Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film

Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film        TMAX-ZY-ZD01-Multi-Layer Deposition for Metals, Alloys & Dielectric Thin Films Product Overview The TMAX-ZY-ZD01 is a desktop thermal evaporation system designed for high-precision thin-film deposition in research and small-scale production. Featuring a turbomolecular pump vacuum system and multi-source evaporation capabilities, it enables efficient deposition of metals, alloys, and dielectric films with minimal operator training. Key Features & Advantages 1. Wide Application Range · Materials Research: Metal films, dielectric layers, polymer coatings. · Functional Devices: Thin-film sensors, optical coatings, nanoelectronics. · Multi-Layer Deposition: Supports up to 99 layers in a single run. 2. User-Friendly Operation · Plug-and-play design—no specialized lab environment required. · 10-inch touchscreen for intuitive control and process monitoring. · Preloaded 100+ deposition recipes for quick setup. 3. High Precision & Stability · Quartz crystal monitoring ensures real-time thickness control (≤3% uniformity). · Turbo-molecular pump (300L/s) achieves ≤6×10⁻⁵ Pa ultimate vacuum. · 3 independent evaporation sources prevent material cross-contamination. 4. Flexible Configuration · Optional: Co-evaporation for alloys, 400°C substrate heating, and cooled rotating stage. · Automatic & manual modes for customized process control. 5. Low Maintenance & Compact Design · Aluminum chamber for efficient heat dissipation. · 65 kg weight, suitable for benchtop use in labs or offices. Technical Specifications Parameter Specification Chamber Ø300 × 350(h) mm (quartz glass) Vacuum System 300L/s turbomolecular pump + dual-stage rotary pump Ultimate Vacuum ≤6 × 10⁻⁵ Pa (after baking) Leak Rate ≤5.0 × 10⁻⁹ Pa·L/s Deposition Rate ≥10 nm/min (material-dependent) Film Uniformity ≤3% (with rotation) Evaporation Sources 3 independent thermal sources Max Layers per Run 99 layers (up to 4 materials) Control Interface 10" touchscreen with programmable recipes Power Supply AC 230V, 32A, 50Hz Cooling Water (Optional) 0.2 MPa, 15–25°C, ≥8 L/min Operational Workflow 1. Automated Deposition: Pre-programmed vacuum pumping, heating, and evaporation. 2. Multi-Layer Control: Supports time-based or thickness-based deposition modes. 3. Remote Monitoring: Adjust parameters via network connection. Why Choose? ✔ Combines research-grade performance with desktop convenience. ✔ Minimal training required—ideal for multi-user environments. ✔ Scalable for both experimental and small production needs.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater

High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater     Model: TMAX-HZ-JS04- High-Vacuum Dual-Target Sputtering Coater Technical Parameters Category Specification Model TMAX-HZ-JS04 Vacuum System Oil-free diaphragm pump + molecular pump Ultimate Vacuum ≤1.0×10⁻⁴ Pa Pressure Measurement Full-range cold cathode gauge + front-end Pirani gauge Gas Control MFC (Mass Flow Controller) for Ar/O₂/N₂ Target Configuration Dual targets (independent control, alternate/synchronous sputtering) Target Compatibility Metals, alloys, compounds (custom sizes available) Optional Feature Real-time thickness monitoring (nanometer precision) Cooling System Energy-efficient target cooling Safety Protections Overpressure/overcurrent/overheat protection, vacuum interlock, emergency vent Key Features 1. Dual-Target Flexibility ·Enables multi-material deposition (e.g., bilayers, graded films, or interfaces) in a single run. 2. High-Vacuum Precision ·Ultra-low base pressure (≤1.0×10⁻⁴ Pa) minimizes contamination for high-purity films. 3. Intelligent Process Control ·MFC-regulated gas flow ensures repeatable reactive sputtering (e.g., oxides/nitrides). 4. User-Optimized Design ·Energy-saving pumps and cooling reduce operational costs without compromising performance. Typical Applications · Semiconductors: Electrode/metallization layers, barrier films. · Optics: Anti-reflective, conductive, or hard coatings. · Energy: Thin-film batteries, solar cell layers. · Research: Nanomaterials, heterostructures, surface engineering. Why Choose? · Lab to Production: Scalable for both R&D prototyping and industrial batch processing. · Safety & Reliability: Automated safeguards protect equipment and users. · Customizable: Adaptable to diverse materials and film architectures.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation

Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation     Model:  TMAX-HZ-JS02-Low-Temperature SEM Preparation Key Features & Applications The  TMAX-HZ-JS02 Magnetron Sputtering System integrates advanced vacuum technology with intelligent automation, delivering high uniformity, efficiency, and versatility for precision thin-film deposition. Its large-target design and planar magnetron cathode minimize plasma-induced thermal damage, making it ideal for temperature-sensitive samples (e.g., polymers, fibers, biological specimens) and high-resolution SEM preparation. Technical Parameters Category Specifications Dimensions 530 × 300 × 320 mm Input Voltage 100–250 VAC, 50/60 Hz Sputtering Voltage 300–600 V (DC) Target Material Ø50 × 0.1 mm (Au, Pt, Ag, Pd, etc.) Control Mode 5-inch touchscreen (ARM architecture, bilingual UI) Power Consumption 100 W Sputtering Current 10–50 mA (1 mA precision) Sputtering Time 0–600 s (1 s step) Working Vacuum 2–10 Pa (0.1 Pa resolution) Ultimate Vacuum <1 Pa Vacuum Measurement Full-range Pirani gauge Chamber Size Ø160 × 120 mm Sample Stage Ø80–100 mm (holds 12 standard stubs) Protections Overcurrent, vacuum safety System Components 1. Sputtering Source: Planar magnetron cathode for Au/Pt/Pd/Ag deposition. 2. Power Supply: Constant-current DC (300–600 V, ±1 mA precision). 3. Vacuum System: Rotary vane pump (<1 Pa), Pirani monitoring. 4. Automation: One-touch operation with parameter memory. 5. Data Display: Real-time curves for current, voltage, and vacuum status. Advantages · Nano-scale Coating: Particle size <5 nm, ideal for high-resolution SEM. · Low Thermal Impact: Magnetron technology reduces sample heating. · High Throughput: 12-sample capacity with auto-rotation for uniformity. · Plug-and-Play: No specialized training required. Ideal for: Material science, biology, and conductive/thermal enhancement of non-metallic samples. Operation Notes · Target Replacement: Tool-free design with shielded ring mechanism. · Maintenance: Oil-lubricated pump (included) with visual oil-level window. · Gas Connection: Supports Ar/N₂ or ambient air (6 mm OD tubing).       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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Au/Pt/Pd/Ag Metal Sputtering Targets PVD Magnetron Sputtering Coating System

Au/Pt/Pd/Ag Metal Sputtering Targets PVD Magnetron Sputtering Coating System     Model: TMAX-HZ-JS01-Au/Pt/Pd/Ag Metal Sputtering Targets Product Overview The TMAX-HZ-JS01 is a next-generation magnetron ion sputtering coater, independently developed and manufactured to set a new benchmark in sample preparation instruments. Featuring one-touch operation and a fully digitized human-machine interface, it delivers high-precision, nanoscale conductive coatings (≤5 nm) for SEM sample preparation, effectively addressing charging effects in non-conductive specimens. Technical Specifications Parameter Specification Model TMAX-HZ-JS01 Dimensions 530 × 300 × 320 mm Power Supply 100–250 VAC, 50/60 Hz Sputtering Voltage 300–600 V (DC) Sputtering Current 10–50 mA (±1 mA) Sputtering Time 0–600 s (±1 s) Working Vacuum 2–10 Pa (4–8 Pa optimal) Ultimate Vacuum <1 Pa Target Size Ø50 × 0.1 mm Sample Stage Ø65 mm (holds 12 standard stubs) Vacuum Chamber Ø120 × 100 mm (130 × 100 mm)* Control Interface 5-inch touchscreen (ARM-based) Vacuum Measurement Piezoelectric Pirani gauge Pump System Rotary vane pump Target Applications · Material Science: Nanomaterials, thin films, composites. · Biology & Medicine: Non-conductive tissues, polymers, membranes. · Electronics: Electrode preparation, semiconductor analysis. · High-Resolution SEM: Requires minimal grain size (≤5 nm) and low thermal impact. Installation & Operation 1. Quick Start: Connect power/gas supply (Ar/N₂ optional), load samples, and press START. 2. Automated Workflow: Self-check, real-time monitoring, and auto-venting post-coating. 3. Maintenance: No specialized upkeep; tool-free target replacement (Au/Pt/Pd/Ag).   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Dip Coater (1-200 mm/min) with 124 L Temperature Chamber and Touch Panel Controller for Large Substrate up to 16"x 9"

