Magnetron Sputtering Deposition System For Functional Film Of SEM, Battery, Biological

Magnetron Sputtering Deposition System For Functional Film Of SEM, Battery, Biological       Model: TMAX-ZK-JS03-Coater for Delicate & Oxidation-Sensitive Samples Of SEM, Battery, Biological Product Highlights · User-friendly LCD touchscreen for simplified operation · Fully automated vacuum process for sample preparation · Automatic gas release for safe handling · Wide sputtering current range (5–45mA) for flexible applications · High sputtering efficiency for fast, uniform coating · Ultra-fine particle size (6–10nm) for superior film quality · No sample surface heating—ideal for temperature-sensitive materials Applications Designed for integration into gloveboxes, this sputtering coater is ideal for oxidizable, contamination-sensitive samples, including: · SEM sample preparation · Electrode material research · Battery separators, filtration membranes · Biological specimens & delicate substrates Technical Specifications Core Parameters Parameter Specification Sputtering Current 5–45mA (adjustable) Operating Mode Fully automatic magnetron sputtering Sputtering Voltage 600V (fixed) Target Materials Gold or Platinum (standard, select one); optional: Ag, Ti, Cr, Al, Cu, Pb Vacuum Level <1Pa Vacuum Pump Oil-sealed rotary vane pump (1L/s); optional dry scroll pump Additional Features · Chamber Dimensions: Ø128×130mm · Sample Holders: 1×Ø90mm, 4×Ø25mm, 6×Ø15mm cups · Power Supply: 220V/50Hz (110V customizable) · Max Power Consumption: 450W · Particle Size: 6–10nm · Working Gas: Air or argon · Protection Mechanisms: Overcurrent cutoff (>50mA), vacuum interlock (>100Pa) Key Advantages · Uniform, fine-grained coatings with excellent adhesion · Zero thermal damage—perfect for heat-sensitive substrates (e.g., polymers, biomaterials) · Compact glovebox-compatible design for inert-atmosphere processing Why Choose? This system combines high-performance sputtering with glovebox compatibility, ensuring contamination-free deposition for advanced materials research. Its cold sputtering capability and sub-10nm particle size make it a top choice for critical applications in energy storage, life sciences, and nanotechnology.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Nano Vacuum Magnetron Ion Sputtering Coater For Thin Film Fabrication

Nano Vacuum Magnetron Ion Sputtering Coater For Thin Film Fabrication     Model:  TMAX-ZK-JS05- Compact Ion Sputtering Coater Overview The TMAX-ZK-JS05 Compact Ion Sputtering Coater is designed for depositing conductive gold films on samples for scanning electron microscopy (SEM). With user-friendly operation, it is an essential tool for sample preparation in small to medium-sized SEM laboratories. Key Applications · Gold ion sputtering for SEM sample coating. · Compatible with target materials: Au, Pt, Cr, Ag, Ti, Cu, Ni, Au-Pd alloy, etc. Technical Specifications Category Specification Chamber Material Glass Chamber Dimensions Ø100 mm (diameter) × 130 mm (height) Sample Stage (Small) Ø40 mm (holds 6 sample cups simultaneously) Sample Stage (Large, Optional) Ø60 mm Gold Target Size Ø58 mm Vacuum Pump Two-stage direct-drive rotary vane pump (1 L/s) Vacuum Measurement Pirani gauge Vacuum Protection 20 Pa with fine-adjustment gas inlet valve Working Gases Air / Argon (dedicated inlet with flow control) Features & Advantages · Robust Design – Special sealing structure minimizes glass chamber damage. · High Compatibility – Supports Au, Pt, Cr, Ag, Ti, Cu, Ni, and Au-Pd alloy targets. · Precision Control – Adjustable gas flow and vacuum protection ensure uniform coatings. · Efficient Workflow – Dual-stage platform allows batch processing (6 samples at once). Recommended Applications ✔ SEM Sample Prep – Ideal for non-conductive specimen coating. ✔ Materials Research – Thin-film deposition for nanotechnology studies. ✔ Industrial QC – Reliable performance for repeatable conductive layering.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation

Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation      Model: TMAX-JY-JS02-Cold Magnetron Sputtering Deposition System Product Description The TMAX-JY-JS02 is a benchtop cold magnetron sputtering coating system equipped with a standard rotating/tilting sample stage. It is specifically designed for high-quality conductive coating of non-conductive samples with varied surface morphologies for SEM imaging. It also meets the requirements for electrode coating, semiconductor materials, and other thin-film applications. Key Features · "Ultra-Cold" Sputtering: Utilizes a high-efficiency, low-voltage DC magnetron source to prevent thermal damage to sensitive samples. · Wide-Angle Coverage: Innovative magnetron design ensures uniform coating coverage, even for closely positioned samples. · Fast Operation: Independent solenoid valves for venting, purging, and exhaust enable rapid system cycling. · Stable Coating Performance: Precisely controlled sputtering current ensures consistent deposition rates and optimal coating quality, unaffected by chamber pressure. · Multi-Material Compatibility: Supports various metal targets (Pt standard, optional Au, Au/Pd, or Pt/Pd) with quick and easy target replacement. Technical Specifications Sputtering System Parameter Specification Target Material Standard: Pt (57mm diameter × 0.1mm thickness)  Optional: Au, Au/Pd, Pt/Pd Sample Stage Rotation 0–60 rpm (continuously adjustable) Sample Stage Tilt -45° to +45° (continuously adjustable) Stage Diameter 40mm (holds 4 standard sample holders; custom sizes available) Sputtering Current Microprocessor-controlled (0–99 mA) with safety interlock Vacuum Range Atm ~3 Pa Control Method Programmable (1–999s) with Start/Pause buttons; automatic pumping/sputtering/venting Vacuum Pump Parameter Specification Pumping Speed 133 L/min Ultimate Vacuum 0.05 Pa Noise Level 56 dB Applications & Advantages · Ideal for SEM Sample Preparation: Ensures high-conductivity coatings without thermal damage, critical for delicate or heat-sensitive materials. · Versatile Material Deposition: Suitable for Pt, Au, and alloy coatings in semiconductor, nanotechnology, and materials research. · User-Friendly Operation: Automated processes and ergonomic design enhance efficiency and reproducibility. · Compact & Reliable: Benchtop design saves lab space while delivering professional-grade performance.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation

Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation     Model:  TMAX-HZ-JS02-Low-Temperature SEM Preparation Key Features & Applications The  TMAX-HZ-JS02 Magnetron Sputtering System integrates advanced vacuum technology with intelligent automation, delivering high uniformity, efficiency, and versatility for precision thin-film deposition. Its large-target design and planar magnetron cathode minimize plasma-induced thermal damage, making it ideal for temperature-sensitive samples (e.g., polymers, fibers, biological specimens) and high-resolution SEM preparation. Technical Parameters Category Specifications Dimensions 530 × 300 × 320 mm Input Voltage 100–250 VAC, 50/60 Hz Sputtering Voltage 300–600 V (DC) Target Material Ø50 × 0.1 mm (Au, Pt, Ag, Pd, etc.) Control Mode 5-inch touchscreen (ARM architecture, bilingual UI) Power Consumption 100 W Sputtering Current 10–50 mA (1 mA precision) Sputtering Time 0–600 s (1 s step) Working Vacuum 2–10 Pa (0.1 Pa resolution) Ultimate Vacuum <1 Pa Vacuum Measurement Full-range Pirani gauge Chamber Size Ø160 × 120 mm Sample Stage Ø80–100 mm (holds 12 standard stubs) Protections Overcurrent, vacuum safety System Components 1. Sputtering Source: Planar magnetron cathode for Au/Pt/Pd/Ag deposition. 2. Power Supply: Constant-current DC (300–600 V, ±1 mA precision). 3. Vacuum System: Rotary vane pump (<1 Pa), Pirani monitoring. 4. Automation: One-touch operation with parameter memory. 5. Data Display: Real-time curves for current, voltage, and vacuum status. Advantages · Nano-scale Coating: Particle size <5 nm, ideal for high-resolution SEM. · Low Thermal Impact: Magnetron technology reduces sample heating. · High Throughput: 12-sample capacity with auto-rotation for uniformity. · Plug-and-Play: No specialized training required. Ideal for: Material science, biology, and conductive/thermal enhancement of non-metallic samples. Operation Notes · Target Replacement: Tool-free design with shielded ring mechanism. · Maintenance: Oil-lubricated pump (included) with visual oil-level window. · Gas Connection: Supports Ar/N₂ or ambient air (6 mm OD tubing).       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater

High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater     Model: TMAX-HZ-JS04- High-Vacuum Dual-Target Sputtering Coater Technical Parameters Category Specification Model TMAX-HZ-JS04 Vacuum System Oil-free diaphragm pump + molecular pump Ultimate Vacuum ≤1.0×10⁻⁴ Pa Pressure Measurement Full-range cold cathode gauge + front-end Pirani gauge Gas Control MFC (Mass Flow Controller) for Ar/O₂/N₂ Target Configuration Dual targets (independent control, alternate/synchronous sputtering) Target Compatibility Metals, alloys, compounds (custom sizes available) Optional Feature Real-time thickness monitoring (nanometer precision) Cooling System Energy-efficient target cooling Safety Protections Overpressure/overcurrent/overheat protection, vacuum interlock, emergency vent Key Features 1. Dual-Target Flexibility ·Enables multi-material deposition (e.g., bilayers, graded films, or interfaces) in a single run. 2. High-Vacuum Precision ·Ultra-low base pressure (≤1.0×10⁻⁴ Pa) minimizes contamination for high-purity films. 3. Intelligent Process Control ·MFC-regulated gas flow ensures repeatable reactive sputtering (e.g., oxides/nitrides). 4. User-Optimized Design ·Energy-saving pumps and cooling reduce operational costs without compromising performance. Typical Applications · Semiconductors: Electrode/metallization layers, barrier films. · Optics: Anti-reflective, conductive, or hard coatings. · Energy: Thin-film batteries, solar cell layers. · Research: Nanomaterials, heterostructures, surface engineering. Why Choose? · Lab to Production: Scalable for both R&D prototyping and industrial batch processing. · Safety & Reliability: Automated safeguards protect equipment and users. · Customizable: Adaptable to diverse materials and film architectures.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; 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Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating

Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating     Model: TMAX-PC-JS01- Versatile Magnetron Sputtering System For Functional Film Deposition Coating Application: Designed for the preparation of nanoscale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, and dielectric films. It is widely suitable for scientific research and small-batch production in universities and research institutes. Equipped with an anode-layer ion source for pre-cleaning and assisted deposition, as well as a reverse sputtering function to enhance film quality and adhesion. System Configuration: The system consists of a sputtering vacuum chamber, permanent magnet sputtering targets (3 targets), a single-substrate heating stage, DC/RF power supplies, gas supply system, pumping system, vacuum measurement, electrical control system, and mounting platform. Technical Specifications Parameter Specification Chamber Structure Vertical, top-loading; stainless steel & vacuum-compatible materials Base Pressure (Sputtering Chamber) ≤5×10⁻⁶ Pa Leak Rate ≤5×10⁻⁷ Pa·L/s Pressure Rise Rate ≤1 Pa (after 12 hours of pump shutdown) Pumping System Domestic molecular pump + mechanical pump Magnetron Targets 3 × 3-inch HV-compatible (2 standard field, 1 strong field) Power Supplies RF: 600 W, 13.56 MHz (auto-matching); DC: 2 × 1000 W Target-Substrate Distance 40–120 mm (adjustable) Substrate Heating Max 450°C, programmable control Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm Uniformity (2-inch area) ≤5% deviation Adhesion Test Withstands 3 tape-peeling tests (glass/si/ceramic) Pre-Cleaning Reverse sputtering capability Ion Source Anode-layer for cleaning & assisted deposition Gas Control 2 MKS mass flow controllers (reactive/Ar); gas mixing Baking Temperature 150°C (infrared heating) Safety Features Water/power failure interlock; anti-misoperation Key Features & Suitability 1. Precision Deposition ·Supports DC/RF sputtering for diverse materials (metals, semiconductors, dielectrics). ·Ion-assisted deposition enhances film density and adhesion. 2. High Vacuum Stability ·Ultra-low base pressure (≤5×10⁻⁶ Pa) ensures contamination-free films. ·Low leak rate maintains consistent process conditions. 3. User-Centric Design ·Vertical loading simplifies sample handling. ·Programmable substrate heating (up to 450°C) for optimized film growth. 4. Quality Assurance ·≤5% thickness uniformity and rigorous adhesion standards (tape test). ·Reverse sputtering and ion source for pre-deposition cleaning. 5. Research & Small-Batch Production ·Ideal for universities, labs, and industrial R&D in optics, electronics, and coatings.         html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Glovebox Magnetron Sputtering System For Metal Film Deposition

Glovebox Magnetron Sputtering System For Metal Film Deposition     Model: TMAX-PD-JS02-PVD Magnetron Sputtering System Product Overview The TMAX-PD-JS02 High-Vacuum Magnetron Sputtering System is a specialized R&D equipment designed for cutting-edge applications in perovskite solar cells, OLEDs, lithium batteries, quantum dot LEDs, OPVs, and other advanced industries. It enables the deposition of nanoscale oxide, nitride, and metallic thin films. The system integrates seamlessly with glovebox environments, ensuring anhydrous/oxygen-free conditions for the entire process—from spin-coating and sputtering to testing—via a hardware-coupled PVD and glovebox system. Key Features 1. Low-Pressure Sputtering Technology (Optional) 1. Delivers dense thin films with minimal substrate damage. 2. High-Precision Chamber Design 1. SUS304 stainless steel sputtering chamber with mirror-polished interior (including shielding plates) for ultra-clean conditions and optimal vacuum performance. 3. Flexible Control Options 1. Manual/Auto Control: Siemens PLC + touchscreen interface. 2. Fully Automated: PC + PLC integration. Technical Specifications Parameter Details Overall Dimensions (L×W×H) 1100 × 800 × 1900 mm Chamber Dimensions (L×W×H) 440 × 440 × 450 mm Substrate Stage Max. temperature: 500°C (±1°C accuracy) Ultimate Vacuum 2 × 10−5 Pa Pumping Speed & Hold ≤8 × 10−4 Pa in 20 min; ≤5 Pa over 12 hours Deposition Uniformity ±3% to ±5% across the tray Target Options Rectangular: 210×210 mm / 300×300 mm; Circular targets available Applications & Advantages Ideal For: · Research & Prototyping: Tailored for sensitive materials requiring inert environments (e.g., perovskites, OLED layers). · Multi-Process Integration: Combines sputtering, spin-coating, and testing in a single glovebox workflow, minimizing contamination risks. · High-Quality Films: Superior uniformity and low-defect deposition critical for optoelectronic and energy storage devices. Why Choose This System? · Glovebox Compatibility: Unique airtight integration for oxygen/moisture-sensitive processes. · Versatile Configurations: Supports diverse target geometries and automation levels. · Industry-Grade Precision: Tight temperature control (±1°C) and high vacuum stability ensure reproducible results.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; 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Lab Multi-target Magnetron Sputtering System For Compound Film Deposition

Lab Multi-target Magnetron Sputtering System For Compound Film Deposition    Model: TMAX-PD-JS04-Adjustable Multi-Target System for Metal, Oxide, and Semiconductor Product Overview The TMAX-PD-JS04 is a compact magnetron sputtering system designed for laboratory applications, including the deposition of metallic, oxide, dielectric, and semiconductor thin films, as well as the preparation of electrode materials for SEM sample coating. It is also suitable for educational purposes and pre-production process testing. With user-friendly operation, multifunctional capabilities, and high scalability, this system is ideal for academic research and industrial R&D. Key Features ✔ Adjustable Co-Focal Sputtering Structure: The target gun height and angle are adjustable for optimized deposition. ✔ Stable Gas Distribution: Process gases are introduced near the target surface, ensuring uniform reaction gas concentration throughout the vacuum chamber. ✔ Flexible Control Options: Supports both manual operation (Siemens PLC + touchscreen) and fully automatic control (computer + PLC). ✔ Precise Heating & Bias Control: The substrate stage supports heating up to 500°C (accuracy: ±3°C at 200°C, ±1.5°C at 500°C) and bias voltage up to -800V. ✔ High Uniformity: Film uniformity within ±3%~±5% over a 3-inch area. Technical Specifications Parameter Value Chamber Dimensions (L×W×H mm) 300 × 300 × 380 System Dimensions (L×W×H mm) 600 × 900 × 1900 Base Pressure ≤5×10⁻⁵ Pa Pumping & Holding Capability ≤8×10⁻⁴ Pa (30 min) / ≤8 Pa (12 hrs) Target Guns 2 guns (2-inch or 3-inch optional) Sputtering Coverage 2–4 inches Advantages & Applications ✔ Advantages · Co-focal sputtering design for precise film control. · High uniformity (±3%~±5%) ensures consistent coating quality. · Multi-functional for diverse thin-film research needs. ✔ Applications · Academic Research: Thin-film studies, electrode fabrication, and SEM sample preparation. · Advanced Materials: R&D in energy-related organic materials and novel processes. This system excels in low-temperature, high-precision, and controllable thin-film deposition, making it a versatile tool for scientific and industrial innovation.           html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Desktop Magnetron Sputtering Coating Machine System For Oxides & Ceramics & Semiconductors

Desktop Magnetron Sputtering Coating Machine System For Oxides & Ceramics & Semiconductors     Model: TMAX-PC-JS04-Multilayer Thin-Film Fabrication Technical Specifications Parameter Specification Base Vacuum 6.7×10−5 Pa Operating Vacuum (after 1h) ≤4×10−4 Pa Magnetron Targets 3 (3-inch, permanent magnet, water-cooled, side shutters) Target-to-Substrate Distance 120–200 mm (manually adjustable, scale-indicated) Target Tilt Angle 0–45° Substrate Heating Iodine-tungsten lamp, max 400°C Substrate Size Φ60 mm (single-piece) Substrate Rotation 0–50 RPM (motorized) Bias Voltage 0–200 V (adjustable) Gas Flow Control 2-channel MFC, 0–50 sccm range Control Functions Manual heating/rotation/shutter/vacuum monitoring Key Features & Applications 1. Precision & Flexibility · Adjustable target-substrate geometry for tailored film stress and uniformity. · Three-target co-sputtering enables multilayer/composite films (e.g., superlattices). 2. High-Quality Deposition · UHV-compatible chamber minimizes impurities for high-purity films. · Heated substrate (400°C max) improves crystallinity (e.g., for oxides/semiconductors). 3. Compact Research Tool · Benchtop design suits small-batch R&D and material screening. Typical Uses · Protective coatings (e.g., TiN, DLC for tools). · Transparent conductive films (e.g., ITO, AZO). · MEMS/sensor fabrication. Best for: Labs requiring flexible, high-precision thin-film deposition with manual control.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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} img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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High-Precision Magnetron Sputtering Deposition PVD Machine For Multilayer & Multitarget

High-Precision Magnetron Sputtering Deposition PVD Machine For Multilayer & Multitarget     Model: TMAX-PC-JS07-High Vacuum & Multilayer & Multitarget Key Features & Applications The TMAX-PC-JS07 is designed for nano-scale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor layers, and dielectric films. Ideal for research institutions and universities, it supports both material science studies and small-batch production. System Components · Vacuum chamber system (sputtering chamber) · Target & power supply system · Sample stage system · Vacuum pumping & measurement system · Gas flow system · Control system · Film thickness monitoring system · Top cover lifting mechanism · Electrical control system · Computer-controlled system & auxiliary components Technical Specifications Parameter Value Ultimate Vacuum 6.7×10-5 Pa System Leak Rate 1×10-7 Pa·L/S Vacuum Recovery Time ≤40 min to 6.6×10 Pa (after N2 purge) Chamber Design Round chamber, Ø450×350 mm Sample Stage 3-inch × 3-inch (3.2 mm thick) Heating Temperature 600°C ±1°C (programmable) Sample Rotation Self-rotation: 0–50 RPM (uniformity)  Revolution: Position-switching capability Magnetron Target 3 targets (standard)  Effective Sputtering Area: 3-inch × 3-inch  Type: Permanent magnet, brazed indirect water-cooled Deposition Mode Upward sputtering (planar target) Substrate Bias Voltage Up to –200 V Gas Flow System 2-channel mass flow controller Thickness Monitor Quartz crystal sensor (0–999,999 Å) Pumping Options Turbo molecular pump / Cryogenic pump + Dry scroll pump Control & Automation · Real-time monitoring: Tracks displacement and revolution speed. · Error analysis: Displays deviations via curves/numerical data. · Flexible display: Switch between linear and logarithmic scales for revolution speed vs. displacement. · Advanced modes: Supports fixed-point deposition and resistive evaporation coating. Why Choose? ✔ High Precision: Programmable heating (±1°C) and dual-axis sample motion ensure uniform film growth. ✔ Versatile Configurations: Compatible with multiple target materials and pumping systems. ✔ Research-Oriented: Combines in-situ thickness control with automated process logging for reproducible results. Ideal for: Advanced material research, optical coatings, semiconductor layers, and protective coatings development.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film

Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film      Model: TMAX-PC-JS08-Dual-Target, Multilayer Films Deposition Equipment Purpose Designed for nano-scale single/multilayer functional films (hard coatings, metals, semiconductors, dielectrics). Features pre-sputtering cleaning for enhanced adhesion. System Components · Vacuum chamber, dual magnetron targets, heating stage, DC/RF power supplies, gas delivery, vacuum pumps, control system. Technical Parameters Category Specification Chamber Structure Vertical front-loading; stainless steel/vacuum materials Base Pressure ≤5×10−5 Pa Leak Rate ≤5×10−7 Pa·L/s Pressure Rise Rate ≤10 Pa (after 12 hours, pump off) Pumping System Domestic molecular pump + mechanical pump Targets 2× 4-inch HV (1 standard-field, 1 strong-field); DC/RF compatible (Kurt J. Lesker) Target-Sample Distance 40–120 mm (multilayer); 80–120 mm (with ion source) Power Supplies RF: 1000 W, 13.56 MHz (auto-matching); DC: 1000 W (AE brand) Sample Stage 3 substrates; 5–30 RPM rotation; 450°C heating; 1000 V bias Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm (±5% uniformity over 2-inch area) Adhesion Test Passes 3-tape peel (glass/Si/ceramic) Gas System 2 MKS mass flow controllers (Ar + reactive gas); mixing capability Baking Temperature 150°C (infrared heating) Key Features 1. Dual-Target Flexibility o Enables co-sputtering or sequential deposition for complex multilayers. 2. High Adhesion & Cleanliness o Integrated pre-sputtering cleaning and ion-assisted deposition (anode-layer source). 3. Precision Process Control o Programmable temperature (450°C max), rotation (5–30 RPM), and gas flow. 4. Safety & Reliability o Interlocks for power/water failures; manual controls for critical operations. Target Applications · Research: Nanomaterials, thin-film physics, prototype development. · Education: Advanced deposition techniques training. · Industry: Small-batch functional coatings (e.g., optics, electronics).     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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Auto Magnetron Sputtering Deposition System For Metals, Perovskite, Semiconductors, MEMS

