Materials Science Vacuum Magnetron Ion Sputter Coating Coater

Materials Science Vacuum Magnetron Ion Sputter Coating Coater Introduction Materials Science Magnetron Ion Sputtering Coater(SD900M Model) is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample. Coating Result Sample Picture under SEM (by SD-900M Model) EPTFE (Extended Poly Tetra Fluoro Ethylene) Low vacuum, can be achieved quickly when using proper vacuum pump within 5 minutes. It generates much less heat and avoids plasma damage to the substrate sample. It is user friendly and easy to operate. Vacuum pump is included. Chiller is optional. Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s)  Vacuum limit 2 Pa Max sputtering current 100mA Working pressure 20Pa - 8 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass Magnetron target source Target size φ50*0.1mm(Au)/target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 45kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Water cooling(optional) Warranty One year limited warranty with lifetime product support 

Magnetron Ion Thermal Evaporation Carbon Sputter Coater for SEM Sample Preparation

Magnetron Ion Thermal Evaporation Carbon Sputter Coater for SEM Sample Preparation Introduction     Magnetron Ion Sputtering Unit &Thermal Evaporation Carbon Coater is ideal and designed for lab SEM sample preparation. SD900C Model (Magnetron Ion Sputtering Unit) is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample.     SD900C Model (Thermal Evaporation Carbon Unit) carbon coater applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM.     Working vacuum pressure can be achieved quickly when using proper vacuum pump within 5 minutes. It is user friendly and easy to operate.     Vacuum pump is included.     Chiller is optional. (for Magnetron Ion Sputtering Unit)   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 100mA Max evaporation current 100A Working pressure 20Pa -8 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Evaporation target source Target material:carbon rope /target source:carbon rope Operation method Instruction Manual (2 units)Weight/size 55kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Cooling method Air cooling(Evaporation)+water cooling (sputtering ) Warranty One year limited warranty with lifetime product support

3 Rotary Target Plasma Sputtering Coater Machine Heater (500C) Including 3 Targets

3 Rotary Target Plasma Sputtering Coater w. Substrate Heater (500C) Including 3 Targets

Ultrasonic Spray Coater Equipment For Thin Film Deposition

Ultrasonic Spray Coater Equipment For Thin Film Deposition     Specifications: · Overall Dimensions: Main unit: 800×500×690mm With injection pump: 1080×500×690mm · Maximum Coating Area: 200×200mm · Motion System: 3-axis automation with programmable motion trajectories · Control Method: High-precision motion card/physical buttons · Ultrasonic Spray Head: Standard: 1 set of any TMAX ultrasonic spray head (customizable for multiple sets) · Applications: Qualitative experiments in scientific research laboratories, small-batch production, and thin-film fabrication Overview: The basic ultrasonic precision spray coater is designed for enterprises, universities, and research institutes new to ultrasonic spray technology. The equipment features a simple yet elegant structure with comprehensive functionality, including: · XYZ 3-axis precision motion modules · A versatile trajectory editing system capable of 2D planar patterns (rectangles, circles, triangles, or curves) · Compatibility with all TMAX ultrasonic spray heads · Precision constant-flow injection pump · Digital display carrier gas system · Optional ultrasonic dispersion liquid supply system and vacuum adsorption heating substrate · Suitable for use in fume hoods Advantages: 1. 4× Efficiency: Ultrasonic atomization spray achieves up to 4× higher material utilization than conventional methods, significantly reducing material costs. 2. Nanoscale Film Thickness: Capable of producing ultra-thin films as thin as tens of nanometers with exceptional uniformity. 3. Pressure-Free Atomization: Utilizes high-frequency ultrasonic vibration for atomization without compressed air, eliminating substrate impact from high-pressure gas. Precision Motion Module: · XYZ axes equipped with stepper motors · Fully enclosed linear screw modules for extended lifespan · Repeat positioning accuracy: 0.01mm Ultrasonic Spray Head System: TMAX offers dozens of ultrasonic spray head models to meet various working conditions and film thickness requirements. Operating System: · TMAX's dedicated control system for ultrasonic spraying · User-friendly interface with integrated control for: o Ultrasonic atomization/dispersion o Injection pump o Carrier gas o Heating stage o Vacuum adsorption plate · Features: o One-click template trajectory generation o G-code complex trajectory editing Standard Configuration: Parameter Specification Viscosity & Solid Content Viscosity ≤30cps; Suspension solid content ≤20-30% Liquid Supply System Precision injection pump + bio-grade sampler (accuracy: 0.1μL/min) Dry Film Thickness 20nm-100μm (solution/substrate dependent) Input Voltage 220V±10%, 50-60Hz Solution Conversion Rate ≥95% (multiple times higher than conventional two-fluid pneumatic spray) Atomized Particle Size 15-45μm average (frequency-dependent: higher frequency yields smaller particles) Spray Head Frequency Configurable 30-200KHz systems Optional Configurations: Configuration Option Specifications Ultrasonic Dispersion Liquid Supply System Continuously disperses nanoparticles during spraying, reducing sedimentation and improving film uniformity Heated Drying Platform - Perforated aviation aluminum or precision microporous ceramic platform - Precise temperature control up to 200°C Vacuum Adsorption Platform - Multi-channel vacuum generator with zone control - Prevents substrate deformation during thin-film processing Spray Head Alignment Device Laser alignment system Custom Configurations Available upon request   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Benchtop Ultrasonic Spray Coater Supplier For Thin Film Coating

Ultrasonic Spray Coating Machine For Solar Cells, Batteries & Electronics Model: TMAX-FS03-Vaccum Ultrasonic Spray Coater Technical Specifications · Overall Dimensions: 1000 × 700 × 680 mm · Coating Area: 300 × 300 mm (Max: 400 × 400 mm) · Motion System: XYZ three-axis, programmable for any planar trajectory · Control Method: o Standard: High-precision control card + 7-inch touchscreen + physical buttons o Optional: PLC + 13.3-inch integrated PC + physical buttons · Ultrasonic Spray Head: o Standard: 1 set of any FUNSONIC ultrasonic spray head (customizable for multiple sets) · Applications: Qualitative experiments in scientific research laboratories, small-batch production, and thin-film fabrication on small surfaces. Overview The sealed ultrasonic spray coating machine differs from the standard 03V model with its enclosed architecture, allowing vacuum treatment of the spray chamber (maximum negative pressure: -0.058 to -0.098 MPa), making it suitable for specialized coating processes. Designed for enterprises, universities, and research institutes new to ultrasonic spray technology, this system features a streamlined structure with comprehensive functionality. It includes: · XYZ three-axis precision motion modules with a versatile trajectory editing system for spraying any 2D pattern (rectangles, circles, triangles, or curves). · Compatibility with all ultrasonic spray heads, paired with a precision constant-flow syringe pump and digital display gas delivery system. · Optional add-ons: ultrasonic dispersion feeding system, vacuum adsorption heated substrate, and more. Advantages ✔ Ultra-High Material Utilization · Achieves several times higher efficiency than conventional spray methods, significantly reducing material costs. ✔ Nanoscale Film Thickness · Produces ultra-thin films (as low as tens of nanometers) with exceptional uniformity. ✔ No Gas-Assisted Atomization · Utilizes high-frequency ultrasonic vibration for atomization, eliminating high-pressure gas impact on substrates. ✔ Stepper Motor & Fully Enclosed Motion Module · XY dual-axis automation with programmable trajectories. · Fully enclosed linear screw modules enhance durability; repeat positioning accuracy: 0.01 mm. ✔ Reinforced Sealing Ring · High-temperature resistant, anti-oxidation, and long-lasting sealing performance. ✔ Reinforced Hinge Design · Ensures firm and stable door closure. ✔ Double-Layered Tempered Glass · Enhances sealing and vacuum performance. Standard Configurations · Viscosity & Solid Content: ≤30 cps; suspensions with ≤20% solid content. · Feeding System: Precision syringe pump + bio-grade injector (accuracy: 0.1 μL/min). · Dry Film Thickness: 20 nm–100 μm (solution- and substrate-dependent). · Input Voltage: 220 V ±10%, 50–60 Hz. · Solution Conversion Rate: ≥95% (multiple times higher than traditional two-fluid gas spray heads). · Atomized Droplet Size: Average 15–45 μm (varies with spray head frequency; higher frequency yields smaller droplets). · Spray Head Frequency: Configurable with 20–180 kHz systems. Optional Configurations · Ultrasonic Dispersion Feeding System: Continuously stirs nanoparticles during spraying, reducing sedimentation and improving film uniformity. · Heated Drying Platform: o Aerospace-grade perforated aluminum or precision microporous ceramic platform. o Precise temperature control up to 200°C (higher temps customizable). · Vacuum Adsorption Platform: Multi-channel vacuum generator with zoned control to prevent film substrate deformation. · Spray Head Alignment Device: Laser-guided for rapid material positioning.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Lab Compact Polymer Film Coater With Doctor Blade Coating Head

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Lab DC or RF Magnetron Ion Sputter Coater with Vacuum Pump And Chiller Using in Perovskite Solar Cell Lab Line

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Lab Automatic 300mm Tape Casting Coater Film Coating Machine

Automatic Film Coater with Dryer, Vacuum Chuck & Adjustable Film Applicator compact tape casting coater 1.coater width:10-200mm  2.with Dryer,Vacuum Pump 3.for lab equipment

Floor-Standing Ultrasonic Spray Coater Coating System For for OLED, Graphene & Semiconductor Film

