Lab automatic Battery Roll to Roll Electrode Coater Coating Machine

Automatic Roll to Roll Transfer Film Coating Machine with Drying Oven For Battery Electrodes TMAX-TCH-TB20A is a CE Certified  and UL ready automatic battery electrode coating system. It uses transfer coating technique for better coating uniformity and is perfect for research or building prototypes (e.g. pilot scale studies) of new generation rechargeable batteries. It is integrated with the functions/ features of metallic foil roll unwinding (reeling out), slurry feeder, coating blade, baking oven, and final electrode winding (reeling in) together with touch screen operation for customer's utmost convenience.

Lab Large Automatic Film Coater with Vacuum Chuck and Adjustable Doctor Blade

Large Automatic Film Coater with Vacuum Chuck and Adjustable Doctor Blade TMAX-TM is a CE Certified Large Automatic Film Coater with vacuum chuck designed to produce films with consistent thickness by using micrometer adjustable applicators or fixed thickness applicators. It has a unique driving system to produce the smooth coating on all types of materials. The flat vacuum chuck is built in to hold the substrate sheet in place, which is particularly useful when coating on the thin substrate and making uniform tape casting. One micrometer adjustable applicator is included for immediate use. This machine can be used for research on ceramic tape casting and Li-Ion battery electrode coating.

Digital Programmable Spin Coater with Overall Chamber Material of PTFE

II automatic film coater is a Large Automatic Film Coater designed to produce films with consistent thickness by using micrometer adjustable applicators or fixed thickness applicators. It has an unique driving system to produce smooth coating on all types of materials. One micrometer adjustable applicator is included for immediate use. 

Lab 200C Spin Coater Equipped with 2-4 Channels of Automatic Glue Dispensing And Developing Function

II automatic film coater is a Large Automatic Film Coater designed to produce films with consistent thickness by using micrometer adjustable applicators or fixed thickness applicators. It has an unique driving system to produce smooth coating on all types of materials. One micrometer adjustable applicator is included for immediate use. 

Lab Automatic 300mm Tape Casting Coater Film Coating Machine

Automatic Film Coater with Dryer, Vacuum Chuck & Adjustable Film Applicator compact tape casting coater 1.coater width:10-200mm  2.with Dryer,Vacuum Pump 3.for lab equipment

Lab Electrode Coater with Vacuum Chuck & 100-250mm Doctor Blade

Automatic Film Coater with Dryer, Vacuum Chuck & Adjustable Film Applicator compact tape casting coater 1.coater width:10-200mm  2.with Dryer,Vacuum Pump 3.for lab equipment

Lab Multi-parameter Automatic Programmable Control Single Station Dip Coater with 4.3-inch LCD Touch Screen

Nanometer Range Programmable Dip Coater with Drying Oven (1-500 nm/sec, 100°C Max. )

Lab Table Type Two Channels Injection Pump used with Spin Coater

II automatic film coater is a Large Automatic Film Coater designed to produce films with consistent thickness by using micrometer adjustable applicators or fixed thickness applicators. It has an unique driving system to produce smooth coating on all types of materials. One micrometer adjustable applicator is included for immediate use. 

Lab DC/RF Dual-Head Vacuum 2 Inch Magnetron Plasma Sputtering Coater Machine

DC/RF Dual-Head High Vacuum 2 Inch Magnetron Plasma Sputtering Coater

Small Carbon Film Deposition Coater for SEM &EDS Sample Preparation

Small Carbon Film Deposition Coater for SEM &EDS Sample Preparation    TMAX-JY-ZD01-SEM/EDS Sample Coating Overview: The TMAX-JY-ZD01 compact carbon coater is designed for applying conductive carbon films to SEM (Scanning Electron Microscope) EDS samples. With user-friendly operation and robust construction, it serves as an essential tool for SEM sample preparation. Key Features: · Durable Metal Bellows Connection: Vacuum pump tubing utilizes metal bellows for enhanced aesthetics and longevity. · High-Performance Vacuum System: Features a fast, low-noise rotary vane pump (8 m³/h), ideal for laboratory environments. · Stable Control System: Equipped with a reliable control board for consistent operation. · Ergonomic Design: Intuitive control panel layout, positioned on one side for ease of use. · Service-Friendly Structure: Simple yet robust design with ample space for maintenance. Technical Specifications: 1. Vacuum Chamber: Ø150 mm × 110 mm (H). 2. Sample Stage: Ø60 mm. 3. Evaporation Method: Carbon thread, 2-stage heating. 4. Vacuum System: Silent direct-drive rotary vane pump (8 m³/h). 5. Vacuum Monitoring: Customized Pirani gauge with analog display for precise measurement. 6. Automatic Venting/Evacuation. 7. Max Evaporation Current: ~100 A. 8. Evaporation Time: Adjustable (0–1 sec). 9. Dimensions: 400 × 450 × 300 mm (L × W × H). Applications & Advantages: This excels in SEM/EDS sample coating, offering rapid pumping, low noise, and precise carbon layer deposition. Its compact design and reliability make it suitable for research labs, material science, and quality control where consistent, artifact-free conductive coatings are critical. Focus on User Needs: Emphasis on ease of use, maintenance accessibility, and lab-friendly noise levels ensures seamless integration into daily workflows     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater

High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater     Model: TMAX-HZ-JS04- High-Vacuum Dual-Target Sputtering Coater Technical Parameters Category Specification Model TMAX-HZ-JS04 Vacuum System Oil-free diaphragm pump + molecular pump Ultimate Vacuum ≤1.0×10⁻⁴ Pa Pressure Measurement Full-range cold cathode gauge + front-end Pirani gauge Gas Control MFC (Mass Flow Controller) for Ar/O₂/N₂ Target Configuration Dual targets (independent control, alternate/synchronous sputtering) Target Compatibility Metals, alloys, compounds (custom sizes available) Optional Feature Real-time thickness monitoring (nanometer precision) Cooling System Energy-efficient target cooling Safety Protections Overpressure/overcurrent/overheat protection, vacuum interlock, emergency vent Key Features 1. Dual-Target Flexibility ·Enables multi-material deposition (e.g., bilayers, graded films, or interfaces) in a single run. 2. High-Vacuum Precision ·Ultra-low base pressure (≤1.0×10⁻⁴ Pa) minimizes contamination for high-purity films. 3. Intelligent Process Control ·MFC-regulated gas flow ensures repeatable reactive sputtering (e.g., oxides/nitrides). 4. User-Optimized Design ·Energy-saving pumps and cooling reduce operational costs without compromising performance. Typical Applications · Semiconductors: Electrode/metallization layers, barrier films. · Optics: Anti-reflective, conductive, or hard coatings. · Energy: Thin-film batteries, solar cell layers. · Research: Nanomaterials, heterostructures, surface engineering. Why Choose? · Lab to Production: Scalable for both R&D prototyping and industrial batch processing. · Safety & Reliability: Automated safeguards protect equipment and users. · Customizable: Adaptable to diverse materials and film architectures.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation

Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation     Model:  TMAX-HZ-JS02-Low-Temperature SEM Preparation Key Features & Applications The  TMAX-HZ-JS02 Magnetron Sputtering System integrates advanced vacuum technology with intelligent automation, delivering high uniformity, efficiency, and versatility for precision thin-film deposition. Its large-target design and planar magnetron cathode minimize plasma-induced thermal damage, making it ideal for temperature-sensitive samples (e.g., polymers, fibers, biological specimens) and high-resolution SEM preparation. Technical Parameters Category Specifications Dimensions 530 × 300 × 320 mm Input Voltage 100–250 VAC, 50/60 Hz Sputtering Voltage 300–600 V (DC) Target Material Ø50 × 0.1 mm (Au, Pt, Ag, Pd, etc.) Control Mode 5-inch touchscreen (ARM architecture, bilingual UI) Power Consumption 100 W Sputtering Current 10–50 mA (1 mA precision) Sputtering Time 0–600 s (1 s step) Working Vacuum 2–10 Pa (0.1 Pa resolution) Ultimate Vacuum <1 Pa Vacuum Measurement Full-range Pirani gauge Chamber Size Ø160 × 120 mm Sample Stage Ø80–100 mm (holds 12 standard stubs) Protections Overcurrent, vacuum safety System Components 1. Sputtering Source: Planar magnetron cathode for Au/Pt/Pd/Ag deposition. 2. Power Supply: Constant-current DC (300–600 V, ±1 mA precision). 3. Vacuum System: Rotary vane pump (<1 Pa), Pirani monitoring. 4. Automation: One-touch operation with parameter memory. 5. Data Display: Real-time curves for current, voltage, and vacuum status. Advantages · Nano-scale Coating: Particle size <5 nm, ideal for high-resolution SEM. · Low Thermal Impact: Magnetron technology reduces sample heating. · High Throughput: 12-sample capacity with auto-rotation for uniformity. · Plug-and-Play: No specialized training required. Ideal for: Material science, biology, and conductive/thermal enhancement of non-metallic samples. Operation Notes · Target Replacement: Tool-free design with shielded ring mechanism. · Maintenance: Oil-lubricated pump (included) with visual oil-level window. · Gas Connection: Supports Ar/N₂ or ambient air (6 mm OD tubing).       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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Dip Coater (1-200 mm/min) with 124 L Temperature Chamber and Touch Panel Controller for Large Substrate up to 16"x 9"

Dip Coater (1-200 mm/min) with 124 L Temperature Chamber and Touch Panel Controller for Large Substrate up to 16"x 9"

Customizable Extrusion Coater Slot Die Coating Machine

Customizable Extrusion Coater Slot Die Coating Machine The extrusion coating machine is a device that uses a narrow extrusion coating die to non-contact coating the substrate. This equipment can achieve two types of coating functions: continuous coating and stripe coating through the combination of slot die narrow extrusion coating die, precision metering feeding system, and feeding valve. The equipment has high coating accuracy, good consistency and stability, and is widely used in the lithium commercial battery, FCCL, optical film, high adhesive tape, and various functional film industries. Specification Control system  independently developed Coating width  200mm-1500mm Coating method  Slot die Coating thickness  0.005-5MM (uniformity ± 3%) Thickness adjustment  digital micrometer Heating channel  drying channel 2-20 meters (1 meter per section) (customizable) Heating control  thermocouple sensor Tension control  Adjustable tension Deviation correction device  fully automatic deviation correction for feeding/receiving Drying duct fan  adjustable speed Oven insulation  asbestos insulation layer Collecting and discharging diameter  Collecting and discharging material diameter 300mm (customizable) Rear lamination  finished lamination (steel pipe+rubber hose) Wind speed control  with wind filtering at the outlet of the drying tunnel (uniform wind speed) Coating speed  1-30 meters/minute (adjustable according to the drying condition of the adhesive) Drying passage roller  304 stainless steel Drying channel material  304 stainless steel (box) Heating method  stainless steel heating tube Oven temperature  room temperature -160 degrees (can be kept at a constant temperature) Drying track structure  tiled Waste heat recovery  with automatic waste heat collector Glue supply method  pressure bucket Expansion axis  3-inch gas expansion axis Drying channel lifting  cylinder lifting Exhaust system  centrifugal fan (external interface 100MM) Equipment power supply  380V Control AC24V Equipment power  12KW (peak)