Nanometer Range Programmable Dip Coater with Drying Oven (1-500 nm/sec, 100°C Max. )

Nanometer Range Programmable Dip Coater with Drying Oven (1-500 nm/sec, 100°C Max. )

5-Position Programmable Dip Coater with Speed 1-200 mm/min & Heating Chamber 100°C max.

5-Position Programmable Dip Coater with Speed 1-200 mm/min & Heating Chamber 100°C max.

Desktop Dip Coater with variable Speed (1-200 mm/min)

Desktop Dip Coater with variable Speed (1-200 mm/min)

Lab Compact Wire Bar Coater Coating Machine with 300mm Width

Lab Compact Film Vacuum Coating Machine with 300mm Width Doctor Blade

Graphene Coating Machine Graphene Heat Conduction Film Coater with Return Oven

Graphene Coating Machine Graphene Heat Conduction Film Coater with Return Oven It is applicable to the precise coating production of high thermal conductivity graphene heat conduction film and graphene heat conduction film in the fields of smart phones, tablet computers, smart VR, planetary circuits, electrothermal painting, floor heating film, etc. The coating machine has better price and higher production efficiency   Specification Control system Independent research and development system Uniform coating ＜5% Coating width Effective coating width100-380mm Coating thickness 0.005-3MM（wet film） Coating typoe Doctor blade Tension control Automatic tension adjustment (according to the membrane tension required to adjust) Oven length 10meters(Back to type) Dryingoven temp Normal temperature ~120 degrees (can be segmented constant temperature) Heating method Electrical heating Oven wind force Adjustable Deviation correcting device Automatic rectifying of winding Exhaust air system Suction is adjustable Production speed 1-20 m/min Equipment air pressure 6 KG/cm2 Power supply 380V 50Hz Equipment power 10KW Dimension 2700*1300*1800mm    

Lab High Temperature Desktop Slot Die Coater Machine of Adjustable Coating Width Used in Perovskite Films

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Touch Screen Programmable (1-200 mm/min) Dip Coater with Drying Oven up to 100°C

Touch Screen Programmable (1-200 mm/min) Dip Coater with Drying Oven up to 100°C 

Programmable Vacuum Chuck Spin Coater (500-6000 rpm, 8" wafer Max) with Optional Heating Cover

Programmable Vacuum Chuck Spin Coater (500-6000 rpm, 8" wafer Max) with Optional Heating Cover

Multi-station Tool Dip Coating Machine Coater For Multi-Layer Depostion

Large size 5-position programmable dip coater w/ 225L Dry Oven

Compact Spin Coater ( Max. 8000 rpm, 4" wafer Max.) with 3 Sets of Vacuum Chucks & Complete Accessories

Compact Spin Coater ( Max. 8000 rpm, 4" wafer Max.) with 3 Sets of Vacuum Chucks & Complete Accessories

Compact Small Lab Roll To Roll Hot-Melt Adhesive Coater

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Micron Range Programmable Dip Coater (1-500 um/sec) with Drying Oven upto 100°C

Micron Range Programmable Dip Coater (1-500 um/sec) with Drying Oven upto 100°C

Lab High-end Single Station Dip Coater Suitable for Dipping And Pull Film Preparation

Micron Range Programmable Dip Coater (1-500 um/sec) with Drying Oven upto 100°C

Economic Desktop Spin Coater (Max. 8000 rpm) with Complete Accessories

 Economic Desktop Spin Coater (Max. 8000 rpm) with Complete Accessories.

RF+DC Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics

RF+DC  Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics     Model: TMAX-BY-JS12| – Product Specifications Technical Specifications Parameter Specification Vacuum Pump System Rotary Vane Pump (Oil-lubricated) + Oil-Free Turbo Molecular Pump Set Rotary Pump Speed 50Hz: 16m³/h (4.4 L/s) | 60Hz: 19.2m³/h (5.2 L/s) Molecular Pump Speed 300 L/s Ultimate Vacuum 5 × 10⁻⁴ Pa Working Pressure 0.5 – 5 Pa Pump-Down Time >10 min (to 10 Pa) Vacuum Measurement Range: Atmosphere to 10⁻⁴ Pa Gas Control Mass Flow Controller (MFC) Chamber Size φ260mm × 200mm (Metal Chamber) Magnetron Target Source Target Size: φ50mm × 3mm (Copper)  Compatible with Weakly Magnetic Materials Operation Method Manual Control (Instruction Manual Provided) Weight / Dimensions 100kg / 610mm (L) × 420mm (W) × 490mm (H) Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption <3000W Cooling System Air Cooling (Pump) + Water Cooling (Sputtering Target) Warranty 1-Year Limited Warranty with Lifetime Technical Support Key Features & Applications Core Advantages 1. Multi-Mode Sputtering Supports RF (Radio Frequency), DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings. 2. High Vacuum Stability Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films. 3. Flexible Compatibility ·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples. ·φ50mm target supports copper and weakly magnetic materials for diverse applications. 4. Efficient Cooling System ·Water-cooled target minimizes thermal load during high-power sputtering. · Air-cooled pump reduces maintenance costs for continuous operation. Typical Applications ·Research Fields Thin film deposition, nanostructured coatings, semiconductor device development. ·Industrial Uses Optical coatings, wear-resistant layers, surface modification of electronic components.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }