Auto Vaccum DC Sputter Coater For Multilayer Thin Film Fabrication

Auto Vaccum DC Sputter Coater For Multilayer Thin Film Fabrication       Model: TMAX-BY-JS10 – Product Specifications 1. Technical Specifications Table Parameter Specification Model Number TMAX-BY-JS10 Vacuum Pump Oil-required Rotary Vacuum Pump (Explicit oil filling needed) Pumping Speed 50Hz: 16 m³/h (4.4 L/s) • 60Hz: 19.2 m³/h (5.2 L/s) • 20% speed boost at 60Hz Ultimate Vacuum 2 Pa Max Sputtering Current 1.6A Operating Pressure Range 20 Pa – 8 Pa Pump-Down Time <5 min (to 2 Pa) Vacuum Measurement Range Atmospheric pressure to 2×10⁷ mbar Gas Control System Precision Gas Flow Controller Chamber Specifications Ø350 × 240mm (H) • Scratch-resistant quartz glass viewport Target Specifications Ø200mm • Materials: Au, Ag, Pt, Cu (noble/conductive metals) Operation Instruction manual guided Dimensions/Weight 490(L) × 400(W) × 590(H) mm • 70 kg Power Requirements Dual-voltage: AC 110V/60Hz (Americas) or AC 220V/50Hz (Europe/Asia) Power Consumption <1500W Warranty & Support 1-year limited warranty + lifetime technical support 2. Key Features & Competitive Advantages Precision-Oriented Design · Dual-Frequency Pumping: Automatically adapts to 50Hz/60Hz power grids (19.2 m³/h vs 16 m³/h) for global compatibility. · Scratch-Resistant Quartz Viewport: Ensures long-term visibility during deposition without degradation. · Oil-Lubricated Vacuum Pump: Delivers stable 2 Pa base pressure (vs. dry pumps), critical for consistent thin-film quality. Material Versatility · Broad Target Compatibility: Supports Au/Ag/Pt/Cu targets for conductive/noble metal coatings. · Rapid Process Setup: <5-minute pump-down enables efficient batch processing. User-Centric Engineering · Global Voltage Support: No external converter needed for 110V/220V operation. · Compact Footprint: Benchtop design (0.49×0.4×0.59m) saves lab space.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Glovebox Dual-Target Sputtering Coating Machine Coater For Oxides & Ceramics & Semiconductors

Glovebox Dual-Target Sputtering Coating Machine Coater For Oxides & Ceramics & Semiconductors     Model: TMAX-BY-JS05 – Product Specifications 1. System Overview The TMAX-BY-JS05 is a compact, benchtop magnetron sputtering system designed for high-performance thin-film deposition in research and laboratory environments. Featuring a dual-target configuration, it supports the deposition of single or multilayer functional films, including conductive, dielectric, optical, and hard coatings. The system combines high vacuum performance, precise process control, and user-friendly operation, making it ideal for material science, semiconductor research, and advanced coating development. 2. Technical Specifications 2.1 General Parameters Parameter Specification Model TMAX-BY-JS05 Type Benchtop Laboratory System Dimensions (W×D×H) 610 × 420 × 490 mm Weight 100 kg Power Supply AC 220V 50Hz / 110V 60Hz Power Consumption <3 kW Cooling Method Water-cooled (target) + Air-cooled (pump) Warranty 1 year limited (lifetime support) 2.2 Vacuum System Parameter Specification Pump Configuration Rotary Pump (4.4 L/s) + Turbo Pump (300 L/s) Base Pressure ≤5×10⁻⁵ Pa Working Pressure 0.5–5 Pa Pump-Down Time (to 10⁻³ Pa) ≤10 minutes Vacuum Measurement Full-range gauge (Atmosphere to 10⁻⁵ Pa) 2.3 Deposition System Parameter Specification Target Configuration Dual magnetron targets (independent control) Target Size Ø50 × 3 mm (standard: Cu & Al) Target Materials Metals, alloys, oxides, ceramics Magnetic Compatibility Weak magnetic materials supported Deposition Rate Adjustable (process-dependent) 2.4 Process Control Parameter Specification Gas Flow Control Mass flow controller (Ar/other inert gases) Power Supply DC: 0–600V, 0–1.6A; RF: 300W/500W (optional) Thickness Monitoring Real-time touchscreen control with 257 preloaded materials Operation Interface Dual-screen VPI control system 2.5 Chamber & Substrate Parameter Specification Chamber Material Stainless steel Chamber Dimensions Outer: Ø260 × 500 mm; Inner: Ø210 × 270 mm Substrate Holder Customizable (max Ø200 mm) 3. Key Features & Benefits · Dual-Target Flexibility: Enables co-deposition or sequential layering of dissimilar materials (e.g., metal/oxide stacks). · High Vacuum Performance: Achieves 5×10⁻⁵ Pa base pressure for contamination-free films. · Precision Control: Touchscreen interface with real-time thickness monitoring and gas flow regulation. · Compact Design: Optimized for small labs with limited space. · Material Versatility: Supports metals, oxides, polymers, and magnetic materials.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Mini DC Ion Sputtering Carbon Coater Coating Machine System

