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Lab Ion Sputtering & Evaporation PVD Coater Machine for SEM for Glove Box
Lab Ion Sputtering & Evaporation PVD Coater Machine for SEM for Glove Box TMAX-BY-JS03- Ion Sputtering & Evaporation Coater for SEM Specification Integrated with sputtering and thermal evaporation functions, this compact and user-friendly instrument is designed for high-quality thin-film deposition, particularly for SEM sample preparation. It supports multiple metal targets for sputtering and carbon fiber evaporation, offering precise control over coating parameters. Technical Specifications Parameter Value Dimensions 305 mm × 400 mm × 390 mm (W×D×H) Vacuum Chamber Material Borosilicate glass, 160 mm × 110 mm (D×H) Target (Upper Electrode) 50 mm × 0.1 mm (D×H) Sputtering Targets Au (standard), optional Ag, Pt, etc. Target Size φ50 mm Sample Stage Compatible with 50 mm/70 mm diameter; customizable Sputtering Voltage 0–1600 V (DC), adjustable Sputtering Current 0–50 mA Sputtering Timer 0–360 s Carbon Evaporation Current 0–100 A (AC) Evaporation Material Carbon fiber Evaporation Voltage 0–30 V Evaporation Time 0–1 s Gas Inlet Valve Compatible with φ3 mm tubing Process Gases Multiple options Power Supply 220 V (110 V optional), 50 Hz Vacuum Pump 2L rotary vane pump (VRD-8, domestic) Key Features 1. Dual-Function Design ·Combines ion sputtering (Au, Pt, Ag, Cu, etc.) and thermal evaporation (carbon fiber) for versatile applications. ·Ideal for high-resolution microscopy (SEM, TEM, EBSD) requiring ultra-fine carbon films (<1 nm). 2. Precision Control ·Adjustable sputtering current, vacuum pressure, and gas selection to optimize coating rate and particle size. ·Digital timer for reproducible processes. 3. Enhanced Sample Protection ·Conductive coatings eliminate charging effects in non-conductive samples. ·Carbon films protect beam-sensitive materials (e.g., biological/plastic samples) from electron beam damage. 4. Efficiency & Reliability ·Compact footprint with automated vacuum protection to prevent short circuits. ·Uniform film deposition with short processing time. Applications · Electron Beam-Sensitive Samples (e.g., polymers, biological tissues): Coating mitigates structural damage. · Non-Conductive Materials: Metal layers (Au, Pt) dissipate charge, improving SEM imaging. · Advanced Materials: Enhances conductivity and surface analysis (EBSD, microprobe) for semiconductors/composites. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; 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Glovebox Dual-Target Sputtering Coating Machine Coater For Oxides & Ceramics & Semiconductors
Glovebox Dual-Target Sputtering Coating Machine Coater For Oxides & Ceramics & Semiconductors Model: TMAX-BY-JS05 – Product Specifications 1. System Overview The TMAX-BY-JS05 is a compact, benchtop magnetron sputtering system designed for high-performance thin-film deposition in research and laboratory environments. Featuring a dual-target configuration, it supports the deposition of single or multilayer functional films, including conductive, dielectric, optical, and hard coatings. The system combines high vacuum performance, precise process control, and user-friendly operation, making it ideal for material science, semiconductor research, and advanced coating development. 2. Technical Specifications 2.1 General Parameters Parameter Specification Model TMAX-BY-JS05 Type Benchtop Laboratory System Dimensions (W×D×H) 610 × 420 × 490 mm Weight 100 kg Power Supply AC 220V 50Hz / 110V 60Hz Power Consumption <3 kW Cooling Method Water-cooled (target) + Air-cooled (pump) Warranty 1 year limited (lifetime support) 2.2 Vacuum System Parameter Specification Pump Configuration Rotary Pump (4.4 L/s) + Turbo Pump (300 L/s) Base Pressure ≤5×10⁻⁵ Pa Working Pressure 0.5–5 Pa Pump-Down Time (to 10⁻³ Pa) ≤10 minutes Vacuum Measurement Full-range gauge (Atmosphere to 10⁻⁵ Pa) 2.3 Deposition System Parameter Specification Target Configuration Dual magnetron targets (independent control) Target Size Ø50 × 3 mm (standard: Cu & Al) Target Materials Metals, alloys, oxides, ceramics Magnetic Compatibility Weak magnetic materials supported Deposition Rate Adjustable (process-dependent) 2.4 Process Control Parameter Specification Gas Flow Control Mass flow controller (Ar/other inert gases) Power Supply DC: 0–600V, 0–1.6A; RF: 300W/500W (optional) Thickness Monitoring Real-time touchscreen control with 257 preloaded materials Operation Interface Dual-screen VPI control system 2.5 Chamber & Substrate Parameter Specification Chamber Material Stainless steel Chamber Dimensions Outer: Ø260 × 500 mm; Inner: Ø210 × 270 mm Substrate Holder Customizable (max Ø200 mm) 3. Key Features & Benefits · Dual-Target Flexibility: Enables co-deposition or sequential layering of dissimilar materials (e.g., metal/oxide stacks). · High Vacuum Performance: Achieves 5×10⁻⁵ Pa base pressure for contamination-free films. · Precision Control: Touchscreen interface with real-time thickness monitoring and gas flow regulation. · Compact Design: Optimized for small labs with limited space. · Material Versatility: Supports metals, oxides, polymers, and magnetic materials. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; 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Versatile Magnetron Sputtering Coater For Conductive Metal Thin Film Layer Deposition
Versatile Magnetron Sputtering Coater For Conductive Metal Thin Film Layer Deposition Model: TMAX-BY-JS06-Benchtop System for R&D and Educational Laboratories Overview The TMAX-BY-JS06 is a compact, cost-effective, high-vacuum magnetron sputtering system designed for pilot-scale experiments in research and educational laboratories. It integrates key components, including a sputtering vacuum chamber, permanent magnet targets (strong/weak magnetic fields), a fiber-optic rotary stage (customizable), DC power supply, gas supply system, pumping system, water cooling system, film thickness monitoring, vacuum measurement, electronic control system, and a sturdy mounting frame. Key Parameters Parameter Specification Sputtering Gas Adjustable (e.g., argon, nitrogen, etc., depending on experimental requirements). Target Material Standard: Gold target; Optional: Silver, copper, chromium, etc. Target Configuration 50mm (weak magnetic target) / 60mm (strong magnetic target). Sputtering Current 0–500mA Ultimate Vacuum ≤5×10−4 Pa Chamber Dimensions Diameter: 180mm; Height: 200mm Sample Stage Fiber-optic rotary stage (customizable). Operating Voltage 230V, 50Hz Applications & Features 1. Coating for Electron Beam-Sensitive Samples · Ideal for: Biological specimens, polymers, and other beam-sensitive materials. · Advantage: In SEM imaging, high-energy electron beams can cause thermal damage to delicate samples. A thin sputtered conductive coating (e.g., gold or carbon) acts as a protective layer, preserving sample integrity while enhancing imaging quality. 2. Non-Conductive Samples · Ideal for: Insulating materials (e.g., ceramics, glass, or organic compounds). · Advantage: Non-conductive samples accumulate surface charges ("charging effect") under electron beams, distorting SEM images. A sputtered conductive metal layer (e.g., gold or platinum) dissipates charges, eliminating artifacts and improving signal-to-noise ratio for clearer imaging. 3. Electrode Fabrication & Conductivity Studies · Ideal for: Novel materials requiring conductive electrodes for electrical property analysis. · Advantage: Enables precise deposition of thin conductive films for experimental electrode fabrication, facilitating studies on material conductivity. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; 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Auto Vaccum DC Sputter Coater For Multilayer Thin Film Fabrication
Auto Vaccum DC Sputter Coater For Multilayer Thin Film Fabrication Model: TMAX-BY-JS10 – Product Specifications 1. Technical Specifications Table Parameter Specification Model Number TMAX-BY-JS10 Vacuum Pump Oil-required Rotary Vacuum Pump (Explicit oil filling needed) Pumping Speed 50Hz: 16 m³/h (4.4 L/s) • 60Hz: 19.2 m³/h (5.2 L/s) • 20% speed boost at 60Hz Ultimate Vacuum 2 Pa Max Sputtering Current 1.6A Operating Pressure Range 20 Pa – 8 Pa Pump-Down Time <5 min (to 2 Pa) Vacuum Measurement Range Atmospheric pressure to 2×10⁷ mbar Gas Control System Precision Gas Flow Controller Chamber Specifications Ø350 × 240mm (H) • Scratch-resistant quartz glass viewport Target Specifications Ø200mm • Materials: Au, Ag, Pt, Cu (noble/conductive metals) Operation Instruction manual guided Dimensions/Weight 490(L) × 400(W) × 590(H) mm • 70 kg Power Requirements Dual-voltage: AC 110V/60Hz (Americas) or AC 220V/50Hz (Europe/Asia) Power Consumption <1500W Warranty & Support 1-year limited warranty + lifetime technical support 2. Key Features & Competitive Advantages Precision-Oriented Design · Dual-Frequency Pumping: Automatically adapts to 50Hz/60Hz power grids (19.2 m³/h vs 16 m³/h) for global compatibility. · Scratch-Resistant Quartz Viewport: Ensures long-term visibility during deposition without degradation. · Oil-Lubricated Vacuum Pump: Delivers stable 2 Pa base pressure (vs. dry pumps), critical for consistent thin-film quality. Material Versatility · Broad Target Compatibility: Supports Au/Ag/Pt/Cu targets for conductive/noble metal coatings. · Rapid Process Setup: <5-minute pump-down enables efficient batch processing. User-Centric Engineering · Global Voltage Support: No external converter needed for 110V/220V operation. · Compact Footprint: Benchtop design (0.49×0.4×0.59m) saves lab space. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }
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RF+DC Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics
RF+DC Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics Model: TMAX-BY-JS12| – Product Specifications Technical Specifications Parameter Specification Vacuum Pump System Rotary Vane Pump (Oil-lubricated) + Oil-Free Turbo Molecular Pump Set Rotary Pump Speed 50Hz: 16m³/h (4.4 L/s) | 60Hz: 19.2m³/h (5.2 L/s) Molecular Pump Speed 300 L/s Ultimate Vacuum 5 × 10⁻⁴ Pa Working Pressure 0.5 – 5 Pa Pump-Down Time >10 min (to 10 Pa) Vacuum Measurement Range: Atmosphere to 10⁻⁴ Pa Gas Control Mass Flow Controller (MFC) Chamber Size φ260mm × 200mm (Metal Chamber) Magnetron Target Source Target Size: φ50mm × 3mm (Copper) Compatible with Weakly Magnetic Materials Operation Method Manual Control (Instruction Manual Provided) Weight / Dimensions 100kg / 610mm (L) × 420mm (W) × 490mm (H) Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption <3000W Cooling System Air Cooling (Pump) + Water Cooling (Sputtering Target) Warranty 1-Year Limited Warranty with Lifetime Technical Support Key Features & Applications Core Advantages 1. Multi-Mode Sputtering Supports RF (Radio Frequency), DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings. 2. High Vacuum Stability Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films. 3. Flexible Compatibility ·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples. ·φ50mm target supports copper and weakly magnetic materials for diverse applications. 4. Efficient Cooling System ·Water-cooled target minimizes thermal load during high-power sputtering. · Air-cooled pump reduces maintenance costs for continuous operation. Typical Applications ·Research Fields Thin film deposition, nanostructured coatings, semiconductor device development. ·Industrial Uses Optical coatings, wear-resistant layers, surface modification of electronic components. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }
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Magnetron Sputtering Thin Film Deposition Coater For SEM preparation
Magnetron Sputtering Thin Film Deposition Coater For SEM preparation TMAX-ZK-JS01-Cold Magnetron Sputtering Coater Product Highlights · Uniform & Ultra-Fine Coating: Produces highly reflective/translucent decorative films with 6–10nm particle size, ideal for aesthetic applications. · Cold Sputtering Technology: No surface temperature rise, ensuring integrity of heat-sensitive samples. · High Efficiency & Precision: Wide sputtering current range (5–45mA) with 600V voltage and up to 450W power for dense, adherent films. · Automated Operation: Features LCD control, auto-vacuum cycling (<90s pump-down), and gas release for streamlined workflows. Key Applications · Decorative Films: Full-reflective/semi-transparent coatings. · Electrode Fabrication: Battery membranes, conductive layers. · Electron Microscopy: FE-SEM sample preparation. · Delicate Materials: Temperature-sensitive substrates (biological specimens, polymers, filters). Technical Specifications Category Parameters Operation Mode Fully automated magnetron sputtering Sputtering Current 2–50mA (adjustable) Voltage 600V (adjustable) Target Materials Standard: Au/Pt (choose one); Optional: Ag, Cu, Al, Ti, Cr, Pb Vacuum System Oil-sealed rotary pump (1L/s) or optional dry scroll pump (<0.1Pa ultimate) Chamber Size Ø128×130mm Sample Holders 1ר90mm, 4ר25mm, 6ר15mm Gas Supply Air/argon, auto-admitted via Φ4 quick-connect Particle Size 6–10nm Power Supply 220V/50Hz (110V customizable), 450W max Protections Over-current (>50mA cutoff), vacuum (>100Pa cutoff) Unique Advantages · Versatile Target Compatibility: Supports diverse metals for tailored film properties. · Zero Thermal Damage: Critical for polymers, biomaterials, and battery components. · Industrial-Grade Adhesion: Strong film bonding for durable decorative/functional layers. Ideal for · R&D Labs: Precision coating for SEM, thin-film studies. · Manufacturers: Decorative films, electrodes, and sensors. · Bio/Nano Tech: Delicate sample preparation with nanoscale control. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Lab PVD Ion Sputtering Coater For Metal and Carbon Layer
