥8 kW Key Performance Metrics 1. Vacuum System: ·Pumps: Compound molecular pump + rotary vane pump, with electric/gas valves. ·Base Pressure: ≤6.6×10⁻⁵ Pa (after 24h pumping). ·Leak Rate: ≤0.8 Pa/h. ·Pump-down Time: ≤15 min (to 5.0×10⁻³ Pa, empty chamber). 2. Substrate Handling: ·Rotation: 0–20 rpm. ·Heating: RT ~ 500±1°C. 3. Target Configuration: ·3× Φ2" magnetron targets (coaxial sputtering). ·Includes DC (2 units) + RF (1 unit) power supplies, with pneumatic shutters. 4. Safety & Control: ·Protections: Overcurrent/voltage, water cooling faults, and interlock system. ·Noise Level: ≤70 dB. Unique Advantages & Target Users · Research & Production Flexibility: Ideal for nano-scale conductive/magnetic films (Ni, Co), semiconductor layers (ITO, ZnO), and ceramic insulating films. · Multi-target Synergy: Independent/sequential/co-sputtering modes enable complex multilayer structures. · User-Friendly: PLC+touchscreen control suits academic labs, R&D centers, and industrial production. Ideal For: Universities, research institutes, and manufacturers requiring high-precision, repeatable thin-film deposition for advanced materials.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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PVD Thermal Evaporation Carbon Fiber Deposition System Coater For SEM/TEM

PVD Thermal Evaporation Carbon Fiber Deposition System Coater For SEM/TEM   Model: TMAX-BY-ZD01-Nanoscale Carbon Coating Machine 1. Product Overview The TMAX-BY-ZD01 Thermal Evaporation Carbon Coater is a precision instrument designed for depositing ultra-thin carbon films (≤1 nm) onto substrates for high-resolution electron microscopy applications. Utilizing resistive heating of pure carbon fiber strands, it ensures uniform and contamination-free coatings, making it ideal for SEM, TEM, EBSD, and microprobe analysis. Key Features: ✔ Nanoscale Coating Precision – Deposits carbon films with minimal grain size (<1 nm) for high-resolution imaging. ✔ Dual Carbon Fiber Source (A/B Selectable) – Ensures consistent evaporation and extended filament life. ✔ Vacuum Protection System – Prevents damage from low vacuum conditions. ✔ Fast Deposition (0-1 sec) – Optimized for laboratory efficiency. ✔ Compact & User-Friendly – Sleek design with intuitive controls. 2. Technical Specifications Core Parameters Category Specification Model Dimensions (W×D×H) 340mm × 390mm × 300mm Chamber Material Borosilicate Glass (Ø170mm × 130mm H) Evaporation Source High-Purity Carbon Fiber (Dual Strand A/B Selectable) Deposition Time 0-1 second (adjustable) Operating Vacuum 4×10⁻² mbar Working Voltage 0-30V (AC) Evaporation Current 0-100A Vacuum Pump 2-Stage Rotary Pump (Feiyue VRD-8, 8 m³/h @50Hz) Power Supply AC 110V/60Hz or 220V/50Hz Power Consumption <2000W Weight 45 kg Vacuum System Performance · Base Pressure: ≤2 Pa · Pumping Speed: o 50Hz: 8 m³/h (2.2 L/s) o 60Hz: 9.6 m³/h (2.6 L/s) · Time to Reach Vacuum: <5 minutes (to 2 Pa) 3. Applications This is optimized for: · Scanning Electron Microscopy (SEM) – Reduces charging effects. · Transmission Electron Microscopy (TEM) – Provides ultra-thin conductive layers. · EBSD (Electron Backscatter Diffraction) – Enhances signal clarity. · Microprobe & X-ray Analysis – Ensures minimal interference. 4. Operational Advantages · High Purity Carbon Films – Minimizes contamination for precise analysis. · Quick & Repeatable Process – Ideal for high-throughput labs. · Compact & Low Maintenance – Robust design with minimal upkeep.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Thermal Evaporation Carbon Metal Deposition Coater PVD System Equipment

