Magnetron Sputter Depostion Coater Machine PVD System For SEM

Magnetron Sputter Depostion Coater Machine PVD System For SEM       Model:  TMAX-HZ-JS03- Au/Carbon Coating Magnetron Sputter Coater Product Overview The  TMAX-HZ-JS03 Dual-Target Magnetron Ion Sputtering Coater, independently developed with cutting-edge technology, sets a new benchmark for sample preparation instruments. It integrates dual-target co-sputtering and multi-layer single-sputtering capabilities, featuring a standard rotating/tilting module for multi-angle, uniform film coverage. This design eliminates charging effects, enhances sample contrast, and delivers high-resolution, true-to-life morphological characterization—ideal for advanced material science and biological research. Technical Specifications Category Parameter Specification Core Parameters Model TMAX-HZ-JS03   Vacuum Chamber (mm) 160 × 120   Sputtering Voltage 300–700 V   Sample Stage (mm) Adjustable 80–100 diameter   Sputtering Type Magnetron   Working Vacuum 2–10 Pa System Configuration Power Supply 100–250 VAC, 50/60 Hz   Target Size (mm) φ50 × 0.1   Control System 5" Touchscreen (ARM)   Max. Power Consumption 100 W Process Control Sputtering Current 10–50 mA (±1 mA)   Sputtering Time 0–600 s (±1 s)   Ultimate Vacuum <1 Pa Safety & Monitoring Vacuum Measurement Digital Pirani Gauge   Protection Current/Vacuum interlock Instrument Highlights 1. SEM-Optimized Coating Performance · Dual-target configuration: Enables sequential Au/Pt and Carbon deposition without breaking vacuum · 2-10Pa working vacuum: Specialized for minimum oxidation during conductive coating · <5nm particle size: Finer than conventional sputter coaters (typically 10-20nm) 2. Intelligent Process Control · 300-700V voltage range with 1mA precision – 30% wider than standard systems for optimal film density · Real-time plasma monitoring prevents arcing on sensitive samples 3. Ergonomic Design · 160mm large chamber: Accommodates tall SEM stubs (up to 25mm) and irregular specimens · Tool-free target change Target Applications ▸ Life Science: Coating for pollen, plant tissues, and hydrated biological samples ▸ Materials Research: Nanowires, polymer films, and porous materials ▸ Failure Analysis: PCB cross-sections and insulating components Operational Advantages · One-cycle coating: 12 samples/batch (50% more than competitors) · Zero thermal damage: Magnetron confinement keeps samples <40°C · Self-diagnostics: Automatic pump protection and target life counter     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Digital Programmable Spin Coater with Overall Chamber Material of PTFE

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Lab 200C Spin Coater Equipped with 2-4 Channels of Automatic Glue Dispensing And Developing Function

II automatic film coater is a Large Automatic Film Coater designed to produce films with consistent thickness by using micrometer adjustable applicators or fixed thickness applicators. It has an unique driving system to produce smooth coating on all types of materials. One micrometer adjustable applicator is included for immediate use. 

Compact Tape Casting Coater w/ Vacuum Chuck (8"Wx14"L), Film Applicator & Optional 100ºC Dryer Cover

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