Floor-Standing Ultrasonic Spray Coater Coating System For for OLED, Graphene & Semiconductor Film Specifications: · Overall Dimensions: 1500 × 1250 × 1900 mm · Maximum Coating Area: 500 × 500 mm · Motion System: 3-axis servo-driven mechanism · Control Method: High-precision motion control card / 15.6" HD touchscreen / Physical buttons · Ultrasonic Spray Head: Standard configuration includes 1 set of TMAX ultrasonic spray head (customizable for multi-head setups) · Application: Ideal for medium-scale production and large-area thin film fabrication Overview: The TMAX-FS04S Ultrasonic Precision Spray Coater is designed for medium-scale production and large-area thin film applications. Featuring a streamlined yet fully functional structure, the system incorporates an XYZ 3-axis servo motion system with optional R-axis rotary spray head mechanism. Paired with a comprehensive trajectory editing system, it enables precise 2D pattern coating (e.g., rectangles, circles, triangles, or custom curves). Compatible with all TMAX ultrasonic spray heads, the system includes a precision constant-flow syringe pump and digital display carrier gas system. Optional upgrades include ultrasonic dispersion feeding system and vacuum-adsorption heated substrate platform. Advantages: 1. 4× Material Utilization Achieves up to 4× higher material efficiency compared to conventional spray methods, significantly reducing material costs. 2. Nanoscale Film Thickness Capable of producing ultra-thin films as fine as tens of nanometers with exceptional uniformity. 3. Pressure-Free Atomization Utilizes high-frequency ultrasonic vibration for atomization without compressed air, eliminating substrate damage from high-pressure impact. 4. Premium Motion System XYZ axes feature imported servo motors and fully enclosed linear screw modules, ensuring 0.01mm repeat positioning accuracy and extended lifespan. 5. Ultrasonic Dispersion System Optional TMAX ultrasonic dispersion feeder effectively prevents particle sedimentation. Control System: Equipped with TMAX's proprietary control system specifically developed for ultrasonic spraying. The intuitive interface integrates: · Ultrasonic atomization/disperser control · Syringe pump regulation · Carrier gas flow management · Heating stage/vacuum plate operation Features include one-click template trajectory generation and G-code editing for complex patterns. Technical Parameters: · Suspension Requirements: Solid content ≤20-30% · Liquid Delivery System: Precision syringe pump + biomedical-grade injector (0.1 μL/min accuracy) · Dry Film Thickness: 20 nm – 100 μm (solution/substrate dependent) · Input Voltage: 220V±10%, 50-60Hz · Solution Conversion Rate: ≥95% (multiple times higher than conventional two-fluid nozzles) · Atomized Particle Size: 15-45μm average (frequency-dependent; higher frequencies yield smaller droplets) · Spray Head Frequency: Configurable 30-200 kHz systems Optional Configurations: 1. Ultrasonic Dispersion Feeding System Continuously disperses nanoparticles during spraying to minimize sedimentation and enhance film uniformity. 2. Heated Drying Platform Aerospace-grade perforated aluminum or precision microporous ceramic platform with precise temperature control up to 200°C. 3. Vacuum Adsorption Platform Multi-channel vacuum generator with zoning control for distortion-free substrate fixation. 4. Laser Alignment Device Precision spray head positioning system.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Versatile Magnetron Sputtering Coater For Conductive Metal Thin Film Layer Deposition

Versatile Magnetron Sputtering Coater For Conductive Metal Thin Film Layer Deposition   Model: TMAX-BY-JS06-Benchtop System for R&D and Educational Laboratories Overview The TMAX-BY-JS06 is a compact, cost-effective, high-vacuum magnetron sputtering system designed for pilot-scale experiments in research and educational laboratories. It integrates key components, including a sputtering vacuum chamber, permanent magnet targets (strong/weak magnetic fields), a fiber-optic rotary stage (customizable), DC power supply, gas supply system, pumping system, water cooling system, film thickness monitoring, vacuum measurement, electronic control system, and a sturdy mounting frame. Key Parameters Parameter Specification Sputtering Gas Adjustable (e.g., argon, nitrogen, etc., depending on experimental requirements). Target Material Standard: Gold target; Optional: Silver, copper, chromium, etc. Target Configuration 50mm (weak magnetic target) / 60mm (strong magnetic target). Sputtering Current 0–500mA Ultimate Vacuum ≤5×10−4 Pa Chamber Dimensions Diameter: 180mm; Height: 200mm Sample Stage Fiber-optic rotary stage (customizable). Operating Voltage 230V, 50Hz Applications & Features 1. Coating for Electron Beam-Sensitive Samples · Ideal for: Biological specimens, polymers, and other beam-sensitive materials. · Advantage: In SEM imaging, high-energy electron beams can cause thermal damage to delicate samples. A thin sputtered conductive coating (e.g., gold or carbon) acts as a protective layer, preserving sample integrity while enhancing imaging quality. 2. Non-Conductive Samples · Ideal for: Insulating materials (e.g., ceramics, glass, or organic compounds). · Advantage: Non-conductive samples accumulate surface charges ("charging effect") under electron beams, distorting SEM images. A sputtered conductive metal layer (e.g., gold or platinum) dissipates charges, eliminating artifacts and improving signal-to-noise ratio for clearer imaging. 3. Electrode Fabrication & Conductivity Studies · Ideal for: Novel materials requiring conductive electrodes for electrical property analysis. · Advantage: Enables precise deposition of thin conductive films for experimental electrode fabrication, facilitating studies on material conductivity.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Vacuum Thermal Evaporating Carbon Coating Coater for Materials Science

