Dip Coater (1-200 mm/min) with Drying Oven up to 100°C

Dip Coater (1-200 mm/min) with Drying Oven up to 200°C 

Customizable Meyer Rod Coating Machine Metering Rod Coater

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Programmable Hi-Speed Spin Coater (10K rpm & 5" max) with Vacuum Chucks (Optional Heating Cover)

Programmable Hi-Speed Spin Coater (10K rpm & 5" max) with Vacuum Chucks (Optional Heating Cover)

Lab PVD Ion Sputtering Coater For Metal and Carbon Layer

Lab PVD Ion Sputtering Coater For Metal and Carbon Layer        Model: TMAX-JY-JS01-SEM Preparation Overview The TMAX-JY-JS01 compact magnetron ion sputtering coater is designed for high-quality conductive coating (e.g., gold film) on SEM samples or material surfaces. Featuring stable performance and user-friendly operation, it employs cold magnetron sputtering technology, minimizing heat generation to protect sensitive samples. Key Features · Durable Metal Bellows – Corrosion-resistant and aesthetically refined vacuum pump tubing. · Precision Adjustment – Sensitive micro-valve control with clear scale markings. · High-Efficiency Vacuum Pump – Fast pumping speed (8 m³/h) with low noise, ideal for lab environments. · Reliable Circuitry – Stable control board for consistent operation. · Cold Sputtering – Near-zero temperature rise preserves sample integrity. Technical Specifications Parameter Specification Vacuum Chamber Ø150 mm × 110 mm (H) Sample Stage Ø60 mm Gold Target Size Ø50 mm Vacuum System Pumping speed: 8 m³/h Vacuum Monitoring Custom Pirani gauge + analog dial Exhaust Mode Automatic Sputtering Time 0–1000 sec (programmable) Process Gas Air or argon (dedicated inlet) Compatible Target Materials Au, Au/Pd, Pt, Pt/Pd, Cu, Ag, etc. Dimensions ~450 × 330 × 235 mm (L×W×H) Applications & Advantages · SEM Sample Prep: Uniform conductive coatings enhance imaging accuracy. · Material Science: Versatile metal deposition for thin-film research. · User-Centric Design: Fast target switching, low maintenance, and lab-friendly noise levels. Ideal for: Academic labs, quality control, and R&D requiring precision coating with minimal thermal impact.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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} img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Nano Vacuum Magnetron Ion Sputtering Coater For Thin Film Fabrication

Nano Vacuum Magnetron Ion Sputtering Coater For Thin Film Fabrication     Model:  TMAX-ZK-JS05- Compact Ion Sputtering Coater Overview The TMAX-ZK-JS05 Compact Ion Sputtering Coater is designed for depositing conductive gold films on samples for scanning electron microscopy (SEM). With user-friendly operation, it is an essential tool for sample preparation in small to medium-sized SEM laboratories. Key Applications · Gold ion sputtering for SEM sample coating. · Compatible with target materials: Au, Pt, Cr, Ag, Ti, Cu, Ni, Au-Pd alloy, etc. Technical Specifications Category Specification Chamber Material Glass Chamber Dimensions Ø100 mm (diameter) × 130 mm (height) Sample Stage (Small) Ø40 mm (holds 6 sample cups simultaneously) Sample Stage (Large, Optional) Ø60 mm Gold Target Size Ø58 mm Vacuum Pump Two-stage direct-drive rotary vane pump (1 L/s) Vacuum Measurement Pirani gauge Vacuum Protection 20 Pa with fine-adjustment gas inlet valve Working Gases Air / Argon (dedicated inlet with flow control) Features & Advantages · Robust Design – Special sealing structure minimizes glass chamber damage. · High Compatibility – Supports Au, Pt, Cr, Ag, Ti, Cu, Ni, and Au-Pd alloy targets. · Precision Control – Adjustable gas flow and vacuum protection ensure uniform coatings. · Efficient Workflow – Dual-stage platform allows batch processing (6 samples at once). Recommended Applications ✔ SEM Sample Prep – Ideal for non-conductive specimen coating. ✔ Materials Research – Thin-film deposition for nanotechnology studies. ✔ Industrial QC – Reliable performance for repeatable conductive layering.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Paper Wax Paraffin Coating Machine Single Side Waxen Coater

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Anti-Corrosion Spin Coater ( 8000 RPM & 6" wafer Max.) with Complete Accessories

Anti-Corrosion Spin Coater ( 8000 RPM & 6" wafer Max.) with Complete Accessories 

Lab Electrode Coater with Vacuum Chuck & 100-250mm Doctor Blade

Automatic Film Coater with Dryer, Vacuum Chuck & Adjustable Film Applicator compact tape casting coater 1.coater width:10-200mm  2.with Dryer,Vacuum Pump 3.for lab equipment

500C High Temperature Benchtop Ultrasonic Spray Coating System Coater Buy Manufacturer Supplier