Thermal Evaporation Carbon Metal Deposition Coater PVD System Equipment      Model: TMAX-BY-ZD02-Pulsing Thermal Evaporation Carbon Coater 1. Product Overview Introduction The TMAX-BY-ZD02 Pulsing Thermal Evaporation Carbon Coater is an advanced deposition system designed for ultra-thin carbon film coating in SEM, TEM, and EBSD applications. Utilizing resistive heating of high-purity carbon rope, it enables precise, fast, and contamination-free carbon film deposition with adjustable parameters for optimized coating quality. Key Technologies & Advantages ✔ Dual Deposition Modes – Supports Flash & Pulsed evaporation (0-9 pulses) for controlled, low-debris coating. ✔ Touchscreen Control – User-friendly interface for precise current/pulse adjustment. ✔ Adjustable Evaporation Current (50A-80A) – Prevents sample damage while ensuring uniform coating. ✔ Vacuum Protection System – Safeguards against low-vacuum short circuits. ✔ Compact & Efficient – Optimized for lab environments with rapid pump-down (<5 min). 2. Technical Specifications Core Parameters Category Specification Model TMAX-BY-ZD02 Dimensions (W×D×H) 390mm × 310mm × 290mm Chamber Material Borosilicate Glass (Ø160mm × 110mm H) Sample Stage 50mm (Diameter) Evaporation Source High-Purity Carbon Rope Deposition Modes Flash / Pulsed (0-9 pulses programmable) Max Evaporation Current 80A Operating Vacuum 4–6 Pa Ultimate Vacuum 5 Pa Pump Type 2-Stage Rotary Pump (VRD-8, 8 m³/h @50Hz) Power Supply 220V AC, 50Hz Power Consumption 1.6 kW Weight ~50 kg Vacuum System Performance · Pumping Speed: o 50Hz: 8 m³/h (2.2 L/s) o 60Hz: 9.6 m³/h (2.6 L/s) · Time to Reach Vacuum: <5 minutes (to 2 Pa) · Vacuum Measurement Range: Atmosphere to 2×10⁻² mbar 3. Applications · High-Resolution SEM/TEM – Minimizes charging effects. · EBSD Analysis – Enhances electron backscatter diffraction signals. · X-ray Microanalysis – Provides conductive layers with minimal interference. 4. Operational Highlights Pulsed Evaporation Technology · Reduces Debris: Short pulses limit carbon splashing for cleaner coatings. · Controlled Thickness: Programmable pulses (0-9) enable repeatable deposition. User-Centric Design · Touchscreen Interface: Intuitive control for current/pulse adjustment. · No Process Gas Required: Simplified operation compared to sputtering systems.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Vacuum Evaporation PVD System Machine For Metal, OLEDs, Organic

Vacuum Evaporation PVD System Machine For Metal, OLEDs, Organic    TMAX-QH-ZD02-High-Vacuum Multi-Material Evaporation Technical Specifications No. Parameter Description 1 Ultimate Vacuum ≤4×10⁻⁵ Pa (new equipment) 2 Leak Rate 6.7×10⁻⁸ Pa·L/S 3 Working Vacuum 5×10⁻⁴ Pa (Time to reach from atmosphere: <30 min, cold state with glovebox integration) 4 Pressure Holding ≤2 Pa after 12 hours (post pump shutdown) 5 Sample Size 130×130 mm (16× 25×25 mm samples; includes 2 sets) 6 Sample Holder Size 146×146 mm 7 Source-Substrate Distance 320 mm 8 Sample Rotation 0–30 RPM (water-cooled) 9 Evaporation Sources 4× metal + 4× organic sources (2 organic sources on inner/outer door, 2 metal sources on each side) 10 Substrate Lift Fixed (non-adjustable) 11 Chamber Access Manual front-opening door 12 Thickness Probes 4× water-cooled probes (above sources) 13 Mask Storage Optional 14 Sample Loading Side-insertion 15 Deposition Control Auto rate/power/temperature control 16 Pumping System Automated vacuum sequencing 17 Film Uniformity ±5% (for 100 nm films) 18 Safety Features Anti-implosion, auto gas refill, environmental thermocouple Key Features 1. High-Precision Deposition Control · Automated Rate/Power/Temperature Control: Ensures repeatable thin-film growth for research and small-scale production. · Real-Time Thickness Monitoring (4× Probes): Enables accurate multilayer deposition with ±5% uniformity. · Dual-Source Configuration (4 Metal + 4 Organic): Supports co-evaporation for advanced materials like perovskites and organic semiconductors. 2. Optimized for Efficiency & Stability · Fast Pump-Down (<30 min to 5×10⁻⁴ Pa): Reduces downtime between batches, improving lab productivity. · Low Leak Rate (6.7×10⁻⁸ Pa·L/S): Maintains ultra-high vacuum integrity for sensitive processes. · Long-Term Pressure Holding (≤2 Pa after 12 hours): Minimizes re-pumping time for multi-step experiments. 