Mini DC Ion Sputtering Carbon Coater Coating Machine System     Product Overview The TMAX-BY-JS02 Ion Sputtering Coater is a DC (direct current) sputtering deposition system based on a two-electrode DC sputtering principle—a simple, reliable, and cost-effective coating technology widely adopted in industrial applications. Beyond its fundamental design, the TMAX-BY-JS02 features: · A dedicated sample sputtering chamber · Vacuum gauge and sputtering current meter · Adjustable sputtering current controller · Micro vacuum valve and timer · Integrated automated circuitry for precise control of chamber pressure, ionization current, and process gas selection, ensuring optimal coating quality. Key Innovations · Durable rubber-sealed bell jar design prevents vacuum leakage and edge chipping during prolonged use. · Ceramic-sealed high-voltage electrode outperforms conventional rubber seals in longevity. · Large-capacity sputtering chamber and optimized target area ensure uniform, contaminant-free coatings. · High-stability solenoid valves and a dual-gas-path automatic control system enhance sample protection and film quality. Ideal for: · SEM sample preparation in electron microscopy labs · Electrode fabrication for R&D research Technical Specifications Parameter Details Sputtering Gas Argon, nitrogen, or other gases (selectable per experiment) Target Material Standard: Gold target (50mm × 0.1mm thick). Optional: Silver, platinum, etc. Sputtering Current Max: 50mA Deposition Rate >4nm/min Chamber Dimensions Ø160mm × 120mm (H) Sample Stage Compatible with Ø50mm and Ø70mm stages (customizable) Power Supply 220V AC (110V optional), 50Hz   Features Highlight 1. Leap Vacuum Pump: High-performance pumping for consistent vacuum levels. 2. Dual-Gas Control: Isolated gas paths safeguard sample integrity. 3. User-Centric Design: Timed sputtering, adjustable parameters, and modular stage options streamline operation. Note: Parameters are default for standard configuration. Customizations (e.g., target materials, voltage) available upon request.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Manual & Auto Lab Sputter Coater for Low Temperature SEM Carbon Preparation