Auto Magnetron Sputtering Deposition System For Metals, Perovskite, Semiconductors, MEMS     Model: TMAX-PC-JS09-Multi-target, Multi-film Deposition 1. Specifications Parameter Specification Chamber Design Single-chamber, vertical front-loading (stainless steel/vacuum-grade materials) Base Vacuum ≤5×10−5 Pa Pump-down Time 100 min (to ≤5×10−4 Pa after N2 venting) Leak Rate ≤5×10−7 Pa·L/s Magnetron Targets 3 × 3-inch (2 standard-field, 1 high-field, DC/RF compatible, Kurt J. Lesker) Power Supplies 1 × RF (600 W, 13.56 MHz), 2 × DC (1000 W, AE Corp.) Substrate Stage 3-position, rotating (5–30 RPM), heated (up to 450°C), bias voltage (1000 V) Target-Substrate Distance 40–120 mm (80–120 mm with ion source) Gas Control 2-channel MKS mass flow controllers (Ar + reactive gases) Film Thickness Uniformity ≤5% on 2-inch area (Cu/Al: 4–5 µm, Ni/PTFE: 1–2 µm) Adhesion Test Passes 3× tape test (glass, Si, ceramic substrates) Additional Features Reverse sputtering, anode-layer ion source, safety interlocks, computer control 2. Key Features & Benefits ✔ High-Precision Deposition · Uniform films with ≤5% thickness variation, ideal for research and prototyping. · Multi-layer capability (e.g., Al/Ni, Al/PTFE) with automated target switching. ✔ Advanced Process Control · Computer-controlled deposition (temperature, rotation, gas flow). · Ion-assisted deposition enhances film density and adhesion. ✔ Flexible & Reliable Design · Three-target system supports diverse materials (metals, dielectrics, semiconductors). · Substrate heating (450°C) and rotation ensure high-quality coatings. ✔ Research-Optimized Safety · Fail-safe protections (water/power interlocks, anti-misoperation). · Controlled environment with bake-out and contamination liners. 3. Ideal Applications · Academic & Industrial R&D: Thin-film studies, optoelectronics, protective coatings. · Semiconductor & MEMS: Precise metal/dielectric layers for device fabrication. · Advanced Materials: Hard coatings (e.g., tooling), functional films (e.g., PTFE). 4. Why Choose This System? · Repeatable results with automated workflows. · Imported critical components (Kurt J. Lesker targets, AE power supplies) ensure reliability. · Compact footprint with full-featured capabilities for labs.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Multi-target Magnetron Sputtering Machine For Parylene,OLED, Solar Cell & Semiconductor

Multi-target Magnetron Sputtering Machine For Parylene,OLED, Solar Cell & Semiconductor     Model: TMAX-PC-JS10-Multi-target, Multi-film Deposition Specifications Category Parameter Primary Application Nanoscale monolayer/multilayer films (hard coatings, metals, semiconductors, dielectrics) Target Users Universities, research institutes (R&D and small-batch production) System Composition Vacuum chamber, sputtering targets, sample stage, vacuum pumps, gas delivery, control systems, film thickness monitor, and auxiliary components Vacuum Performance Parameter Specification Ultimate Vacuum 6.7 × 10-5 Pa System Leak Rate ≤1 × 10-7 Pa·L/s Vacuum Recovery Time ≤40 min (to 6.6 × 10-1 Pa after N2 purge) Chamber & Sample Stage Component Specification Chamber Dimensions Ø630 mm × 350 mm (cylindrical) Sample Capacity 8 × 4-inch substrates (1 mm thickness) Sputtering Targets Feature Specification Target Types 3 × Permanent magnet targets, 3 × High-intensity magnet targets Cooling Method Indirect water-cooled (brazed structure) Target Diameter Ø100 mm Target-Substrate Distance 50–90 mm (manual adjustment, with position indicator) Sputtering Mode Vertical downward sputtering Substrate Control Parameter Specification Bias Voltage Up to -200 V Rotation Mechanism Computer-controlled revolution + rotation (stepper