Lab PVD Ion Sputtering Coater For Metal and Carbon Layer Model: TMAX-JY-JS01-SEM Preparation Overview The TMAX-JY-JS01 compact magnetron ion sputtering coater is designed for high-quality conductive coating (e.g., gold film) on SEM samples or material surfaces. Featuring stable performance and user-friendly operation, it employs cold magnetron sputtering technology, minimizing heat generation to protect sensitive samples. Key Features · Durable Metal Bellows – Corrosion-resistant and aesthetically refined vacuum pump tubing. · Precision Adjustment – Sensitive micro-valve control with clear scale markings. · High-Efficiency Vacuum Pump – Fast pumping speed (8 m³/h) with low noise, ideal for lab environments. · Reliable Circuitry – Stable control board for consistent operation. · Cold Sputtering – Near-zero temperature rise preserves sample integrity. Technical Specifications Parameter Specification Vacuum Chamber Ø150 mm × 110 mm (H) Sample Stage Ø60 mm Gold Target Size Ø50 mm Vacuum System Pumping speed: 8 m³/h Vacuum Monitoring Custom Pirani gauge + analog dial Exhaust Mode Automatic Sputtering Time 0–1000 sec (programmable) Process Gas Air or argon (dedicated inlet) Compatible Target Materials Au, Au/Pd, Pt, Pt/Pd, Cu, Ag, etc. Dimensions ~450 × 330 × 235 mm (L×W×H) Applications & Advantages · SEM Sample Prep: Uniform conductive coatings enhance imaging accuracy. · Material Science: Versatile metal deposition for thin-film research. · User-Centric Design: Fast target switching, low maintenance, and lab-friendly noise levels. 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Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation
Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation Model: TMAX-HZ-JS02-Low-Temperature SEM Preparation Key Features & Applications The TMAX-HZ-JS02 Magnetron Sputtering System integrates advanced vacuum technology with intelligent automation, delivering high uniformity, efficiency, and versatility for precision thin-film deposition. Its large-target design and planar magnetron cathode minimize plasma-induced thermal damage, making it ideal for temperature-sensitive samples (e.g., polymers, fibers, biological specimens) and high-resolution SEM preparation. Technical Parameters Category Specifications Dimensions 530 × 300 × 320 mm Input Voltage 100–250 VAC, 50/60 Hz Sputtering Voltage 300–600 V (DC) Target Material Ø50 × 0.1 mm (Au, Pt, Ag, Pd, etc.) Control Mode 5-inch touchscreen (ARM architecture, bilingual UI) Power Consumption 100 W Sputtering Current 10–50 mA (1 mA precision) Sputtering Time 0–600 s (1 s step) Working Vacuum 2–10 Pa (0.1 Pa resolution) Ultimate Vacuum <1 Pa Vacuum Measurement Full-range Pirani gauge Chamber Size Ø160 × 120 mm Sample Stage Ø80–100 mm (holds 12 standard stubs) Protections Overcurrent, vacuum safety System Components 1. Sputtering Source: Planar magnetron cathode for Au/Pt/Pd/Ag deposition. 2. Power Supply: Constant-current DC (300–600 V, ±1 mA precision). 3. Vacuum System: Rotary vane pump (<1 Pa), Pirani monitoring. 4. Automation: One-touch operation with parameter memory. 5. Data Display: Real-time curves for current, voltage, and vacuum status. Advantages · Nano-scale Coating: Particle size <5 nm, ideal for high-resolution SEM. · Low Thermal Impact: Magnetron technology reduces sample heating. · High Throughput: 12-sample capacity with auto-rotation for uniformity. · Plug-and-Play: No specialized training required. Ideal for: Material science, biology, and conductive/thermal enhancement of non-metallic samples. Operation Notes · Target Replacement: Tool-free design with shielded ring mechanism. · Maintenance: Oil-lubricated pump (included) with visual oil-level window. · Gas Connection: Supports Ar/N₂ or ambient air (6 mm OD tubing). html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Mini Auto Ion Sputtering Coater Machine For Carbon, Ti, Au, Al
