RF Magnetron Sputtering System for Metals & Non-Metals Film Deposition

RF Magnetron Sputtering System for Metals & Non-Metals Film Deposition     Model: TMAX-SD-01-Metals & Non-Metals: Insulators, Semiconductors, Carbon-Based Thin Film Deposition Product Specifications Parameter Specification Model TMAX-SD-01 Type RF Magnetron Sputtering System Chamber Size 150 × 120 mm Target Material 50 mm diameter (metals & non-metals, thickness: 1–2 mm) RF Power Adjustable (1–500 W) RF Frequency 13.56 MHz Matching Network Automatic impedance matcher Sputtering Area 50 mm Ultimate Vacuum 5 Pa (base pressure) Process Gases Argon, nitrogen, and other inert gases (flow rate adjustable) Max. Deposition Rate 8 nm/min Key Features & Applications 1. Versatile RF Sputtering for Metals & Non-Metals · RF Power & Auto-Matching: 13.56 MHz RF with automatic impedance matching ensures stable sputtering of both conductive and insulating materials (e.g., oxides, ceramics). · Broad Applications: Ideal for advanced thin-film research in semiconductors, optics, and functional coatings. 2. Precise Gas Control & High Vacuum Performance · Adjustable Inert Gas Flow: Supports Ar, N₂, and other inert gases for controlled deposition environments. · High Purity Deposition: Base vacuum of 5 Pa minimizes contamination, ensuring high-quality film growth. 3. User-Friendly & Efficient Operation · Quick Target Change: Compatible with 50 mm targets (1–2 mm thick) for flexible material testing. · Preset Process Recipes: Saves and recalls parameters for repeatable experiments and production. 4. Stable & High-Speed Deposition · Max Deposition Rate: 8 nm/min with excellent film uniformity. · Automated Matching: Reduces manual tuning and enhances process stability. Recommended Applications ✔ Research & Development: Thin-film studies for semiconductors, dielectrics, and optical coatings. ✔ Small-Scale Production: Prototyping and specialized coating applications. ✔ Multi-Material Sputtering: Supports both metallic and non-metallic targets for diverse material systems.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

PVD Magnetron Sputtering System For Thin Film Deposition In Research, Semiconductor Prototyping and Optical Coating

PVD Magnetron Sputtering System For Thin Film Deposition In Research, Semiconductor Prototyping and Optical Coating   Model: Lith-SD-JS02-Sputtering System for Research Labs, Semiconductor Prototyping, and Optical Coating Product Overview The Plasma Magnetron Sputtering System (Model: TMAX-SD-JS02) is a compact, user-friendly instrument designed for high-quality thin film deposition. With a quartz chamber (150 × 120 mm) and a maximum sputtering rate of 8 nm/min, it is ideal for research and small-scale production requiring precise, uniform coatings. Compatible with inert gases (Ar, N₂) and versatile metal targets (Au, Ag, Pt, etc.), this system combines efficiency with advanced operational features. Technical Specifications Parameter Specification Quartz Chamber Size 150 × 120 mm Sample Stage Size 70 mm (diameter) Sputtering Area 50 mm (diameter) Max. Vacuum Degree 5 Pa Process Gases Argon, Nitrogen (flow rate adjustable) Max. Sputtering Rate 8 nm/min Power Consumption 200 W Dimensions (W×D×H) 360 × 310 × 150 mm Operating Temperature 0–40°C Relative Humidity < 85% Installation Horizontal desktop placement Key Features & Advantages 1. Intuitive Control & Monitoring 4.3" color touchscreen with graphical interface for real-time display of sputtering current, voltage, and vacuum levels. 2. Flexible Gas & Target Options Adjustable inert gas flow (Ar/N₂) and support for 50 mm diameter metal targets (1–2 mm thickness), enabling quick material swaps and process reproducibility. 3. Modular & User-Centric Design ·Split-type quartz chamber for easy maintenance. ·Height-adjustable sample stage (±20 mm) with rotational alignment. ·Auto-venting post-sputtering simplifies sample handling. 4. Compact & Reliable ·Space-saving footprint with multi-layered software protections for extended durability. 5. Uniform Film Quality ·Dense, homogeneous coatings compatible with noble and transition metals (Au, Ag, Pt, etc.). Target Applications · Research Labs: Thin film studies, surface engineering, and material science. · Semiconductor Prototyping: Deposition of conductive/metallic layers. · Optics & Electronics: Functional coatings for sensors or display components. Note: Optimized for small substrates (≤50 mm) and low-to-medium throughput requirements.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Versatile Magnetron Sputtering Coater For Conductive Metal Thin Film Layer Deposition