Dip Coater (1-200 mm/min) with 124 L Temperature Chamber and Touch Panel Controller for Large Substrate up to 16"x 9"

Customizable Extrusion Coater Slot Die Coating Machine

Customizable Extrusion Coater Slot Die Coating Machine The extrusion coating machine is a device that uses a narrow extrusion coating die to non-contact coating the substrate. This equipment can achieve two types of coating functions: continuous coating and stripe coating through the combination of slot die narrow extrusion coating die, precision metering feeding system, and feeding valve. The equipment has high coating accuracy, good consistency and stability, and is widely used in the lithium commercial battery, FCCL, optical film, high adhesive tape, and various functional film industries. Specification Control system  independently developed Coating width  200mm-1500mm Coating method  Slot die Coating thickness  0.005-5MM (uniformity ± 3%) Thickness adjustment  digital micrometer Heating channel  drying channel 2-20 meters (1 meter per section) (customizable) Heating control  thermocouple sensor Tension control  Adjustable tension Deviation correction device  fully automatic deviation correction for feeding/receiving Drying duct fan  adjustable speed Oven insulation  asbestos insulation layer Collecting and discharging diameter  Collecting and discharging material diameter 300mm (customizable) Rear lamination  finished lamination (steel pipe+rubber hose) Wind speed control  with wind filtering at the outlet of the drying tunnel (uniform wind speed) Coating speed  1-30 meters/minute (adjustable according to the drying condition of the adhesive) Drying passage roller  304 stainless steel Drying channel material  304 stainless steel (box) Heating method  stainless steel heating tube Oven temperature  room temperature -160 degrees (can be kept at a constant temperature) Drying track structure  tiled Waste heat recovery  with automatic waste heat collector Glue supply method  pressure bucket Expansion axis  3-inch gas expansion axis Drying channel lifting  cylinder lifting Exhaust system  centrifugal fan (external interface 100MM) Equipment power supply  380V Control AC24V Equipment power  12KW (peak)    

PLC Controlled Dip Coater (1-200 mm/min) for Large Substrate up to 10"x12"

PLC Controlled Dip Coater (1-200 mm/min) for Large Substrate up to 10"x12"

Large size 5-position programmable dip coater w/ 225L Dry Oven

Large size 5-position programmable dip coater w/ 225L Dry Oven

Carbon coated Aluminum foil for lithium battery cathode electrode

Advantage: Improve the consistency of battery usage group and reduce battery cost significantly. Improve the adhesion of active material and the collector, and reduce the electrode manufacturing cost. Reduce the polarization, increase the rate and capacity, improve the battery performance. Protection of fluid collection, extend battery life. Throughput: Possess Japan Fuji coating machine, slitting machine and automatic computer inspection rewinder machine. Average coating speed reach 90-120m/min. Product 21600m conductive coating aluminum foil every 8 hours,can be used for    200Kpcs 18650 core. Roller coating width up to 1 meters. Can adopt continuous or intermittent coating mode. 