Mini Auto Ion Sputtering Coater Machine For Carbon, Ti, Au, Al TMAX-BY-JS13-Glovebox-Compatible SEM Sample Coater for Conductive Coatings 1. Key Features & Design Highlights Ultra-Compact Design · Chamber volume reduced by 67% (φ115×100 mm) vs. conventional systems · 0.02 m³ footprint (307×260×260 mm) and 40 kg weight for easy benchtop placement Rapid Process Ready · Achieves working vacuum in <2 minutes (vs. industry-standard 5–10 mins) · Oil-lubricated rotary pump with dual-frequency support (50/60Hz) Precision Sputtering · φ50×0.1 mm ultra-thin targets (Au/Ag/Pt) for microscale coating · Scratch-resistant quartz viewport for real-time monitoring Energy Efficient · <1500W power consumption (30% lower than comparable systems) · Air-cooled operation eliminates water chiller requirements 2. Complete Technical Specifications Core Parameters Parameter Specification Vacuum Pump Oil-required rotary pump Pumping Speed 50Hz: 8 m³/h (2.2 L/s) • 60Hz: 9.6 m³/h (2.6 L/s) Base Pressure Achievable in <2 mins Target Materials Au (std.), Ag, Pt (φ50×0.1 mm) Max Substrate Size Ø50 mm Power Supply 110V/60Hz or 220V/50Hz auto-switching Cooling Method Passive air cooling Warranty 1-year limited + lifetime support Mechanical Details · Chamber Material: Stainless steel with quartz viewport · Control Interface: Timer-based automation (manual override) · Safety: Overcurrent protection, grounding detection 3. Recommended Applications ✔ SEM Sample Preparation · Conductive coatings for non-metallic samples (e.g., polymers, biological tissues) · Charge dissipation layers for high-resolution imaging ✔ Material Science Research · Micro/nano-scale metal film deposition · Prototype coating for flexible electronics ✔ Field & Educational Use · Portable solution for shared lab spaces · Low-maintenance operation (no water cooling) 4. Comparison vs. Conventional Systems Aspect SD-800 Traditional Coaters Footprint 0.02 m³ ≥0.05 m³ Setup Time <5 mins 15–30 mins Target Thickness 0.1 mm 0.3–1 mm Cooling Air-cooled Water-chilled html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets
DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets Model: TMAX-PC-JS03-Rotatable Triple-targets Technical Specifications Category Parameter Value/Description Chamber Structure Design Vertical front-loading, stainless steel Sample Access Easy loading/unloading Vacuum Performance Base Pressure ≤5×10−5 Pa Leak Rate ≤5×10−7 Pa·L/s Pressure Rise Rate (12h) ≤10 Pa Pumping System Domestic molecular pump + mechanical pump Targets & Power Supplies Target Quantity & Size 3 × 2-inch magnetron targets (HV compatible) Target Types 1 × Standard magnetic field, 1 × Strong magnetic field Target-Substrate Distance (Multilayer) 40–120 mm Target-Substrate Distance (Ion Source) 80–120 mm RF Power Supply 1 × 1000 W, 13.56 MHz (auto-matching) DC Power Supply 2 × 1000 W Substrate Holder Capacity Up to 3 substrates Rotation Speed 5–30 RPM (self-rotation + planetary) Heating Range Programmable up to 450°C Bias Voltage Supports up to 1000 V Gas Control System Gas Lines 2 independent MKS mass flow controllers (Ar + reactive gas) Features Gas mixing, adjustable/measurable chamber pressure Additional Features Chamber Baking Infrared heating (150°C) Liner Plate Prevents chamber contamination Safety Protections Water/power failure interlock, anti-misoperation protection Key Features & Applications 1. Advanced Deposition Capabilities · Supports DC/RF sputtering for metals, semiconductors, and insulators. · Triple-target design enables sequential multilayer deposition without vacuum breaks. 2. Precision Process Control · Programmable substrate heating (±450°C) with adjustable ramp rates. · Rotation mechanism (5–30 RPM) ensures uniform film thickness. 3. Research & Small-Batch Flexibility · Ideal for nanoscale functional films (e.g., optoelectronics, tribological coatings). · Reverse sputtering cleaning enhances film adhesion and purity. 4. User-Centric Design · Manual controls for target shutters, rotation, and temperature. · Safety systems mitigate operational risks (e.g., interlock protections). Users · Academic & Government Labs: Thin-film material R&D. · Industrial Prototyping: Small-scale production of specialized coatings. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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RF Sputtering Coater System For Solar, OLED & Semiconductor