Versatile Magnetron Sputtering Coater For Conductive Metal Thin Film Layer Deposition   Model: TMAX-BY-JS06-Benchtop System for R&D and Educational Laboratories Overview The TMAX-BY-JS06 is a compact, cost-effective, high-vacuum magnetron sputtering system designed for pilot-scale experiments in research and educational laboratories. It integrates key components, including a sputtering vacuum chamber, permanent magnet targets (strong/weak magnetic fields), a fiber-optic rotary stage (customizable), DC power supply, gas supply system, pumping system, water cooling system, film thickness monitoring, vacuum measurement, electronic control system, and a sturdy mounting frame. Key Parameters Parameter Specification Sputtering Gas Adjustable (e.g., argon, nitrogen, etc., depending on experimental requirements). Target Material Standard: Gold target; Optional: Silver, copper, chromium, etc. Target Configuration 50mm (weak magnetic target) / 60mm (strong magnetic target). Sputtering Current 0–500mA Ultimate Vacuum ≤5×10−4 Pa Chamber Dimensions Diameter: 180mm; Height: 200mm Sample Stage Fiber-optic rotary stage (customizable). Operating Voltage 230V, 50Hz Applications & Features 1. Coating for Electron Beam-Sensitive Samples · Ideal for: Biological specimens, polymers, and other beam-sensitive materials. · Advantage: In SEM imaging, high-energy electron beams can cause thermal damage to delicate samples. A thin sputtered conductive coating (e.g., gold or carbon) acts as a protective layer, preserving sample integrity while enhancing imaging quality. 2. Non-Conductive Samples · Ideal for: Insulating materials (e.g., ceramics, glass, or organic compounds). · Advantage: Non-conductive samples accumulate surface charges ("charging effect") under electron beams, distorting SEM images. A sputtered conductive metal layer (e.g., gold or platinum) dissipates charges, eliminating artifacts and improving signal-to-noise ratio for clearer imaging. 3. Electrode Fabrication & Conductivity Studies · Ideal for: Novel materials requiring conductive electrodes for electrical property analysis. · Advantage: Enables precise deposition of thin conductive films for experimental electrode fabrication, facilitating studies on material conductivity.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; 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Magnetron Sputtering Deposition System For Functional Film Of SEM, Battery, Biological

Magnetron Sputtering Deposition System For Functional Film Of SEM, Battery, Biological       Model: TMAX-ZK-JS03-Coater for Delicate & Oxidation-Sensitive Samples Of SEM, Battery, Biological Product Highlights · User-friendly LCD touchscreen for simplified operation · Fully automated vacuum process for sample preparation · Automatic gas release for safe handling · Wide sputtering current range (5–45mA) for flexible applications · High sputtering efficiency for fast, uniform coating · Ultra-fine particle size (6–10nm) for superior film quality · No sample surface heating—ideal for temperature-sensitive materials Applications Designed for integration into gloveboxes, this sputtering coater is ideal for oxidizable, contamination-sensitive samples, including: · SEM sample preparation · Electrode material research · Battery separators, filtration membranes · Biological specimens & delicate substrates Technical Specifications Core Parameters Parameter Specification Sputtering Current 5–45mA (adjustable) Operating Mode Fully automatic magnetron sputtering Sputtering Voltage 600V (fixed) Target Materials Gold or Platinum (standard, select one); optional: Ag, Ti, Cr, Al, Cu, Pb Vacuum Level <1Pa Vacuum Pump Oil-sealed rotary vane pump (1L/s); optional dry scroll pump Additional Features · Chamber Dimensions: Ø128×130mm · Sample Holders: 1×Ø90mm, 4×Ø25mm, 6×Ø15mm cups · Power Supply: 220V/50Hz (110V customizable) · Max Power Consumption: 450W · Particle Size: 6–10nm · Working Gas: Air or argon · Protection Mechanisms: Overcurrent cutoff (>50mA), vacuum interlock (>100Pa) Key Advantages · Uniform, fine-grained coatings with excellent adhesion · Zero thermal damage—perfect for heat-sensitive substrates (e.g., polymers, biomaterials) · Compact glovebox-compatible design for inert-atmosphere processing Why Choose? This system combines high-performance sputtering with glovebox compatibility, ensuring contamination-free deposition for advanced materials research. Its cold sputtering capability and sub-10nm particle size make it a top choice for critical applications in energy storage, life sciences, and nanotechnology.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating

Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating     Model: TMAX-PC-JS01- Versatile Magnetron Sputtering System For Functional Film Deposition Coating Application: Designed for the preparation of nanoscale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, and dielectric films. It is widely suitable for scientific research and small-batch production in universities and research institutes. Equipped with an anode-layer ion source for pre-cleaning and assisted deposition, as well as a reverse sputtering function to enhance film quality and adhesion. System Configuration: The system consists of a sputtering vacuum chamber, permanent magnet sputtering targets (3 targets), a single-substrate heating stage, DC/RF power supplies, gas supply system, pumping system, vacuum measurement, electrical control system, and mounting platform. Technical Specifications Parameter Specification Chamber Structure Vertical, top-loading; stainless steel & vacuum-compatible materials Base Pressure (Sputtering Chamber) ≤5×10⁻⁶ Pa Leak Rate ≤5×10⁻⁷ Pa·L/s Pressure Rise Rate ≤1 Pa (after 12 hours of pump shutdown) Pumping System Domestic molecular pump + mechanical pump Magnetron Targets 3 × 3-inch HV-compatible (2 standard field, 1 strong field) Power Supplies RF: 600 W, 13.56 MHz (auto-matching); DC: 2 × 1000 W Target-Substrate Distance 40–120 mm (adjustable) Substrate Heating Max 450°C, programmable control Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm Uniformity (2-inch area) ≤5% deviation Adhesion Test Withstands 3 tape-peeling tests (glass/si/ceramic) Pre-Cleaning Reverse sputtering capability Ion Source Anode-layer for cleaning & assisted deposition Gas Control 2 MKS mass flow controllers (reactive/Ar); gas mixing Baking Temperature 150°C (infrared heating) Safety Features Water/power failure interlock; anti-misoperation Key Features & Suitability 1. Precision Deposition ·Supports DC/RF sputtering for diverse materials (metals, semiconductors, dielectrics). ·Ion-assisted deposition enhances film density and adhesion. 2. High Vacuum Stability ·Ultra-low base pressure (≤5×10⁻⁶ Pa) ensures contamination-free films. ·Low leak rate maintains consistent process conditions. 3. User-Centric Design ·Vertical loading simplifies sample handling. ·Programmable substrate heating (up to 450°C) for optimized film growth. 4. Quality Assurance ·≤5% thickness uniformity and rigorous adhesion standards (tape test). ·Reverse sputtering and ion source for pre-deposition cleaning. 5. Research & Small-Batch Production ·Ideal for universities, labs, and industrial R&D in optics, electronics, and coatings.         html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Glovebox Magnetron Sputtering System For Metal Film Deposition

Glovebox Magnetron Sputtering System For Metal Film Deposition     Model: TMAX-PD-JS02-PVD Magnetron Sputtering System Product Overview The TMAX-PD-JS02 High-Vacuum Magnetron Sputtering System is a specialized R&D equipment designed for cutting-edge applications in perovskite solar cells, OLEDs, lithium batteries, quantum dot LEDs, OPVs, and other advanced industries. It enables the deposition of nanoscale oxide, nitride, and metallic thin films. The system integrates seamlessly with glovebox environments, ensuring anhydrous/oxygen-free conditions for the entire process—from spin-coating and sputtering to testing—via a hardware-coupled PVD and glovebox system. Key Features 1. Low-Pressure Sputtering Technology (Optional) 1. Delivers dense thin films with minimal substrate damage. 2. High-Precision Chamber Design 1. SUS304 stainless steel sputtering chamber with mirror-polished interior (including shielding plates) for ultra-clean conditions and optimal vacuum performance. 3. Flexible Control Options 1. Manual/Auto Control: Siemens PLC + touchscreen interface. 2. Fully Automated: PC + PLC integration. Technical Specifications Parameter Details Overall Dimensions (L×W×H) 1100 × 800 × 1900 mm Chamber Dimensions (L×W×H) 440 × 440 × 450 mm Substrate Stage Max. temperature: 500°C (±1°C accuracy) Ultimate Vacuum 2 × 10−5 Pa Pumping Speed & Hold ≤8 × 10−4 Pa in 20 min; ≤5 Pa over 12 hours Deposition Uniformity ±3% to ±5% across the tray Target Options Rectangular: 210×210 mm / 300×300 mm; Circular targets available Applications & Advantages Ideal For: · Research & Prototyping: Tailored for sensitive materials requiring inert environments (e.g., perovskites, OLED layers). · Multi-Process Integration: Combines sputtering, spin-coating, and testing in a single glovebox workflow, minimizing contamination risks. · High-Quality Films: Superior uniformity and low-defect deposition critical for optoelectronic and energy storage devices. Why Choose This System? · Glovebox Compatibility: Unique airtight integration for oxygen/moisture-sensitive processes. · Versatile Configurations: Supports diverse target geometries and automation levels. · Industry-Grade Precision: Tight temperature control (±1°C) and high vacuum stability ensure reproducible results.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; 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Lab Multi-target Magnetron Sputtering System For Compound Film Deposition

Lab Multi-target Magnetron Sputtering System For Compound Film Deposition    Model: TMAX-PD-JS04-Adjustable Multi-Target System for Metal, Oxide, and Semiconductor Product Overview The TMAX-PD-JS04 is a compact magnetron sputtering system designed for laboratory applications, including the deposition of metallic, oxide, dielectric, and semiconductor thin films, as well as the preparation of electrode materials for SEM sample coating. It is also suitable for educational purposes and pre-production process testing. With user-friendly operation, multifunctional capabilities, and high scalability, this system is ideal for academic research and industrial R&D. Key Features ✔ Adjustable Co-Focal Sputtering Structure: The target gun height and angle are adjustable for optimized deposition. ✔ Stable Gas Distribution: Process gases are introduced near the target surface, ensuring uniform reaction gas concentration throughout the vacuum chamber. ✔ Flexible Control Options: Supports both manual operation (Siemens PLC + touchscreen) and fully automatic control (computer + PLC). ✔ Precise Heating & Bias Control: The substrate stage supports heating up to 500°C (accuracy: ±3°C at 200°C, ±1.5°C at 500°C) and bias voltage up to -800V. ✔ High Uniformity: Film uniformity within ±3%~±5% over a 3-inch area. Technical Specifications Parameter Value Chamber Dimensions (L×W×H mm) 300 × 300 × 380 System Dimensions (L×W×H mm) 600 × 900 × 1900 Base Pressure ≤5×10⁻⁵ Pa Pumping & Holding Capability ≤8×10⁻⁴ Pa (30 min) / ≤8 Pa (12 hrs) Target Guns 2 guns (2-inch or 3-inch optional) Sputtering Coverage 2–4 inches Advantages & Applications ✔ Advantages · Co-focal sputtering design for precise film control. · High uniformity (±3%~±5%) ensures consistent coating quality. · Multi-functional for diverse thin-film research needs. ✔ Applications · Academic Research: Thin-film studies, electrode fabrication, and SEM sample preparation. · Advanced Materials: R&D in energy-related organic materials and novel processes. This system excels in low-temperature, high-precision, and controllable thin-film deposition, making it a versatile tool for scientific and industrial innovation.           html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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4-Target Multilayer Film Metal PVD Sputtering Deposition System

4-Target Multilayer Film Metal PVD Sputtering Deposition System     Model: TMAX-PC-JS05-Target Multi-Mode Sputtering (DC + RF + Strong Magnetic Field) Technical Parameters Category Specification Chamber Structure Horizontal design, electric lift-off top cover, stainless steel/vacuum materials Base Vacuum ≤5×10⁻⁵ Pa Working Vacuum ≤5×10⁻⁴ Pa (achieved in 100 min after pump-down) Leak Rate ≤5×10⁻⁷ Pa·L/s Pressure Rise Rate ≤10 Pa (after 12 h shutdown) Pumping System Domestic molecular pump + mechanical pump Target Configuration 4 × 6-inch targets (3 standard-field, 1 strong-field); DC/RF, max 5,000 W Target-Substrate Distance 40–120 mm (adjustable) Substrate Heating Max 400°C, programmable rate/dwell time Film Thickness Uniformity ≤5% (2-inch area; Cu/Al: 4–5 µm; Ni/PTFE: 1–2 µm) Adhesion Standard Passes 3× tape peel tests (glass/Si/ceramic substrates) Pre-Cleaning Reverse sputtering capability Ion Source Anode-layer ion source (cleaning + assisted deposition) Gas Control 2 MKS mass flow controllers (reactive/Ar gases), mixing/pressure adjustment Baking Temperature 150°C (infrared heating) Safety Protections Water/power failure interlock, anti-misoperation design Automation PC-controlled (target switching, rotation, temperature, shutters) Key Features & Suitability Analysis 1. Precision Deposition for Advanced Films · Nanoscale control: Achieves ≤5% thickness uniformity for functional films (e.g., semiconductors, hard coatings). · Multi-material flexibility: Simultaneously supports metals (Cu/Al), dielectrics (PTFE), and compounds via 4 targets. 2. Enhanced Process Stability · Ion-assisted deposition improves film adhesion and density. · Pre-sputtering cleaning ensures contamination-free substrates. 3. User-Friendly Operation · Automated PC control simplifies complex processes (e.g., multilayer deposition). · Horizontal chamber design enables quick sample loading. 4. Industrial & Research Versatility · R&D labs: Ideal for prototyping optical, electronic, or wear-resistant coatings. · Small-batch production: Reliable for precision coatings in aerospace or semiconductor sectors. 5. Safety & Maintenance · Liner plates protect chamber walls, reducing maintenance downtime. · Interlocks prevent damage from operational errors. Summary: This excels in high-repeatability, multi-material deposition, and automation, catering to both cutting-edge research and specialized industrial coating needs. Why Choose? 1. 4-Target Multi-Mode Sputtering (DC + RF + Strong Magnetic Field) · Unique Feature: Only system in its class offering 3 standard-field targets + 1 strong-field target in a compact design. · Competitor Comparison: Most systems provide only DC or RF targets separately, limiting material compatibility. · Client Benefit: Enables simultaneous deposition of metals, insulators, and alloys (e.g., Cu+Al₂O₃+Ni) without breaking vacuum. 2. Ultra-High Vacuum with Rapid Recovery (<100 min to 5×10⁻⁴ Pa) · Unique Feature: Patented bypass pumping + dry nitrogen venting reduces pump-down time by 40% vs. industry average. · Competitor Comparison: Comparable systems often require 3+ hours to reach working vacuum after venting. · Client Benefit: Dramatically improves throughput for batch processing (e.g., 8–10 runs/day vs. 4–5 with competitors). 3. Integrated Ion-Assisted Deposition (IAD) for Superior Film Quality · Unique Feature: Built-in anode-layer ion source for in-situ cleaning + energy-enhanced deposition. · Competitor Comparison: Most systems require external ion guns (added cost/complexity). · Client Benefit: Achieves >2x better adhesion (passes 10+ tape tests vs. industry-standard 3) and denser films for optical/barrier coatings.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); 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Double Chamber PVD Coater System For Thin Film Deposition Preparation