3. User-Friendly Design · Side-Loading & Front-Opening Chamber: Compatible with glovebox workflows, reducing contamination risks. · Water-Cooled Sample Rotation (0–30 RPM): Enhances film homogeneity while preventing thermal damage. · Optional Mask Storage: Enables patterned deposition for micro/nanofabrication. 4. Robust Safety Protections · Anti-Implosion Design: Safeguards against chamber breaches during high-vacuum operation. · Auto Gas Refill & Environmental Thermocouple: Protects samples and equipment during reactive material handling. Application Areas 1. Advanced Optoelectronic Research · OLEDs & Organic Electronics: Precise co-evaporation of metal-organic layers for emissive devices. · Perovskite Solar Cells: Uniform thin-film deposition for high-efficiency photovoltaic research. · Quantum Dots & 2D Materials: Controlled growth of nanoscale films for photonics and sensors. 2. Industrial Thin-Film Development · Barrier Coatings: Ultra-thin encapsulation layers for flexible electronics. · MEMS & Sensors: High-purity metal/oxide deposition for microfabrication. · Optical Coatings: Low-defect films for lenses, mirrors, and filters. 3. Customizable for Specialized Needs · In-Situ Monitoring Upgrades: Additional diagnostics (e.g., RHEED, quartz crystal microbalance) available. · Multi-Source Expansion: Accommodates complex material stacks (e.g., ternary systems). Why Choose This System? ✔ Lab-Optimized Throughput: Balances high sample capacity (16×25 mm substrates) with research-grade precision. ✔ Glovebox-Compatible: Ideal for air-sensitive materials like lithium or reactive organics. ✔ Future-Ready Design: Modular options support evolving thin-film R&D demands.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; 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Benchtop PVD Systems Manufacturer For Metal, Oxide, Semiconductor Deposition

Benchtop PVD Systems Manufacturer For Metal, Oxide, Semiconductor Deposition      TMAX-PC-DZ04-Electron Beam Evaporation Coating System Applications · Deposition of conductive, semiconductor, ferroelectric, and optical films · Ideal for research labs, universities, and small-scale production Key Advantages ✔ High-precision deposition with E-type electron gun for uniform coatings ✔ Dual evaporation modes (E-beam + optional resistive thermal evaporation) ✔ Rotating & heated substrate stage (up to 800°C) for improved film adhesion ✔ Fast vacuum recovery (<20 min to high vacuum) for efficient operation ✔ Quartz crystal monitoring for real-time thickness control (0–999.99 nm) ✔ Flexible configuration (4-pocket crucible, multi-material compatibility) Technical Specifications Category Parameter Value/Description Vacuum System Ultimate Vacuum ≤6.7×10-4Pa   Vacuum Recovery Time (1×10-1→5×10-4) ≤20 min   Leak Rate ≤6.7×10-7 Pa·L/s Vacuum Chamber Dimensions 500 × 500 × 600 mm (U-shaped, front-opening) E-Gun Evaporation Anode Voltage 6 kV / 8 kV (1 set)   Crucible Water-cooled, 4-pocket (11 mL each)   Power Range 0–6 kW (adjustable) Resistive Evaporation (Optional) Voltage 5 V / 10 V   Max Current/Power 300 A / 3 kW (1 set)   Electrodes 3 water-cooled (configurable for 2 boats) Substrate Handling Max Substrate Size 4″ (100 mm)   Rotation Speed 5–60 RPM   Source-to-Substrate Distance 300–350 mm   Heating Temperature Up to 800°C (±1°C) Control & Monitoring Shutter Manual (1 set)   Gas Flow Control 1-channel MFC   Thickness Monitor (QCM) 0–99,999 Å (0–999.99 nm) Recommended Use Cases · Semiconductor research (dielectric layers, conductive films) · Optical coatings (anti-reflective, filters, mirrors) · Advanced materials (ferroelectrics, superconductors, 2D materials) · Prototype development for thin-film devices Why Choose this? · Reliable performance for high-purity film growth. · Modular design supports diverse materials and processes. · User-friendly controls for both manual and precision deposition.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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