RF Sputtering Coater System For Solar, OLED & Semiconductor Model: TMAX-PD-JS05-Wafer Sputtering Coater System Product Overview The TMAX-PD-JS05 magnetron sputtering system is equipped with multiple sputtering sources, capable of depositing metallic, semiconducting, and dielectric materials. It supports the fabrication of multilayer thin films and co-sputtered alloy films with high precision. Key Features · Compact & Integrated Design: Space-saving layout with refined aesthetics, optional sample-loading functionality. · High Uniformity Coating: Features 4× magnetron sputtering targets (2–4 inches), compatible with 2–8 inch wafers. Substrate holder ensures uniformity within ±3%–5% for 8-inch wafers. · Flexible Control Options: Siemens PLC + touchscreen (manual/automatic) or PC + PLC full-automatic control. Technical Specifications · System Dimensions (L×W×H): 1400 × 1300 × 1900 mm · Chamber Dimensions (L×W×H): 500 × 500 × 500 mm (PD-500C) / 600 × 600 × 500 mm (PD-600C) · Substrate Stage: Max heating temperature 500–800°C · Base Pressure: ≤5 × 10⁻⁵ Pa · Pumping & Holding: Achieves 8 × 10⁻⁴ Pa within ≤30 min; pressure rise ≤8 Pa over 12 hours. · Target Configuration: 4× sputter guns (2–3 inches or 2–4 inches), coating area 2–6 inches. Applications & Advantages Ideal for R&D and small-batch production, the PD-500C/600C excels in depositing high-quality, uniform thin films for optics, electronics, and functional coatings. Its modular control and excellent temperature/vacuum stability cater to advanced material research and industrial precision demands. TMAX-PD-JS05 vs. Conventional Model Feature Conventional Systems Advantage Uniformity (8-inch wafer) ±3%–5% ±5%–10% or worse Higher film consistency for precision applications System Footprint Compact (1400×1300×1900 mm) 30–50% larger Saves lab/cleanroom space Substrate Heating 500–800°C Typically 300–600°C Supports high-temperature depositions (e.g., oxides, nitrides) Base Vacuum ≤5×10⁻⁵ Pa ~1×10⁻⁴ Pa Better for reactive sputtering, reduced contamination Pressure Stability ≤8 Pa over 12 hours Frequent drift (>10 Pa in hours) Longer process stability Control Options PLC + Touchscreen or PC + PLC Manual or basic PLC Flexible automation, better reproducibility Target Configuration 4× guns (2–4 inch) Often 2–3 guns (2–3 inch) Wider material selection, co-sputtering capability Coating Area 2–8 inch wafers Typically ≤6 inch Broader substrate compatibility Key Takeaways · Precision & Consistency: Superior uniformity (±3–5%) vs. conventional (±5–10%). · Compact & Efficient: 30% smaller footprint without sacrificing performance. · High-Temp & Vacuum Stability: Enables advanced materials (e.g., optical coatings, semiconductors). · Automation Ready: PC-controlled processes improve repeatability over manual systems. Ideal For: R&D labs, semiconductor fabs, and optical coating producers needing high-repeatability, multi-material deposition in a space-efficient design. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Double Chamber PVD Coater System For Thin Film Deposition Preparation
Double Chamber PVD Coater System For Thin Film Deposition Preparation Model: TMAX-PC-JS12-With Ion Source Cleaning & Assisted Sputtering General Information Category Description Application Preparation of nanoscale monolayer/multilayer functional films (hard coatings, metallic/semiconductor/dielectric films). Suitable for research labs, universities, and small-batch production. Key Features • Anode-layer ion source (cleaning + assisted deposition) • Reverse sputtering for adhesion enhancement • Automated PC-controlled process System Structure Sputtering chamber, 3 magnetron targets, heating stage, DC/RF power supplies, gas/pumping systems, vacuum measurement, control unit. Technical Parameters Parameter Specification Chamber Design Vertical front-loading, stainless steel construction Base Vacuum ≤5×10-5 Pa (sputtering chamber) Pumping Speed Recovers to 5×10-4 Pa in 100 min (via bypass valve + turbopump) Leak Rate ≤5×10-7 Pa·L/s Pressure Rise Rate ≤10 Pa after 12 hours (power off) Pumping System Domestic turbomolecular pump + mechanical pump Targets 3 × 3-inch HV targets (2 standard, 1 strong magnetic field) Power Supplies • RF: 600 W, 13.56 MHz (auto-matching) • DC: 2 × 1000 W Target-to-Sample Distance 40–120 mm (adjustable) Substrate Heating Max 450°C, programmable (rate/dwell time controllable) Film Thickness Uniformity ±5% (e.g., Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm over 2-inch area) Adhesion Strength Survives 3 tape-peeling tests (glass/Si/ceramic) Pre-Cleaning Reverse sputtering + anode-layer ion source Gas Control 2 MFCs (Ar + reactive gases), MKS-brand, mixing enabled Baking IR heating, max 150°C Safety Water/power failure interlocks, anti-misoperation protection Automation PC-controlled (target switching, substrate rotation, temperature) Performance Advantages & Suitability Feature Benefit Target Applications Ion Source + Sputtering Ensures clean surfaces and high adhesion Semiconductor films, optical coatings Multi-Mode Deposition Supports DC/RF, reactive sputtering, multilayers Research on novel functional materials Precise Automation Reduces human error, improves reproducibility Small-batch prototyping, academic labs Rapid Pumping Minimizes downtime between runs High-throughput R&D environments Key Features & Suitability · High-Precision Deposition: Ensures uniform, high-adhesion films for research and prototyping. · Multi-Functional Cleaning: Combines ion source + reverse sputtering for optimal surface preparation. · Flexible Configuration: Supports DC/RF modes, multilayer films, and reactive sputtering. · User-Friendly Automation: PC-controlled workflow reduces manual errors. Ideal for: Advanced material research, semiconductor labs, and functional coating development requiring reproducible, high-quality thin films. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Multi-Material Deposition Magnetron Sputter Coating System Equipment For Organic Multilayer
Multi-Material Deposition Magnetron Sputter Coating System Equipment For Organic Multilayer Model: TMAX-PC-JS11 – Product Specifications Specifications Category Parameter Details Vacuum Performance Ultimate Vacuum (Sputtering Chamber) ≤6.6×10⁻⁶ Pa System Leak Rate ≤5.0×10⁻⁷ Pa·L/S Pump-Down Time (Atmosphere → 6.6×10⁻⁴ Pa) ≤30 min Vacuum Retention (After 12 Hours Shutdown) ≤5 Pa Sputtering Chamber Structure Vertical, top-opening, stainless steel (argon-welded, electropolished) Dimensions ≥Ø300 mm × 300 mm (with anti-contamination liner) Bakeability & Sealing 100–150°C; metal gasket/fluororubber O-ring Magnetron Sputtering Target Configuration 3 × 50 mm adjustable-angle permanent magnet targets (RF/DC/MF compatible) Power Supply 2 × DC (≥500 W), 1 × auto-matching RF (≥500 W) Film Uniformity ≤5% deviation Additional Features 3 × SMC rotary shutters; magnetic material support Substrate Stage Sample Capacity 1 × ≥100 mm diameter Rotation Speed 0–30 RPM (adjustable) Heating Range RT–500°C (PID-controlled, thermocouple feedback) Gas Delivery Mass Flow Control 2 paths (100 SCCM + 20 SCCM MFCs, CF16 valves) Auxiliary Gas Lines 2 × DN16 inlet valves Pumping System High-Vacuum Pump Pfeiffer Hipace 700 (680 L/s) + 4 L/s rotary pump Valves & Pipeline DN40/CC150 pneumatic valves, stainless steel bellows Control & Safety Automation PLC + industrial PC + touchscreen (real-time monitoring/logging) Protection Interlocks for water/power faults (overcurrent, open circuit, etc.) Additional Components Frame Steel construction, lockable casters, removable panels Included Accessories Chiller, silent compressor, tool kit, spare parts Measurement Vacuum Gauge INFICON combination gauge Key Advantages & Applications Advantages: · High Precision: Ultra-high vacuum (UHV) capability ensures contamination-free thin-film deposition. · Flexibility: Multi-target configuration with adjustable parameters for diverse materials (including magnetic films). · Reliability: Robust PLC automation with fail-safe interlocks and real-time diagnostics. · User-Friendly: Integrated touchscreen and PC control streamline operation. Target Applications: · Research & Development: Ideal for academic or industrial labs studying advanced coatings (e.g., semiconductors, optics). · Industrial Coating: Suitable for small-scale production of functional films (wear-resistant, conductive, or decorative layers). · Material Science: Supports experiments requiring controlled environments (e.g., reactive sputtering, multi-layer deposition). html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Thermal Evaporation Carbon Metal Deposition Coater PVD System Equipment
Thermal Evaporation Carbon Metal Deposition Coater PVD System Equipment Model: TMAX-BY-ZD02-Pulsing Thermal Evaporation Carbon Coater 1. Product Overview Introduction The TMAX-BY-ZD02 Pulsing Thermal Evaporation Carbon Coater is an advanced deposition system designed for ultra-thin carbon film coating in SEM, TEM, and EBSD applications. Utilizing resistive heating of high-purity carbon rope, it enables precise, fast, and contamination-free carbon film deposition with adjustable parameters for optimized coating quality. Key Technologies & Advantages ✔ Dual Deposition Modes – Supports Flash & Pulsed evaporation (0-9 pulses) for controlled, low-debris coating. ✔ Touchscreen Control – User-friendly interface for precise current/pulse adjustment. ✔ Adjustable Evaporation Current (50A-80A) – Prevents sample damage while ensuring uniform coating. ✔ Vacuum Protection System – Safeguards against low-vacuum short circuits. ✔ Compact & Efficient – Optimized for lab environments with rapid pump-down (<5 min). 