Vacuum Magnetron Ion Sputtering Coater Optional Water Cooling Used to Coat Non-conductive Or Heat-sensitive SEM Samples

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Lab Vacuum Single Side Six-port Multi-station Glove Box Placeable 9999rpm Spin Coater Machine

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Lab Benchtop Vacuum Spin Coater Machine with Film Holder And Vacuum Pump

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Thermal Evaporation Evaporator Coating Coater System For Au, Ag, Al Film

Thermal Evaporation Evaporator Coating Coater System For Au, Ag, Al Film        TMAX-QH-ZD01-High-Vacuum Multi-Material Evaporation Product Overview The TMAX-QH-ZD01is a high-performance vacuum deposition system designed for precision thin-film coating applications in research and industrial laboratories. It features advanced vacuum technology, multi-source evaporation capabilities, and user-friendly controls, making it ideal for organic electronics, optoelectronics, and nanomaterials research. Technical Specifications No. Parameter Description Vacuum Chamber     1 Ultimate Vacuum Better than 4×10–5 Pa (new equipment) 2 Leak Rate 6.7×10–8 Pa·L/s 3 Working Vacuum 5×10–4 Pa (Time from atmosphere to working vacuum <30 min) (For N2-purged glovebox-integrated systems, cold state) 4 Vacuum Retention Pressure remains below 3 Pa after 24 hours post shutdown 5 Sample Size 300 × 300 mm 6 Sample Holder Size 360 × 360 mm 7 Evaporation Sources 4 organic + 4 metal sources 8 Compatible Materials C60, BCP, Cu, Ag, LiF, MoO3, Al, etc. 9 Evaporation Sources Configuration     - Metal Sources: 4 water-cooled electrodes (compatible with 5cc ceramic Ta crucibles for Cu/Al).     - Organic Sources: 4 standard Knudsen cells (10cc, max. 500°C).     Performance Metrics:     - Organic (NPB standard): Deposition rate 0.5–3 Å/s (±0.1 Å/s stability), uniformity ±5% (≤300×300 mm).     - Metal (Al standard): Deposition rate 0.5–3 Å/s (±0.1 Å/s stability), uniformity ±5% (≤300×300 mm).   10 Source-to-Substrate Distance 530 mm (metal sources include extendable electrode rods, default 100 mm). 11 Mask Library Not included (customizable upon request). 12 Thickness Probes 4 imported probes (1 probe monitors 2 sources). 13 Thickness Display Real-time touchscreen monitoring:  - Individual source rate/thickness/temperature (Knudsen cells).  - Total thickness/rate (large-font display). 14 Deposition Control Organic sources: Rate/temperature control. Metal sources: Rate control (manual/automated). 15 Software Process lock function for repeatability. 16 Closed Pumping Mechanical pump isolation feature to enhance productivity. Key Advantages 1. High Precision & Uniformity 1. Stable deposition rates (≤±0.1 Å/s variation) and excellent uniformity (±5%) ensure reproducible thin films for sensitive applications like OLEDs and solar cells. 2. Multi-Source Flexibility 1. Simultaneous evaporation of organic/metallic materials (8 total sources) enables complex multilayer structures without breaking vacuum. 3. Robust Vacuum Performance 1. Ultra-high vacuum (4×10–5 Pa) and low leak rate (6.7×10–8 Pa·L/s) guarantee contamination-free coatings. 4. User-Centric Design 1. Intuitive touchscreen interface, real-time monitoring, and glovebox compatibility streamline workflow for lab environments. Recommended Applications · Research: Organic semiconductors, perovskite solar cells, quantum dots. · Industry: Optical coatings, flexible electronics, barrier films. · Education: Thin-film deposition training, material science experiments.    html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film

PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film    TMAX-ZY-ZD02-Research-Grade Thin Film Deposition Equipment System Overview TMAX-ZY-ZD02 benchtop resistive thermal evaporation coating system integrates a turbo-molecular pump vacuum assembly to achieve high-vacuum thin film deposition. Equipped with 4 evaporation sources and a precision thickness control system, it is optimized for rapid multi-layer metal/alloy deposition. Featuring a plug-and-play design, this compact instrument operates reliably in office or lab environments without specialized infrastructure, making it ideal for R&D and small-batch production. Key Advantages 1. Portability & Flexibility ·Compact footprint with multi-environment adaptability (lab/office). 2. User-Centric Design ·One-touch operation with preloaded parameters (100+ metal deposition recipes). ·10" touchscreen for intuitive process control and real-time monitoring. 3. High-Performance Deposition ·4-source simultaneous evaporation (supports 99 layers of metals/alloys/polymers per run). ·Quartz crystal monitoring for nanometer-level thickness accuracy (±3% uniformity). 4.Premium Components ·All-aluminum chamber for efficient heat dissipation. ·Imported turbo-molecular pump (300L/s) ensures ≤6×10−5 Pa ultimate vacuum. 5.Low Maintenance ·Minimal training required; modular design simplifies servicing. Typical Applications · Thin-film material research (metals/dielectrics) · Optical coatings & nanoelectronics · Thin-film sensors & MEMS devices · Custom alloy/polymer multilayer structures Standard Specifications Component Details Chamber 400×350×360mm (H), CNC-machined aluminum Vacuum System 300L/s turbo pump + dual-stage rotary vane pump Vacuum Measurement Full-range gauge (atmosphere to UHV) Evaporation Sources 4 independent thermal sources (cross-contamination-free) Power Supply DC power for multi-layer deposition Thickness Control Quartz crystal monitor + manual/auto mode switching Software Network-upgradable with remote parameter adjustment Optional: · Co-evaporation kit for alloys · 2" substrate heater (400°C max) · Water-cooled rotating sample stage Technical Parameters · Ultimate Vacuum: ≤6×10−5 Pa (after bake-out) · Leak Rate: ≤5.0×10−9 Pa·L/s · Deposition Rate: ≥8 nm/min (varies by material) · Thickness Uniformity: ≤3% (with planetary rotation) Site Requirements Parameter Specification Dimensions 600×720×1200mm (H) Weight 85 kg Environment 23±3°C, <60% RH Power AC 230V, 32A, 50Hz Cooling Water 0.2MPa, 15–25°C, ≥8L/min (optional) Gas Supply 99.9% N2 (optional for venting) Operational Workflow · Fully automated process: Pre-programmed vacuum pumping, substrate heating, and evaporation. · Multi-layer capability: Sequential deposition of 4 materials (up to 99 layers) with customizable thickness/time modes. · Data export: Real-time parameter logging and remote monitoring. Why Choose? · Time-saving: Eliminates complex setup with industry-leading uptime. · Precision: Combines lab-grade vacuum performance with production-level repeatability. · Scalability: Modular options cater to evolving research needs. Ideal for academic labs, startups, and industrial R&D requiring rapid prototyping of advanced thin films.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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Double Chamber PVD Coater System For Thin Film Deposition Preparation

Double Chamber PVD Coater System For Thin Film Deposition Preparation        Model: TMAX-PC-JS12-With Ion Source Cleaning & Assisted Sputtering General Information Category Description Application Preparation of nanoscale monolayer/multilayer functional films (hard coatings, metallic/semiconductor/dielectric films). Suitable for research labs, universities, and small-batch production. Key Features • Anode-layer ion source (cleaning + assisted deposition)   • Reverse sputtering for adhesion enhancement  • Automated PC-controlled process System Structure Sputtering chamber, 3 magnetron targets, heating stage, DC/RF power supplies, gas/pumping systems, vacuum measurement, control unit. Technical Parameters Parameter Specification Chamber Design Vertical front-loading, stainless steel construction Base Vacuum ≤5×10－5 Pa (sputtering chamber) Pumping Speed Recovers to 5×10－4 Pa in 100 min (via bypass valve + turbopump) Leak Rate ≤5×10－7 Pa·L/s Pressure Rise Rate ≤10 Pa after 12 hours (power off) Pumping System Domestic turbomolecular pump + mechanical pump Targets 3 × 3-inch HV targets (2 standard, 1 strong magnetic field) Power Supplies • RF: 600 W, 13.56 MHz (auto-matching)   • DC: 2 × 1000 W Target-to-Sample Distance 40–120 mm (adjustable) Substrate Heating Max 450°C, programmable (rate/dwell time controllable) Film Thickness Uniformity ±5% (e.g., Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm over 2-inch area) Adhesion Strength Survives 3 tape-peeling tests (glass/Si/ceramic) Pre-Cleaning Reverse sputtering + anode-layer ion source Gas Control 2 MFCs (Ar + reactive gases), MKS-brand, mixing enabled Baking IR heating, max 150°C Safety Water/power failure interlocks, anti-misoperation protection Automation PC-controlled (target switching, substrate rotation, temperature) Performance Advantages & Suitability Feature Benefit Target Applications Ion Source + Sputtering Ensures clean surfaces and high adhesion Semiconductor films, optical coatings Multi-Mode Deposition Supports DC/RF, reactive sputtering, multilayers Research on novel functional materials Precise Automation Reduces human error, improves reproducibility Small-batch prototyping, academic labs Rapid Pumping Minimizes downtime between runs High-throughput R&D environments   Key Features & Suitability · High-Precision Deposition: Ensures uniform, high-adhesion films for research and prototyping. · Multi-Functional Cleaning: Combines ion source + reverse sputtering for optimal surface preparation. · Flexible Configuration: Supports DC/RF modes, multilayer films, and reactive sputtering. · User-Friendly Automation: PC-controlled workflow reduces manual errors. Ideal for: Advanced material research, semiconductor labs, and functional coating development requiring reproducible, high-quality thin films.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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RF Sputtering Coater System For Solar, OLED & Semiconductor

