Lab Manual Spin Coater Equipped with Countdown Display Function

Nanometer Range Programmable Dip Coater with Drying Oven (1-500 nm/sec, 100°C Max. )

200C Desktop Dip Coater for Precision Coating

Nanometer Range Programmable Dip Coater with Drying Oven (1-500 nm/sec, 100°C Max. )

Lab Automatic Film Coater Machine with Heating Function Suitable for Lithium Battery,PET And Aluminum Foil

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Beeswax Wrapper Coating Machine Cotton Fabric Coater

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Lab Automatic Spin Coater with Super Wide Speed Range

Nanometer Range Programmable Dip Coater with Drying Oven (1-500 nm/sec, 100°C Max. )

Lab 4 Inches Manual Type Vacuum Spin Coater Used with Perovskite Solar Cell Fabrication Machine

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Desktop Six-station Rotation Dip Coater for Precision Coating

Nanometer Range Programmable Dip Coater with Drying Oven (1-500 nm/sec, 100°C Max. )

Dual-Source Vacuum Deposition Coating System Evaporation Coater

Dual-Source Vacuum Deposition Coating System Evaporation Coater      TMAX-BY-ZD04-Dual-Source Vacuum Deposition Technical Specifications Parameter Specification Model TMAX-BY-ZD04 Coating Method Multi-source metal evaporation Vacuum Chamber Glass bell jar + stainless steel base Chamber Dimensions Φ300mm × H360mm Substrate Heating Room temperature ~ 250°C Substrate Size Φ100mm Film Uniformity ≤ ±5.0% (within Φ80mm area) Evaporation Sources 2 independent metal sources Control System PLC + touchscreen interface Footprint L1100mm × W800mm (main unit) Power Requirement ≥ 5kW Key Features & Competitive Analysis 1. Compact & High Cost-Performance · Compared to larger industrial systems, the ZHD300 offers a space-saving integrated design, making it ideal for labs with limited space. · Lower operational costs due to efficient power usage and minimal maintenance needs. 2. Dual-Source Deposition Flexibility · Many basic models offer only single-source evaporation, limiting material options. The ZHD300’s dual-source configuration enables: o Co-evaporation: Producing alloy or doped films (e.g., metal-oxide composites). o Sequential evaporation: Depositing multilayer structures (e.g., electrode/interlayer/active layers for solar cells). · Superior to thermal evaporation-only systems, as it supports both organic and inorganic materials. 3. Precision & Reproducibility · ±5% thickness uniformity outperforms many entry-level systems (typically ±8–10%), ensuring research-grade consistency. · PLC-controlled deposition reduces human error vs. manual systems. 4. Glove-Box Compatibility · Unlike conventional stand-alone coaters, the ZHD300 can be integrated with glove-box workflows, critical for: o Air-sensitive materials (e.g., perovskites, OLED emitters). o In-line encapsulation, reducing contamination risks. Target Applications vs. Alternatives Application  Advantage Alternatives R&D on Solar Cells Dual-source for graded/stacked layers Single-source systems lack compositional control OLED/Thin-Film Research Organic-Inorganic compatibility Dedicated organic evaporators (higher cost) Pilot Production Trials High uniformity meets pre-production standards Industrial systems (over-sized for labs) Conclusion: Ideal for Innovators The TMAX-BY-ZD04 bridges the gap between basic lab tools and industrial coaters, offering: ✔ Research versatility – Thin-film exploration with multi-material capability. ✔ Process reliability – Repeatable results for scalable R&D. ✔ Future-ready design – Glove-box integration for next-gen optoelectronics. Engineered for advanced materials science, where precision meets adaptability.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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} img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Mini Auto Ion Sputtering Coater Machine For Carbon, Ti, Au, Al

Mini Auto Ion Sputtering Coater Machine For Carbon, Ti, Au, Al      TMAX-BY-JS13-Glovebox-Compatible SEM Sample Coater for Conductive Coatings 1. Key Features & Design Highlights Ultra-Compact Design · Chamber volume reduced by 67% (φ115×100 mm) vs. conventional systems · 0.02 m³ footprint (307×260×260 mm) and 40 kg weight for easy benchtop placement Rapid Process Ready · Achieves working vacuum in <2 minutes (vs. industry-standard 5–10 mins) · Oil-lubricated rotary pump with dual-frequency support (50/60Hz) Precision Sputtering · φ50×0.1 mm ultra-thin targets (Au/Ag/Pt) for microscale coating · Scratch-resistant quartz viewport for real-time monitoring  Energy Efficient · <1500W power consumption (30% lower than comparable systems) · Air-cooled operation eliminates water chiller requirements 2. Complete Technical Specifications Core Parameters Parameter Specification Vacuum Pump Oil-required rotary pump Pumping Speed 50Hz: 8 m³/h (2.2 L/s) • 60Hz: 9.6 m³/h (2.6 L/s) Base Pressure Achievable in <2 mins Target Materials Au (std.), Ag, Pt (φ50×0.1 mm) Max Substrate Size Ø50 mm Power Supply 110V/60Hz or 220V/50Hz auto-switching Cooling Method Passive air cooling Warranty 1-year limited + lifetime support Mechanical Details · Chamber Material: Stainless steel with quartz viewport · Control Interface: Timer-based automation (manual override) · Safety: Overcurrent protection, grounding detection 3. Recommended Applications ✔ SEM Sample Preparation · Conductive coatings for non-metallic samples (e.g., polymers, biological tissues) · Charge dissipation layers for high-resolution imaging ✔ Material Science Research · Micro/nano-scale metal film deposition · Prototype coating for flexible electronics ✔ Field & Educational Use · Portable solution for shared lab spaces · Low-maintenance operation (no water cooling) 4. Comparison vs. Conventional Systems Aspect SD-800 Traditional Coaters Footprint 0.02 m³ ≥0.05 m³ Setup Time <5 mins 15–30 mins Target Thickness 0.1 mm 0.3–1 mm Cooling Air-cooled Water-chilled       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Magnetron Sputter Depostion Coater Machine PVD System For SEM

Magnetron Sputter Depostion Coater Machine PVD System For SEM       Model:  TMAX-HZ-JS03- Au/Carbon Coating Magnetron Sputter Coater Product Overview The  TMAX-HZ-JS03 Dual-Target Magnetron Ion Sputtering Coater, independently developed with cutting-edge technology, sets a new benchmark for sample preparation instruments. It integrates dual-target co-sputtering and multi-layer single-sputtering capabilities, featuring a standard rotating/tilting module for multi-angle, uniform film coverage. This design eliminates charging effects, enhances sample contrast, and delivers high-resolution, true-to-life morphological characterization—ideal for advanced material science and biological research. Technical Specifications Category Parameter Specification Core Parameters Model TMAX-HZ-JS03   Vacuum Chamber (mm) 160 × 120   Sputtering Voltage 300–700 V   Sample Stage (mm) Adjustable 80–100 diameter   Sputtering Type Magnetron   Working Vacuum 2–10 Pa System Configuration Power Supply 100–250 VAC, 50/60 Hz   Target Size (mm) φ50 × 0.1   Control System 5" Touchscreen (ARM)   Max. Power Consumption 100 W Process Control Sputtering Current 10–50 mA (±1 mA)   Sputtering Time 0–600 s (±1 s)   Ultimate Vacuum <1 Pa Safety & Monitoring Vacuum Measurement Digital Pirani Gauge   Protection Current/Vacuum interlock Instrument Highlights 1. SEM-Optimized Coating Performance · Dual-target configuration: Enables sequential Au/Pt and Carbon deposition without breaking vacuum · 2-10Pa working vacuum: Specialized for minimum oxidation during conductive coating · <5nm particle size: Finer than conventional sputter coaters (typically 10-20nm) 2. Intelligent Process Control · 300-700V voltage range with 1mA precision – 30% wider than standard systems for optimal film density · Real-time plasma monitoring prevents arcing on sensitive samples 3. Ergonomic Design · 160mm large chamber: Accommodates tall SEM stubs (up to 25mm) and irregular specimens · Tool-free target change Target Applications ▸ Life Science: Coating for pollen, plant tissues, and hydrated biological samples ▸ Materials Research: Nanowires, polymer films, and porous materials ▸ Failure Analysis: PCB cross-sections and insulating components Operational Advantages · One-cycle coating: 12 samples/batch (50% more than competitors) · Zero thermal damage: Magnetron confinement keeps samples <40°C · Self-diagnostics: Automatic pump protection and target life counter     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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