motor-driven) Temperature Control RT to 300°C (single calibration required; 3 heaters, one active at a time) Gas & Thickness Control Component Specification Mass Flow Controllers (MFC) 2 channels Film Thickness Monitor Quartz crystal microbalance (0–999,999 Å) Pumping Options Configuration Components Standard Turbo molecular pump + dry scroll pump Alternative Cryogenic pump + dry scroll pump Computer Control Features · Real-time displacement/speed monitoring with error calculation. · Linear/logarithmic display modes for speed vs. displacement. · Site-specific deposition via precision positioning. Key Advantages & Applications ✔ Multi-Target Flexibility – Supports diverse materials (metals, oxides, nitrides). ✔ Uniform Deposition – Computer-controlled rotation ensures film consistency. ✔ High Vacuum Stability – Minimizes contamination for high-purity films. ✔ Research-Ready – Modular design suits optoelectronics, tribological coatings, and semiconductor R&D. Ideal for: Advanced material science studies and prototyping of functional thin-film devices.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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Multi-target Magnetron Sputtering Coating System For Multilayer Thin Film Fabrication

Multi-target Magnetron Sputtering Coating System For Multilayer Thin Film Fabrication      Model: TMAX-TK-JS01-Multilayer Thin Film Fabrication Technical Parameters Parameter Specification Model TMAX-TK-JS01 Vacuum Chamber Structure Vertical top-opening design, manual gas spring lift Chamber Dimensions Φ220mm × H300mm Heating Temperature Room temperature to 500°C Substrate Holder Size Φ100mm (rotatable, heated) Film Uniformity ≤ ±5.0% within Φ50mm area Sputtering Target 1 × Φ2-inch magnetron target (DC/RF compatible) Process Gas Control 1–2 channels, precision ±0.1 sccm Control System PLC + touchscreen interface Footprint (Main Unit) 600mm (L) × 800mm (W) × 1700mm (H) Power Consumption ≥6 kW Base Vacuum 6.6×10⁻⁵Pa Pumping Time ≤15 min (from atmosphere to 7×10⁻³Pa) Applications Designed for thin-film research and small-batch production, ideal for: · Academic labs: Universities and research institutes studying novel materials. · Industrial R&D: Prototyping functional coatings (e.g., ITO for solar cells, wear-resistant alloys). Key Features 1. Multi-Mode Sputtering ·Supports DC, RF, and pulsed sputtering for metals, oxides, and semiconductors. ·Single-/multi-target configurations for layered or composite films. 2. User-Friendly Operation ·Automated PLC control with real-time monitoring via touchscreen. ·Substrate heating (≤300°C) and rotation (2–20 rpm) for uniform coatings. 3. Compact & Reliable ·Minimal footprint, low maintenance, and energy-efficient design. 4. Safety & Precision ·Water-cooling protection, gas flow control (±0.1 sccm), and arc suppression. Quick Start Guide 1. Installation: ·Ensure stable power (AC 380V ±5%, ≥8 kW), cooling water (≥10 L/min), and proper grounding (<3Ω). ·Verify vacuum seals and gas connections before startup. 2. Operational Workflow: ·Pumping: Start mechanical pump → Open foreline valve → Activate molecular pump (at >5 Pa). ·Deposition: Set substrate temperature → Adjust gas flow → Initiate sputtering (5–15 W/cm² target power). ·Shutdown: Cool substrate (<50°C) → Vent chamber → Maintain pump oil/clean seals regularly. 3. Maintenance Tips: ·Replace mechanical pump oil every 500 operational hours. ·Clean chamber and target surfaces after each use to avoid cross-contamination. Summary The  TMAX-TK-JS01 combines research-grade precision with industrial durability, offering: · Flexibility: Adaptable to diverse materials (metals, dielectrics, etc.). · Efficiency: Fast pumping, intuitive controls, and low running costs. · Support: Comprehensive manuals and technical assistance provided. For advanced applications (e.g., perovskite layers), consult the manufacturer for tailored process parameters.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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