Aluminum Foil Double Side Coated by LiFePO4

Advantage: Improve the consistency of battery usage group and reduce battery cost significantly. Improve the adhesion of active material and the collector, and reduce the electrode manufacturing cost. Reduce the polarization, increase the rate and capacity, improve the battery performance. Protection of fluid collection, extend battery life. Throughput: Possess Japan Fuji coating machine, slitting machine and automatic computer inspection rewinder machine. Average coating speed reach 90-120m/min. Product 21600m conductive coating aluminum foil every 8 hours,can be used for    200Kpcs 18650 core. Roller coating width up to 1 meters. Can adopt continuous or intermittent coating mode. 

Lab Copper Foil Double side coated by Graphite

Advantage: Improve the consistency of battery usage group and reduce battery cost significantly. Improve the adhesion of active material and the collector, and reduce the electrode manufacturing cost. Reduce the polarization, increase the rate and capacity, improve the battery performance. Protection of fluid collection, extend battery life. Throughput: Possess Japan Fuji coating machine, slitting machine and automatic computer inspection rewinder machine. Average coating speed reach 90-120m/min. Product 21600m conductive coating aluminum foil every 8 hours,can be used for    200Kpcs 18650 core. Roller coating width up to 1 meters. Can adopt continuous or intermittent coating mode. 

Thermally conductive coating copper foil

Advantage: Improve the consistency of battery usage group and reduce battery cost significantly. Improve the adhesion of active material and the collector, and reduce the electrode manufacturing cost. Reduce the polarization, increase the rate and capacity, improve the battery performance. Protection of fluid collection, extend battery life. Throughput: Possess Japan Fuji coating machine, slitting machine and automatic computer inspection rewinder machine. Average coating speed reach 90-120m/min. Product 21600m conductive coating aluminum foil every 8 hours,can be used for    200Kpcs 18650 core. Roller coating width up to 1 meters. Can adopt continuous or intermittent coating mode. 

Laboratory Doctor Blade Film Coater Coating Machine with Heat and Vacuum Function

Compact Tape Casting Coater with Vacuum Chuck, Adjustable Film Applicator & Dryer Cover TMAX-TMH250 is a CE Certified ready compact tape casting coater with a heating cover designed to produce films with consistent thickness. It has a unique driving system to produce a smooth coating on all types of materials. The flat vacuum chuck is built in to hold the substrate sheet in place, which is particularly useful when making thin coatings. One 100 mm width adjustable micrometer applicator (doctor-blade). Heating cover with digital temperature controller can dry films after coating up to 100°C with a temperature accuracy of +/-1°C. This equipment can be used for researchers on ceramic tape castings and Li-Ion battery electrode coating.

Customizable Immersion Double-Sided Dip Coating Machine Extrusion Coater

Customizable Immersion Double-Sided Dip Coating Machine Extrusion Coater This coating machine is suitable for substrates that require double-sided dip coating. Suitable for slurries with lower viscosity. The coating width, oven length, and temperature can be customized. Specification Control system  independently developed Coating width  200mm-1500mm Coating method  double-sided dip coating Coating thickness  0.005-5MM (uniformity ± 3%) Thickness adjustment  digital micrometer Heating channel  drying channel 2-20 meters (1 meter per section) (customizable) Heating control  thermocouple sensor Tension control  Adjustable tension Deviation correction device  fully automatic deviation correction for feeding/receiving Drying duct fan  adjustable speed Collecting and discharging diameter  Collecting and discharging material diameter 300mm (customizable) Rear lamination  finished lamination (steel pipe+rubber hose) Wind speed control  with wind filtering at the outlet of the drying tunnel (uniform wind speed) Coating speed  1-20 meters/minute (adjustable according to the drying condition of the adhesive) Drying passage roller  304 stainless steel Drying channel material  304 stainless steel (box) Heating method  stainless steel heating tube Oven temperature  room temperature -160 degrees (can be kept at a constant temperature) Drying track structure  Tiled Waste heat recovery  with automatic waste heat collector Glue supply method  pressure bucket Expansion axis  3-inch gas expansion axis Drying channel lifting  cylinder lifting Exhaust system  centrifugal fan (external interface 100MM) Equipment power supply  380V Control AC24V Equipment power  12KW (peak)