Double Chamber PVD Coater System For Thin Film Deposition Preparation        Model: TMAX-PC-JS12-With Ion Source Cleaning & Assisted Sputtering General Information Category Description Application Preparation of nanoscale monolayer/multilayer functional films (hard coatings, metallic/semiconductor/dielectric films). Suitable for research labs, universities, and small-batch production. Key Features • Anode-layer ion source (cleaning + assisted deposition)   • Reverse sputtering for adhesion enhancement  • Automated PC-controlled process System Structure Sputtering chamber, 3 magnetron targets, heating stage, DC/RF power supplies, gas/pumping systems, vacuum measurement, control unit. Technical Parameters Parameter Specification Chamber Design Vertical front-loading, stainless steel construction Base Vacuum ≤5×10－5 Pa (sputtering chamber) Pumping Speed Recovers to 5×10－4 Pa in 100 min (via bypass valve + turbopump) Leak Rate ≤5×10－7 Pa·L/s Pressure Rise Rate ≤10 Pa after 12 hours (power off) Pumping System Domestic turbomolecular pump + mechanical pump Targets 3 × 3-inch HV targets (2 standard, 1 strong magnetic field) Power Supplies • RF: 600 W, 13.56 MHz (auto-matching)   • DC: 2 × 1000 W Target-to-Sample Distance 40–120 mm (adjustable) Substrate Heating Max 450°C, programmable (rate/dwell time controllable) Film Thickness Uniformity ±5% (e.g., Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm over 2-inch area) Adhesion Strength Survives 3 tape-peeling tests (glass/Si/ceramic) Pre-Cleaning Reverse sputtering + anode-layer ion source Gas Control 2 MFCs (Ar + reactive gases), MKS-brand, mixing enabled Baking IR heating, max 150°C Safety Water/power failure interlocks, anti-misoperation protection Automation PC-controlled (target switching, substrate rotation, temperature) Performance Advantages & Suitability Feature Benefit Target Applications Ion Source + Sputtering Ensures clean surfaces and high adhesion Semiconductor films, optical coatings Multi-Mode Deposition Supports DC/RF, reactive sputtering, multilayers Research on novel functional materials Precise Automation Reduces human error, improves reproducibility Small-batch prototyping, academic labs Rapid Pumping Minimizes downtime between runs High-throughput R&D environments   Key Features & Suitability · High-Precision Deposition: Ensures uniform, high-adhesion films for research and prototyping. · Multi-Functional Cleaning: Combines ion source + reverse sputtering for optimal surface preparation. · Flexible Configuration: Supports DC/RF modes, multilayer films, and reactive sputtering. · User-Friendly Automation: PC-controlled workflow reduces manual errors. Ideal for: Advanced material research, semiconductor labs, and functional coating development requiring reproducible, high-quality thin films.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film

Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film        TMAX-ZY-ZD01-Multi-Layer Deposition for Metals, Alloys & Dielectric Thin Films Product Overview The TMAX-ZY-ZD01 is a desktop thermal evaporation system designed for high-precision thin-film deposition in research and small-scale production. Featuring a turbomolecular pump vacuum system and multi-source evaporation capabilities, it enables efficient deposition of metals, alloys, and dielectric films with minimal operator training. Key Features & Advantages 1. Wide Application Range · Materials Research: Metal films, dielectric layers, polymer coatings. · Functional Devices: Thin-film sensors, optical coatings, nanoelectronics. · Multi-Layer Deposition: Supports up to 99 layers in a single run. 2. User-Friendly Operation · Plug-and-play design—no specialized lab environment required. · 10-inch touchscreen for intuitive control and process monitoring. · Preloaded 100+ deposition recipes for quick setup. 3. High Precision & Stability · Quartz crystal monitoring ensures real-time thickness control (≤3% uniformity). · Turbo-molecular pump (300L/s) achieves ≤6×10⁻⁵ Pa ultimate vacuum. · 3 independent evaporation sources prevent material cross-contamination. 4. Flexible Configuration · Optional: Co-evaporation for alloys, 400°C substrate heating, and cooled rotating stage. · Automatic & manual modes for customized process control. 5. Low Maintenance & Compact Design · Aluminum chamber for efficient heat dissipation. · 65 kg weight, suitable for benchtop use in labs or offices. Technical Specifications Parameter Specification Chamber Ø300 × 350(h) mm (quartz glass) Vacuum System 300L/s turbomolecular pump + dual-stage rotary pump Ultimate Vacuum ≤6 × 10⁻⁵ Pa (after baking) Leak Rate ≤5.0 × 10⁻⁹ Pa·L/s Deposition Rate ≥10 nm/min (material-dependent) Film Uniformity ≤3% (with rotation) Evaporation Sources 3 independent thermal sources Max Layers per Run 99 layers (up to 4 materials) Control Interface 10" touchscreen with programmable recipes Power Supply AC 230V, 32A, 50Hz Cooling Water (Optional) 0.2 MPa, 15–25°C, ≥8 L/min Operational Workflow 1. Automated Deposition: Pre-programmed vacuum pumping, heating, and evaporation. 2. Multi-Layer Control: Supports time-based or thickness-based deposition modes. 3. Remote Monitoring: Adjust parameters via network connection. Why Choose? ✔ Combines research-grade performance with desktop convenience. ✔ Minimal training required—ideal for multi-user environments. ✔ Scalable for both experimental and small production needs.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Small Carbon Film Deposition Coater for SEM &EDS Sample Preparation

Small Carbon Film Deposition Coater for SEM &EDS Sample Preparation    TMAX-JY-ZD01-SEM/EDS Sample Coating Overview: The TMAX-JY-ZD01 compact carbon coater is designed for applying conductive carbon films to SEM (Scanning Electron Microscope) EDS samples. With user-friendly operation and robust construction, it serves as an essential tool for SEM sample preparation. Key Features: · Durable Metal Bellows Connection: Vacuum pump tubing utilizes metal bellows for enhanced aesthetics and longevity. · High-Performance Vacuum System: Features a fast, low-noise rotary vane pump (8 m³/h), ideal for laboratory environments. · Stable Control System: Equipped with a reliable control board for consistent operation. · Ergonomic Design: Intuitive control panel layout, positioned on one side for ease of use. · Service-Friendly Structure: Simple yet robust design with ample space for maintenance. Technical Specifications: 1. Vacuum Chamber: Ø150 mm × 110 mm (H). 2. Sample Stage: Ø60 mm. 3. Evaporation Method: Carbon thread, 2-stage heating. 4. Vacuum System: Silent direct-drive rotary vane pump (8 m³/h). 5. Vacuum Monitoring: Customized Pirani gauge with analog display for precise measurement. 6. Automatic Venting/Evacuation. 7. Max Evaporation Current: ~100 A. 8. Evaporation Time: Adjustable (0–1 sec). 9. Dimensions: 400 × 450 × 300 mm (L × W × H). Applications & Advantages: This excels in SEM/EDS sample coating, offering rapid pumping, low noise, and precise carbon layer deposition. Its compact design and reliability make it suitable for research labs, material science, and quality control where consistent, artifact-free conductive coatings are critical. Focus on User Needs: Emphasis on ease of use, maintenance accessibility, and lab-friendly noise levels ensures seamless integration into daily workflows     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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PVD Thin Film Deposition Coating Machine System For Metals And Organics