Manual & Auto Lab Sputter Coater for Low Temperature SEM Carbon Preparation   Model: TMAX-BY-JS01 DC Ion Sputtering Coater Introduction The TMAX-BY-JS01 Ion Sputtering Coater is designed for high-quality SEM sample preparation. Compared to conventional sputtering systems, it features magnetron sputtering technology, making it suitable for temperature-sensitive samples (e.g., thin films, rubber). The system offers automatic/manual operation modes, adjustable vacuum control, and auto-venting functionality, with optional rotary sample stage compatibility. Its user-friendly interface and stable performance make it ideal for universities and research institutes.     Key Specifications Parameter Value Dimensions (Main Unit) 510mm (L) × 310mm (W) × 290mm (H) Target Material Au, 50mm (D) × 0.1mm (H) Sample Chamber Glass chamber, Ø180mm × 120mm (H) Sample Stage Diameter Ø70mm (rotary stage optional) Target Size Ø50mm Ultimate Vacuum 1 Pa Operating Vacuum 2–15 Pa Sputtering Current 0–50 mA (adjustable) Timer Digital, 0–600 sec Coating Area 50mm diameter Deposition Rate 0–60 nm/min Vacuum Measurement Pirani gauge Touchscreen 4-inch HMI interface Gas Compatibility Supports multiple gases Mechanical Pump VRD-8 Power Consumption 100 W     Features & Applications 1. Magnetron Sputtering Technology · Enables low-temperature coating for delicate samples (e.g., polymers, biological specimens). · Stable target design ensures uniform film deposition. 2. Dual Operation Modes · Automatic mode: Streamlines repetitive tasks. · Manual mode: Offers flexibility for customized protocols. 3. Adjustable Sputtering Modes · Standard/gentle startup accommodates sensitive materials. 4. Intelligent Vacuum Control · Auto-pressure stabilization eliminates manual adjustments and reduces coarse grain formation. 5. User-Friendly Interface · Simplified/advanced UI options cater to users of all experience levels. 6. Optional Rotary Stage · Enhances coating uniformity for complex geometries.     Typical Applications · SEM sample preparation (metals, ceramics, polymers). · Thin-film deposition for research in materials science, life sciences, and nanotechnology.         html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Customizable Solvent Coating Line Solvent-containing Slurry Coater Machine

Solvent coating machine with oven, temperature up to 150-250C. The coating width and oven length can be customized. Suitable for all kinds of solvent coating, explosion-proof fan.

Customizable Teeth Whitening Strips Coating Equipment Dental Stickers Coater

Customizable Teeth Whitening Strips Coating Equipment Dental Stickers Coater This equipment is specialized in making liquid materials into thin film. It can be used to make quick-dissolve oral films, trans films, and mouth freshener strips, having wide application range in pharmaceutical field, food industry and etc.,  The dental paste coating machine is made of aluminum alloy, PLC control and touch screen operation. The equipment is removable, which is convenient for entering the elevator. The dental paste automatic coating machine has complete functions and covers a small area. The coating machine is easy to clean. Teeth Whitening Strips' Function: The gel layer on the whitening tooth paste is dry and can produce high adhesion when fused with saliva water. It can remain attached to the teeth for a long time. Specification Control system Independent research and development system Uniform coating ＜6% Coating width Effective coating width 300MM（discharge 400MM), customizable Coating thickness 0.01-2MM（wet film） Coating typoe Double-sided + single-sided double-ended (can be used separately) Tension control Automatic tension adjustment (according to the membrane tension required to adjust) Doctor blade lift Pneumatic lifting Oven length 2-20 meters (2 meters per section, customizable) Dryingoven temp Normal temperature ~100 degrees (can be segmented constant temperature) Heating method Electrical heating Heating tube Adopt stainless steel fin heating tube Deviation correcting device Automatic rectifying of winding Production speed 0.1-5 m/min (steady at low speed) Roll up function Double reel up and down Balance of winding Floating roll Stripe function Strip with double edge Waste collection unit Double aeration axis with magnetic powder Exhaust system Adjustable wind power Oven blower Adjustable wind power Oven lift Pneumatic automatic lifting Glue supply system Upward side Diameter of retraction Retracting and discharging diameter 500MM Type of motor 3-wire variable frequency motor Emptying device Inflatable shaft 3 inches Lamination station Automatic laminating (with heated roller) Equipment material Aluminum alloy Power supply 380V 50Hz Equipment power 60KW    

Automatic Pulsing Thermal Evaporator Carbon Coater equipped with Vacuum Pump for Lab SEM Sample Preparation

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Desktop Multi Vessel Dip Coater

Desktop Multi Vessel Dip Coater

Programmable Control Vertical Dip Coater

II automatic film coater is a Large Automatic Film Coater designed to produce films with consistent thickness by using micrometer adjustable applicators or fixed thickness applicators. It has an unique driving system to produce smooth coating on all types of materials. One micrometer adjustable applicator is included for immediate use. 

Lab 200C Spin Coater with Bluetooth Communication Function And Supporting Remote Communication Software

Nanometer Range Programmable Dip Coater with Drying Oven (1-500 nm/sec, 100°C Max. )