500C High Temperature Benchtop Ultrasonic Spray Coating System Coater Buy Manufacturer Supplier     Technical Parameters · Overall Dimensions: 1100 × 850 × 1150 mm · Coating Area: 300 × 300 mm (Max: 400 × 400 mm) · Motion System: XYZ 3-axis programmable for arbitrary planar trajectories · Control Method: PLC-controlled with LCD touchscreen and physical buttons · Ultrasonic Nozzle: Standard with 1 set of TMAX ultrasonic nozzles (customizable multi-nozzle configurations) · Applications: Qualitative research in laboratories, small-batch production, and thin-film fabrication Overview The high-temperature ultrasonic precision spray coater features a high-accuracy heated platform with temperature control precision of ±0.1°C, supporting multi-stage temperature programming (up to 500°C). Post-power interruption, the system resumes either from the point of failure or restarts the program. Designed with a streamlined structure and comprehensive functionality, the equipment integrates: · XYZ 3-axis precision motion modules · Versatile trajectory editing system for 2D patterns (rectangles, circles, triangles, or curves) · Compatibility with all TMAX ultrasonic nozzles · Precision constant-flow syringe pump · Digital display gas delivery system · Optional upgrades: Ultrasonic dispersion feeding system, vacuum-adsorption heated substrate, etc. Advantages 1. Ultra-High Material Utilization o Achieves several times higher efficiency than conventional spray methods, significantly reducing material costs. 2. Nanoscale Film Thickness o Deposits films as thin as tens of nanometers with exceptional uniformity. 3. Pressure-Free Atomization o Utilizes ultrasonic vibration (no compressed air), eliminating substrate impact from high-pressure gas. 4. Imported Servo Motors & Fully Enclosed Motion Modules o XYZ axes employ imported servo motors and sealed linear screw modules, ensuring 0.01mm repeat positioning accuracy and extended lifespan. 5. Ultrasonic Nozzle System o TMAX offers dozens of nozzle variants for diverse operational requirements and film thicknesses. 6. Control System o Proprietary TMAX software for intuitive operation, integrating: § Ultrasonic atomization/dispersion § Syringe pump/gas flow/heating stage/vacuum chuck control § One-click preset trajectory templates & G-code editing for complex paths. 7. High-Precision Heated Platform o ±0.1°C temperature control, multi-stage programming, and heating up to 500°C. Configuration Category Specifications Standard Configuration   Viscosity & Solid Content ≤30cps viscosity; ≤20% solid content for suspensions Feeding System Precision syringe pump + bio-grade injector (0.1μL/min accuracy) Dry Film Thickness 20nm–100μm (solution/substrate-dependent) Input Voltage 220V±10%, 50–60Hz Solution Conversion Rate ≥95% (multiple times higher than traditional two-fluid nozzles) Atomized Particle Size Avg. 15–45μm (frequency-dependent; higher frequency = finer particles) Nozzle Frequency Compatible with 20–180kHz systems Optional Configurations   Ultrasonic Dispersion Feeding System Continuously disperses nanoparticles during spraying, minimizes sedimentation, and enhances film uniformity. Heated Drying Platform Stainless steel heating plate with precision control up to 500°C. Nozzle Alignment Device Laser-guided positioning for rapid substrate alignment. Custom Options Tailored configurations available upon request.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; 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DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets

DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets     Model: TMAX-PC-JS03-Rotatable Triple-targets  Technical Specifications Category Parameter Value/Description Chamber Structure Design Vertical front-loading, stainless steel   Sample Access Easy loading/unloading Vacuum Performance Base Pressure ≤5×10−5 Pa   Leak Rate ≤5×10−7 Pa·L/s   Pressure Rise Rate (12h) ≤10 Pa   Pumping System Domestic molecular pump + mechanical pump Targets & Power Supplies Target Quantity & Size 3 × 2-inch magnetron targets (HV compatible)   Target Types 1 × Standard magnetic field, 1 × Strong magnetic field   Target-Substrate Distance (Multilayer) 40–120 mm   Target-Substrate Distance (Ion Source) 80–120 mm   RF Power Supply 1 × 1000 W, 13.56 MHz (auto-matching)   DC Power Supply 2 × 1000 W Substrate Holder Capacity Up to 3 substrates   Rotation Speed 5–30 RPM (self-rotation + planetary)   Heating Range Programmable up to 450°C   Bias Voltage Supports up to 1000 V Gas Control System Gas Lines 2 independent MKS mass flow controllers (Ar + reactive gas)   Features Gas mixing, adjustable/measurable chamber pressure Additional Features Chamber Baking Infrared heating (150°C)   Liner Plate Prevents chamber contamination   Safety Protections Water/power failure interlock, anti-misoperation protection Key Features & Applications 1. Advanced Deposition Capabilities · Supports DC/RF sputtering for metals, semiconductors, and insulators. · Triple-target design enables sequential multilayer deposition without vacuum breaks. 2. Precision Process Control · Programmable substrate heating (±450°C) with adjustable ramp rates. · Rotation mechanism (5–30 RPM) ensures uniform film thickness. 3. Research & Small-Batch Flexibility · Ideal for nanoscale functional films (e.g., optoelectronics, tribological coatings). · Reverse sputtering cleaning enhances film adhesion and purity. 4. User-Centric Design · Manual controls for target shutters, rotation, and temperature. · Safety systems mitigate operational risks (e.g., interlock protections). Users · Academic & Government Labs: Thin-film material R&D. · Industrial Prototyping: Small-scale production of specialized coatings.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Economic Hi-speed 150W Desktop Rotary Coater with Acceleration Adjustable Optional Pipette Gun

Anti-Corrosion Spin Coater ( 8000 RPM & 6" wafer Max.) with Complete Accessories 

2 inch RF Plasma Magnetron Sputtering Coater Machine for Non-Conductive Thin Films

2 inch  RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin Films

Lab DC Magnetron Sputtering Coater Machine With Target for Noble Metal Coating

Compact DC Magnetron Sputtering Coater With Gold Target for Noble Metal Coating

Lab DC Magnetron Sputtering Coater Machine with Rotary Stage & Water Chiller

High Power DC Magnetron Sputtering Coater w Rotary Stage & Water Chiller

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm   Introduction Ion Sputtering Coater (SD900 Model)  is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly within 2 minutes when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate. Vacuum pump is included.   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 0-20mA Working pressure 30Pa -7 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 45kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support