PVD Thin Film Deposition Coating Machine System For Metals And Organics        TMAX-PD-ZD01-High-Vacuum Evaporation Coating System Product Overview This system is a compact, multi-source high-vacuum evaporation coating platform designed for laboratory use, capable of depositing thin films of metals, organics, and other functional materials. It is ideal for: · Research labs (metal electrode fabrication, SEM sample preparation). · Advanced materials development (organic thin films). · Process optimization (high-precision coatings for novel material synthesis). Key Advantages vs. Competing Systems Feature This System Typical Competing Systems Vacuum Speed 15–20 min to high vacuum (≤5×10⁻⁵ Pa) Often 30+ min for similar vacuum levels. Film Uniformity ±3%–5% thickness deviation Typically ±5%–10% in entry-level models. Chamber Material 304 stainless steel (high corrosion resistance) Some use aluminum or lower-grade steel. Modularity Supports 1–3 evaporation sources (expandable) Fixed configurations common in low-end systems. Footprint Compact (500×360×420mm for desktop model) Larger benchtop units often >600×500mm. Technical Specifications Parameter Specification Vacuum Chamber 304 stainless steel, cylindrical (Φ260×H350 mm) Internal Coating Area ~Φ260×H310 mm Ultimate Vacuum ≤5×10⁻⁵ Pa Pumping Speed ≤8×10⁻⁴ Pa in 30 min, holds ≤5 Pa for 12 hours Substrate Stage - Max size: 80×80 mm (standard) / 120 mm diameter (rotary)  - Rotation: 0–20 RPM (magnetic fluid sealed) Film Uniformity <5% (120 mm diameter area) Evaporation Sources 2–3 sources (metal/organic compatible, co-evaporation or switching) Power Supply 2 kW, constant current/power modes Electrical AC 220 V / 50 Hz, 3.5 kW Dimensions (L×W×H) - Main unit: 600×500×900 mm  - Desktop model: 500×360×420 mm Why This System Stands Out? 1. Speed & Efficiency o Achieves high vacuum 50% faster than comparable models, reducing idle time. 2. Precision Engineering o Stainless steel chamber + optimized gas paths ensure minimal contamination and long-term stability. 3. Flexible Configurations o Modular design allows easy upgrades (e.g., adding a third evaporation source). 4. Space-Saving o 30% smaller footprint than conventional systems, critical for crowded labs. Ideal For: ✔ Universities studying thin-film physics. ✔ R&D centers developing flexible electronics or OLEDs. ✔ Industrial labs requiring high-repeatability coatings. Order Note: Minimum 1 unit. 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Film Deposition Equipment For Metal And Perovskite Films In  Solar, OLED & Semiconductor Applications

Film Deposition Equipment For Metal And Perovskite Films In  Solar, OLED & Semiconductor Applications     TMAX-PD-ZD02-Multi-Material Coater for Au, Ag, Al, Perovskite Films Product Overview The TMAX-PD-ZD02 High-Vacuum Evaporation Coating System is designed for depositing high-quality metal, organic, and functional thin films, with broad applications in academic research (materials science, physics, chemistry, electronics, energy) and industrial R&D (OPV perovskite solar cells, semiconductors, OLED displays). It supports 4–6 evaporation sources (compatible with wire and boat configurations) and features a versatile design for both metal and organic material deposition (organic evaporation uses tungsten baskets/crucibles). Key Features 1. Precision & Stability ·Advanced evaporation power supply with constant current/power control, ensuring high process repeatability (±3%–5% uniformity). ·Programmable automation: One-touch start/stop and pre-set current/power parameters. 2. User-Friendly Operation ·PLC + touchscreen interface for intuitive control and high automation. ·Front-loading chamber (304 stainless steel, Ø260×H310 mm) with observation window for easy sample handling and maintenance. 3. Flexible Substrate & Source Options ·Adjustable substrate stage: Heated (0–300°C, ±1°C) or water-cooled, with rotational capability (0–30 RPM) and vertical adjustment (280–380 mm source-to-substrate distance). ·Multi-source compatibility: 4–6 sources for co-evaporation or sequential deposition, with anti-cross-contamination partitions. 4. High-Vacuum Performance ·Vacuum level: ≤5×10−5 Pa (base pressure);  ·leak rate ≤5×10−8 Pa·m3s. ·Fast pumping: Achieves 5×10−4 Pa in <30 min (1200 L/s molecular pump + rotary vane pump). 5. Versatile Applications ·Deposits metals (Au, Ag, Al, Cu, etc.), compounds (MoO3, LiF), and organic materials. 6. Ideal for multilayer films, electrodes, and SEM sample preparation. Technical Specifications Parameter Detail Chamber Dimensions 350×350×450 mm (L×W×H) System Footprint 750×1100×1900 mm Max. Substrate Size 120×120 mm Evaporation Sources 4–6 groups (metal/organic) Film Uniformity ±3%–±5% Pumping System Molecular pump + 6 L/s rotary pump Optional Accessories INFICON SQC310 thickness monitor, precision etching mask Why Choose this? · Compact & Safe: Closed-frame design (0.7 m² footprint) with wheels for mobility. · High Throughput: Processes up to 25 ITO/FTO glass slides (15–25 mm) per batch. · Research-Grade: Supports OPV, OLED, and semiconductor R&D with industry-leading repeatability. Ideal for: Universities, labs, and industries focused on advanced thin-film technologies.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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Perovskite Vacuum Multilayer Organic Thin Film Evaporation Deposition System