 RF Sputtering Coater System For Solar, OLED & Semiconductor   Model:  TMAX-PD-JS05-Wafer Sputtering Coater System Product Overview The TMAX-PD-JS05 magnetron sputtering system is equipped with multiple sputtering sources, capable of depositing metallic, semiconducting, and dielectric materials. It supports the fabrication of multilayer thin films and co-sputtered alloy films with high precision. Key Features · Compact & Integrated Design: Space-saving layout with refined aesthetics, optional sample-loading functionality. · High Uniformity Coating: Features 4× magnetron sputtering targets (2–4 inches), compatible with 2–8 inch wafers. Substrate holder ensures uniformity within ±3%–5% for 8-inch wafers. · Flexible Control Options: Siemens PLC + touchscreen (manual/automatic) or PC + PLC full-automatic control. Technical Specifications · System Dimensions (L×W×H): 1400 × 1300 × 1900 mm · Chamber Dimensions (L×W×H): 500 × 500 × 500 mm (PD-500C) / 600 × 600 × 500 mm (PD-600C) · Substrate Stage: Max heating temperature 500–800°C · Base Pressure: ≤5 × 10⁻⁵ Pa · Pumping & Holding: Achieves 8 × 10⁻⁴ Pa within ≤30 min; pressure rise ≤8 Pa over 12 hours. · Target Configuration: 4× sputter guns (2–3 inches or 2–4 inches), coating area 2–6 inches. Applications & Advantages Ideal for R&D and small-batch production, the PD-500C/600C excels in depositing high-quality, uniform thin films for optics, electronics, and functional coatings. Its modular control and excellent temperature/vacuum stability cater to advanced material research and industrial precision demands. TMAX-PD-JS05 vs. Conventional Model Feature   Conventional Systems Advantage Uniformity (8-inch wafer) ±3%–5% ±5%–10% or worse Higher film consistency for precision applications System Footprint Compact (1400×1300×1900 mm) 30–50% larger Saves lab/cleanroom space Substrate Heating 500–800°C Typically 300–600°C Supports high-temperature depositions (e.g., oxides, nitrides) Base Vacuum ≤5×10⁻⁵ Pa ~1×10⁻⁴ Pa Better for reactive sputtering, reduced contamination Pressure Stability ≤8 Pa over 12 hours Frequent drift (>10 Pa in hours) Longer process stability Control Options PLC + Touchscreen or PC + PLC Manual or basic PLC Flexible automation, better reproducibility Target Configuration 4× guns (2–4 inch) Often 2–3 guns (2–3 inch) Wider material selection, co-sputtering capability Coating Area 2–8 inch wafers Typically ≤6 inch Broader substrate compatibility Key Takeaways · Precision & Consistency: Superior uniformity (±3–5%) vs. conventional (±5–10%). · Compact & Efficient: 30% smaller footprint without sacrificing performance. · High-Temp & Vacuum Stability: Enables advanced materials (e.g., optical coatings, semiconductors). · Automation Ready: PC-controlled processes improve repeatability over manual systems. Ideal For: R&D labs, semiconductor fabs, and optical coating producers needing high-repeatability, multi-material deposition in a space-efficient design.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Lab Powder PVD Coater Machine with DC Magnetron Sputtering & Vibration Stage

Compact Powder PVD Coater with DC Magnetron Sputtering & Vibration Stage

5 Heads RF Plasma Magnetron Sputtering Coater Machine for MGI Thin Film Research

Customized 5 Heads RF Plasma Magnetron Sputtering Coater for MGI Thin Film Research

Combinatorial Plasma Sputtering Coater Machine with Three 2'' magnetron Sputtering Sources and RF/DC Power

Combinatorial Plasma Sputtering Coater with Three 2'' magnetron Sputtering Sources and RF/DC Power Supplies

Lab High Temperature Controlled Benchtop Vacuum Rotary Coater Machine with Adjustable Acceleration

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Lab High Speed Programmable Vacuum Spin Coater of 6000 rpm Speed

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Automatic Vertical Plate Gap Coater For Battery Production Electrode Making or Tape Casting Preparation.

TMAX-CF650 is a compact hydraulic crimper for sealing all types of cylinder cases in battery R&D labs. The compact body design allows it to be easily placed inside a glove box and thus preventing contamination of the electrolyte materials during cell assembly. Simple operation with safety protection feature allows customers to master the sealing procedure within 5 minutes. 

Lab Vertical Type Vacuum Spin Film Coater with Vacuum Chunk Optional 200 to 600mm Substrate

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com