2. Technical Specifications Core Parameters Category Specification Model TMAX-BY-ZD02 Dimensions (W×D×H) 390mm × 310mm × 290mm Chamber Material Borosilicate Glass (Ø160mm × 110mm H) Sample Stage 50mm (Diameter) Evaporation Source High-Purity Carbon Rope Deposition Modes Flash / Pulsed (0-9 pulses programmable) Max Evaporation Current 80A Operating Vacuum 4–6 Pa Ultimate Vacuum 5 Pa Pump Type 2-Stage Rotary Pump (VRD-8, 8 m³/h @50Hz) Power Supply 220V AC, 50Hz Power Consumption 1.6 kW Weight ~50 kg Vacuum System Performance · Pumping Speed: o 50Hz: 8 m³/h (2.2 L/s) o 60Hz: 9.6 m³/h (2.6 L/s) · Time to Reach Vacuum: <5 minutes (to 2 Pa) · Vacuum Measurement Range: Atmosphere to 2×10⁻² mbar 3. Applications · High-Resolution SEM/TEM – Minimizes charging effects. · EBSD Analysis – Enhances electron backscatter diffraction signals. · X-ray Microanalysis – Provides conductive layers with minimal interference. 4. Operational Highlights Pulsed Evaporation Technology · Reduces Debris: Short pulses limit carbon splashing for cleaner coatings. · Controlled Thickness: Programmable pulses (0-9) enable repeatable deposition. User-Centric Design · Touchscreen Interface: Intuitive control for current/pulse adjustment. · No Process Gas Required: Simplified operation compared to sputtering systems. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film
PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film TMAX-ZY-ZD02-Research-Grade Thin Film Deposition Equipment System Overview TMAX-ZY-ZD02 benchtop resistive thermal evaporation coating system integrates a turbo-molecular pump vacuum assembly to achieve high-vacuum thin film deposition. Equipped with 4 evaporation sources and a precision thickness control system, it is optimized for rapid multi-layer metal/alloy deposition. Featuring a plug-and-play design, this compact instrument operates reliably in office or lab environments without specialized infrastructure, making it ideal for R&D and small-batch production. Key Advantages 1. Portability & Flexibility ·Compact footprint with multi-environment adaptability (lab/office). 2. User-Centric Design ·One-touch operation with preloaded parameters (100+ metal deposition recipes). ·10" touchscreen for intuitive process control and real-time monitoring. 3. High-Performance Deposition ·4-source simultaneous evaporation (supports 99 layers of metals/alloys/polymers per run). ·Quartz crystal monitoring for nanometer-level thickness accuracy (±3% uniformity). 4.Premium Components ·All-aluminum chamber for efficient heat dissipation. ·Imported turbo-molecular pump (300L/s) ensures ≤6×10−5 Pa ultimate vacuum. 5.Low Maintenance ·Minimal training required; modular design simplifies servicing. Typical Applications · Thin-film material research (metals/dielectrics) · Optical coatings & nanoelectronics · Thin-film sensors & MEMS devices · Custom alloy/polymer multilayer structures Standard Specifications Component Details Chamber 400×350×360mm (H), CNC-machined aluminum Vacuum System 300L/s turbo pump + dual-stage rotary vane pump Vacuum Measurement Full-range gauge (atmosphere to UHV) Evaporation Sources 4 independent thermal sources (cross-contamination-free) Power Supply DC power for multi-layer deposition Thickness Control Quartz crystal monitor + manual/auto mode switching Software Network-upgradable with remote parameter adjustment Optional: · Co-evaporation kit for alloys · 2" substrate heater (400°C max) · Water-cooled rotating sample stage Technical Parameters · Ultimate Vacuum: ≤6×10−5 Pa (after bake-out) · Leak Rate: ≤5.0×10−9 Pa·L/s · Deposition Rate: ≥8 nm/min (varies by material) · Thickness Uniformity: ≤3% (with planetary rotation) Site Requirements Parameter Specification Dimensions 600×720×1200mm (H) Weight 85 kg Environment 23±3°C, <60% RH Power AC 230V, 32A, 50Hz Cooling Water 0.2MPa, 15–25°C, ≥8L/min (optional) Gas Supply 99.9% N2 (optional for venting) Operational Workflow · Fully automated process: Pre-programmed vacuum pumping, substrate heating, and evaporation. · Multi-layer capability: Sequential deposition of 4 materials (up to 99 layers) with customizable thickness/time modes. · Data export: Real-time parameter logging and remote monitoring. Why Choose? · Time-saving: Eliminates complex setup with industry-leading uptime. · Precision: Combines lab-grade vacuum performance with production-level repeatability. · Scalability: Modular options cater to evolving research needs. Ideal for academic labs, startups, and industrial R&D requiring rapid prototyping of advanced thin films. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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