Perovskite Vacuum Multilayer Organic Thin Film Evaporation Deposition System    TMAX-QH-DZ01-Electron Beam Evaporation Coating System 1. Core Parameters No. Parameter Specification 1 Ultimate Vacuum ≤6×10−5 Pa (after baking, new equipment) 2 Leak Rate ≤6.7×10−8 Pa·L/S 3 Working Vacuum 7×10−4 Pa (reached in <40 min) 4 System Pressure Holding ≤10 Pa after 12 hours (post shutdown) 5 Sample Size 100×100 mm 6 Sample Holder Size 126×126 mm (includes 2 sets) 7 Evaporation Distance 330±20 mm 8 Sample Stage 0–30 RPM rotation; Heating: 300°C (±1°C) 9 Electron Gun 6 kW, 270° deflection, 4-pocket water-cooled crucible 10 Resistive Evaporation Dual-position switching 11 Thickness Probes 2 sets (quartz crystal) 12 Chamber Access Manual front-opening design 13 Control Mode Power-regulated deposition 14 Film Uniformity ≤±3% (9-point test on 10×10 cm2) 15 Pumping System Automated vacuum control 2. Key Advantages ·Ultra-High Vacuum Performance o Achieves ≤6×10−5 Pa after baking, ideal for contamination-sensitive applications. o Low leak rate (6.7×10−8 Pa·L/S) ensures long-term stability. ·Precision Deposition Control o ±1°C heating accuracy (sample stage) minimizes thermal stress on films. o ±3% thickness uniformity across 9 test points for reproducible coatings. ·Efficiency & Automation o <40 min pump-down time (ambient to working vacuum) reduces idle periods. o Automated pumping/control lowers operator dependency and human error ·Versatile Evaporation Options o 6 kW e-gun handles refractory materials (e.g., oxides, carbides). o Dual-position resistive evaporation for sequential metal/alloy deposition. ·User-Friendly Design o Front-opening chamber simplifies sample loading/cleaning. o 2 thickness probes enable real-time monitoring and correction. 3. Recommended Applications · Optics & Photonics o Anti-reflection coatings, laser mirrors, optical filters. · Semiconductor & Electronics o Thin-film transistors, conductive layers, MEMS devices. · R&D & Academia o Material science studies, nanostructured films, solar cell research. · Industrial Coatings o Wear-resistant layers, decorative films, barrier coatings. 4. Customization Options (Optional) · Larger sample holders (up to 200×200 mm). · Additional probes or substrate heating configurations. · Integration with in-situ monitoring tools (e.g., ellipsometry)   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Solar Cell Thin Film Evaporation Evaporator For Metals, Alloys & Dielectric Deposition

Solar Cell Thin Film Evaporation Evaporator For Metals, Alloys & Dielectric Deposition        TMAX-PC-DZ03-Electron Beam Evaporation Coating System Key Applications Designed for the deposition of conductive films, semiconductor films, ferroelectric films, and optical coatings, this system is widely utilized in university laboratories, research institutions, and small-scale production environments requiring high-precision thin-film fabrication. System Components · Deposition Chamber: U-shaped design with front-loading door, dimensions: 800 × 600 × 600 mm. · E-Gun Electron Beam Source: o Anode voltage: 8 kV / 10 kV (1 set included). o Power range: 0–10 kW (adjustable). · Crucible: Water-cooled, 6-pocket design (11 mL per pocket). · Resistive Evaporation Source (Optional): o Voltage: 5 V / 10 V. o Power: 300 A current, max. 3 kW output (1 set). o Configurable with 3 water-cooled electrodes to form 2 evaporation boats. · Substrate Holder: o Accommodates up to 4″ substrates. o Rotational speed: 5–60 RPM (continuously adjustable). o Substrate-to-source distance: 300–350 mm. o Heating range: up to 800°C ±1°C (manual control). o Includes a manual sample shutter assembly. · Gas Delivery System: 1-channel mass flow controller (MFC). · Vacuum System: o Base pressure: ≤6.7 × 10–4 Pa. o Pump-down time: ≤20 min (from 1 × 10–1 Pa to 5 × 10–4 Pa). o Leak rate: ≤6.7 × 10–7 Pa·L/s. · Thickness Monitoring: Quartz crystal microbalance (QCM) with display range: 0–99,999 Å. Technical Advantages 1. Precision Control: Adjustable e-beam power and substrate rotation ensure uniform film thickness and composition. 2. Versatility: Compatible with multiple evaporation sources (e-beam + resistive), enabling deposition of diverse materials. 3. High-Temperature Stability: Substrate heating up to 800°C (±1°C) supports annealing and epitaxial growth. 4. Efficient Vacuum Performance: Rapid pump-down and low leak rate enhance process reproducibility. 5. User-Friendly Design: Front-loading chamber and modular components simplify maintenance and sample handling. Target Industries & Research Fields · Advanced Materials: Optoelectronics, MEMS, superconducting films. · Energy Applications: Thin-film solar cells, battery electrodes. · Academic Research: Surface science, nanotechnology, and condensed matter physics.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; 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