Vacuum Thermal Evaporating Carbon Coating Coater for Materials Science   Introduction Thermal Evaporation Carbon Coater (SD800C Model) is ideal and designed for lab SEM sample preparation. SD800C Model carbon coater applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM. Working vacuum pressure can be achieved quickly when using proper vacuum pump within 5 minutes. It is user friendly and easy to operate.      Vacuum pump is included. Parameter  Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h 2.6 L/s) Vacuum limit 2Pa Max evaporation current 100A Working pressure 6Pa -4 Pa Vacuuming tme < 5 Min( 2Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass  Evaporation target source Target material :carbon rope/target source:carbon rope Operation method Instruction Manua Weight/size 45kg/340mm length x 390mm wide x 300mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Warranty One year limited warranty with lifetime product support  

DC Vacuum Portable Auto Ion Sputtering Coater for Non-conductive SEM Sample Preparation

DC Vacuum Portable Auto Ion Sputtering Coater for Non-conductive SEM Sample Preparation Introduction   Compact Automatic Ion Sputtering Coater (SD800 Model) that is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate using Time Control. Vacuum pump is included.   Parameter  Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuuming time < 2 Min Chamber size Φ115*100mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 40kg/307mm length x 260mm wide x 260mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support    

Vacuum Pulsing Thermal Evaporating Sputtering Coating Coater with Vacuum Pump

Vacuum Pulsing Thermal Evaporating Sputtering Coating Coater with Vacuum Pump   Introduction Automatic Pulsing Thermal Evaporation Carbon Coater (SD980 Model) that is ideal and designed for lab SEM sample preparation. SD980 Model carbon coater is a fully-automated carbon coater that applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM. A pulsed mode for protecting samples is also included. Working vacuum pressure can be achieved quickly when using proper vacuum pump. It is user friendly and easy to operate by Controlling Touch Screen Heating Power (Current) and Pulsing Times (Recipe). Vacuum pump is included. Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2 Pa Max evaporation current 80A Working pressure 6 Pa - 4 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass Evaporation target source Target material :carbon rope/target source: carbon rope Operation method Instruction Manual Weight/size 45kg/390mm length x 310mm wide x 290mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Warranty One year limited warranty with lifetime product support

DC or RF High Vacuum Magnetron Ion Sputtering Coating Coater

DC or RF High Vacuum Magnetron Ion Sputtering Coating Coater   Introduction High Vacuum Magnetron Ion Sputtering Coater is ideal and designed for materials science and sample preparation. It is widely used for the majority of universities and scientific research institutes of materials science and engineering to coat, for metals, ceramics, semiconductors, insulators or other kinds of membrane material preparation. High Vacuum Magnetron Ion Sputtering Coater provides the most stable sputtering environment and achieves the basic experimental conditions of magnetron sputtering in a very short period of time. It provides DC / RF two kinds of sputtering power options which allow sputtering conductive or non-conductive substance on specimen and improves physical vapor deposition (PVD) Performance. It is also excellent for surface treatment and coating. It is easy to operate and user friendly as well. Vacuum pump and Chiller are included. Parameter Vacuum pump set (Oil required) rotary vacuum pump+(oil free) turbo moleculan pump set Rotary pumping speed 50 Hz : 16 m³/h (4.4 L/s)/ 60 Hz : 19.2 m³/h (5.2 L/s) Molecular pumping speed 300 L/s  Vacuum limit 5* 10-5 Pa Working pressure 0.5-5 Pa Vacuuming time >10 Min(10-3Pa) Vacuum measure Measuring range from atmosphere to 1*10-6 Pa Gas control Gas flow controller Chamber size φ260*200mm (height) metal Magnetron target source Target size φ 50*3mm(Cu)/target source: weak magnetic substance /materials Operation method Instruction Manual Weight/size 100kg/610mm length x 420mm wide x 490mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <3000W Cooling method Air cooling(pump)+ water cooling(sputtering target) Warranty One year limited warranty with lifetime product support